JPS63161178A - Release solution for tin or tin alloy - Google Patents

Release solution for tin or tin alloy

Info

Publication number
JPS63161178A
JPS63161178A JP30546686A JP30546686A JPS63161178A JP S63161178 A JPS63161178 A JP S63161178A JP 30546686 A JP30546686 A JP 30546686A JP 30546686 A JP30546686 A JP 30546686A JP S63161178 A JPS63161178 A JP S63161178A
Authority
JP
Japan
Prior art keywords
acid
tin
thiourea
halogen
release
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30546686A
Other languages
Japanese (ja)
Inventor
Yutaka Kawabe
豊 川辺
Masanori Kishimoto
岸本 全令
Tetsuo Kida
哲郎 木田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
METSUKU KK
Original Assignee
METSUKU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by METSUKU KK filed Critical METSUKU KK
Priority to JP30546686A priority Critical patent/JPS63161178A/en
Publication of JPS63161178A publication Critical patent/JPS63161178A/en
Pending legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/44Compositions for etching metallic material from a metallic material substrate of different composition
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/10Etching compositions
    • C23F1/14Aqueous compositions
    • C23F1/16Acidic compositions
    • C23F1/30Acidic compositions for etching other metallic material

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE:To reduce the title novel release soln. capable of selectively releasing the tin on a copper matrix by preparing the soln. consisting of thiourea, a halogon-substituted fatty carboxylic acid, a release accelerating agent. CONSTITUTION:The thiourea selected from thiourea, an alkyl thiourea (thiosemicarbazide, etc.) and an aromatic thiourea [1-phenyl-3-(2-thiazolyl)-2- thiourea, etc.], and at least one kind of compd. selected from a halogen- substituted fatty carboxylic acid (dichloroacetic acid, etc.) having at least one halogen atom, the same sulfonic acid, the same aromatic carboxylic acid (trichlorobenzoic acid, etc.) the same halogen-substituted aromatic sulfonic acid (trichloro benzene sulfonic acid, etc.), or their esters and salts, and the inorg. acid (hydrochloric acid, etc.) and/or org. acid (citric acid, etc.) for accelerating the release, as required, are dissolvent in specified amts. in water to prepare the release soln. The novel and useful release soln. capable of selectively releas ing the tin or tin alloy on a copper matrix is thus obtained.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はプリント回路基板の回路形成工程において、銅
基質上のスズまたはスズ合金を選択的に剥離する新規f
有用な剥離液に関するもの1ある。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention is a novel method for selectively peeling off tin or tin alloys on a copper substrate in the circuit forming process of a printed circuit board.
There is one article regarding a useful stripping solution.

〔従来の技術・発明が解決すべき問題点〕プリント回路
基板の製造において、回路部分の鋼上に、エツチングレ
ジストとしてハンダメッキ(スズまたはスズ合金メッキ
)を行なう事が多い。
[Prior Art/Problems to be Solved by the Invention] In the manufacture of printed circuit boards, solder plating (tin or tin alloy plating) is often applied as an etching resist on the steel of the circuit portion.

このスズまたはスズ合金メッキが後の工程〒剥離されね
ばならない場合がある。その際全工程を円滑に進行させ
るためにも、ハンダは基板から迅速に剥離されねばなら
ず、かつ銅基質の溶解損失は最小限におさえなければな
らない。
This tin or tin alloy plating may have to be removed in a subsequent step. In order for the entire process to proceed smoothly, the solder must be peeled off quickly from the substrate and the dissolution loss of the copper substrate must be kept to a minimum.

従来鋼基質よりスズまたはスズ合金を選択的に剥離する
には、過酸化水素のような過酸化物と無機酸とを含む酸
性溶液が高く使用されてきたが、これは銅基質をしばし
ば腐蝕することがある。加えて、過酸化物は不安定マ、
金属イオンによって分解が促進され、急激な液温の上昇
を招くことがあり、かつまた過酸化物自身危険な物質で
あり、作業条件に著るしい悪影響を及ぼす。過酸化物の
かわシに硝酸第二鉄や塩化第二鉄等の金属イオンを含む
、スズまたはスズ合金の剥離剤も存在するが、これらは
含まれる金属イオンのため、はなはだしく銅基質を腐蝕
し、実用に適しない。
Traditionally, acidic solutions containing peroxides and inorganic acids, such as hydrogen peroxide, have been used to selectively strip tin or tin alloys over steel substrates, which often corrode copper substrates. Sometimes. In addition, peroxides are unstable,
Decomposition is accelerated by metal ions, which can lead to a rapid rise in liquid temperature, and peroxide itself is a dangerous substance that has a significant negative impact on working conditions. There are also tin or tin alloy strippers that contain metal ions such as ferric nitrate or ferric chloride in addition to peroxide, but these can significantly corrode the copper substrate due to the metal ions they contain. , not suitable for practical use.

本発明におけるスズまたはスズ合金の剥離液には、過酸
化物が含まれていないの↑、危険性がより少なく、また
金属イオンをも含まないので、銅基質を腐蝕することが
極めて少なく、得られる銅基質表面は光沢に富んでいる
The tin or tin alloy stripping solution of the present invention does not contain peroxides, is less dangerous, and does not contain metal ions, so it is extremely unlikely to corrode the copper substrate and is advantageous. The copper substrate surface has a high gloss.

過酸化物および金属イオンを含まない、スズまたはスズ
合金の銅基質からの選択的剥離剤が特公昭50−173
36号公報に開示されているが、この剥離剤は、スズま
たはスズ合金が導入されてから数時間のうちに析出物が
沈澱しはじめ、しばしば液全体が凝固してしまうような
ものであるため実用的であるとは言い難い。
A selective stripping agent for tin or tin alloys from copper substrates that does not contain peroxides or metal ions was published in Japanese Patent Publication No. 50-173.
However, this stripping agent is such that precipitates begin to precipitate within a few hours after tin or tin alloy is introduced, and often the entire liquid solidifies. It is hard to say that it is practical.

〔発明の構成・作用〕[Structure and operation of the invention]

本発明の銅基質より選択的にスズまたはスズ合金を剥離
する剥離液は次の3種の成分よりなるものfある: (1)チオ尿素、アルキルチオ尿素オよび芳香族チオ尿
素からなる群より選択されたチオ尿素、(2)(イ)少
なくとも1個のハロゲン基を含む、ハロゲン置換脂肪族
カルゼン酸またはハロゲン置換芳香族カル2ン酸または
それらのエステルまたはそれらの塩、 (ロ)少なくとも1個のハロゲン基を含む、ハロゲン置
換脂肪、族スルホン酸またはハロゲン置換芳香族スルホ
ン酸またはそれらの塩、 かうなる群より選択された1種以上の化合物、および場
合により (3)  スズまたはスズ合金の剥離を促進するための
無機酸および/または有機酸より選択された酸。
The stripping solution for selectively stripping tin or tin alloys from the copper substrate of the present invention is composed of the following three components: (1) selected from the group consisting of thiourea, alkylthiourea, and aromatic thiourea; (2) (a) halogen-substituted aliphatic carzenic acid or halogen-substituted aromatic carzenic acid or ester or salt thereof containing at least one halogen group; (b) at least one halogen group; halogen-substituted fatty acids, group sulfonic acids or halogen-substituted aromatic sulfonic acids, or salts thereof, containing a halogen group, one or more compounds selected from the following groups, and optionally (3) stripping of tin or tin alloys. Acids selected from inorganic and/or organic acids for promoting.

第一成分は、スズまたはスズ合金と水溶性の付加化合物
を形成し、速やかにスズまたはスズ合金を剥離液中に溶
解せしめろチオ尿素成分である。
The first component is a thiourea component that forms a water-soluble addition compound with the tin or tin alloy and quickly dissolves the tin or tin alloy into the stripping solution.

このようなチオ尿素成分としてはチオ尿素;アルキルチ
オ尿素、例えばチオ尿素、チオセシカルパジド、アリル
チオ尿素(チオシナミン)、チオアセトアミr、エチレ
ンチオ尿素、1,3−ビス(ジメチルアミノゾロビル)
−2−チオ尿素、1.3−ジメチル−2−チオ尿素、1
,3−ジプロピル−2−チオ尿素、マロニルチオ尿素な
ど;芳香族チオ尿素1例えばフェニルチオカルパント(
N−フェニルチオ尿素)、1−フェニル−3−(2−チ
アゾリル)−2−チオ尿素などがある。
Such thiourea components include thiourea; alkylthiourea such as thiourea, thiothesicalpazide, allylthiourea (thiocinamine), thioacetamir, ethylenethiourea, 1,3-bis(dimethylaminozorobyl);
-2-thiourea, 1,3-dimethyl-2-thiourea, 1
, 3-dipropyl-2-thiourea, malonylthiourea, etc.; aromatic thiourea 1, such as phenylthiocarpant (
N-phenylthiourea), 1-phenyl-3-(2-thiazolyl)-2-thiourea, and the like.

ただしチオ尿素は還元性を有するため、溶解したスズま
たはスズ合金を、銅基質上に析出させろ傾向がある。添
加量としては1〜251)A9が望ましい。1 f!/
’に9以下では充分な剥離速度が得られず、2S&A9
以上fは剥離液の還元性が強くなり過ぎて好ましくない
、 第三成分は、酸化剤としてのノ・ロゲン置換有機化合物
成分である。ハロゲン置換有機化合物としてはハロゲン
置換脂肪族カルゼン酸1例えばジクロロ酢酸、トリクロ
ロ酢酸、ジブロモ酢酸、トリブロモ酢酸、ジフルオロ酢
酸、トリフルオロ酢酸など;ハロゲン置換芳香族カルゼ
ン酸、例えばトリクロロ安息香酸、トリブロモ安息香酸
・294!5−トリクロロフェノキシ酢酸など;またハ
ロゲン置換脂肪族スルホン酸、およびハロゲン置換芳香
族スルホン酸1例えばトリクミロベンゼンスルホン酸、
ならびにこれらの酸のエステルおよび塩が挙げられる。
However, since thiourea has reducing properties, it tends to precipitate dissolved tin or tin alloys onto the copper substrate. The amount added is preferably 1 to 251) A9. 1 f! /
If the value is less than 9, sufficient peeling speed cannot be obtained, and 2S&A9
The above f is undesirable because the reducing property of the stripping solution becomes too strong. The third component is a nitrogen-substituted organic compound component as an oxidizing agent. Examples of halogen-substituted organic compounds include halogen-substituted aliphatic carzenic acids such as dichloroacetic acid, trichloroacetic acid, dibromoacetic acid, tribromoacetic acid, difluoroacetic acid, and trifluoroacetic acid; halogen-substituted aromatic carzenic acids such as trichlorobenzoic acid, tribromobenzoic acid, etc. 294!5-Trichlorophenoxyacetic acid and the like; also halogen-substituted aliphatic sulfonic acids, and halogen-substituted aromatic sulfonic acids 1 such as tricumylobenzenesulfonic acid,
and esters and salts of these acids.

この成分はスズまたはスズ合金のチオ尿素成分の還元力
による再析出を防止する効果がある。添加量は10〜5
00 、li’/に9が望ましい。
This component has the effect of preventing redeposition due to the reducing power of the thiourea component of tin or tin alloy. Addition amount is 10-5
00, 9 is desirable for li'/.

1)09A以下ではスズまたはスズ合金の再析出を充分
に防止できず、3001/に9以上添加しても性能は向
上せず経済的に不利である、 上記第一および第二成分は本発明の剥離液の必須成分で
ある。
1) If the content is less than 09A, the redeposition of tin or tin alloy cannot be sufficiently prevented, and even if 9A or more is added to 3001/, the performance will not improve and it will be economically disadvantageous. It is an essential component of the stripping solution.

第三成分は、第一および第二成分による反応が、酸性溶
液中1いちじるしく促進されるので、剥離速度向上のた
めに場合により添加される。無機酸および/または有機
酸成分である。このような無機酸としては塩酸、硝酸、
硫酸、リン酸、スルファミン酸、ホウフッ酸、フッ化水
素酸など−および有機酸としてはクエン酸、酢酸、乳酸
などが挙げられろ。その添加量は50!i〜3009/
’に9が望ましい。50I/に!?以下では添加の効果
がなく、3001//に9以上1は銅の腐蝕速度が増大
するなどして好ましくない。
The third component is optionally added to improve the peeling speed, since the reaction between the first and second components is significantly accelerated in an acidic solution. Inorganic acid and/or organic acid component. Such inorganic acids include hydrochloric acid, nitric acid,
Examples of organic acids include sulfuric acid, phosphoric acid, sulfamic acid, boric acid, hydrofluoric acid, etc., and citric acid, acetic acid, lactic acid, etc. The amount added is 50! i~3009/
'9 is desirable. 50I/! ? If it is less than 9, there will be no effect, and if it is 3001//9 or more, the corrosion rate of copper will increase, which is not preferable.

本発明の剥離液には、更に銅層インヒビターや界面活性
剤を添加して、一層の性能の向上をはか′ることが可能
フある。
It is possible to further improve the performance by adding a copper layer inhibitor or a surfactant to the stripping solution of the present invention.

本発明の剥離液においては、液が消耗して使用不能とな
るまfは液は半透明fあり析出物が沈澱することばない
In the stripping solution of the present invention, the solution is translucent and no precipitates will settle out until the solution is exhausted and becomes unusable.

次に実施例をあげて本発明を更に具体的に説明する。Next, the present invention will be explained in more detail with reference to Examples.

実施例1 トリクロロ酢酸      1001)/it硝酸  
         1501/1スルフアミン酸   
    401)/1チオ尿索          2
01/1水   総量が1)になるまで添加する銅でパ
ターン形成されたエポキシ−ガラス基板に、ヌズ60%
および鉛40%を含む半田fメッキした板(半田厚10
μ77L)を40℃f1上記の組成よりなる剥離液に浸
漬したところ半田が45秒間f板から完全に除去された
。半田を板から除去した後、このパターン形成されたエ
ポキシ−ガラス基板を剥離液に更に10分間浸漬しつづ
けた。
Example 1 Trichloroacetic acid 1001)/it nitric acid
1501/1 sulfamic acid
401)/1 thiourechord 2
01/1 Wednesday Nuzu 60% was added to the epoxy glass substrate patterned with copper added until the total amount was 1).
and a plate plated with solder f containing 40% lead (solder thickness 10
μ77L) was immersed in a stripping solution having the above composition at 40° C. f1, and the solder was completely removed from the f plate for 45 seconds. After the solder was removed from the board, the patterned epoxy glass substrate was continued to be immersed in the stripper solution for an additional 10 minutes.

剥離液から基板をとりだし検査した結果、その銅表面は
光沢があり、エポキシ−ガラス基板にモ(i’1ら異状
が見られなかった、更に別のハンダメッキした板を上記
の組成からなる剥離液に溶解しつづけ、半田溶解量が9
01)/lになるまf溶解しても沈澱は生成せず、液は
半透明のままfあった。
As a result of removing the board from the stripping solution and inspecting it, the copper surface was shiny and no abnormalities were observed on the epoxy glass board. It continues to dissolve in the liquid, and the amount of solder dissolved is 9
Even when the solution was dissolved until it reached 01)/l, no precipitate was formed and the liquid remained translucent.

実施例2 トリクロロ酢酸      100F/A!チオ尿累 
         209/1水   総量が1)にな
るまで添加 実施例1と同条件ツメツキされた半田板を40℃で上記
剥離液に浸漬したところ半田は60秒f板から完全に除
去された・半田を板から除去した後、このノソターン形
成されたエポキシ−ガラス基板を剥離液に更に10分間
浸漬しつづけた。剥離液から基板をとりだし検査した結
果、その銅表面は光沢があり、エポキシ−ガラス基板に
も何ら異状が見られなかった。
Example 2 Trichloroacetic acid 100F/A! Thio urine accumulation
209/1 Water A solder board that had been plated under the same conditions as in Example 1 was immersed in the above stripping solution at 40°C until the total amount reached 1), and the solder was completely removed from the board for 60 seconds. After removal from the substrate, the nosoturned epoxy glass substrate was continued to be immersed in the stripping solution for an additional 10 minutes. When the substrate was removed from the stripping solution and inspected, the copper surface was shiny and no abnormality was observed on the epoxy glass substrate.

実施例3 硝酸           150g/lスルファミン
酸       401!/1チオ尿:X      
     20171水   総量が1)になるま〒添
加 実施例1と同条件ツメツキされた半田板’L’lO℃で
上記剥離液に浸漬したところ10分経過しても1部銅面
が出現する程度f、はとんどの半田は除去されなかった
Example 3 Nitric acid 150g/l Sulfamic acid 401! /1thioluria:X
20171 Water A solder plate plated under the same conditions as Addition Example 1 was immersed in the above stripping solution at 0°C until the total amount reached 1). Even after 10 minutes, some copper surface still appeared. , most of the solder was not removed.

比較例 トリクロロ酢酸      1001/1硝酸    
       150Ii/lスルフアミン酸    
   401)/1水   総量が1)になる5まで添
加 実施例1と同条件〒メッキされた半田板を40’C−t
’上記剥離液に浸漬したところ10分経過して半田の大
部分が除去された。しかし銅面は赤くやけてお9、光沢
は全くなかった。
Comparative example trichloroacetic acid 1001/1 nitric acid
150Ii/l sulfamic acid
401)/1 water Added up to 5 where the total amount becomes 1) Same conditions as Example 1. Plated solder plate at 40'C-t.
'When immersed in the above stripping solution, most of the solder was removed after 10 minutes. However, the copper surface was burnt red and had no luster at all.

以上の実施例および比較例から先に述べた第一成分のチ
オ尿素成分と第二成分のハロゲン置換有機化合物成分は
、本発明の剥離液中必須成分子あり、第三成分の無機酸
および/または有機酸に剥離を促進する効果があること
が明らかである。
From the above Examples and Comparative Examples, the first component thiourea component and the second component halogen-substituted organic compound component are essential components in the stripping solution of the present invention, and the third component inorganic acid and/or Alternatively, it is clear that organic acids have the effect of promoting peeling.

〔発明の効果〕〔Effect of the invention〕

本発明の剥離液は剥離の際に銅基質を極めて僅かしか溶
解せず、剥離後の銅表面は残さが残らず光沢があって清
浄〒あり、長期の使用中にも殆んど沈澱を生ぜず、ハン
ダ剥離速度が極めて犬ぎく。
The stripping solution of the present invention dissolves the copper substrate very little during stripping, and the copper surface after stripping is shiny and clean without any residue, and almost no precipitation occurs even during long-term use. First, the solder removal speed is extremely slow.

単位体積当りの剥離液の半田溶解量が多く、また危険な
過酸化物を使用していないの1作業条件に悪影響の及ぼ
されること(例えば過酸化物の分解による急激な液温上
昇)がないという多くの利点を有している。
The stripper dissolves a large amount of solder per unit volume, and does not use dangerous peroxides. 1) There is no negative effect on working conditions (for example, a sudden rise in liquid temperature due to decomposition of peroxides). It has many advantages.

Claims (3)

【特許請求の範囲】[Claims] (1)チオ尿素、アルキルチオ尿素および芳香族チオ尿
素からなる群より選択されたチオ尿素、
(1) a thiourea selected from the group consisting of thiourea, alkylthiourea and aromatic thiourea;
(2)(イ)少なくとも1個のハロゲン原子を含有する
ハロゲン置換脂肪族カルボン酸またはハロゲン置換芳香
族カルボン酸およびそれらのエステルまたは塩、 (ロ)少なくとも1個のハロゲン原子を含有するハロゲ
ン置換脂肪族スルホン酸またはハロゲン置換芳香族スル
ホン酸およびそれらのエステルまたは塩、 からなる群より選択された少なくとも1種の化合物、お
よび場合により、
(2) (a) Halogen-substituted aliphatic carboxylic acid or halogen-substituted aromatic carboxylic acid containing at least one halogen atom and their esters or salts; (b) Halogen-substituted fat containing at least one halogen atom at least one compound selected from the group consisting of group sulfonic acids or halogen-substituted aromatic sulfonic acids and their esters or salts, and optionally,
(3)スズまたはスズ合金の剥離を促進するための無機
酸および/または有機酸 からなるスズまたはスズ合金の剥離液。
(3) A stripping solution for tin or tin alloy consisting of an inorganic acid and/or an organic acid for promoting stripping of tin or tin alloy.
JP30546686A 1986-12-23 1986-12-23 Release solution for tin or tin alloy Pending JPS63161178A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30546686A JPS63161178A (en) 1986-12-23 1986-12-23 Release solution for tin or tin alloy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30546686A JPS63161178A (en) 1986-12-23 1986-12-23 Release solution for tin or tin alloy

Publications (1)

Publication Number Publication Date
JPS63161178A true JPS63161178A (en) 1988-07-04

Family

ID=17945484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30546686A Pending JPS63161178A (en) 1986-12-23 1986-12-23 Release solution for tin or tin alloy

Country Status (1)

Country Link
JP (1) JPS63161178A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008106354A (en) * 2006-09-25 2008-05-08 Mec Kk Metal removing solution and metal removing method using the same
JP2016148081A (en) * 2015-02-12 2016-08-18 メック株式会社 Etchant and etching method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008106354A (en) * 2006-09-25 2008-05-08 Mec Kk Metal removing solution and metal removing method using the same
JP2016148081A (en) * 2015-02-12 2016-08-18 メック株式会社 Etchant and etching method

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