JPS63153737A - Optical recording medium - Google Patents
Optical recording mediumInfo
- Publication number
- JPS63153737A JPS63153737A JP61300698A JP30069886A JPS63153737A JP S63153737 A JPS63153737 A JP S63153737A JP 61300698 A JP61300698 A JP 61300698A JP 30069886 A JP30069886 A JP 30069886A JP S63153737 A JPS63153737 A JP S63153737A
- Authority
- JP
- Japan
- Prior art keywords
- medium
- alloy
- optical recording
- recording medium
- temp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 14
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 19
- 239000000956 alloy Substances 0.000 claims abstract description 19
- 239000013078 crystal Substances 0.000 claims abstract description 13
- 239000002184 metal Substances 0.000 claims abstract description 9
- 229910052751 metal Inorganic materials 0.000 claims abstract description 9
- 238000002844 melting Methods 0.000 claims abstract description 7
- 230000008018 melting Effects 0.000 claims abstract description 5
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 3
- 229910005939 Ge—Sn Inorganic materials 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 229910005936 Ge—Sb Inorganic materials 0.000 claims 1
- 229910052798 chalcogen Inorganic materials 0.000 claims 1
- 150000001787 chalcogens Chemical class 0.000 claims 1
- 230000008859 change Effects 0.000 abstract description 10
- 230000015654 memory Effects 0.000 abstract description 8
- 238000004544 sputter deposition Methods 0.000 abstract description 3
- 238000001579 optical reflectometry Methods 0.000 abstract 3
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 8
- 239000010410 layer Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- 229910001128 Sn alloy Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 229910001245 Sb alloy Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910002056 binary alloy Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910002058 ternary alloy Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
く卒業上の利用分野〉
本発明は、情報の記録、再生、消去の可能な光記録媒体
を提供しようとするものである。[Detailed Description of the Invention] Further Fields of Use> The present invention aims to provide an optical recording medium on which information can be recorded, reproduced, and erased.
〈従来の技術及びその問題点〉
光記録媒体はディスクの形で、追記型メモリーが先行し
て開発されており、引き続いて光磁気媒体や相変化型媒
体の開発も広く行なわれている。<Prior Art and its Problems> Optical recording media are in the form of disks, and write-once memories have been developed first, followed by the widespread development of magneto-optical media and phase change media.
光記録媒体は、磁気配録媒体に比べて高密度な記録が可
能である点に長所があるが、将来的にはよシ高密度なも
のが必要とされている。このため、最近、多層膜メモリ
ー材料や光化学ホー/L/バーニング(PHB、)など
/ビットに複数清報を記録できる媒体(多値メモリー媒
体)の研究が行なわれて−るが、前者に2いては多数の
記録膜や中間層の重ね合せが必要であり、成膜上煩雑さ
が伴なう箒や、レーザー光の異なる記録層へのフォーカ
ス技術などに難さがある。後者においては、メモリーを
保持するためへ11ウム温度などの極低温を必要とされ
、現実性が少ない。Optical recording media have the advantage of being capable of higher density recording than magnetic recording media, but in the future, even higher densities will be needed. For this reason, research has recently been carried out on multilayer memory materials and media that can record multiple bits (multilevel memory media), such as photochemical hole/light/burning (PHB), but the former In this case, it is necessary to superimpose a large number of recording films and intermediate layers, and there are difficulties in the process of film formation, which is complicated, and in the technique of focusing laser light on different recording layers. The latter method requires extremely low temperatures such as 11 um to maintain the memory, and is therefore less practical.
〈発明の目的〉
本発明者等は上記のような多値メモリー媒体の実用的に
問題の少ないものを提供するべく種々検討を重ねた結果
、低融点金属を合金化することにより数段階の記録値を
取ることができることを見出し、本発明を完成するに至
った。<Purpose of the Invention> As a result of various studies in order to provide a multi-level memory medium with fewer practical problems as described above, the present inventors have found that by alloying low-melting point metals, multiple levels of recording can be achieved. They discovered that the value can be taken, and completed the present invention.
〈発明の構成〉
本発明の要旨は、低融点金属を含有する合金からなり、
熱的変化に応じ3種以上の異なる゛結晶構造(アモルフ
ァス構造も含む)を持ち、夫々の結晶状態において異な
る光反射率を示す合金を記録材料として剛固ることを特
徴とする光記録媒体に存する。<Structure of the Invention> The gist of the present invention is to make an alloy containing a low melting point metal,
An optical recording medium characterized in that it hardens as a recording material using an alloy that has three or more different crystal structures (including an amorphous structure) and exhibits different light reflectance in each crystalline state in response to thermal changes. Exists.
本発明者はアモルファスψ結晶転移に伴なう反射上変化
する、相変化型記録媒体につき研究を行なった結果単−
記録膜知おいて異なる温度で反射率が段階的に変化する
ような媒体を見いだすに到った。該媒体は、レーザービ
ームなどの光(熱)のパワー、及び照射時間を制御する
事により、媒体の温度を制御して単一膜において複数の
反射上状態をとり、7ビツトにおいて3つ以上の区別可
能な記録を行なわせる事を可能にした。The present inventor conducted research on phase-change recording media that change upon reflection due to amorphous ψ crystal transition, and found that
We have discovered a recording film medium whose reflectance changes stepwise at different temperatures. By controlling the power and irradiation time of light (heat) such as a laser beam, the temperature of the medium is controlled and a single film takes on multiple reflective states. This makes it possible to record distinguishable records.
このような性質を有する合金としてはTo−Sn合金、
Te−Ge−Sn合金、TO−Ge−8b合金、Te−
Ge−An合金、Te−Go−Cu合金等が挙げられる
。As alloys having such properties, To-Sn alloy,
Te-Ge-Sn alloy, TO-Ge-8b alloy, Te-
Examples include Ge-An alloy and Te-Go-Cu alloy.
これらの合金が何故3種以上の異なる結晶構造(アモル
ファス構造も含む)を有するかは判然としていないが、
発明者等の観察によれば、アモルファス状態と結晶状態
との間に比鮫的安定な準結晶状態とも呼ぶべき結晶状態
が明確に現われるためと思われる。この準結晶状態は、
前述した2元系又は3元系の合金において明確に現われ
た。It is not clear why these alloys have three or more different crystal structures (including amorphous structures), but
According to the observations of the inventors, this seems to be because a crystalline state, which can also be called a comparatively stable quasicrystalline state, clearly appears between the amorphous state and the crystalline state. This quasicrystalline state is
This clearly appeared in the binary or ternary alloys mentioned above.
従って、これらの合金においては、アモルファス状態−
準結晶状態−結晶状態の3種の結晶状態が認められ、光
学的にこれらを区別することが可能であるから、単一ビ
ットに複数の値の記録を行なうことが可能となる。Therefore, in these alloys, the amorphous state -
Three types of crystalline states, quasicrystalline state and crystalline state, are recognized and it is possible to optically distinguish between them, so it is possible to record a plurality of values in a single bit.
すなわち、記録層をアモルファス状態とし、これに弱め
のレーザービームを照射し冷却すれば準結晶状態が得ら
れ、強めのレーザービームを照射して冷却すれば結晶状
態が得られ、夫々の反射上の相違によシ多値メモリーが
構成し得る。In other words, if the recording layer is made into an amorphous state and then irradiated with a weak laser beam and cooled, a quasi-crystalline state is obtained, and if it is irradiated with a strong laser beam and cooled, a crystalline state is obtained. Due to the difference, multi-level memory can be constructed.
このような多値メモリーとして使用し得る合金は上記し
た。組成以外にもあると思われるが、前前述した合金に
ついての組成割合を示しておく。The alloys that can be used as such multivalued memories are described above. Although there are probably other factors besides the composition, the composition ratios for the alloys mentioned above are shown below.
Te−Sn合金・・・・・・Sn:j〜/j原子%Te
−Ge−Sn合金・・・・・・Ge:/j%子%以下(
0を含まず)Eln:j〜/!原子%
Te−()θ−sb合金・・・・・・Ge:/j原原子
塊以下Oを含まず)Sbニオ〜/!原子%
TeC)θ−A−u合金・・・・・・Ge : /!r
原子%以下(0を含まず)Au:10原子%以下(0を
含まず)
Te−Ge−Cu合金・・・・・・Ge:/j原原子塊
以下0を含まず)Oa:10原子%以下(0を含まず)
〈実施例〉
以下に実方例を示すが、本発明はその要旨を越えない限
υ以下の実施例に限定されるものではない。Te-Sn alloy...Sn:j~/j atomic%Te
-Ge-Sn alloy...Ge:/j%% or less (
(excluding 0) Eln:j~/! Atomic % Te-()θ-sb alloy...Ge:/jO not included below the original atomic mass)SbNio~/! Atomic % TeC) θ-A-u alloy...Ge: /! r
atomic% or less (not including 0) Au: 10 atomic% or less (not including 0) Te-Ge-Cu alloy...Ge: /j original atomic mass or less (not including 0) Oa: 10 atoms % or less (not including 0) <Example> Although actual examples are shown below, the present invention is not limited to the following examples as long as they do not exceed the gist of the invention.
実施例/
表面に紫外線硬化性樹脂を塗布・硬゛化した厚さ数10
μmの下引層を設けたガラス基板を用いRFスパッタリ
ング装置によりSiO□保獲下引層’ziooo〜30
00λ程度の厚みになるように設けた。Example / A thickness of 10 coated and hardened with ultraviolet curable resin on the surface
Using a glass substrate with a μm undercoat layer, a SiO
It was provided to have a thickness of about 00λ.
次いで、該保護下引層上に記録層2BFスパツタリング
により設けた。Next, a recording layer 2BF was provided on the protective undercoat layer by sputtering.
記録層はTeターゲット上<Oa金・寓片及びSn金属
片をTeg!;、Ge 10 、 Snjの割合シてな
るように配置してスパッタリングすることにニジ行なっ
た。成膜速度は10λ/S程度とした。The recording layer is formed by placing Oa gold pieces and Sn metal pieces on the Te target. , Ge 10 , and Snj were arranged in the same proportions and sputtered. The film formation rate was approximately 10λ/S.
次いで保護層として5i02層テスパッタリングにより
形成した。Next, a 5i02 layer was formed as a protective layer by test sputtering.
得られた合金薄膜の組成をX腺回折した結果特定結晶面
に対応するビークは現れず、アモルファス相であった。As a result of X-ray diffraction of the composition of the obtained alloy thin film, no peaks corresponding to specific crystal planes appeared, indicating that it was an amorphous phase.
該アモルファス相の局所的な結晶化には集光させた半導
体レーザー光の熱を用いて行なった。Local crystallization of the amorphous phase was performed using the heat of focused semiconductor laser light.
図/にそのための装置図を示す。該装置において半導体
レーザー(波長r30nm)からの光は、レンズにより
記録媒体面に焦点あわせされてお)、パルスジュネレー
ターによシ照射パワー、及び照射時間の制御された矩形
波状の光により結晶化を行なわせる。Figure/ shows a diagram of the equipment for this purpose. In this device, light from a semiconductor laser (wavelength: 30 nm) is focused onto the surface of the recording medium by a lens, and is crystallized by rectangular wave light whose irradiation power and irradiation time are controlled by a pulse generator. have them do it.
図2に印加されたレーザーパワーの波形及び該レーザー
光パルス照射に伴なう記録媒体の反射率変化の典型例を
示す。図から明らかな様にレーザーパルスの照射時間の
増加によって階段的に反射率の変化することがわかる。FIG. 2 shows a typical example of the waveform of the applied laser power and the change in reflectance of the recording medium due to the laser light pulse irradiation. As is clear from the figure, the reflectance changes stepwise as the laser pulse irradiation time increases.
図3は電気炉中で、io℃/頗で昇温させていった時の
該試料の温度に対する透過上の変化を示す。異なる温度
に透過上の変化する様子が理解できる。一般に透過率変
化が起こった時には、反射上の変化も起こし前述のレー
ザーパルスの照射時間の増加に伴なう反射上変化が、媒
体温度に依存している事を示している。FIG. 3 shows the change in permeability of the sample with respect to temperature when the sample was heated at io° C./mm in an electric furnace. You can understand how the transmission changes at different temperatures. Generally, when a change in transmittance occurs, a change in reflection also occurs, indicating that the above-mentioned change in reflection as the irradiation time of the laser pulse increases is dependent on the medium temperature.
本実施例においてはパルス照射時間を変える事により媒
体温度の上昇を制御しているが、照射時間を一定にして
レーザーパルス光強度を変化させる事によって制御する
事も可能である。In this embodiment, the increase in medium temperature is controlled by changing the pulse irradiation time, but it is also possible to control by changing the laser pulse light intensity while keeping the irradiation time constant.
又、アモルファス≠結晶の相転移を例にしたが、結晶≠
結晶相転移においても3つ以上の多形が存在し、媒体温
度を変える事により、多形に対応した光反射廊をもつよ
うな媒体においても同様の事が期待される。Also, although we used the phase transition of amorphous≠crystal as an example, crystal≠
Three or more polymorphs exist in crystal phase transition as well, and by changing the medium temperature, the same thing can be expected in a medium that has light reflection corridors corresponding to the polymorphs.
実施例においては、反射上状態は、R1s R2、R,
(図2)の3つであるがよシ多数の状態が階段状に存在
する場合も存在する。In the example, the reflective states are R1s R2, R,
In addition to the three states shown in FIG. 2, there are also cases where a large number of states exist in a stepwise manner.
〈発明の効果〉
本発明によシ、従来の光記録よシも容量の大きな光記録
を実現する事ができる。<Effects of the Invention> According to the present invention, optical recording with a larger capacity than conventional optical recording can be realized.
図/は本発明にかかる記録膜に、レーザービームを照射
する装置の概略図である。/はレーザービームを記録媒
体上へ焦点あわせするためのサーボ用DC電源、コはレ
ーザー光を反射させるミラー、3は試料、≠は光ビーム
スプリーター、jはレンズ、乙は半導体レーザー素子、
7はパルスジュネレーター、♂ばPINタイプの光セン
サ−,2はシンクロスコープを表わす。
図2は、図/に示した装置によシレーザービーム光加熱
した際の印加したレーザービームパルス(a)、及び−
反射率を電圧出力に変換した時の該レーザービーム照射
に伴なう記録膜の反射上の典型的な図を示している。初
期の反射上をR1とするとビーム照射に伴ない、R2s
Lと反射上が階段状に変化する。
図3は、温度上昇て伴なう記録膜の透過率変化を示す図
である。Figure 1 is a schematic diagram of an apparatus for irradiating a recording film with a laser beam according to the present invention. / is a servo DC power supply for focusing the laser beam onto the recording medium, ko is a mirror that reflects the laser beam, 3 is a sample, ≠ is a light beam splitter, j is a lens, O is a semiconductor laser element,
7 represents a pulse generator, ♂ represents a PIN type optical sensor, and 2 represents a synchroscope. Figure 2 shows the applied laser beam pulse (a) and -
A typical diagram of the reflection of the recording film accompanying the laser beam irradiation is shown when the reflectance is converted into voltage output. If the initial reflection is R1, as the beam irradiates, R2s
L and the reflection top change in a step-like manner. FIG. 3 is a diagram showing the change in transmittance of the recording film as the temperature rises.
Claims (3)
応じ3種以上の異なる結晶構造(アモルファス構造も含
む)を持ち、夫々の結晶状態において異なる光反射率を
示す合金を記録材料として用いることを特徴とする光記
録媒体。(1) An alloy that is made of an alloy containing a low-melting point metal, has three or more different crystal structures (including an amorphous structure) depending on thermal changes, and exhibits different light reflectance in each crystal state is used as a recording material. An optical recording medium characterized in that it is used.
特許請求の範囲第1項記載の光記録媒体。(2) The optical recording medium according to claim 1, wherein the low melting point metal is chalcogen.
−Ge−Sn、、Te−Ge−Sb、Te−Ge−Au
又はTe−Ge−Cu系合金であることを特徴とする特
許請求の範囲第1項に記載の光記録媒体。(3) The alloy containing low melting point metal is Te-Sn, Te
-Ge-Sn, Te-Ge-Sb, Te-Ge-Au
The optical recording medium according to claim 1, wherein the optical recording medium is a Te-Ge-Cu alloy.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61300698A JP2615577B2 (en) | 1986-12-17 | 1986-12-17 | Optical recording method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61300698A JP2615577B2 (en) | 1986-12-17 | 1986-12-17 | Optical recording method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63153737A true JPS63153737A (en) | 1988-06-27 |
JP2615577B2 JP2615577B2 (en) | 1997-05-28 |
Family
ID=17888004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61300698A Expired - Lifetime JP2615577B2 (en) | 1986-12-17 | 1986-12-17 | Optical recording method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2615577B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0432731A2 (en) * | 1989-12-11 | 1991-06-19 | Hitachi, Ltd. | Information recording medium and information recording and reproducing method and apparatus |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS613324A (en) * | 1984-06-15 | 1986-01-09 | Matsushita Electric Ind Co Ltd | Optical information recording medium |
JPS6153034A (en) * | 1984-08-24 | 1986-03-15 | 株式会社イナックス | Principal-section reinforced resin molded shape and manufacture thereof |
JPS61168142A (en) * | 1985-01-18 | 1986-07-29 | Fujitsu Ltd | Optical recording medium |
JPS61219692A (en) * | 1985-03-26 | 1986-09-30 | Matsushita Electric Ind Co Ltd | Optical information-recording member |
-
1986
- 1986-12-17 JP JP61300698A patent/JP2615577B2/en not_active Expired - Lifetime
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS613324A (en) * | 1984-06-15 | 1986-01-09 | Matsushita Electric Ind Co Ltd | Optical information recording medium |
JPS6153034A (en) * | 1984-08-24 | 1986-03-15 | 株式会社イナックス | Principal-section reinforced resin molded shape and manufacture thereof |
JPS61168142A (en) * | 1985-01-18 | 1986-07-29 | Fujitsu Ltd | Optical recording medium |
JPS61219692A (en) * | 1985-03-26 | 1986-09-30 | Matsushita Electric Ind Co Ltd | Optical information-recording member |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0432731A2 (en) * | 1989-12-11 | 1991-06-19 | Hitachi, Ltd. | Information recording medium and information recording and reproducing method and apparatus |
Also Published As
Publication number | Publication date |
---|---|
JP2615577B2 (en) | 1997-05-28 |
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