JPS63161187A - Production of reflow-treated solder plated material - Google Patents
Production of reflow-treated solder plated materialInfo
- Publication number
- JPS63161187A JPS63161187A JP31357686A JP31357686A JPS63161187A JP S63161187 A JPS63161187 A JP S63161187A JP 31357686 A JP31357686 A JP 31357686A JP 31357686 A JP31357686 A JP 31357686A JP S63161187 A JPS63161187 A JP S63161187A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- tin
- plating
- reflow
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims description 28
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 229910000679 solder Inorganic materials 0.000 title abstract description 42
- 238000007747 plating Methods 0.000 claims abstract description 54
- 239000002253 acid Substances 0.000 claims abstract description 33
- 238000009713 electroplating Methods 0.000 claims abstract description 18
- 239000004094 surface-active agent Substances 0.000 claims abstract description 17
- 150000003839 salts Chemical class 0.000 claims abstract description 8
- 229910052718 tin Inorganic materials 0.000 claims abstract description 7
- 239000000203 mixture Substances 0.000 claims description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 11
- 229910052802 copper Inorganic materials 0.000 claims description 11
- 239000010949 copper Substances 0.000 claims description 11
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims description 10
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical class [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 9
- 239000000243 solution Substances 0.000 claims description 8
- 230000004907 flux Effects 0.000 claims description 5
- 150000002500 ions Chemical class 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 4
- 229910021626 Tin(II) chloride Inorganic materials 0.000 claims description 3
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 2
- 238000002844 melting Methods 0.000 claims description 2
- 230000008018 melting Effects 0.000 claims description 2
- 229910001174 tin-lead alloy Inorganic materials 0.000 claims 5
- 229910052745 lead Inorganic materials 0.000 abstract 2
- 238000000034 method Methods 0.000 description 12
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 150000007513 acids Chemical class 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- WHOZNOZYMBRCBL-OUKQBFOZSA-N (2E)-2-Tetradecenal Chemical compound CCCCCCCCCCC\C=C\C=O WHOZNOZYMBRCBL-OUKQBFOZSA-N 0.000 description 3
- 229910001128 Sn alloy Inorganic materials 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 2
- 229910000640 Fe alloy Inorganic materials 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910001297 Zn alloy Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- IUYOGGFTLHZHEG-UHFFFAOYSA-N copper titanium Chemical compound [Ti].[Cu] IUYOGGFTLHZHEG-UHFFFAOYSA-N 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- SUMDYPCJJOFFON-UHFFFAOYSA-N isethionic acid Chemical compound OCCS(O)(=O)=O SUMDYPCJJOFFON-UHFFFAOYSA-N 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 229940044654 phenolsulfonic acid Drugs 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- NSRGOAGKXKNHQX-UHFFFAOYSA-N 2-hydroxybutane-1-sulfonic acid Chemical compound CCC(O)CS(O)(=O)=O NSRGOAGKXKNHQX-UHFFFAOYSA-N 0.000 description 1
- HSXUNHYXJWDLDK-UHFFFAOYSA-N 2-hydroxypropane-1-sulfonic acid Chemical compound CC(O)CS(O)(=O)=O HSXUNHYXJWDLDK-UHFFFAOYSA-N 0.000 description 1
- 241000251468 Actinopterygii Species 0.000 description 1
- 241001163841 Albugo ipomoeae-panduratae Species 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910000978 Pb alloy Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- QDHFHIQKOVNCNC-UHFFFAOYSA-N butane-1-sulfonic acid Chemical compound CCCCS(O)(=O)=O QDHFHIQKOVNCNC-UHFFFAOYSA-N 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- MOFOBJHOKRNACT-UHFFFAOYSA-N nickel silver Chemical compound [Ni].[Ag] MOFOBJHOKRNACT-UHFFFAOYSA-N 0.000 description 1
- 239000010956 nickel silver Substances 0.000 description 1
- QELJHCBNGDEXLD-UHFFFAOYSA-N nickel zinc Chemical compound [Ni].[Zn] QELJHCBNGDEXLD-UHFFFAOYSA-N 0.000 description 1
- RJQRCOMHVBLQIH-UHFFFAOYSA-M pentane-1-sulfonate Chemical compound CCCCCS([O-])(=O)=O RJQRCOMHVBLQIH-UHFFFAOYSA-M 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 1
- KCXFHTAICRTXLI-UHFFFAOYSA-N propane-1-sulfonic acid Chemical compound CCCS(O)(=O)=O KCXFHTAICRTXLI-UHFFFAOYSA-N 0.000 description 1
- HNDXKIMMSFCCFW-UHFFFAOYSA-N propane-2-sulphonic acid Chemical compound CC(C)S(O)(=O)=O HNDXKIMMSFCCFW-UHFFFAOYSA-N 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229910001432 tin ion Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3457—Solder materials or compositions; Methods of application thereof
- H05K3/3473—Plating of solder
Abstract
Description
【発明の詳細な説明】
皇呈上且剋朋分野
本発明は、金属条仮に錫と鉛の合金である半田を電気め
っきした後、リフロー処理を施すことにより、外観、及
び膜厚の均一性の点で優れた品質を有するリフロー半田
めっき材を製造する方法に関する。[Detailed Description of the Invention] Field of the Invention The present invention is directed to electroplating a metal strip with solder, which is an alloy of tin and lead, and then subjecting it to a reflow treatment to improve the appearance and uniformity of the film thickness. The present invention relates to a method of manufacturing a reflow solder plating material having excellent quality in terms of.
l米■茨班
従来、金属材料に半田めっきを施すための表面処理法の
一つとして、各種の金属素材に半田を電気めっきした後
、めっき層の外観や耐食性等を向上させるために、半田
めっき層の溶融処理をする、いわゆるリフロー処理を行
う方法が知られている。Ibaraban Conventionally, as a surface treatment method for applying solder plating to metal materials, after electroplating solder on various metal materials, solder is applied to improve the appearance and corrosion resistance of the plating layer. A method is known in which a plating layer is melt-processed, ie, a so-called reflow process is performed.
従来、上記半田めっきを施すための電気めっき浴として
、ホウフッ化浴又はフェノールスルホン酸浴が用いられ
ていた。しかし、ホウフッ化浴におけるホウフッ化物、
及びフェノールスルホン酸浴に微量に含まれるフェノー
ルは、公害性物質であることから、無公害性の代替浴の
開発が要望されていた。Conventionally, a borofluoride bath or a phenolsulfonic acid bath has been used as an electroplating bath for applying the solder plating. However, borofluoride in borofluoride baths,
Since the trace amount of phenol contained in the phenolsulfonic acid bath is a polluting substance, there has been a demand for the development of a non-polluting alternative bath.
近年、このような要望に鑑み、アルカノールスルホン酸
又はアルカンスルホン酸を遊離酸成分とする各種の低公
害性の半田めっき浴が実用化されている。In recent years, in view of such demands, various low-pollution solder plating baths containing alkanolsulfonic acid or alkanesulfonic acid as a free acid component have been put into practical use.
しかし、前述のホウフッ化浴から電着された半田めっき
材のリフロー処理については古くから行われていて技術
的にも確立されているが、上述のアルカノールスルホン
酸並びにアルカンスルホン酸を遊離酸とする半田浴を用
いてのリフロー半田めっき材の製造については未だ満足
すべき技術は確立されていないのが現状である。However, although the reflow treatment of solder plating material electrodeposited from the borofluoride bath described above has been carried out for a long time and is technically established, At present, no satisfactory technology has yet been established for producing reflow solder plated materials using a solder bath.
■が ° しようとする諜
本発明者らは、低公害性のアルカンスルホン酸又はアル
カノールスルホン酸を遊離酸とする半田めっき浴を用い
てめっきを行い、次いでリフロー処理を施して品質の優
れたリフロー半田めっき材を製造する方法について研究
した結果、アルカンスルホン酸又はアルカノールスルホ
ン酸もしくは両者の混合物の遊離酸成分と2価の錫塩及
び2価の鉛塩を含有する溶液に、特定な界面活性剤を添
加して成るめっき浴を、或は、上記界面活性剤に加えて
さらにホルマリンを添加しためつき浴を用いることによ
り、品質の優れたリフロー半田めっき材を得られること
を見出した。■ However, the present inventors performed plating using a solder plating bath containing low-pollution alkanesulfonic acid or alkanolsulfonic acid as the free acid, and then performed reflow treatment to achieve high-quality reflow. As a result of research on a method for manufacturing solder plating materials, it was found that a specific surfactant was added to a solution containing a free acid component of alkanesulfonic acid or alkanolsulfonic acid, or a mixture of both, and divalent tin salt and divalent lead salt. It has been discovered that a reflow solder plated material of excellent quality can be obtained by using a plating bath in which formalin is added in addition to the above-mentioned surfactant.
したがって、本発明は、外観、めつき膜厚の均−性及び
耐食性等の点で品質の優れたリフロー半田めっき材を有
利に製造するための方法を提供することを課題とする。Therefore, an object of the present invention is to provide a method for advantageously producing a reflow solder plated material that is excellent in quality in terms of appearance, uniformity of plated film thickness, corrosion resistance, etc.
以下本発明の詳細な説明する。The present invention will be explained in detail below.
fl且盪底
本発明の特徴は、アルカンスルホン酸又はアルカノール
スルホン酸もしくは両者の混合物からなる遊離酸成分と
、2価の錫塩と2価の鉛塩を含有する溶液に、下記式(
I)で示される化合物からなる界面活性剤を添加して成
る半田めっき浴を用いて金属条仮に半田を電気めっきを
行い、次いでめっき層にリフロー処理を行うことにある
。The feature of the present invention is that the following formula (
The method involves electroplating solder on a metal strip using a solder plating bath containing a surfactant made of a compound represented by I), and then subjecting the plated layer to a reflow treatment.
HO(C!H40)、−(C3H60)b−(C!H4
0)c)l (I)(式中、11.。は2〜35
0であり1.は 11〜66のである)
量 を”するための
本発明において、めっき浴の遊離酸成分として用いるア
ルカンスルホン酸並びにアルカノールスルホン酸はそれ
ぞれ下記の一般式(VI)並びに(■)を有する。HO(C!H40), -(C3H60)b-(C!H4
0) c) l (I) (wherein 11.. is 2-35
0 and 1. In the present invention for reducing the amount of 11 to 66, the alkanesulfonic acid and alkanolsulfonic acid used as the free acid component of the plating bath have the following general formulas (VI) and (■), respectively.
R−3O3H(Vl)
(式中、Rは炭素数1乃至12個のアルキル基をわす)
HO−R−5OsH(■)
(式中、Rは炭素数1乃至12個のアルキル基を表わし
、水酸基はアルキル基の任意の位置に結合してもよい)
上記アルカンスルホン酸としては、メタンスルホン酸、
エタンスルホン酸、プロパンスルホン酸、2−プロパン
スルホン酸、ブタンスルホン酸及びペンタンスルホン酸
等を例示し得、これらは単独又は2種以上混合して用い
ることができる。R-3O3H (Vl) (In the formula, R represents an alkyl group having 1 to 12 carbon atoms) HO-R-5OsH (■) (In the formula, R represents an alkyl group having 1 to 12 carbon atoms, (The hydroxyl group may be bonded to any position of the alkyl group) The alkanesulfonic acids mentioned above include methanesulfonic acid,
Examples include ethanesulfonic acid, propanesulfonic acid, 2-propanesulfonic acid, butanesulfonic acid, pentanesulfonic acid, etc., and these can be used alone or in a mixture of two or more.
また、アルカノールスルホン酸の例としては、2−ヒド
ロキシエタン−1−スルホン酸、2−ヒドロキシプロパ
ン−1−スルホン酸、2−ヒドロキシブタン−1−スル
ホン酸、2−ヒドロキシペンタ−1−スルホン酸等を例
示し得、これは単独又は2種以上混合して用い得る。Examples of alkanolsulfonic acids include 2-hydroxyethane-1-sulfonic acid, 2-hydroxypropane-1-sulfonic acid, 2-hydroxybutane-1-sulfonic acid, and 2-hydroxypent-1-sulfonic acid. These may be used alone or in combination of two or more.
さらに、アルカンスルホン酸とアルカノールスルホン酸
の2種以上の混合物としても使用できる。Furthermore, it can also be used as a mixture of two or more types of alkanesulfonic acids and alkanolsulfonic acids.
半田めっき成分としての錫塩及び鉛塩は、上記のアルカ
ンスルホン酸の塩、アルカノールスルホン酸の塩、フェ
ノールスルホン酸の塩の形体で用いてもよ(、また、そ
れらの混合物として用いることもできる。Tin salts and lead salts as solder plating components may be used in the form of the above-mentioned alkanesulfonic acid salts, alkanolsulfonic acid salts, and phenolsulfonic acid salts (or may be used as a mixture thereof). .
錫イオンと鉛イオンのめつき浴中の濃度は、目的とする
めつき皮膜組成に応じて比率を決めるとよく、一般にめ
っき皮膜組成がSn:Pb−9:1の場合、めっき浴中
のイオン含有比率もSn”: pb”・=9:1に近い
ので、錫と鉛の上記皮膜組成と浴中のイオンの比率は近
い値となる。The concentration of tin ions and lead ions in the plating bath should be determined at a ratio depending on the desired plating film composition. Generally, when the plating film composition is Sn:Pb-9:1, the ion content in the plating bath is Since the ratio is also close to Sn":pb".=9:1, the above film composition of tin and lead and the ratio of ions in the bath have similar values.
なお、錫と鉛のめつき浴中の合計イオン濃度は5〜10
0g/ lであり、好ましくは10〜50g/ lであ
るが、めっき浴中の金属イオン濃度が10g/ j!未
満では高電流密度部にコゲが生じ、一方、50g/ 1
より高くしても格別、品質及び電着速度等の向上がみら
れず、逆にめっき液の汲み出しによるコスト高をきたす
ので留意する必要がある。The total ion concentration in the tin and lead plating bath is 5 to 10
0g/l, preferably 10 to 50g/l, but the metal ion concentration in the plating bath is 10g/j! If the current density is less than 50g/1, burnt occurs in the high current density area.
Even if it is made higher, the quality and electrodeposition speed will not be significantly improved, and on the contrary, the cost will increase due to pumping out the plating solution, so care must be taken.
本発明において、上述しためつき浴に添加する界面活性
剤は、前記式(りを有するポリオキシエチレンポリオキ
シプロピレン縮金物からなり、該界面活性剤を0.5〜
30g/ l、好ましくは1〜15g/ 10割合でめ
っき浴中に添加することにより、該浴から得られる電着
半田は均一な無光沢乃至光沢の外観を呈するようになり
、リフロー処理後の品質も良好となる。ただし、界面活
性剤の添加量が0.58/ffi未満では、いわゆるレ
ベリング効果が低く、電着粒子が荒れるためリフロー処
理が困難となり、一方、30g/ lを越えると、添加
量としての効果が飽和になるため経済上得策ではない。In the present invention, the surfactant added to the above-mentioned matting bath is composed of a polyoxyethylene polyoxypropylene condensate having the formula (2), and the surfactant is
By adding it to the plating bath at a ratio of 30 g/l, preferably 1 to 15 g/10, the electrodeposited solder obtained from the bath will have a uniform matte to glossy appearance, and the quality after reflow treatment will be improved. will also be good. However, if the amount of surfactant added is less than 0.58/ffi, the so-called leveling effect will be low and the electrodeposited particles will become rough, making reflow processing difficult. On the other hand, if the amount exceeds 30 g/l, the effect of the amount added will be This is not economically advantageous as it will lead to saturation.
また、本発明では、式(1)を有する界面活性剤0.0
5〜20g/ Itに加えて、下記式(II)乃至(V
)を有する界面活性剤の1種又は2種以上を合計で0.
05〜20g/ j!を組合せて添加すると、リフロー
半田めっき材の品質が一層向上する。Further, in the present invention, the surfactant having the formula (1) 0.0
In addition to 5 to 20 g/It, the following formulas (II) to (V
) of one or more surfactants having a total of 0.
05~20g/j! When added in combination, the quality of reflow solder plating materials is further improved.
(式中、は5乃至15を表わす)で示されるエトキシレ
ート(α−又はβ−)ナフトールスルホン酸、
(式中、は5乃至30を表わす)で示されるエトキシレ
ート(α−又はβ−)ナフトール、(式中、は5乃至3
01.は1乃至10を表わす)で示されるエトキシレー
ト(α−又はβ−)ナフトールのエチレンオキサイド・
プロピレンオキサイド付加物、
プロピレンオキサイド・エチレンオキサイド付加物であ
る。(In the formula, represents 5 to 15) Ethoxylate (α- or β-) Naphtholsulfonic acid, (In the formula, represents 5 to 30) Ethoxylate (α- or β-) naphthol, (in the formula, is 5 to 3
01. represents 1 to 10) of ethoxylate (α- or β-) naphthol with ethylene oxide.
Propylene oxide adduct, propylene oxide/ethylene oxide adduct.
さらに、本発明では、半田めっきの電着面を緻密にし、
リフロー処理後のめつき品質を向上させるために、上記
の界面活性剤のほかにホルマリンを0.1〜2kl/l
めつき浴に添加することもできる。なお、この場合、ホ
ルマリンの添加量が0、1e+ II / j!未満で
は電着粒子微細化の効果が得られず、一方、20■l1
711を越えると上記効果が飽和するのでそれ以上の添
加は不経済である。Furthermore, in the present invention, the electrodeposition surface of solder plating is made dense,
In addition to the above surfactants, 0.1 to 2 kl/l of formalin is added to improve the plating quality after reflow processing.
It can also be added to plating baths. In this case, the amount of formalin added is 0, 1e+ II/j! If it is less than 20μl1, the effect of finer electrodeposited particles cannot be obtained;
If the amount exceeds 711, the above effect will be saturated, so it is uneconomical to add more than that.
本発明では、上記したような各種の半田めっき浴を用い
、金属条板を陰極として半田を電気めっきを行い、次い
で、めっき層にリフロー処理を施す、このリフロー処理
をして得られる半田めっき材の用途として代表的なもの
は、端子、コネクター等の弱電部品である。In the present invention, solder is electroplated using various solder plating baths as described above, using a metal strip as a cathode, and then a reflow treatment is performed on the plating layer. Typical applications include light electrical parts such as terminals and connectors.
リフロー半田めっき材に用いられる母材としては、銅、
銅合金、鉄、鉄合金等が挙げられるが、リフロー半田め
っきは、これらの母材表面の耐食性、半田付性、電気的
接続性等の品質を向上させるために行われる。The base materials used for reflow solder plating materials include copper,
Examples include copper alloy, iron, iron alloy, etc., and reflow solder plating is performed to improve the quality of the surface of these base materials, such as corrosion resistance, solderability, and electrical connectivity.
上記母材に用いられる銅合金としては、銅−亜鉛合金で
ある黄銅並びに丹銅、銅−錫合金であるりん青銅、銅−
ニッケルー亜鉛合金である洋白及び銅−チタン合金であ
るチタン銅等を例示し得る。Copper alloys used for the above base material include copper-zinc alloys such as brass and red copper, copper-tin alloys such as phosphor bronze, and copper-tin alloys.
Examples include nickel silver, which is a nickel-zinc alloy, and titanium copper, which is a copper-titanium alloy.
また、鉄合金としては、各種ステンレス銅や高ニッケル
合金等が利用できる。Further, as the iron alloy, various types of stainless steel copper, high nickel alloy, etc. can be used.
リフロー半田めっき材の母材は、強度や導電性等の特性
面を考慮して選ばれるが、本発明においては、リフロー
処理後の外観、耐食性及び半田付性等の品質面からすれ
ば、下地に鉄系であるものより銅系である方が優れてい
る。したがって、鉄系材料を母材とする場合でも、銅を
錫の下地めっきとして施すとめつき品質が向上する。こ
のような効果は、本発明に従って施された半田めっき層
の錫が下地銅成分との間で緻密な銅−錫金属間化合物層
をリフロー処理の際に形成することに因る。The base material for reflow solder plating materials is selected taking into consideration characteristics such as strength and conductivity, but in the present invention, the base material is Copper-based materials are better than iron-based materials. Therefore, even when an iron-based material is used as the base material, plating quality is improved by applying copper as an underplating to tin. Such an effect is due to the fact that tin in the solder plating layer applied according to the present invention forms a dense copper-tin intermetallic compound layer with the underlying copper component during reflow treatment.
この場合、下地は銅成分が30%以上存在しておれば良
く、クラッド等の他の方法によって形成された下地層で
あっても良い。In this case, the base layer only needs to have a copper component of 30% or more, and may be a base layer formed by other methods such as cladding.
本発明において行うリフロー処理については、半田めっ
き層を電着させた後、各種遊離酸、塩基或は界面活性剤
を含む水溶液に浸漬させた後、リフロー処理を行う方法
が知られている。この方法は、通常、半田めっき後のド
ラッグアウトタンクで処理を行うものであって、フラッ
クス処理と呼ばれ、半田めっき層を融点直上まで加熱し
、リフローさせる過程においてSnO&びSnO,の発
生を抑制して半田電着粒が溶融した俊速やかに平滑面に
なるよう流動させる機能を奏する。Regarding the reflow treatment performed in the present invention, a method is known in which a solder plating layer is electrodeposited and then immersed in an aqueous solution containing various free acids, bases, or surfactants, and then the reflow treatment is performed. This method is usually carried out in a drag-out tank after solder plating, and is called flux treatment, which heats the solder plating layer to just above its melting point and suppresses the generation of SnO and SnO during the reflow process. It has the function of causing the electrodeposited solder particles to quickly melt and flow to form a smooth surface.
したがって、本発明においてもリフロー処理に上記のフ
ラックス処理を利用して行い、下記の結果が得られた。Therefore, in the present invention, the above-mentioned flux treatment was also used in the reflow treatment, and the following results were obtained.
すなわち、電気めっき浴の遊離酸成分として用いたアル
カンスルホン酸又はアルカノールスルホン酸又は両者の
混合物を1〜100g/ l、さらに電気めっき浴に添
加した1種又は2種以上の界面活性剤の混合物を0.0
1〜10g/ ll含む水溶液をフラックスとして、電
気めっき後の半田めっき層に塗布してリフロー処理を行
うと、外観、光沢が一層良好となり、かつ品質も向上す
ることが認められた。That is, 1 to 100 g/l of alkanesulfonic acid or alkanolsulfonic acid or a mixture of both used as the free acid component of the electroplating bath, and a mixture of one or more surfactants added to the electroplating bath. 0.0
It was found that when an aqueous solution containing 1 to 10 g/ll as a flux was applied to the solder plating layer after electroplating and a reflow treatment was performed, the appearance and gloss became better, and the quality was also improved.
また、本発明によると、広範囲の電流密度、温度条件及
び攪拌条件においても有効に処理できる利点も認められ
る。Further, according to the present invention, there is an advantage that the process can be performed effectively even under a wide range of current density, temperature conditions, and stirring conditions.
以下に実施例により本発明とその効果を具体的に説明す
る。ただし、実施例に示しためつき液組成及びめっき作
業条件は、具体的説明のための例示であって、本発明は
これらに限定されるべきでなく、前記の目的に沿って任
意に変更し得るものと理解すべきである。EXAMPLES The present invention and its effects will be specifically explained below using Examples. However, the tamping solution composition and plating working conditions shown in the examples are examples for specific explanation, and the present invention should not be limited to these, and can be arbitrarily changed in accordance with the above objectives. It should be understood that
実施例
第1表に示した0、2su+厚の母材から成る各種金属
板に、常法によりアルカリ脱脂、電解脱脂、酸洗い及び
中和処理を行った後、半田めっきを施した。ただし、S
O5304については、めっきの密着性を向上させるた
めに、ウッド浴(NiC1t・6H,0240g/ l
、塩酸10抛Httを含む)を用い、5A/drrlの
電流密度で1分間のストライクめっきを施した。Examples Various metal plates made of base materials having a thickness of 0.2 su + as shown in Table 1 were subjected to alkaline degreasing, electrolytic degreasing, pickling and neutralization treatment by conventional methods, and then solder plating was applied. However, S
Regarding O5304, in order to improve the adhesion of the plating, a wood bath (NiClt・6H, 0240 g/l
Strike plating was performed for 1 minute at a current density of 5 A/drrl using hydrochloric acid (containing 10 ml of hydrochloric acid).
また、半田の下地めっきとして、それらの処理扱銅を硫
酸浴(CuSO*・5Hz0250g/ j! 5kh
sO< 100g/lを含む)を用いて1μ−施した。In addition, as a base plating for solder, the treated copper is treated in a sulfuric acid bath (CuSO*・5Hz0250g/j!5kh
sO < 100 g/l).
また、半田めっき層のリフロー処理は電気炉内(大気中
)で700℃の温度下に5〜10秒保持する方法で行っ
た。Further, the reflow treatment of the solder plating layer was performed by holding the solder plated layer at a temperature of 700° C. for 5 to 10 seconds in an electric furnace (in the atmosphere).
次に、各めっき条件で処理して得られたリフロー半田め
っき材の各々についての評価は下記基準に基いて行った
。Next, each of the reflow solder plated materials obtained by processing under each plating condition was evaluated based on the following criteria.
■外観は、光沢が良好な均一性を示し、かつヌレ不良が
発生していないめっきのものを良と判定した。(2) Appearance was judged to be good if the plating showed good uniformity of gloss and no wetting defects occurred.
■半田付性は、めっき試験片を1時間エージング(Mル
5TD−202E 208 Cニ準拠)した後、60S
n/40Pbの半田浴(230±5℃)に浸漬し、メニ
スコグラフ法によるヌレに至るまでの時間t、を測定し
た。t!は短いほど半田付性が良いと判定される。■Solderability was determined by aging the plated test piece for 1 hour (based on M 5TD-202E 208C) and then testing it for 60S.
The sample was immersed in an n/40Pb solder bath (230±5°C), and the time t until wetting was measured using the meniscograph method. T! It is determined that the shorter is, the better the solderability is.
■塩水噴霧試験はJIS Z 2371に準拠して行い
、5時間の噴霧で白錆が発生しないものを良と判定した
。■The salt water spray test was conducted in accordance with JIS Z 2371, and those that did not generate white rust after 5 hours of spraying were judged to be good.
なお、比較例として、母材に銅を用い、第2表に示した
めつき条件により得られたリフロー半田めっき材につい
て、上記と同様にして評価を行った。As a comparative example, reflow solder plated materials obtained using copper as the base material and under the flashing conditions shown in Table 2 were evaluated in the same manner as above.
結果は第第1及び第2表にそれぞれ示したとおりである
。The results are shown in Tables 1 and 2, respectively.
上記各表にみられるとおり、本発明の実施例により得ら
れるめっき材は、いずれも比較例によるものに比べて品
質が優れている。As seen in the above tables, all of the plating materials obtained in the Examples of the present invention are superior in quality to those in the Comparative Examples.
また、実施例のl1hlと魚4及び磁5、磁7と11h
12の対比からみられるように、下地には銅又は銅合金
を施したほうが鉄系に比べて半田めっき材の品質が良好
であり、さらに、実施例の陳1と隘10及びNa4と磁
11の各対比からみられるように、フラックス処理を行
った場合、また、実施例の嵐1と1lh6の対比からみ
られるように、めっき液の特定量のホルマリンを添加し
た場合のいずれも、半田めっきの品質を向上させる効果
が認められる。In addition, l1hl and fish 4 and magnetic 5, magnetic 7 and 11h of the example
As can be seen from the comparison in Example 12, the quality of the solder plated material is better when copper or copper alloy is used as the base material than when iron-based. As can be seen from each comparison, the quality of solder plating is improved both when flux treatment is performed, and when a specific amount of formalin is added to the plating solution, as seen from the comparison between Arashi 1 and 1lh6 in the example. The improvement effect is recognized.
Claims (6)
き層を融点以上に加熱し溶融させるリフロー処理を施す
ことにより、リフロー錫−鉛合金めつき材を製造する方
法において、電気めつき浴として、アルカンスルホン酸
又はアルカノールスルホン酸もしくは両者の混合物から
成る遊離酸成分と2価の錫塩及び2価の鉛塩を含有する
溶液に、下記式( I )で示される化合物からなる界面
活性剤を添加しためつき液を用いることを特徴とするリ
フロー錫−鉛合金めつき材の製造方法。 HO(C_2H_4O)_a−(C_3H_6O)_b
−(C_2H_4O)_cH( I )(式中、_a_+
_cは2〜350であり、_bは11〜66である)(1) A method for producing a reflow tin-lead alloy plated material by electroplating a tin-lead alloy on a metal strip and then subjecting the plated layer to a reflow treatment in which the plated layer is heated above its melting point and melted, As an electroplating bath, a compound represented by the following formula (I) is added to a solution containing a free acid component consisting of alkanesulfonic acid or alkanolsulfonic acid or a mixture of both, and divalent tin salt and divalent lead salt. A method for producing a reflow tin-lead alloy plating material, characterized by using a plating solution containing a surfactant. HO(C_2H_4O)_a-(C_3H_6O)_b
−(C_2H_4O)_cH(I) (in the formula, _a_+
__c is 2-350, __b is 11-66)
活性剤0.05〜20g/lと、下記式(II)乃至(V
)で示される界面活性剤の1種もしくは2種以上を合計
で0.05〜20g/lとを添加しためつき液から成る
特許請求の範囲第(1)項記載の製造方法。 ▲数式、化学式、表等があります▼(II) (式中_nは5乃至15を表わす) ▲数式、化学式、表等があります▼(III) (式中_mは5乃至30を表わす) ▲数式、化学式、表等があります▼(IV) (式中_xは5乃至30、_yは1乃至10をそれぞれ
表わす) ▲数式、化学式、表等があります▼(V) (式中_Xは1乃至10、_Yは5乃至30をそれぞれ
表わす)(2) The electroplating bath contains 0.05 to 20 g/l of a surfactant represented by the above formula (I) and the following formulas (II) to (V
The manufacturing method according to claim (1), comprising a tacking solution containing one or more surfactants represented by 0.05 to 20 g/l in total. ▲There are mathematical formulas, chemical formulas, tables, etc.▼(II) (In the formula, __n represents 5 to 15) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(III) (In the formula, __m represents 5 to 30) ▲Mathematical formula , chemical formulas, tables, etc. ▼(IV) (In the formula, _x represents 5 to 30, __y represents 1 to 10, respectively) ▲There are mathematical formulas, chemical formulas, tables, etc. ▼(V) (In the formula, _X represents 1 to 10 , _Y represents 5 to 30, respectively)
ンを生成する錫塩を含有する特許請求の範囲第(1)項
又は第(2)項記載の製造方法。(3) The manufacturing method according to claim 1 or 2, wherein the electroplating bath contains a tin salt that produces 10 to 50 g/l of stannous ions.
リンを添加しためつき液から成る特許請求の範囲第(1
)項乃至第(3)項のいずれかに記載の製造方法。(4) The electroplating bath comprises a plating solution to which 0.1 to 20 ml/l of formalin has been added.
) to (3).
の範囲第(1)項乃至第(4)項の何れかに記載の製造
方法。(5) The manufacturing method according to any one of claims (1) to (4), in which copper or a copper alloy is used as the tin plating base.
き浴の遊離酸成分として用いたアルカンスルホン酸又は
アルカノールスルホン酸もしくは両者の混合物0.05
〜50g/lと、電気めつき浴への添加に用いた界面活
性剤の1種もしくは2種以上の混合物0.01〜10g
/lを含む水溶液をフラックスとして用いて上記錫−鉛
合金めつき層に塗布することによりリフロー処理を行う
特許請求の範囲第(1)項乃至第(5)項のいずれかに
記載の製造方法。(6) Alkanesulfonic acid or alkanolsulfonic acid, or a mixture of both, 0.05% of the tin-lead alloy plated layer after electroplating was used as the free acid component of the electroplating bath.
~50 g/l and 0.01 to 10 g of one or more surfactants used for addition to the electroplating bath
The manufacturing method according to any one of claims (1) to (5), wherein a reflow treatment is performed by applying an aqueous solution containing /l as a flux to the tin-lead alloy plating layer. .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31357686A JPS63161187A (en) | 1986-12-24 | 1986-12-24 | Production of reflow-treated solder plated material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31357686A JPS63161187A (en) | 1986-12-24 | 1986-12-24 | Production of reflow-treated solder plated material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63161187A true JPS63161187A (en) | 1988-07-04 |
Family
ID=18042973
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP31357686A Pending JPS63161187A (en) | 1986-12-24 | 1986-12-24 | Production of reflow-treated solder plated material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63161187A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5174887A (en) * | 1987-12-10 | 1992-12-29 | Learonal, Inc. | High speed electroplating of tinplate |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5469534A (en) * | 1977-11-16 | 1979-06-04 | Dipsol Chem | Citric acid brilliant tin or tin alloy plating bath |
JPS5967387A (en) * | 1982-10-08 | 1984-04-17 | Hiyougoken | Tin, lead and tin-lead alloy plating bath |
JPS59182986A (en) * | 1983-04-01 | 1984-10-17 | Keigo Obata | Tin, lead and tin-lead alloy plating bath |
-
1986
- 1986-12-24 JP JP31357686A patent/JPS63161187A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5469534A (en) * | 1977-11-16 | 1979-06-04 | Dipsol Chem | Citric acid brilliant tin or tin alloy plating bath |
JPS5967387A (en) * | 1982-10-08 | 1984-04-17 | Hiyougoken | Tin, lead and tin-lead alloy plating bath |
JPS59182986A (en) * | 1983-04-01 | 1984-10-17 | Keigo Obata | Tin, lead and tin-lead alloy plating bath |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5174887A (en) * | 1987-12-10 | 1992-12-29 | Learonal, Inc. | High speed electroplating of tinplate |
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