JPS63171891A - Production of thin blade - Google Patents
Production of thin bladeInfo
- Publication number
- JPS63171891A JPS63171891A JP318787A JP318787A JPS63171891A JP S63171891 A JPS63171891 A JP S63171891A JP 318787 A JP318787 A JP 318787A JP 318787 A JP318787 A JP 318787A JP S63171891 A JPS63171891 A JP S63171891A
- Authority
- JP
- Japan
- Prior art keywords
- base
- thin blade
- layer
- blade
- thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims abstract description 18
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 20
- 238000004070 electrodeposition Methods 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 15
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- 229910052759 nickel Inorganic materials 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 235000011121 sodium hydroxide Nutrition 0.000 claims description 5
- 230000002093 peripheral effect Effects 0.000 abstract description 4
- 229910003460 diamond Inorganic materials 0.000 abstract description 3
- 239000010432 diamond Substances 0.000 abstract description 3
- 238000007747 plating Methods 0.000 abstract description 3
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 abstract 2
- 239000011810 insulating material Substances 0.000 abstract 2
- 239000006061 abrasive grain Substances 0.000 abstract 1
- 239000010419 fine particle Substances 0.000 abstract 1
- 239000000843 powder Substances 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 14
- 239000003792 electrolyte Substances 0.000 description 8
- 239000002245 particle Substances 0.000 description 7
- 238000005452 bending Methods 0.000 description 6
- 239000008151 electrolyte solution Substances 0.000 description 5
- 239000012811 non-conductive material Substances 0.000 description 5
- 238000004090 dissolution Methods 0.000 description 3
- 239000002659 electrodeposit Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052582 BN Inorganic materials 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000007514 turning Methods 0.000 description 1
Landscapes
- Polishing Bodies And Polishing Tools (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、薄いブレードを電着加工によって製造する
方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] This invention relates to a method for manufacturing thin blades by electrodeposition.
薄いブレード、たとえば、厚さが２０〜１００ｇｍのブ
レードは、従来から電着加工によって成形されている。Thin blades, for example blades with a thickness of 20 to 100 gm, have traditionally been formed by electrodeposition.
つまり、ニッケル、または、アルミニウムから成る基台
は、陰極に接続されて、電解槽内の電解液に浸漬される
。他方、被電解金属、たとえば、ニッケルバーが、陽極
に接続されて、電解液に浸漬される。ここで、電解液に
、ダイヤモンドあるいは立方晶窒化ホウ素等の砥粒子が
混入されている。That is, a base made of nickel or aluminum is connected to a cathode and immersed in an electrolytic solution in an electrolytic cell. On the other hand, the metal to be electrolyzed, for example a nickel bar, is connected to the anode and immersed in the electrolyte. Here, abrasive particles such as diamond or cubic boron nitride are mixed into the electrolyte.
そして、基台、ニッケルバー間に通電されると、金属メ
ッキと同様の原理で、基台に電着加工が施され、砥粒子
は、イオン化しているニッケルの析出により、基台に付
着して電着層を形成する。When electricity is applied between the base and the nickel bar, the base is electroplated using the same principle as metal plating, and the abrasive particles adhere to the base due to the precipitation of ionized nickel. to form an electrodeposition layer.
ここで、基台は、偏平な円柱形をしており、非導電性材
料が基台の周面に予め付着されて周面への電着層の被覆
を防止している。そのため、浸漬される基台の端面に、
薄い円板形の電着層が形成される。Here, the base has a flat cylindrical shape, and a non-conductive material is previously attached to the circumferential surface of the base to prevent the circumferential surface from being coated with an electrodeposited layer. Therefore, on the end face of the base to be immersed,
A thin disk-shaped electrodeposited layer is formed.
そして、この電着層を基台から分離することによって、
薄型ブレードが成形される。基台から電着層を分離する
方法として、工具による剥離と、曲げによる剥離とが従
来から広く採用されている、前者では、カッターのよう
な先の尖った先細の工具が使用され、工具の尖端が、基
台と電着層との境界面に圧入され、電着層の一部を強制
的に基台から剥離し分離する。それから、電着層の剥離
部分を牽引して、電着層の残る部分を基台から分離して
、電着層を基台から完全に分離させる。また、後者の曲
げによる分離は、主として、基台が薄い場合に採用され
、この方法では、基台を曲げることによって、電着層の
一部を基台から剥離させ分離する。その後、電着層の剥
離部分を牽引して、電着層を完全に分離する。このよう
にして分離された電着層から薄覆ブレードが成形される
。By separating this electrodeposition layer from the base,
A thin blade is formed. Peeling with a tool and peeling by bending have been widely used as methods for separating the electrodeposited layer from the base. In the former, a sharp, tapered tool such as a cutter is used, and the The tip is press-fitted into the interface between the base and the electrodeposited layer, and forcibly peels and separates a portion of the electrodeposited layer from the base. The peeled portion of the electrodeposit layer is then pulled to separate the remaining portion of the electrodeposit layer from the base, thereby completely separating the electrodeposit layer from the base. The latter separation by bending is mainly employed when the base is thin, and in this method, by bending the base, part of the electrodeposited layer is peeled off and separated from the base. Thereafter, the peeled portion of the electrodeposition layer is pulled to completely separate the electrodeposition layer. A thinly covered blade is formed from the electrodeposited layer thus separated.
上記のような薄型ブレードの製造方法では、電着層の厚
さが、通電時間、砥粒子の混入率等によって制御でき、
数十ルｌといった薄いブレードが比較的容易に成形でき
る。In the method for manufacturing a thin blade as described above, the thickness of the electrodeposited layer can be controlled by controlling the current application time, the mixing ratio of abrasive particles, etc.
A thin blade of several tens of liters can be formed relatively easily.
しかしながら、工具による剥離では、工具の尖端を基台
と電着層との境界面に圧入して電着層の一部を強制的に
基台から剥離する際、電着層を損傷する虞れがある。ま
た、曲げによる剥離では、電着層を剥離するために基台
をかなり曲げる必要があり、基台とともに、電着層も曲
げられる虞れがある。このように、機械的な力を利用し
た電着層の剥離では、基台から剥離する際、電着層が損
傷したり曲げられ、良品の薄型ブレードが得にくい。However, when removing with a tool, there is a risk of damaging the electrodeposition layer when the tip of the tool is pressed into the interface between the base and the electrodeposition layer to forcibly peel off a part of the electrodeposition layer from the base. There is. Further, in peeling by bending, it is necessary to bend the base considerably in order to peel off the electrodeposited layer, and there is a risk that the electrodeposited layer will be bent along with the base. As described above, when the electrodeposition layer is peeled off using mechanical force, the electrodeposition layer is damaged or bent when it is peeled off from the base, making it difficult to obtain a thin blade of good quality.
また、多数の基台を電解槽に浸漬すると、基台同士が接
触しやすく、基台の接触する部分には、電着層が被覆さ
れない、そのため、電解槽に同時に浸漬できる基台の数
が限定され、多数の薄型ブレードが迅速に製造できない
。Additionally, when a large number of bases are immersed in an electrolytic bath, they tend to come into contact with each other, and the contacting parts of the bases are not coated with the electrodeposited layer.Therefore, the number of bases that can be immersed in the electrolytic bath at the same time is limited. limited and large numbers of thin blades cannot be manufactured quickly.
この発明は、剥離用工具を使用したり、基台に曲げを加
えることなく、基台から電着層を分離する薄型ブレード
の製造方法の提供を目的としている。The present invention aims to provide a method for manufacturing a thin blade that separates an electrodeposited layer from a base without using a peeling tool or bending the base.
この目的を達成するため、この発明によれば、基台、被
電解金属、溶解液を適切に選らび、基台を溶解除去させ
ている。たとえば、基台をアルミニウム、被電解金属を
二−ツケル、溶解液をカセイソーダ溶液とすれば、カセ
イソーダ溶液は、基台を溶解除去するにも拘らず、ニッ
ケルから成る電着層を溶解しない、そのため、電着層が
無傷のまま残存して、基台から分離され、この電着層か
ら薄型ブレードが成形される。In order to achieve this object, according to the present invention, the base, the metal to be electrolyzed, and the solution are appropriately selected, and the base is dissolved and removed. For example, if the base is aluminum, the metal to be electrolyzed is nickel, and the solution is a caustic soda solution, the caustic soda solution will dissolve and remove the base but will not dissolve the electrodeposited layer made of nickel. , the electrodeposited layer remains intact and separated from the base, and a thin blade is formed from the electrodeposited layer.
また、たとえば、単一部材を機械加工して、基台を軸線
方向に多数連設することが好ましい、このような方法で
は、多数の基台が接触することなく、電解槽に同時に浸
漬でき、多数の薄型ブレードが同時に製造可能となる。In addition, for example, it is preferable to machine a single member and install a large number of bases in series in the axial direction. In such a method, a large number of bases can be simultaneously immersed in the electrolytic bath without contacting each other, and A large number of thin blades can be manufactured simultaneously.
以下、図面を参照しながらこの発明の実施例について詳
細に説明する。Embodiments of the present invention will be described in detail below with reference to the drawings.
この発明に係る薄型ブレードの製造方法において、第１
図かられかるように、基台１０は、導電性材料より偏平
の円筒形状に形成され、その材質は、後述する溶解液に
対応して選らばれる。たとえば、溶解液がカセイソーダ
溶液であれば、基台１０はアルミニウムから形成される
。ここで、基台ｌＯを軸線方向に多数連設して一体化、
つまり、ユニット化することが好ましく、基台ユニット
ｔｉを使用すれば、後述するように、多数の薄型ブレー
ドが同時に製造できる。基台ユニッ）１１は、単一部材
を機械加工、たとえば、旋盤加工することによって、容
易に得られる。そして、電着加工において、電着層が基
台の上下端面１２．１３にのみ蓄積されるように、非導
電性材料が周面１４および基台連結部１５に予め付着さ
れる。In the method for manufacturing a thin blade according to the present invention, the first
As can be seen from the figure, the base 10 is formed of a conductive material into a flat cylindrical shape, and the material is selected depending on the solution to be described later. For example, if the solution is a caustic soda solution, the base 10 is formed from aluminum. Here, a large number of bases IO are arranged in series in the axial direction and integrated,
In other words, it is preferable to form a unit, and if the base unit ti is used, a large number of thin blades can be manufactured at the same time, as will be described later. The base unit) 11 can be easily obtained by machining, for example turning, a single member. Then, in the electrodeposition process, a non-conductive material is preliminarily applied to the circumferential surface 14 and the base connection 15 so that the electrodeposition layer is accumulated only on the upper and lower end faces 12.13 of the base.
それから、第２図に示すように、基台ユニット１１は、
陰極に接続され、電解槽ＩＢの電解液ＩＢに浸漬される
。また、陽極に接続された被電解金属２０も電解液１８
に浸漬される。たとえば、電解液として流酸ニッケル液
、被電解金属としてニッケルバ−が、それぞれ使用でき
る。電解液に、ダイヤモンドあるいは立方晶窒化ホウ素
等の砥粒子が混入されている。ここで、電解液１８を攪
拌機で攪拌したり、超音波発信器を使って振動して、電
解液に砥粒子を均一に混入させることが好ましい、そし
て、基台１０、被電解金属２０間に通電される。すると
、金属メッキと同様の原理で、各基台ＩＯに電着加工が
施される。つまり、電解液中の砥粒子は、非導電性材料
の被覆されていない基台の上下端面１２．１３に付着し
ながら、被電解金属のイオンと混同して蓄積し、被覆さ
れる。このようにして、電着物の層、つまり、電着層２
２．２３が、基台の上下端面１２．１３にそれぞれ形成
される（第３図参照）、ここで、通電時間、砥粒子の混
入率等を制御することによって、電着層２２．２３の厚
さが調整されることはいうまでもない。Then, as shown in FIG. 2, the base unit 11 is
It is connected to the cathode and immersed in electrolyte solution IB of electrolytic cell IB. Furthermore, the electrolyte 18 also includes the electrolyte metal 20 connected to the anode.
immersed in. For example, a nickel flow acid solution can be used as the electrolytic solution, and a nickel bar can be used as the metal to be electrolyzed. Abrasive particles such as diamond or cubic boron nitride are mixed into the electrolyte. Here, it is preferable to stir the electrolytic solution 18 with a stirrer or vibrate using an ultrasonic transmitter to uniformly mix the abrasive particles into the electrolytic solution, and between the base 10 and the metal to be electrolyzed 20. Power is applied. Then, electrodeposition processing is performed on each base IO using the same principle as metal plating. In other words, the abrasive particles in the electrolyte adhere to the upper and lower end surfaces 12.13 of the uncoated base made of non-conductive material, accumulate and get mixed up with ions of the metal to be electrolyzed, and are coated. In this way, the electrodeposited layer, i.e. the electrodeposited layer 2
2.23 are respectively formed on the upper and lower end surfaces 12.13 of the base (see Fig. 3).Here, by controlling the current application time, the mixing rate of abrasive particles, etc., the electrodeposited layers 22.23 are formed. Needless to say, the thickness can be adjusted.
電着加工後、基台ユニツ）１１は、電解槽１Ｂから取出
され、非導電性材料を剥離した後、第４図に示すように
、溶解槽２４の溶解液２Ｂに浸漬される。After the electrodeposition process, the base unit 11 is taken out from the electrolytic bath 1B, and after peeling off the non-conductive material, it is immersed in the dissolving solution 2B in the dissolving bath 24, as shown in FIG.
溶解液２Ｂは、上下の電着層２２．２３を溶解せず基台
１０のみを溶解する溶液から構成される。溶解液は、基
台１０および被電解金属２０の材質との関係から選ばれ
、たとえば、基台の材質がアルミニウム、被電解金属が
ニッケルバーであれば、カセイソーダ２０Ｘ液が使用さ
れる。そのため、溶解液２６に浸漬された基台ｌＯは溶
解除去され、電着層２２．２３が、残される。そして、
残存する電着層２２．２３を溶解層２４から取出せば、
中央孔の形成された薄型ブレードが得られる。特に、実
施例では、基台ｌＯを連設してユニット化しているため
、各基台は隔離され、互に接触しない、そのため、同時
に、多数の基台１０が電解槽１Ｂに浸漬でき、多数の薄
型ブレードが得られる。The solution 2B is composed of a solution that does not dissolve the upper and lower electrodeposited layers 22, 23 but only the base 10. The dissolving solution is selected depending on the material of the base 10 and the metal to be electrolyzed 20. For example, if the material of the base is aluminum and the metal to be electrolyzed is nickel bar, caustic soda 20X solution is used. Therefore, the base lO immersed in the solution 26 is dissolved and removed, leaving the electrodeposited layers 22 and 23 behind. and,
If the remaining electrodeposited layers 22 and 23 are taken out from the dissolving layer 24,
A thin blade with a central hole is obtained. In particular, in the embodiment, since the bases 10 are connected in series to form a unit, each base is isolated and does not come into contact with each other. Therefore, a large number of bases 10 can be immersed in the electrolytic bath 1B at the same time, and a large number A thin blade is obtained.
上述した実施例は、この発明を説明するためのものであ
り、この発明を何等限定するものでなく、この発明の技
術範囲内で変形、改造等の施されたものも全てこの発明
に包含されることはいうまでもない、たとえば、実施例
では、基台は、電解槽内に垂直に配設され、基台の上下
端面に電着層を被覆させているが１周面、基台連結部と
同様に、基台の下端面にも非導電性材料を付着して上端
面にのみ電着層を被覆させてもよい、また、基台を電解
槽内に垂直に配設せず、水平または斜めに配設してもよ
い、更に、電着層が均一に被覆され・ るように、基
台を電解槽内で回転させてもよい。The above-mentioned embodiments are for illustrating the present invention, and are not intended to limit the present invention in any way, and any modifications, modifications, etc. made within the technical scope of the present invention are also included in the present invention. Needless to say, for example, in the embodiment, the base is arranged vertically in the electrolytic cell, and the upper and lower end surfaces of the base are coated with electrodeposited layers, but one peripheral surface is connected to the base. In the same way as above, a non-conductive material may also be attached to the lower end surface of the base so that only the upper end surface is coated with an electrodeposition layer. It may be arranged horizontally or diagonally, and the base may be rotated within the electrolytic cell to ensure uniform coverage of the electrodeposited layer.
上記のように、この発明に係る薄型ブレードの製造方法
によれば、基台が溶解除去されるため。As described above, according to the method for manufacturing a thin blade according to the present invention, the base is dissolved and removed.
損傷したり曲げられることなく、無傷で電着層が、基台
から容易に分離される。The electrodeposited layer is easily separated from the base intact without damage or bending.
また、基台を連設してユニット化すれば、基台間の接触
が防止されるため、多数の基台が電解槽に同時に浸漬で
きる。そのため、多数の薄型ブレードが迅速に製造でき
る。Furthermore, if the bases are arranged in series to form a unit, contact between the bases is prevented, so that a large number of bases can be immersed in the electrolytic bath at the same time. Therefore, a large number of thin blades can be manufactured quickly.
第１図は、ユニット化された基台の斜視図、第２図は、
電解槽に浸漬された基台の正面図、第３図は、電解槽か
ら取出された基台の斜視図、第４図は、溶解槽に浸漬さ
れた基台の正面図である。
１０：基台、ｌに基台ユニット、１２，１３：基台の上
下端面、１４：基台の周面、１５：基台連結部、１６：
電解槽、１８：電解液、２０：被電解金属、２２，２３
：電着層、２４：溶解槽、２Ｂ＝溶解濠。
第１図
第２図
第３ 区
悸４ 口Figure 1 is a perspective view of a unitized base, Figure 2 is a
FIG. 3 is a front view of the base immersed in the electrolytic bath, FIG. 3 is a perspective view of the base taken out from the electrolytic bath, and FIG. 4 is a front view of the base immersed in the dissolution bath. 10: Base, l: Base unit, 12, 13: Upper and lower end surfaces of the base, 14: Peripheral surface of the base, 15: Base connection part, 16:
Electrolytic cell, 18: Electrolyte, 20: Electrolyte metal, 22, 23
: electrodeposition layer, 24: dissolution tank, 2B=dissolution moat. Figure 1 Figure 2 Figure 3 Kuyu 4 mouth
Claims (4)
離し、分離した電着層から薄型ブレードを成形する薄型
ブレードの製造方法において、基台を溶解除去して、基
台から電着層を分離させることを特徴とする薄型ブレー
ドの製造方法。(1) In a method for manufacturing a thin blade in which a base is coated with an electrodeposition layer, the electrodeposition layer is separated from the base, and a thin blade is formed from the separated electrodeposition layer, the base is dissolved and removed; A method for manufacturing a thin blade, characterized by separating an electrodeposited layer from a base.
囲第１項記載の薄型ブレードの製造方法。(2) The method for manufacturing a thin blade according to claim 1, wherein a large number of bases are arranged in series in the axial direction.
一体的に形成した特許請求の範囲第２項記載の薄型ブレ
ードの製造方法。(3) A method for manufacturing a thin blade according to claim 2, wherein a single member is machined to integrally form a number of consecutively arranged bases.
、溶解液をカセイソーダ溶液とした特許請求の範囲第１
項ないし第３項記載の薄型ブレードの製造方法。(4) Claim 1 in which the base is aluminum, the metal to be electrolyzed is a nickel bar, and the solution is a caustic soda solution.
A method for manufacturing a thin blade according to items 1 to 3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP318787A JPS63171891A (en) | 1987-01-12 | 1987-01-12 | Production of thin blade |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP318787A JPS63171891A (en) | 1987-01-12 | 1987-01-12 | Production of thin blade |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63171891A true JPS63171891A (en) | 1988-07-15 |
Family
ID=11550398
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP318787A Pending JPS63171891A (en) | 1987-01-12 | 1987-01-12 | Production of thin blade |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63171891A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6152367A (en) * | 1984-08-20 | 1986-03-15 | C Uyemura & Co Ltd | Plating device for plate work |
-
1987
- 1987-01-12 JP JP318787A patent/JPS63171891A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6152367A (en) * | 1984-08-20 | 1986-03-15 | C Uyemura & Co Ltd | Plating device for plate work |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CA1129807A (en) | Organic polymer mandrel for electroforming | |
| EP1798312A1 (en) | Apparatus for recovering metal | |
| JP3992168B2 (en) | Electrodeposition blade manufacturing method | |
| JPH034628B2 (en) | ||
| JPS63171891A (en) | Production of thin blade | |
| JPS5824507B2 (en) | Improved drum equipment for producing electrodeposited copper foil | |
| CN107920427A (en) | The preparation method and printed circuit board (PCB) of the metal connecting structure of circuit board | |
| US2846378A (en) | Electrode and its manufacture | |
| CN110923783B (en) | Manufacturing method of hub-type electroplated ultrathin diamond cutting blade | |
| JP3767850B2 (en) | Method for producing metal powder | |
| JP3724364B2 (en) | Manufacturing method of metal products | |
| CN109811398B (en) | Electric polishing deburring device for miniature parts | |
| JPH08100288A (en) | Production of metallic mesh foil | |
| JP2005231023A (en) | Electrode tool for electrochemical machining and its manufacturing method | |
| JP2003193282A (en) | Electrodeposition drum for producing metallic foil and method of producing metallic foil using the same | |
| JP3525618B2 (en) | Plating method for metal substrate | |
| JP2002302787A (en) | Method of producing special-shaped electric nickel for plating | |
| JP2001007268A (en) | Semiconductor device and manufacture thereof | |
| JPH0771790B2 (en) | Method of manufacturing electroformed thin blade grindstone | |
| JP2736690B2 (en) | Manufacturing method of electrodeposited whetstone | |
| SE511207C2 (en) | Method of electropolishing titanium-based coatings on cutting tools and wear parts to a high surface finish | |
| JPH02310400A (en) | Method for removing plating film on magnesium | |
| JP2002004078A (en) | Method for manufacturing electrolytic copper foil | |
| JPH1088369A (en) | Formation of hard carbon coating film and electric shaver edge | |
| KR20100037364A (en) | The electrochemical machining electrode and manufacturing method thereof |