JPS63157853A - Apparatus for producing electrophotographic sensitive body - Google Patents
Apparatus for producing electrophotographic sensitive bodyInfo
- Publication number
- JPS63157853A JPS63157853A JP30563686A JP30563686A JPS63157853A JP S63157853 A JPS63157853 A JP S63157853A JP 30563686 A JP30563686 A JP 30563686A JP 30563686 A JP30563686 A JP 30563686A JP S63157853 A JPS63157853 A JP S63157853A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- substrate
- ion bombardment
- discharge
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 238000010849 ion bombardment Methods 0.000 claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 claims abstract description 12
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 10
- 238000010438 heat treatment Methods 0.000 claims abstract description 9
- 108091008695 photoreceptors Proteins 0.000 claims description 16
- 239000004020 conductor Substances 0.000 claims description 3
- 239000002994 raw material Substances 0.000 abstract description 11
- 230000002159 abnormal effect Effects 0.000 abstract description 5
- 238000001704 evaporation Methods 0.000 abstract description 5
- 230000008020 evaporation Effects 0.000 abstract description 4
- 238000010891 electric arc Methods 0.000 abstract description 2
- 238000007740 vapor deposition Methods 0.000 abstract description 2
- 230000003252 repetitive effect Effects 0.000 abstract 1
- 238000000151 deposition Methods 0.000 description 7
- 230000008021 deposition Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 4
- 238000007738 vacuum evaporation Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、導電性基体表面を予めイオン衝撃法で清浄化
したのち、感光層を基体上に真空蒸着によって形成する
ために、蒸着槽内にイオン衝撃用電極を備えた電子写真
感光体製造装置に関する。Detailed Description of the Invention [Industrial Field of Application] The present invention is directed to cleaning the surface of a conductive substrate in advance using an ion bombardment method, and then forming a photosensitive layer on the substrate by vacuum deposition in a vapor deposition tank. The present invention relates to an electrophotographic photoreceptor manufacturing apparatus equipped with an ion bombardment electrode.
電子写真感光体の製造工程において、特にＳｓ系。 In the manufacturing process of electrophotographic photoreceptors, especially Ss type.
５ｅ−Ｔｅ系、５ｅ−Ａｓ系、５ｅ−Ｔｅ−Ａｓ系の電
子写真感光体においては、その感光層は通常アルミニウ
ム製の円筒状の基体の上に、蒸着槽内での真空蒸着によ
って形成される。その際のアルミニウム基体の表面状態
は、感光層の薄膜の状態に大きな影響を与える。特に基
体表面の汚れ、吸着物質等は、真空蒸着時においては表
面からのガス放出の原因となり、その結果、感光層の膜
にピンホール等の欠陥を生じさせる。基体表面が清浄に
処理されていても、空気中で放置されている限りは、空
気中の分子の吸着、水分の吸着等は避けられず、その一
部は蒸着槽内の真空状態では必ず放出されてくる。特に
、真空蒸着時に、基体表面温度が高い場合には、その放
出が著しく促進される。従って、基体表面からのガス放
出を防止し、真空蒸着によって欠陥のない感光層を形成
する為には、真空蒸着の直前に真空中において基体の清
浄化処理をするのが望ましく、その一つの方法としてイ
オン衝撃法がある。In 5e-Te, 5e-As, and 5e-Te-As electrophotographic photoreceptors, the photosensitive layer is usually formed on a cylindrical aluminum substrate by vacuum deposition in a deposition tank. Ru. The surface condition of the aluminum substrate at that time has a great influence on the condition of the thin film of the photosensitive layer. In particular, dirt, adsorbed substances, etc. on the surface of the substrate cause gas to be released from the surface during vacuum deposition, resulting in defects such as pinholes in the photosensitive layer. Even if the surface of the substrate is cleaned, as long as it is left in the air, adsorption of molecules in the air and moisture cannot be avoided, and some of this will inevitably be released in the vacuum state of the deposition tank. It will be done. In particular, when the substrate surface temperature is high during vacuum deposition, its release is significantly accelerated. Therefore, in order to prevent gas release from the substrate surface and form a defect-free photosensitive layer by vacuum evaporation, it is desirable to perform a cleaning treatment on the substrate in a vacuum immediately before vacuum evaporation. Another method is the ion bombardment method.
イオン衝撃法は、真空蒸着槽内に電極を設置し、炉内を
０．０５〜数Ｔｏｒｒ程度の真空に保って電極に数１０
０Ｖｏｌｔ〜２ＫＶｏｌｔ程度の直流または交流電圧を
かけ、電極と接地されたアルミニウム基体との間にグロ
ー放電を生じさせ、その際発生するイオンの衝撃によっ
て基体表面の微小な汚れ、吸着ガスを追い出そうとする
ものである。In the ion bombardment method, an electrode is installed in a vacuum deposition tank, the inside of the furnace is maintained at a vacuum of about 0.05 to several Torr, and several tens of Torr is applied to the electrode.
A direct current or alternating current voltage of about 0 Volt to 2 KVolt is applied to generate a glow discharge between the electrode and the grounded aluminum base, and the impact of the ions generated at this time attempts to drive out minute dirt and adsorbed gas on the base surface. It is something.
以上のように、電子写真感光体の製造工程においては、
蒸着槽内でイオン衝撃法を実施した後、直ちに真空蒸着
が行われる。その為、蒸発させた感光層の原料が目標物
である基体だけでなく、槽内にあるイオン衝撃用電極の
部分にもかなり付着してしまう。イオン衝撃用電極に原
料が付着してしまうと、次のロフトで放電が起こりにく
くなると共に、均一な放電が起こらず、異常放電の原因
となる。それを防ぐ為には、毎ロフト、電極を付着物の
ない清浄な電極と交換しなければならず、量産ラインで
は工数、設備稼動率に与える影響が大きい、また、電極
に原料が付着することにより、相対的に基体への付着効
率が減少し、原料コストの増大となる。As mentioned above, in the manufacturing process of electrophotographic photoreceptors,
Vacuum deposition is performed immediately after performing the ion bombardment method in the deposition tank. Therefore, the evaporated raw material of the photosensitive layer adheres not only to the target substrate, but also to a large extent to the ion bombardment electrode in the tank. If the raw material adheres to the ion bombardment electrode, it becomes difficult for discharge to occur in the next loft, and uniform discharge does not occur, causing abnormal discharge. In order to prevent this, it is necessary to replace the electrode with a clean electrode without any deposits at every loft, which has a large impact on man-hours and equipment operation rate on mass production lines, and also prevents raw materials from adhering to the electrode. As a result, the adhesion efficiency to the substrate is relatively reduced, leading to an increase in raw material cost.
本発明の目的は、上述の問題を解決し、イオン衝撃用電
極に感光層蒸着時に原料が付着することな（、電極を交
換しないで次のロフトの感光体の製造ができる電子写真
感光体製造装置に関する。An object of the present invention is to solve the above-mentioned problems and to provide an electrophotographic photoreceptor manufacturing method that prevents raw materials from adhering to the ion bombardment electrode during photoreceptor layer deposition (i.e., allows production of a photoreceptor with the next loft without replacing the electrode). Regarding equipment.
上記の目的を達成するために、本発明は、導電性基体上
に感光層を形成するための真空蒸着槽内に基体に対向し
てイオン衝撃用電極を備えた電子写真感光体製造装置に
おいて、イオン衝撃用電極の高圧電極部の感光体用基体
に対向しない側に、電極部と所定の間隔を保つ接地され
た導体板を介して加熱源を備えたものとする。In order to achieve the above object, the present invention provides an electrophotographic photoreceptor manufacturing apparatus that includes an ion bombardment electrode facing the substrate in a vacuum deposition tank for forming a photosensitive layer on a conductive substrate. A heating source is provided on the side of the high-voltage electrode portion of the ion bombardment electrode that does not face the photoreceptor substrate via a grounded conductor plate that maintains a predetermined distance from the electrode portion.
高圧電極部の背後に備えた加熱源は、イオン衝撃電極、
特に放電のために重要な高圧部分に蒸発した原料の付着
するのを防止する。また接地導体。The heating source behind the high-voltage electrode is an ion bombardment electrode,
In particular, it prevents evaporated raw materials from adhering to high-pressure parts that are important for electric discharge. Also a grounding conductor.
板は、高圧部と所定の間隔をおくことにより、加熱源側
での放電の発生を防止する役目をする。By leaving a predetermined distance between the plate and the high voltage part, the plate serves to prevent the occurrence of electrical discharge on the heating source side.
第１図および第２図は、本発明の一実施例を示す。 1 and 2 show one embodiment of the invention.
電子写真感光体製造装置において、真空槽１の内部に支
持軸２が設けられ、電子写真感光体用基体３が装着され
ている。そして、その下方に感光層を真空蒸着をする際
に原料を蒸発させるための蒸発源４が配置されている。In an electrophotographic photoreceptor manufacturing apparatus, a support shaft 2 is provided inside a vacuum chamber 1, and an electrophotographic photoreceptor substrate 3 is attached thereto. An evaporation source 4 for evaporating raw materials when vacuum-depositing a photosensitive layer is arranged below it.
さらに、基体３の近傍に、基体３表面の清浄化処理のた
めのイオン衝撃用電極５が５０簡の距離を置いて配置さ
れている。Furthermore, an ion bombardment electrode 5 for cleaning the surface of the substrate 3 is placed near the substrate 3 at a distance of 50 cm.
第２図に、本発明に基づくイオン衝撃用電極５の断面図
を示すが、コ字型の電極の高圧部６は、三方が絶縁碍子
７を用いて接地金属板８により保持される。この時の高
圧部６と接地板８の間隙を３ｎとした。さらに、接地板
の外側に電極を加熱するためのヒータ９が取付けられて
いる。FIG. 2 shows a cross-sectional view of the ion bombardment electrode 5 according to the present invention. The high voltage part 6 of the U-shaped electrode is supported by a grounded metal plate 8 using insulators 7 on three sides. At this time, the gap between the high voltage section 6 and the ground plate 8 was set to 3n. Furthermore, a heater 9 for heating the electrode is attached to the outside of the ground plate.
このような真空蒸着槽ｌ内の真空度を０．１〜ＩＴｏｒ
ｒとし、電極５に＋５００Ｖｏｔｔの直流電圧をかける
と、基体３と高圧部６の間で安定したグロー放電が得ら
れ、接地板８へのアーク放電等の異常放電は起こらなか
った。グロー放電による基体３へのイオン衝撃実施後、
引きつづいての真空蒸着実施時にヒータ９により電極を
加熱し、接地板８の部分での温度を３５０℃まで上げて
保持した所、電極高圧部６への蒸発原料の付着が起こら
ず、イオン衝撃用電極のくり返し使用を行うことが可能
であった。The degree of vacuum in such a vacuum evaporation tank l is 0.1 to ITor.
When a DC voltage of +500 Vott was applied to the electrode 5, a stable glow discharge was obtained between the base 3 and the high voltage section 6, and no abnormal discharge such as arc discharge to the ground plate 8 occurred. After performing ion bombardment on the base 3 by glow discharge,
When the electrode was heated by the heater 9 during subsequent vacuum evaporation and the temperature at the ground plate 8 was raised to 350°C and maintained, the evaporation raw material did not adhere to the electrode high-pressure part 6 and ion bombardment occurred. It was possible to use the electrode repeatedly.
本発明によれば、電子写真感光体用基体の清浄化のため
のイオン衝撃用電極の反基体側を接地板で覆い、その背
後に加熱源を備えることにより、接地板によって放電方
向を制限して異常放電を防ぎ、加熱源によって感光層蒸
着時に電極部に蒸発原料の付着するのを防ぐことができ
るので、イオン衝撃用電極を交換することなく感光層蒸
着を繰り返し行うことが可能となり、設備稼動率の増大
。According to the present invention, the opposite side of the ion bombardment electrode for cleaning the substrate for an electrophotographic photoreceptor is covered with a ground plate, and a heating source is provided behind it, so that the discharge direction is limited by the ground plate. The heating source prevents abnormal discharge and the adhesion of evaporation materials to the electrode during photosensitive layer deposition using a heating source, making it possible to repeatedly perform photosensitive layer deposition without replacing the ion bombardment electrode. Increased utilization.
原料コストの低下による電子写真感光体の製造コストの
低減効果が得られた。The effect of reducing the manufacturing cost of an electrophotographic photoreceptor was obtained due to the reduction in raw material cost.
第１図は本発明の実施される感光体製造装置の断面図、
第２図は本発明の一実施例のイオン衝撃用電極の断面図
である。
１：真空槽、２：支持軸、３：感光体用基体、５：イオ
ン衝撃用電極、６：電極高圧部、８：接地板、９：ヒー
タ。
第１図
第２図FIG. 1 is a sectional view of a photoreceptor manufacturing apparatus in which the present invention is implemented;
FIG. 2 is a sectional view of an ion bombardment electrode according to an embodiment of the present invention. 1: Vacuum chamber, 2: Support shaft, 3: Substrate for photoreceptor, 5: Electrode for ion bombardment, 6: Electrode high pressure part, 8: Ground plate, 9: Heater. Figure 1 Figure 2
Claims (1)
内に基体に対向してイオン衝撃用電極を備えたものにお
いて、イオン衝撃用電極の高圧電極部の感光体用基体に
対向しない側に、電極部と所定の間隔を保つ接地された
導体板を介して加熱源を備えたことを特徴とする電子写
真感光体製造装置。1) In a vacuum deposition tank for forming a photosensitive layer on a conductive substrate, which is equipped with an ion bombardment electrode facing the substrate, the high voltage electrode part of the ion bombardment electrode does not face the photoconductor substrate. An electrophotographic photoreceptor manufacturing apparatus characterized in that a heating source is provided on the side via a grounded conductor plate that maintains a predetermined distance from the electrode portion.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30563686A JPS63157853A (en) | 1986-12-22 | 1986-12-22 | Apparatus for producing electrophotographic sensitive body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30563686A JPS63157853A (en) | 1986-12-22 | 1986-12-22 | Apparatus for producing electrophotographic sensitive body |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63157853A true JPS63157853A (en) | 1988-06-30 |
Family
ID=17947515
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30563686A Pending JPS63157853A (en) | 1986-12-22 | 1986-12-22 | Apparatus for producing electrophotographic sensitive body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63157853A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5277831A (en) * | 1975-12-24 | 1977-06-30 | Stanley Electric Co Ltd | Ion bombarding method |
| JPS5815651B2 (en) * | 1973-04-24 | 1983-03-26 | エス カ−ル エフ ノ−ヴア ア− ベ− | ball butting |
-
1986
- 1986-12-22 JP JP30563686A patent/JPS63157853A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5815651B2 (en) * | 1973-04-24 | 1983-03-26 | エス カ−ル エフ ノ−ヴア ア− ベ− | ball butting |
| JPS5277831A (en) * | 1975-12-24 | 1977-06-30 | Stanley Electric Co Ltd | Ion bombarding method |
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