JPS63172827A - High frequency heating appliance - Google Patents

High frequency heating appliance

Info

Publication number
JPS63172827A
JPS63172827A JP536987A JP536987A JPS63172827A JP S63172827 A JPS63172827 A JP S63172827A JP 536987 A JP536987 A JP 536987A JP 536987 A JP536987 A JP 536987A JP S63172827 A JPS63172827 A JP S63172827A
Authority
JP
Japan
Prior art keywords
heating chamber
heating
food
plate
reflector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP536987A
Other languages
Japanese (ja)
Inventor
Mitsuhiko Serikawa
芹川 光彦
Sawako Usuki
佐和子 薄木
Katsumasa Sato
克昌 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP536987A priority Critical patent/JPS63172827A/en
Publication of JPS63172827A publication Critical patent/JPS63172827A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To reduce heating irregularities by providing a metallic reflector in a gap between the bottom surface part and rotary tray of a heating chamber, and rotating the reflection plate by utilizing the shaft driving force of a driving part rotating the rotary tray. CONSTITUTION:A microwave radiated from a radiation antenna of a magnetron is transmitted through a wave guide 3 and is radiated into a heating chamber 5 through a coupling hole 4. In the interior of the heating chamber 5, the microwave repeats its reflection between the inner wall of the heating chamber 5 and a metallic reflector 14, whereby a standing wave is formed and intenseness and weakness occurs in energy distribution depending on the difference in location. However, the reflection plate 14 has a negative gentle slope from a part A to a part B and a positive gentle slope from the part B to the port A and further rotates with the rotation of the rotary tray 8. Therefore, the reflecting direction of the incident microwave, on the reflector 14 varies with the rotation of the reflector 14. In addition to the effect obtained by the rotation of a food 9 itself, it is possible to obtain more heating uniformity.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は被加熱物(以下食品という)の加熱むらを軽減
し、均一な加熱を簡単な構成で実現する高周波加熱装置
に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a high-frequency heating device that reduces uneven heating of an object to be heated (hereinafter referred to as food) and achieves uniform heating with a simple configuration.

従来の技術 高周波加熱装置においては、食品のなま焼けを防止する
とともに良好かつ効率的な加熱調理を行なうために、均
一加熱が可能となるような加熱室及び導波管取付は部の
設計を行なう必要がある。
Conventional technology In high-frequency heating equipment, in order to prevent food from being browned and to perform good and efficient cooking, the heating chamber and waveguide installation must be designed to ensure uniform heating. It is necessary to do it.

一般に高周波を用いた誘電加熱の場合、食品内部での単
位体積、単位時間あたりの発熱量Pは次式%式% ここでKは比例定数、fは高周波(以下マイクロ波とい
う)の周波数(電子レンジの場合2460MHz)、ε
1は食品の比誘電率の実数部、tanδは誘電力率、E
は食品内部における電界である。
In general, in the case of dielectric heating using high frequency, the amount of heat generated per unit volume and unit time inside the food, P, is calculated using the following formula (%), where K is a proportionality constant, and f is the frequency of the high frequency (hereinafter referred to as microwave) (electronic 2460MHz for range), ε
1 is the real part of the dielectric constant of the food, tanδ is the dielectric constant, E
is the electric field inside the food.

(1)式においてに、fsε1 、 tanδは食品に
より決まる定数であることから、均一加熱を実現するた
めには食品内部での電界強度IEIをできるだけ一様な
状態にすることが必要となる。
In equation (1), fsε1 and tanδ are constants determined by the food, so in order to achieve uniform heating, it is necessary to make the electric field intensity IEI inside the food as uniform as possible.

従来、この電界強度を一様にして加熱むらを軽減する手
段としては、加熱室の床面に回転皿を設け、食品をこの
回転皿にのせて加熱中に回転させることにより食品内部
の電界強度分布を周期的に変動させる方法や、加熱室内
に金属製の回転羽根を設けて導波管から照射されるマイ
クロ波を拡はんする方法が多く行なわれていた。
Conventionally, as a means to uniformize the electric field strength and reduce uneven heating, a rotating plate is installed on the floor of the heating chamber, and the electric field strength inside the food is adjusted by placing the food on the rotating plate and rotating it during heating. Many methods have been used to periodically vary the distribution, or to spread the microwaves irradiated from a waveguide by installing rotating metal blades in the heating chamber.

以下、図面を参照しながら上述した従来の加熱むらを軽
減する方法について説明する。
Hereinafter, a conventional method for reducing heating unevenness described above will be described with reference to the drawings.

第3図、第4図は加熱むらを軽減する方法に関する従来
例を示す図である。まず第3図において、1は高周波発
振器(以下マグネトロン)、2はマグネトロン1の放射
アンテナ、3はアンテナ2より放射されたマイクロ波の
伝送路となる導波管、6は加熱室、4は導波管3と加熱
室6とを高周波的に結合するだめの結合孔、8は食品を
のせるための回転皿、6は回転皿8を回転させるための
駆動部、7は駆動部6からのトルクを回転皿8に伝達す
るためのシャフト、9はマイクロ波により誘電加熱され
る食品である。
FIGS. 3 and 4 are diagrams showing conventional examples of methods for reducing uneven heating. First, in Fig. 3, 1 is a high-frequency oscillator (hereinafter referred to as a magnetron), 2 is a radiation antenna of the magnetron 1, 3 is a waveguide that serves as a transmission path for the microwaves radiated from the antenna 2, 6 is a heating chamber, and 4 is a guide. A coupling hole for coupling the wave tube 3 and the heating chamber 6 at high frequency; 8 is a rotating plate for placing food; 6 is a drive unit for rotating the rotating plate 8; 7 is a connection hole from the drive unit 6; A shaft 9 for transmitting torque to the rotating plate 8 is a food dielectrically heated by microwaves.

以上のように構成された高周波加熱装置において、マグ
ネトロン1に結合された放射アンテナ2から放射された
マイクロ波は導波管3の中を結合孔4へ伝播し、結合孔
4から加熱室6内部へ放射される。一方、加熱室6内部
におかれた回転皿8は、駆動部6により生ずるトルクを
シャフト7を介して受けることにより、回転皿8の上に
おかれた食品9とともに回転する。ところで、加熱室6
内部にマイクロ波が照射される場合、加熱室6内部にお
いては、内壁面で何回も反射をくり返したマイクロ波が
干渉することにより、定在波モードが生じるようになる
。このため、電界強度に関して強弱の分布が存在するよ
うになり、食品の加熱むらをひき起こす原因となる。上
記した構成においては、食品9を回転移動させることに
より食品9の内部の電界強度分布を変化させて、加熱む
らの軽減を図っている。
In the high-frequency heating device configured as described above, microwaves radiated from the radiation antenna 2 coupled to the magnetron 1 propagate through the waveguide 3 to the coupling hole 4, and from the coupling hole 4 to the inside of the heating chamber 6. radiated to. On the other hand, the rotating plate 8 placed inside the heating chamber 6 rotates together with the food 9 placed on the rotating plate 8 by receiving torque generated by the drive unit 6 via the shaft 7 . By the way, heating chamber 6
When the inside is irradiated with microwaves, a standing wave mode is generated inside the heating chamber 6 due to the interference of the microwaves that have been reflected many times on the inner wall surface. For this reason, there is a distribution of strength and weakness in the electric field strength, which causes uneven heating of the food. In the above configuration, by rotating the food 9, the electric field strength distribution inside the food 9 is changed, thereby reducing uneven heating.

次に第4図において、他の従来の構成について説明する
と、12は加熱室5の内部におかれた金属性の羽根(以
下スタンという)、11は回転駆動用のシャフト、10
は駆動部で、他は第3図に示す構成と同じである。
Next, in FIG. 4, another conventional structure will be explained. 12 is a metal blade (hereinafter referred to as a stun) placed inside the heating chamber 5, 11 is a shaft for rotational driving, and 10
3 is a drive section, and the other components are the same as those shown in FIG. 3.

上記のように構成された第4図に示す高周波加熱装置に
おいては、駆動部1oによりシャフト11を介してスタ
ン12を回転させることにより、加熱室6内部のマイク
ロ波を拡はんする。そして加熱室5内部において定在波
モードの発生を軽減し、あわせて内部にマイクロ波を一
様に拡散させることにより加熱むらの軽減を図っている
In the high-frequency heating apparatus shown in FIG. 4 configured as described above, the microwave inside the heating chamber 6 is expanded by rotating the stun 12 via the shaft 11 by the drive unit 1o. The generation of standing wave modes inside the heating chamber 5 is reduced, and the microwaves are uniformly diffused inside, thereby reducing uneven heating.

発明が解決しようとする問題点 しかしながら加熱室内部に発生するマイクロ波の定在波
モードは加熱室内空間形状に強く依存し、第3図に示す
ような構成では食品の回転により電界エネルギーは周方
向には平均化されるが、半径方向には平均化されにくい
ため、たとえば周辺部はよく加熱されるが中央付近はな
ま焼けであるといっだことが起こる。
Problems to be Solved by the Invention However, the standing wave mode of microwaves generated inside the heating chamber strongly depends on the spatial shape of the heating chamber. Although it is averaged in the radial direction, it is difficult to average it in the radial direction, so a problem may occur if, for example, the periphery is well heated but the center is half-baked.

また第4図のような構成としても、定在波の発生を軽減
するためにはスタンを構成する羽根の代表寸法をマイク
ロ波の波長(空間波長12.2cM)に比べてかなり大
きくしないと十分な効果が得られず、ヒータ等を搭載し
たレンジでは、そのような大きなスタンを配置すること
は、スペースファクター等を考慮すると事実上困難であ
った。
Furthermore, even with the configuration shown in Figure 4, in order to reduce the generation of standing waves, the typical dimensions of the blades that make up the stun must be considerably larger than the microwave wavelength (spatial wavelength 12.2 cM). However, in a microwave oven equipped with a heater etc., it was practically difficult to arrange such a large stun due to space factors and other considerations.

本発明は上記問題点に鑑み、簡単な構成で加熱室内部の
マイクロ波を一様に拡散させることにより、加熱むらの
少ない良好な高周波加熱装置を提供することを目的とし
ている。
In view of the above-mentioned problems, an object of the present invention is to provide an excellent high-frequency heating device with less uneven heating by uniformly diffusing microwaves inside a heating chamber with a simple configuration.

問題点を解決するだめの手段 上記問題点を解決するために本発明の高周波加熱装置は
、加熱室の底面部と回転皿の間隙に金属性の反射板を設
け、回転皿を回転する駆動部の軸駆動力を利用して、こ
の反射板を回転させるものである。
Means for Solving the Problems In order to solve the above-mentioned problems, the high-frequency heating device of the present invention provides a metallic reflector between the bottom of the heating chamber and the rotary plate, and a drive unit that rotates the rotary plate. The reflector is rotated using the shaft driving force of the reflector.

作用 本発明は上記した構成により、回転皿による食品の回転
移動による加熱均一効果に加えて、回転皿の下部に比較
的大きな面積をもつ金属性の反射板を設置し、これを回
転皿とともに回転させることにより、加熱室内部に伝送
されたマイクロ波が加熱室の壁面および反射板の間で何
回も反射をくり返すことにより生じる定在波を反射板の
回転とともに時々刻々変化させ、食品内部に生じる電界
エネルギー分布を時間的に平均化することにより、加熱
の均一度をより一層高めることが可能となる。
Function The present invention has the above-mentioned configuration, and in addition to the uniform heating effect achieved by the rotational movement of the food by the rotating plate, a metal reflecting plate with a relatively large area is installed at the bottom of the rotating plate, and this is rotated together with the rotating plate. By doing so, the microwaves transmitted into the heating chamber are reflected many times between the walls of the heating chamber and the reflection plate, causing the standing waves to change moment by moment as the reflection plate rotates, causing waves to be generated inside the food. By temporally averaging the electric field energy distribution, it is possible to further improve the uniformity of heating.

実施例 以下、本発明の一実施例の高周波加熱装置について、図
面を参照しながら説明する。
EXAMPLE Hereinafter, a high-frequency heating device according to an example of the present invention will be described with reference to the drawings.

第1図は本発明の一実施例における高周波加熱装置を示
す。第1図において、マグネトロン1゜放射アンテナ2
.導波管3.結合孔4.加熱室6゜駆動部6.シャフト
7、回転皿81食品9は第3図に示すものと同じである
。15は加熱室6を構成する底面の一部で、同心円状の
くぼみ空間である。14は金属性の反射板であり、回転
皿8の下側に保持され、くぼみ空間16におさまるよう
に配置されている。
FIG. 1 shows a high frequency heating device in one embodiment of the present invention. In Figure 1, magnetron 1° radiation antenna 2
.. Waveguide 3. Binding hole 4. Heating chamber 6° drive unit 6. The shaft 7, rotating plate 81 and food 9 are the same as those shown in FIG. Reference numeral 15 denotes a part of the bottom of the heating chamber 6, which is a concentric recessed space. Reference numeral 14 denotes a metal reflecting plate, which is held below the rotary plate 8 and arranged so as to fit into the recessed space 16.

第2図は反射板14の詳細な構成を示す図で、反射板1
4は金属性プレート部17とスペーサ13、およびスペ
ーサ13と金属性プレート17を締結する締結部材16
から構成されている。スペーサ13はその中央部にキー
溝付き穴があけられており、駆動部6からの駆動力を伝
達するシャフト7が貫通し、回転皿8とともにくぼみ空
間内で回転するように構成されている。なお金属性プレ
ート17は、第2図において、A部とB部の高さが異な
っておυ、A部からB部へは負の傾斜が、逆にB部から
A部へは正の傾斜がつけられている。
FIG. 2 is a diagram showing the detailed configuration of the reflector 14.
Reference numeral 4 denotes a metal plate portion 17 and a spacer 13, and a fastening member 16 that fastens the spacer 13 and the metal plate 17.
It consists of The spacer 13 has a hole with a key groove in its center, through which the shaft 7 for transmitting the driving force from the drive section 6 passes, and is configured to rotate together with the rotary plate 8 in the recessed space. In Fig. 2, the money attribute plate 17 has different heights between parts A and B, and has a negative slope from part A to part B, and a positive slope from part B to part A. is attached.

以上のように構成された高周波加熱装置において、マグ
ネトロン1の放射アンテナ2から放射されたマイクロ波
は、導波管3の中を伝送されて結合孔4よシ加熱室6の
内部に放射される。加熱室6の内部において、マイクロ
波は加熱室内壁および金属性の反射板14の間で反射を
くり返すことにより定在波が形成され、電界エネルギー
分布は場所の違いによる強弱が生じることになる。しか
しながら反射板14は、第2図に示すようにA部からB
部へ負のなめらかな傾斜を、またB部からム部へは正の
なめらかな傾斜をもっており、しかも回転皿8の回転と
ともに回転するため、反射板14に入射したマイクロ波
の反射方向は、反射板14の回転とともに徐々に変化す
ることになる。
In the high-frequency heating device configured as described above, microwaves radiated from the radiation antenna 2 of the magnetron 1 are transmitted through the waveguide 3 and radiated through the coupling hole 4 into the heating chamber 6. . Inside the heating chamber 6, the microwaves are repeatedly reflected between the heating chamber walls and the metal reflection plate 14 to form a standing wave, and the electric field energy distribution varies in strength depending on the location. . However, as shown in FIG.
There is a smooth negative slope from part B to part B, and a smooth positive slope from part B to part B. Furthermore, since the plate rotates with the rotation of the rotating plate 8, the direction of reflection of the microwave incident on the reflection plate 14 is It will gradually change as the plate 14 rotates.

しかも、反射板14は回転皿8と加熱室6の底部の間の
くぼみ空間に配置されていることから、食品が置かれる
実質空間を占有することなく省スペース対応であるにも
かかわらず、比較的金属性プレート1アの面積を大きく
とることができるため、その定在波形成に及ぼす影響は
大である。このため加熱室6の内部に形成される定在波
分布は、反射板14の回転にともなって時々刻々周期的
な変化をくり返すと考えられる。これにより、食品9の
内部での電界エネルギー分布すなわち電界エネルギーの
場所による強弱の分布は時々刻々変化することになり、
食品9自身の回転による効果とあわせて、より一層の加
熱均一性を得ることができる。
Moreover, since the reflector plate 14 is arranged in the recessed space between the rotary plate 8 and the bottom of the heating chamber 6, it does not occupy the actual space where food is placed and is space-saving. Since the area of the metallic plate 1a can be large, its influence on the formation of standing waves is large. Therefore, it is considered that the standing wave distribution formed inside the heating chamber 6 repeats periodic changes from time to time as the reflection plate 14 rotates. As a result, the electric field energy distribution inside the food 9, that is, the distribution of electric field energy strength depending on the location, changes from moment to moment.
In addition to the effect of rotation of the food 9 itself, further heating uniformity can be obtained.

なお、第2図において、金属性プレート17は一枚のプ
レートより構成されているが、複数に分割して羽根形状
としてもよい。また第1図および第2図の構成では金属
性プレート17は回転皿8と同じ回転数で回転するが、
適当な減速機構を設けて異なる回転数で回転させてもよ
い。
In addition, in FIG. 2, the metal plate 17 is composed of one plate, but it may be divided into a plurality of blade-shaped plates. Furthermore, in the configurations shown in FIGS. 1 and 2, the metal plate 17 rotates at the same number of rotations as the rotary plate 8;
An appropriate speed reduction mechanism may be provided to rotate at different rotational speeds.

発明の効果 本発明は、加熱室底面部と回転皿の間隙部に例えば金属
性の反射板を配置し、被加熱物の加熱時にこの反射板を
回転させることにより加熱室内部に発生する電界の定在
波パターンを時々刻々変化させて食品内部の電界エネル
ギー分布を平均化させ、食品自身の回転による均一効果
とあわせて均一性の高い加熱が可能な高周波加熱装置を
実現するものである。
Effects of the Invention The present invention provides a method for reducing the electric field generated inside the heating chamber by arranging, for example, a metallic reflective plate in the gap between the bottom of the heating chamber and the rotary plate, and rotating this reflective plate when heating an object to be heated. The present invention realizes a high-frequency heating device that can uniformly heat the food by changing the standing wave pattern from time to time to average the electric field energy distribution inside the food, and combining this with the uniform effect of the rotation of the food itself.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例の高周波加熱装置を示す断面
図、第2図は同反射板の詳細な構成を示す要部分解斜視
図、第3図と第4図は従来の高周波加熱装置の断面図で
ある。 1・・・・・・マグネトロ/、2・・・・・・放射アン
テナ、3・・・・・・導波管、4・・・・・・結合孔、
6・・・・・・加熱室、6・・・・・・駆動部、7・・
・・・・シャフト、8・・・・・・回転皿、9・・・・
・・食品、10・・・・・・駆動部、11・・・・・・
シャフト、12・・・・・・スタン、13・・・・・・
スペーサ、14・・・・・・反射板、15・・・・・・
くぼみ空間、16・・・・・・締結部材、17・・・・
・・金属性プレート。 代理人の氏名 弁理士 中 尾 敏 男 ほか1名l計
−スベー丈 14−−一反身丁本( 4,32 第2図
Fig. 1 is a sectional view showing a high-frequency heating device according to an embodiment of the present invention, Fig. 2 is an exploded perspective view of main parts showing the detailed structure of the reflector, and Figs. 3 and 4 are conventional high-frequency heating devices. FIG. 2 is a cross-sectional view of the device. 1... Magnetro/, 2... Radiation antenna, 3... Waveguide, 4... Coupling hole,
6... Heating chamber, 6... Drive section, 7...
...Shaft, 8... Rotating plate, 9...
...Food, 10...Drive unit, 11...
Shaft, 12...Stan, 13...
Spacer, 14...Reflector, 15...
Hollow space, 16... Fastening member, 17...
...Metal plate. Name of agent: Patent attorney Toshio Nakao and 1 other person Total height: 14cm - Ittan-Binchohon (4,32 Figure 2)

Claims (1)

【特許請求の範囲】[Claims] 加熱室と、高周波発振器と、前記高周波発振器より出力
された高周波電力を前記加熱室へ導く導波管と、被加熱
物をのせる回転皿と、前記回転皿を回転させる駆動部と
を有し、前記加熱室の底面部と前記回転皿の間隙に反射
板を設け、この反射板を前記駆動部の軸駆動力により前
記回転皿とともに回転させることを特徴とする高周波加
熱装置。
The device includes a heating chamber, a high-frequency oscillator, a waveguide that guides the high-frequency power output from the high-frequency oscillator to the heating chamber, a rotating plate on which an object to be heated is placed, and a drive unit that rotates the rotating plate. A high-frequency heating device characterized in that a reflecting plate is provided in a gap between the bottom of the heating chamber and the rotating plate, and the reflecting plate is rotated together with the rotating plate by an axial driving force of the driving section.
JP536987A 1987-01-13 1987-01-13 High frequency heating appliance Pending JPS63172827A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP536987A JPS63172827A (en) 1987-01-13 1987-01-13 High frequency heating appliance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP536987A JPS63172827A (en) 1987-01-13 1987-01-13 High frequency heating appliance

Publications (1)

Publication Number Publication Date
JPS63172827A true JPS63172827A (en) 1988-07-16

Family

ID=11609254

Family Applications (1)

Application Number Title Priority Date Filing Date
JP536987A Pending JPS63172827A (en) 1987-01-13 1987-01-13 High frequency heating appliance

Country Status (1)

Country Link
JP (1) JPS63172827A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0525347U (en) * 1991-03-09 1993-04-02 株式会社エイコー・エンジニアリング Sample microwave processing device
FR2757931A1 (en) * 1996-12-27 1998-07-03 Daewoo Electronics Co Ltd Microwave oven with additional wave distribution feature

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0525347U (en) * 1991-03-09 1993-04-02 株式会社エイコー・エンジニアリング Sample microwave processing device
FR2757931A1 (en) * 1996-12-27 1998-07-03 Daewoo Electronics Co Ltd Microwave oven with additional wave distribution feature
US5877479A (en) * 1996-12-27 1999-03-02 Daewoo Electronics Co., Ltd. Microwave oven with a turntable and mode stirrers

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