JPS63175158U - - Google Patents
Info
- Publication number
- JPS63175158U JPS63175158U JP4883987U JP4883987U JPS63175158U JP S63175158 U JPS63175158 U JP S63175158U JP 4883987 U JP4883987 U JP 4883987U JP 4883987 U JP4883987 U JP 4883987U JP S63175158 U JPS63175158 U JP S63175158U
- Authority
- JP
- Japan
- Prior art keywords
- gas
- gas blowing
- plasma discharge
- discharge field
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007664 blowing Methods 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 4
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 3
- 230000035699 permeability Effects 0.000 claims 1
Landscapes
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Description
図面は本考案の一実施例を示し、第１図はプラ
ズマＣＶＤ装置の模式的な側面図、第２図は第１
図における―線に沿う断面図、第３図は第２
図の具体的な拡大図、第４図は第３図における
―線に沿う断面図である。
１……チヤンバ、２……基板、４……ガス吹出
ノズル、９……ガス導入経路、３１，３２……ガ
ス吹出板、Ｓ……プラズマ放電場。
The drawings show one embodiment of the present invention, and FIG. 1 is a schematic side view of a plasma CVD apparatus, and FIG. 2 is a schematic side view of a plasma CVD apparatus.
A sectional view taken along the line - in the figure, Figure 3 is the 2nd
A detailed enlarged view of the figure, FIG. 4 is a sectional view taken along the line - in FIG. 3. DESCRIPTION OF SYMBOLS 1... Chamber, 2... Substrate, 4... Gas blowing nozzle, 9... Gas introduction path, 31, 32... Gas blowing plate, S... Plasma discharge field.
Claims (1)
側に配置した基板と、この基板に対向して前記プ
ラズマ放電場の他端側に配置した通気性を有する
ガス吹出板と、このガス吹出板の背後に位置変更
可能に設けられ該ガス吹出板および前記プラズマ
放電場を介して前記基板にガスを供給する複数の
ガス吹出ノズルと、これらのガス吹出ノズルに前
記チヤンバ外からガスを導入するガス導入経路と
を具備してなることを特徴とするプラズマＣＶＤ
装置。 A substrate disposed on one end side of a plasma discharge field formed in a chamber, a gas blowing plate having air permeability disposed on the other end side of the plasma discharge field facing the substrate, and behind the gas blowing plate. a plurality of gas blowing nozzles which are provided in a position changeable manner and which supply gas to the substrate via the gas blowing plate and the plasma discharge field; and a gas introduction path which introduces gas into these gas blowing nozzles from outside the chamber. A plasma CVD characterized by comprising:
Device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4883987U JPH0543094Y2 (en) | 1987-03-31 | 1987-03-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4883987U JPH0543094Y2 (en) | 1987-03-31 | 1987-03-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63175158U true JPS63175158U (en) | 1988-11-14 |
| JPH0543094Y2 JPH0543094Y2 (en) | 1993-10-29 |
Family
ID=30870746
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4883987U Expired - Lifetime JPH0543094Y2 (en) | 1987-03-31 | 1987-03-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0543094Y2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005026233A (en) * | 1996-10-02 | 2005-01-27 | Tokyo Electron Ltd | Plasma processing device |
| JP2012111984A (en) * | 2010-11-22 | 2012-06-14 | Kojima Press Industry Co Ltd | Apparatus for forming surface coat of resin substrate |
-
1987
- 1987-03-31 JP JP4883987U patent/JPH0543094Y2/ja not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005026233A (en) * | 1996-10-02 | 2005-01-27 | Tokyo Electron Ltd | Plasma processing device |
| JP2012111984A (en) * | 2010-11-22 | 2012-06-14 | Kojima Press Industry Co Ltd | Apparatus for forming surface coat of resin substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0543094Y2 (en) | 1993-10-29 |
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