JPS63158979U - - Google Patents
Info
- Publication number
- JPS63158979U JPS63158979U JP4764887U JP4764887U JPS63158979U JP S63158979 U JPS63158979 U JP S63158979U JP 4764887 U JP4764887 U JP 4764887U JP 4764887 U JP4764887 U JP 4764887U JP S63158979 U JPS63158979 U JP S63158979U
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- vapor deposition
- chemical vapor
- chamber
- evaporating section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005229 chemical vapour deposition Methods 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 2
- 239000012808 vapor phase Substances 0.000 claims description 2
- 239000002994 raw material Substances 0.000 claims 6
- 238000001704 evaporation Methods 0.000 claims 4
- 239000012159 carrier gas Substances 0.000 claims 1
- 230000008020 evaporation Effects 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 claims 1
- 239000000919 ceramic Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4764887U JPS63158979U (enExample) | 1987-04-01 | 1987-04-01 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4764887U JPS63158979U (enExample) | 1987-04-01 | 1987-04-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63158979U true JPS63158979U (enExample) | 1988-10-18 |
Family
ID=30868450
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4764887U Pending JPS63158979U (enExample) | 1987-04-01 | 1987-04-01 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63158979U (enExample) |
-
1987
- 1987-04-01 JP JP4764887U patent/JPS63158979U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH03500667A (ja) | 多重平行充てんカラム気化器 | |
| JP2001323374A (ja) | 気相反応物を反応室内へ供給するための方法および装置 | |
| JP2001507757A (ja) | フラッシュ気化器 | |
| ATE251237T1 (de) | Verfahren und vorrichtung zum zuführen von vorläufern zu mehreren epitaxialreaktoren | |
| JPS63158979U (enExample) | ||
| CN209989463U (zh) | 用于汽化和递送经汽化源材料的汽化器组合件 | |
| CN213835530U (zh) | 一种固态源瓶 | |
| CN118028776B (zh) | 用于储存固体颗粒的升华容器及高浓度蒸汽制备方法 | |
| JPS61209005A (ja) | 分離膜及びその製造方法 | |
| CN215828863U (zh) | 一种ald与cvd配合使用的薄膜材料制备系统 | |
| CN213596460U (zh) | 一种前体源气体输送装置 | |
| JP2003013233A (ja) | 液体原料気化供給装置 | |
| CN217997318U (zh) | 克级粉末表面均匀镀膜的原子层沉积装置 | |
| KR20010077002A (ko) | 액체원료 기화장치 | |
| JPH0331477A (ja) | Cvd装置用バブラー | |
| CN217997319U (zh) | 克级粉末表面均匀镀膜的原子层沉积装置 | |
| CN214572214U (zh) | 原子层沉积设备 | |
| JPS6293367U (enExample) | ||
| JPS5877042U (ja) | 薄膜気相成長用気化装置 | |
| JPS61243176A (ja) | Cvd処理方法 | |
| CN120830089A (zh) | 前驱体输送装置和半导体工艺设备 | |
| JPS62218576A (ja) | プラズマcvd法 | |
| JPH11104468A (ja) | 緻密質膜の保持構造体およびその製造方法 | |
| JPH05132779A (ja) | 液体材料気化装置 | |
| JPH02138421U (enExample) |