JPS63156653A - Method of polishing copper laminated layer plate and printed circuit board substrate and device therefor - Google Patents

Method of polishing copper laminated layer plate and printed circuit board substrate and device therefor

Info

Publication number
JPS63156653A
JPS63156653A JP30285486A JP30285486A JPS63156653A JP S63156653 A JPS63156653 A JP S63156653A JP 30285486 A JP30285486 A JP 30285486A JP 30285486 A JP30285486 A JP 30285486A JP S63156653 A JPS63156653 A JP S63156653A
Authority
JP
Japan
Prior art keywords
polishing
substrate
polished
printed circuit
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30285486A
Other languages
Japanese (ja)
Inventor
Ryoichi Suzuki
良一 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON KEMU TEC KK
SHIZUOKA GIKEN SANKI KK
Original Assignee
NIPPON KEMU TEC KK
SHIZUOKA GIKEN SANKI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON KEMU TEC KK, SHIZUOKA GIKEN SANKI KK filed Critical NIPPON KEMU TEC KK
Priority to JP30285486A priority Critical patent/JPS63156653A/en
Publication of JPS63156653A publication Critical patent/JPS63156653A/en
Pending legal-status Critical Current

Links

Landscapes

  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To prevent a material to be polished, such as a substrate, a laminated layer plate, a laminated layer sheet or the like from being damaged, and to make it possible to perform dry type polishing without the necessity of a water processing device by absorbing the material to be polished, so as to make it into close contact with a running conveyer belt, and by allowing a polishing cloth to take circular motion so as to effect dry type polishing. CONSTITUTION:A substrate 4 as a material to be polished is absorbed so as to be made into close contact with a conveyer type setting bed 3 having perforations 5 by a suction pump 8, and is conveyed. A motor 10 in a polishing cloth attaching device causes a polishing device 14 to take circular motion through the intermediary of a small gear 12 and an internal gear 13 so as to polish the substrate 4. Meanwhile, abrasive dust produced during polishing is removed by an endless belt-type unwoven fabric 15 rotated by a motor 16 and is retrieved into a dust collector. As a result, it is possible to prevent the substrate 4 as the material to be polished, from being swung during polishing, without the substrate being damaged, and therefore, it is possible to carry out continuous dry type polishing without the necessity of a water processing device.

Description

【発明の詳細な説明】 此の発明は上記銅張積層板、積層シート及び印刷回路基
板の整面、粗面化、研削に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to surface preparation, roughening, and grinding of the copper-clad laminate, laminate sheet, and printed circuit board.

従来の銅張積層板、銅張シート、印刷回路基板の整面、
机面化、研削の方法は、水を掛けながら行う湿式法によ
り回転ブラシ又はベルトサングーを使用している。
Surface preparation of conventional copper-clad laminates, copper-clad sheets, printed circuit boards,
The surface preparation and grinding method is a wet method in which water is poured over the surface using a rotating brush or a belt sander.

此の発明による方法及び装置は下記の特徴がある。The method and apparatus according to this invention have the following features.

イ)従来方法では主として湿式方法により、水を掛けな
がら研磨するので、水を掛ける装置と排水装置及び公害
の原因となる銅粉及び緑青を取り除く装置を併設し排水
を処理しなければならないが、此の方法は、乾式研師法
のため廃液回収装置ら不要で、無公害研磨ができる。
b) In the conventional method, polishing is performed mainly by applying water, so it is necessary to treat the waste water by installing a water application device, a drainage device, and a device to remove copper powder and patina that cause pollution. Since this method is a dry polisher method, there is no need for a waste liquid collection device, and pollution-free polishing is possible.

口)円運動方式研磨の為ホール(穴)内へパリを押し込
まず連続してパリ取り作業ができ、ホールエツジ(穴の
端部)や基板のエツジ(端)の損傷が無い。
Mouth) Circular motion polishing allows for continuous deburring without pushing the deburr into the hole, and there is no damage to the hole edges or the edges of the board.

ハ〕円運動方式かつ吸引密着方式の為、薄いフレキシブ
ル(軟質)銅張シートの場合ら、めくれたり、移動した
すせず、コンベアベルト上に密着さ仕て作業できるので
寸法変化なしに高速処理ができる。
C] Because of the circular motion method and suction contact method, thin flexible (soft) copper-clad sheets can be worked on tightly on the conveyor belt without turning over or moving, allowing high-speed processing without dimensional changes. I can do it.

二)高速回転のブラシを使用しないので、運転音が低く
低騒音安全作業ができる。
2) Since high-speed rotating brushes are not used, the operating noise is low and safe work can be done.

ホ)水を使用しない乾式のため、比較して小型設備の設
計が可能であり、設置場所をとらない。
e) Since it is a dry method that does not use water, it is possible to design relatively small equipment and it does not take up much space.

へ)円運動のためサングー圧が一定なので、研磨紙・布
の寿命が長く経済的である。
f) Because of the circular motion, the sand pressure is constant, so the life of the abrasive paper and cloth is long and economical.

本発明は従来技術の欠点を解消したもので具体的には多
数の小孔を有する無端帯状の載置台に基板を乗せ此れを
研磨しても動かぬ様に小孔を通して空気を抜き載置台に
密着させて研磨し研磨粉を不織布製のベルトで拭い集塵
装置を用いて除去する。
The present invention solves the drawbacks of the prior art. Specifically, the substrate is placed on an endless belt-shaped mounting table having a large number of small holes, and air is removed through the small holes so that the substrate does not move even when polished. The polishing powder is then wiped with a non-woven fabric belt and removed using a dust collector.

以下本発明の実施例を示す図面に基づいて詳細に説明す
る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described in detail based on the drawings.

第1図は本発明の方法を行なう装置の概略を示すもので
あるが、図において機枠■の上部両端に軸支されている
プーリー■、■の間にベルトコンベア一式の設置台■が
掛は渡されているもので、この設置台■には多数の小孔
■が穿設されており設置台■の下側には上面が開口部と
なっている箱状支持部材■がありこれの底面中央部から
パイプ■が下方に伸びている。此のペイプ■はバキュー
ム装置■に接続している。一方研磨布取付装置■はモー
ター[相]により小歯車@が回され、内歯車[株]と共
に研磨装置■を円運動させ、設置台■に密装置で研磨粉
を集塵ずろ。
Figure 1 shows an outline of a device for carrying out the method of the present invention. In the figure, a set of belt conveyor installation stand ■ is hung between pulleys ■ and ■ that are pivotally supported at both ends of the upper part of the machine frame ■. This installation stand ■ has many small holes ■, and there is a box-shaped support member ■ with an opening at the top on the bottom of the installation stand ■. A pipe ■ extends downward from the center of the bottom. This pipe ■ is connected to the vacuum device ■. On the other hand, in the polishing cloth attachment device ■, the small gear @ is turned by the motor [phase], which moves the polishing device ■ in a circular motion together with the internal gear [Co., Ltd.], and the polishing powder is collected on the installation table ■ by the close device.

本発明は上記の様なものであるので従来不可能とされ丁
作業で研磨されていた軟かいフレキシブル印刷回路基板
及びフレキシブル銅張シートをも自動的に連続研磨し、
水を一切使用しない、種々の111点をYrするもので
ある。
Since the present invention is as described above, it is possible to automatically and continuously polish soft flexible printed circuit boards and flexible copper-clad sheets, which were conventionally considered impossible to polish using a grinding process.
It uses 111 different types of Yr without using any water.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明方法を示す縦断側面図であり、第2図及
び第3図は研磨装置の円運動を示す図である。第4図は
従来(旧法)であり、ベルト■の上にブラシ[相]を回
転さけ水管■で水を掛けながら基板■を研磨する方法で
ある。 ■載置台、■基板、■小孔、■上面開口箱状支持部材、
■吸引ポンプ、■研磨装置、[相]モーター、■軸受、
■小歯車、■内歯車、■内歯車スライド板、■無端帯状
不織布、[相]モーター、O駆動装置、[株]上部機械
本体、■搬送ベルト、[相]ブラシ、■水管
FIG. 1 is a longitudinal sectional side view showing the method of the present invention, and FIGS. 2 and 3 are diagrams showing circular motion of the polishing device. FIG. 4 shows the conventional method (old method), in which a brush [phase] is rotated on top of the belt (2) and the substrate (2) is polished while being sprayed with water from a water pipe (2). ■Placement table, ■Substrate, ■Small hole, ■Top opening box-shaped support member,
■Suction pump, ■Polishing device, [phase] motor, ■Bearing,
■Small gear, ■Internal gear, ■Internal gear slide plate, ■Endless strip nonwoven fabric, [Phase] Motor, O drive device, [Co., Ltd.] Upper machine body, ■Transport belt, [Phase] Brush, ■Water tube

Claims (1)

【特許請求の範囲】[Claims]  孔あきないし、孔無しの軟らかいフレキシブル(軟質
)印刷回路基板及び硬いリジッド(硬質)印刷回路基板
の製造に供する、リジッド銅張積層板及びフレキシブル
銅張シートの銅(その他の導電材料も含む)箔の表面、
及び上記銅張積層板及び銅張シートの表面に金属鍍金、
ハンダ付、硬化樹脂塗布を於した印刷回路基板の半製品
の表面を研磨するに際し、搬送するコンベヤーベルトに
基板、積層板、積層シートを密着させ、研磨布を円運動
させて水を使用しない乾式方法で研磨する方法及び装置
Copper (including other conductive materials) foil for rigid copper-clad laminates and flexible copper-clad sheets for the manufacture of perforated, non-perforated soft flexible printed circuit boards and hard rigid printed circuit boards. the surface of
and metal plating on the surface of the copper-clad laminate and copper-clad sheet,
When polishing the surface of a semi-finished printed circuit board that has been soldered or coated with a cured resin, the board, laminate, or laminate sheet is brought into close contact with a conveyor belt, and the polishing cloth is moved in a circular motion using a dry method that does not use water. Method and apparatus for polishing by method.
JP30285486A 1986-12-20 1986-12-20 Method of polishing copper laminated layer plate and printed circuit board substrate and device therefor Pending JPS63156653A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30285486A JPS63156653A (en) 1986-12-20 1986-12-20 Method of polishing copper laminated layer plate and printed circuit board substrate and device therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30285486A JPS63156653A (en) 1986-12-20 1986-12-20 Method of polishing copper laminated layer plate and printed circuit board substrate and device therefor

Publications (1)

Publication Number Publication Date
JPS63156653A true JPS63156653A (en) 1988-06-29

Family

ID=17913896

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30285486A Pending JPS63156653A (en) 1986-12-20 1986-12-20 Method of polishing copper laminated layer plate and printed circuit board substrate and device therefor

Country Status (1)

Country Link
JP (1) JPS63156653A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02155599A (en) * 1988-12-08 1990-06-14 Imaizumi Tekkosho:Kk Deburring device for powder press formed part
US6015334A (en) * 1996-08-05 2000-01-18 Hh Patent A/S Method for the deburring of items, particularly items of metal, and use of the method
KR100412260B1 (en) * 2001-10-24 2003-12-31 주식회사 화인알텍 A hair-line processing device metal blank
CN103440928A (en) * 2013-08-15 2013-12-11 王玉凯 Consecutive wrapping welding drawing production line for railway subgrade through ground wires
CN106239753A (en) * 2016-08-29 2016-12-21 铜仁市万山区林谢丹砂艺术雕刻有限公司 A kind of Cinnabaris artware processing shipment structure
CN106313356A (en) * 2016-08-29 2017-01-11 铜仁市万山区林谢丹砂艺术雕刻有限公司 Vermilion artware processing system operation structure
CN109227277A (en) * 2018-11-27 2019-01-18 江苏晶裕成光电科技有限公司 A kind of 2.5D glass cover-plate edge polisher

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02155599A (en) * 1988-12-08 1990-06-14 Imaizumi Tekkosho:Kk Deburring device for powder press formed part
US6015334A (en) * 1996-08-05 2000-01-18 Hh Patent A/S Method for the deburring of items, particularly items of metal, and use of the method
KR100412260B1 (en) * 2001-10-24 2003-12-31 주식회사 화인알텍 A hair-line processing device metal blank
CN103440928A (en) * 2013-08-15 2013-12-11 王玉凯 Consecutive wrapping welding drawing production line for railway subgrade through ground wires
CN106239753A (en) * 2016-08-29 2016-12-21 铜仁市万山区林谢丹砂艺术雕刻有限公司 A kind of Cinnabaris artware processing shipment structure
CN106313356A (en) * 2016-08-29 2017-01-11 铜仁市万山区林谢丹砂艺术雕刻有限公司 Vermilion artware processing system operation structure
CN109227277A (en) * 2018-11-27 2019-01-18 江苏晶裕成光电科技有限公司 A kind of 2.5D glass cover-plate edge polisher

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