JPS6316465B2 - - Google Patents

Info

Publication number
JPS6316465B2
JPS6316465B2 JP11277684A JP11277684A JPS6316465B2 JP S6316465 B2 JPS6316465 B2 JP S6316465B2 JP 11277684 A JP11277684 A JP 11277684A JP 11277684 A JP11277684 A JP 11277684A JP S6316465 B2 JPS6316465 B2 JP S6316465B2
Authority
JP
Japan
Prior art keywords
crucible
film
mold
manufacturing
boron carbide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11277684A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60258465A (ja
Inventor
Masatomi Okumura
Takeo Ido
Iwao Kawamata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP11277684A priority Critical patent/JPS60258465A/ja
Publication of JPS60258465A publication Critical patent/JPS60258465A/ja
Publication of JPS6316465B2 publication Critical patent/JPS6316465B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)
JP11277684A 1984-06-01 1984-06-01 電子ビ−ム加熱用ルツボの製造方法 Granted JPS60258465A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11277684A JPS60258465A (ja) 1984-06-01 1984-06-01 電子ビ−ム加熱用ルツボの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11277684A JPS60258465A (ja) 1984-06-01 1984-06-01 電子ビ−ム加熱用ルツボの製造方法

Publications (2)

Publication Number Publication Date
JPS60258465A JPS60258465A (ja) 1985-12-20
JPS6316465B2 true JPS6316465B2 (enrdf_load_html_response) 1988-04-08

Family

ID=14595211

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11277684A Granted JPS60258465A (ja) 1984-06-01 1984-06-01 電子ビ−ム加熱用ルツボの製造方法

Country Status (1)

Country Link
JP (1) JPS60258465A (enrdf_load_html_response)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5532064B2 (ja) * 2012-02-29 2014-06-25 信越化学工業株式会社 希土類酸化物含有溶射基板の製造方法及び積層板の製造方法
JP6421525B2 (ja) * 2013-10-09 2018-11-14 信越化学工業株式会社 溶射成形体の製造方法

Also Published As

Publication number Publication date
JPS60258465A (ja) 1985-12-20

Similar Documents

Publication Publication Date Title
KR100295145B1 (ko) 서셉터
US20180151401A1 (en) Substrate support assembly having a plasma resistant protective layer
CA2381716C (en) Aluminum substrate thick film heater
US3227431A (en) Crucible externally lined with filamentary carbon
TW200541008A (en) Manufacturing method for sintered body with buried metallic member
TW201606105A (zh) 離子輔助沉積的稀土氧化物之頂部塗層
JPS594825B2 (ja) Ｘ線管陽極及びその製造方法
US7672111B2 (en) Electrostatic chuck and method for manufacturing same
JP2008520087A (ja) 封入型ウェーハプロセス機器とその作製方法
US3660158A (en) Thin film nickel temperature sensor and method of forming
JPH11251303A (ja) プラズマ処理装置
US5118983A (en) Thermionic electron source
JP5549834B2 (ja) 溶射膜及びその製造方法
JPS6366391B2 (enrdf_load_html_response)
US6517908B1 (en) Method for making a test wafer from a substrate
JPS6316465B2 (enrdf_load_html_response)
JP2533679B2 (ja) 盤状セラミックスヒ―タ―及びその製造方法
JP2563947B2 (ja) 被覆方法
US6054187A (en) Method of manufacturing a boron carbide film on a substrate
US5250327A (en) Composite substrate and process for producing the same
JPH0679444B2 (ja) 電気皮膜
CN116194613A (zh) 溅射靶的制造和再填充
JP3761055B2 (ja) 石英ガラス黒色板状体
JPH08250465A (ja) 半導体プラズマ処理装置の電極カバー
JP2000012665A (ja) セラミックス部品