JPH0863781A - Phase change type optical disk - Google Patents

Phase change type optical disk

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Publication number
JPH0863781A
JPH0863781A JP6203544A JP20354494A JPH0863781A JP H0863781 A JPH0863781 A JP H0863781A JP 6203544 A JP6203544 A JP 6203544A JP 20354494 A JP20354494 A JP 20354494A JP H0863781 A JPH0863781 A JP H0863781A
Authority
JP
Japan
Prior art keywords
film
protective film
phase change
recording
change type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6203544A
Other languages
Japanese (ja)
Other versions
JP3080844B2 (en
Inventor
Mitsuya Okada
満哉 岡田
Tatsunori Ide
達徳 井出
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP06203544A priority Critical patent/JP3080844B2/en
Publication of JPH0863781A publication Critical patent/JPH0863781A/en
Application granted granted Critical
Publication of JP3080844B2 publication Critical patent/JP3080844B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE: To improve the overwriting characteristics of a phase change type optical disk and to obtain a novel phase change type optical disk capable of high density recording by making the reflectance of an amorphous recording mark higher than that of a crystalline part and therefore making the absorption factor of the crystalline part higher than that of the amorphous recording mark. CONSTITUTION: A 1st protective film 2, a recording film 3, a 2nd protective film 4 and a reflecting film 5 are laminated on a transparent substrate 1 to obtain a phase change type optical disk and the top of the reflecting film 5 is coated with a UV-curing resin 6 for protection. In order to make the reflectance of an amorphous recording mark higher than that, of a crystalline part and to therefore make the absorption factor of the crystalline part higher than that of the amorphous recording mark, the thickness of the 1st protective film is regulated to 80-120nm, e.g. when the thickness of the recording film of GeSbTe is 15nm, that of the 2nd protective film of ZnS-SiO2 is 20nm and that of the reflecting film of Al is 60nm.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、レーザ光を用いて高密
度に情報を記録・再生・消去する相変化型光ディスクに
関し、特に、非晶質部分と結晶部分と反射率および吸収
率の違いにより記録する相変化型光ディスクに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a phase-change type optical disc in which information is recorded / reproduced / erased at a high density by using a laser beam, and particularly, a difference in reflectance and absorptivity between an amorphous portion and a crystalline portion. The present invention relates to a phase change type optical disc for recording.

【0002】[0002]

【従来の技術】レ−ザ光を用いた光ディスク記録方式は
大容量記録が可能であり、非接触で高速アクセスできる
ことから、大容量メモリとして実用化が進んでいる。光
ディスクはコンパクトディスクやレ−ザディスクとして
知られている再生専用型、ユ−ザ自身で記録できる追記
型、およびユ−ザ側で繰り返し記録消去ができる書き替
え型に分類される。追記型・書き替え型の光ディスクは
コンピュ−タの外部メモリ、あるいは文書・画像ファイ
ルとして使用されている。
2. Description of the Related Art An optical disk recording system using laser light is capable of high-capacity recording and can be accessed at high speed in a non-contact manner. Optical discs are classified into a read-only type known as a compact disc and a laser disc, a write-once type that can be recorded by the user himself, and a rewritable type that can be repeatedly recorded and erased by the user. The write-once type / rewritable type optical disc is used as an external memory of a computer or as a document / image file.

【0003】書き替え型光ディスクには、記録膜の相変
化を利用した相変化型光ディスクと垂直磁化膜の磁化方
向の変化を利用した光磁気ディスクがある。このうち、
相変化型光ディスクは、外部磁場が不要で、かつ、オ−
バライトが容易にできることから、今後、書き替え型光
ディスクの主流になることが期待されている。
Rewritable optical disks include phase-change optical disks that utilize the phase change of the recording film and magneto-optical disks that utilize the change of the magnetization direction of the perpendicular magnetization film. this house,
A phase change optical disc does not require an external magnetic field and
It is expected that rewriting type optical discs will become the mainstream in the future because they can be easily burnt.

【0004】従来よりレ−ザ光照射により結晶−非晶質
間の相変化を起こす記録膜を用いた書き替え可能な、い
わゆる相変化型光ディスクが知られている。相変化型光
ディスクでは記録膜に記録すべき情報に応じた高パワの
レ−ザ光スポットを照射し、記録膜温度を局部的に上昇
させることにより、結晶−非晶質間の相変化を起こさせ
て記録し、これに伴う光学定数の変化を低パワのレ−ザ
光によって反射光強度差あるいは位相変化として読み取
ることにより再生を行っている。例えば、結晶化時間が
比較的遅い記録膜を用いた相変化型光ディスクでは、デ
ィスクを回転させ、そのディスクに形成された記録膜に
レ−ザ光を照射し、その記録膜の温度を融点以上に上昇
させ、レ−ザ光が通過した後、急冷することによりその
部分を非晶質状態とし、記録する。消去時には、記録膜
温度を結晶化温度以上、融点以下の結晶化可能温度範囲
で結晶化を進行させるために十分な時間保持し、記録膜
を結晶化させる。このための方法としては、レ−ザ光進
行方向に長い長円レ−ザ光を照射する方法が知られてい
る。既に記録したデ−タを消去しながら新しい情報を記
録する2ビ−ムによる疑似的なオ−バライトを行う場合
には、消去用の長円レ−ザ光を記録用円形レ−ザ光に先
行させて照射するように配置する。
Conventionally known is a rewritable so-called phase change type optical disk using a recording film which causes a phase change between a crystal and an amorphous by irradiation with laser light. In a phase-change type optical disk, a high power laser light spot corresponding to the information to be recorded is irradiated on the recording film to locally raise the temperature of the recording film, thereby causing a phase change between crystalline and amorphous. Recording is performed, and the change in the optical constants associated therewith is read as a reflected light intensity difference or a phase change by the low-power laser light for reproduction. For example, in a phase-change type optical disc using a recording film having a relatively slow crystallization time, the disc is rotated and the recording film formed on the disc is irradiated with laser light so that the temperature of the recording film is higher than the melting point. Then, after the laser light has passed therethrough, it is rapidly cooled to make the portion amorphous and recorded. At the time of erasing, the recording film is crystallized by holding the temperature of the recording film in a temperature range above the crystallization temperature and below the melting point for a time sufficient for crystallization to proceed. As a method for this purpose, there is known a method of irradiating a long oval laser light in the laser light traveling direction. In the case of performing pseudo-overwrite by two beams for recording new information while erasing the already recorded data, the elliptic laser light for erasing is changed to the circular laser light for recording. Arrange to irradiate first.

【0005】一方、高速結晶化が可能な情報記録膜を用
いたディスクでは、円形に集光した1本のレ−ザ光を使
う。従来より知られている方法は、レ−ザ光のパワを2
つのレベル間で変化させることにより、結晶化あるいは
非晶質化を行う。すなわち、記録膜の温度を融点以上に
上昇させることが可能なパワのレ−ザ光を記録膜に照射
することにより、そのほとんどの部分は冷却時に非晶質
状態となり、一方、記録膜温度が結晶化温度以上、融点
以下の温度に達するようなパワのレ−ザ光が照射された
部分は結晶状態になる。相変化型光ディスクの記録膜に
は、カルコゲナイド系材料であるGeSbTe系,In
SbTe系,InSe系,InTe系,AsTeGe
系,TeOx−GeSn系,TeSeSn系,SbSe
Bi系,BiSeGe系などが用いられるが、いずれも
抵抗加熱真空蒸着法、電子ビ−ム真空蒸着法、スパッタ
リング法などの成膜法で成膜される。成膜直後の記録膜
の状態は一種の非晶質状態であり、この記録膜に記録を
行って非晶質の記録部を形成するために、記録膜全体を
結晶質にしておく初期化処理が行われる。記録はこの結
晶化された状態の中に非晶質部分を形成することにより
達成される。
On the other hand, in a disc using an information recording film capable of high-speed crystallization, a single laser beam focused in a circular shape is used. The conventionally known method is to increase the power of laser light to 2
Crystallization or amorphization is performed by changing between two levels. That is, by irradiating the recording film with laser light having a power capable of raising the temperature of the recording film to a temperature equal to or higher than the melting point, most of the recording film becomes in an amorphous state upon cooling, while the recording film temperature decreases. The portion of the laser beam irradiated with the power so as to reach a temperature higher than the crystallization temperature and lower than the melting point becomes a crystalline state. The recording film of the phase-change optical disk is formed of a chalcogenide-based material such as GeSbTe-based or In-based.
SbTe system, InSe system, InTe system, AsTeGe
System, TeOx-GeSn system, TeSeSn system, SbSe
Bi-based, BiSeGe-based, etc. are used, and both are formed by a film-forming method such as a resistance heating vacuum evaporation method, an electron beam vacuum evaporation method, or a sputtering method. The state of the recording film immediately after film formation is a kind of amorphous state, and an initialization process in which the entire recording film is made crystalline in order to perform recording on this recording film to form an amorphous recording portion. Is done. Recording is accomplished by forming an amorphous portion within this crystallized state.

【0006】上述した従来のディスクでは、反射光量差
を利用して再生する場合、非晶質の反射率を結晶状態の
反射率に比べて小さくした相変化型光ディスクが用いら
れており、そのために非晶質に比べて結晶部分の吸収率
が小さくなっていた。こうした特性を持つディスクにオ
ーバライトによりマークエッジ記録を行った場合、前述
した吸収率の差に起因したマークエッジの歪が発生し、
これが高密度記録の妨げになっていた。
In the above-mentioned conventional disc, when reproducing by utilizing the difference in reflected light amount, a phase change type optical disc having an amorphous reflectance smaller than that of a crystalline state is used. The absorptance of the crystal part was smaller than that of the amorphous. When mark edge recording is performed by overwriting on a disc having such characteristics, distortion of the mark edge occurs due to the difference in absorption rate described above,
This has been an obstacle to high density recording.

【0007】例えば、特開平2−128330号公報の
ものでは、記録膜の吸収率の規定が示されているが、マ
ークエッジ記録に対応した媒体の吸収率に関する記述は
なく、消し残りを小さくするために、結晶と非晶質間の
吸収率の差を小さく抑えることを規定しているにすぎな
い。
For example, Japanese Laid-Open Patent Publication No. 2-128330 discloses the regulation of the absorptance of the recording film, but there is no description about the absorptance of the medium corresponding to the mark edge recording, and the unerased portion is reduced. Therefore, it merely stipulates that the difference in the absorptance between the crystal and the amorphous be kept small.

【0008】[0008]

【発明が解決しようとする課題】ここで、相変化型光デ
ィスクの吸収率制御について図面を参照して詳細に説明
する。
The absorptance control of the phase change type optical disk will be described in detail with reference to the drawings.

【0009】図3は、相変化型光ディスクの吸収率制御
について説明するための相変化型光ディスクの断面図で
ある。
FIG. 3 is a cross-sectional view of a phase change type optical disk for explaining absorption rate control of the phase change type optical disk.

【0010】相変化型光ディスクの構成は、透明基板3
1上に第一保護膜32、記録膜33、第二保護膜34、
反射膜35を順次積層し、さらに保護用として紫外線硬
化樹脂36などが塗布された、いわゆる4層反射膜構成
である。ここで、従来から記録膜33の非晶質の反射率
を結晶状態の反射率に比べて小さくした構成が採用され
ていた。つまり、非晶質部分の反射率をRa、結晶部分
の反射率をRcとしたとき、Ra<Rcとなる構成であ
る。この場合、記録膜33の相変化に伴う光学定数の変
化を反射率変化に効率良く変換でき、良好な再生信号が
確保できるという長所を持つ反面、反射膜35において
ほとんどの光が反射されてしまうため、記録膜33の光
学定数変化に伴う反射率差を大きく確保しようとする
と、記録膜33の吸収率は、必然的に、非晶質に比べて
結晶部分の吸収率が小さくなってしまうという欠点があ
った。非晶質部分の吸収率をAa、結晶部分の吸収率を
Acとしたとき、Ac<Aaとなる。このように、結晶
部分の吸収率が小さくなった場合、通常、結晶質のほう
が非晶質に比べて熱伝導率が大きく、また溶融に必要な
潜熱も大きいので、オーバライト時に記録膜33が結晶
か、非晶質かによって記録膜昇温状態に差が生じる。
The structure of the phase change type optical disk is the transparent substrate 3
On the first protective film 32, recording film 33, second protective film 34,
This is a so-called four-layer reflection film structure in which the reflection films 35 are sequentially laminated and further an ultraviolet curable resin 36 or the like is applied for protection. Here, conventionally, a configuration has been adopted in which the amorphous reflectance of the recording film 33 is smaller than the reflectance in the crystalline state. That is, when the reflectance of the amorphous portion is Ra and the reflectance of the crystalline portion is Rc, Ra <Rc. In this case, the change of the optical constant due to the phase change of the recording film 33 can be efficiently converted into the change of the reflectance, and a good reproduction signal can be secured, but most of the light is reflected by the reflective film 35. Therefore, if it is attempted to secure a large reflectance difference due to the change of the optical constant of the recording film 33, the absorptance of the recording film 33 is inevitably smaller than that of the amorphous portion. There was a flaw. When the absorption rate of the amorphous portion is Aa and the absorption rate of the crystalline portion is Ac, Ac <Aa. As described above, when the absorptance of the crystalline portion is small, the thermal conductivity of crystalline material is generally higher than that of amorphous material, and the latent heat required for melting is also large. There is a difference in the temperature rising state of the recording film depending on whether it is crystalline or amorphous.

【0011】図4は、相変化型光ディスクの吸収率制御
について説明するための相変化記録メカニズムを示した
図である。
FIG. 4 is a diagram showing a phase change recording mechanism for explaining the absorption rate control of the phase change type optical disk.

【0012】マークエッジに情報を持たせるためには、
エッジ形状を精度良く形成することが不可欠である。図
4に示すように吸収率制御が不十分な場合、オーバライ
ト信号がオーバライト前の信号成分によって変調され、
特にマークエッジ近傍でのエッジ形状歪が発生する。我
々は、研究の結果、これがオーバライトジッタ低減を制
限する一因になっていることを突き止めた。
In order to have information on the mark edge,
It is essential to accurately form the edge shape. When the absorption rate control is insufficient as shown in FIG. 4, the overwrite signal is modulated by the signal component before overwrite,
In particular, edge shape distortion occurs near the mark edge. We have found, as a result of our research, that this is one of the factors that limit the overwrite jitter reduction.

【0013】[0013]

【課題を解決するための手段】本発明の目的は、非晶質
記録マークの反射率を結晶部分に比べて大きくし、結晶
部分の吸収率を非晶質に比べて大きい状態にすることに
より、上記の欠点を解決し、相変化型光ディスクのオー
バライト特性を改善し、高密度記録を可能にする新規な
相変化型光ディスクを提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to make the reflectance of an amorphous recording mark higher than that of a crystalline portion and the absorption rate of the crystalline portion to be higher than that of an amorphous portion. SUMMARY OF THE INVENTION It is an object of the present invention to solve the above-mentioned drawbacks, improve the overwrite characteristics of a phase-change optical disk, and provide a novel phase-change optical disk that enables high-density recording.

【0014】そのため、本発明の相変化型光ディスク
は、情報記録膜の結晶と非晶質間の可逆的な相変化を用
い、レ−ザ光照射による情報記録膜の相状態変化によっ
て情報の記録再生消去を行う相変化型光ディスクであっ
て、透明基板と、透明基板上に形成された第一の保護膜
と、第一保護膜上に形成された相変化型情報記録膜と、
記録膜上に形成された第二の保護膜と、第二の保護膜上
に形成された反射膜とを有し、情報記録膜の非晶質記録
マークの反射率をRa、結晶部分の反射率をRc、非晶
質記録マークの吸収率をAa、結晶部分の吸収率をAc
としたとき、Ra>RcならびにAc>Aaであること
を特徴としている。
Therefore, the phase change type optical disk of the present invention uses reversible phase change between the crystal and amorphous of the information recording film, and records information by the phase change of the information recording film by laser light irradiation. A phase-change type optical disc for reproducing and erasing, comprising a transparent substrate, a first protective film formed on the transparent substrate, and a phase-change information recording film formed on the first protective film.
It has a second protective film formed on the recording film and a reflective film formed on the second protective film, and the reflectance of the amorphous recording mark of the information recording film is Ra and the reflection of the crystal part is The absorption rate of the amorphous recording mark is Aa, and the absorption rate of the crystalline portion is Ac.
In this case, Ra> Rc and Ac> Aa.

【0015】本発明の相変化型光ディスクは、第一保護
膜としてZnS−SiO2 を、相変化型情報記録膜とし
てGeSbTeを、第二保護膜としてZnS−SiO2
を、反射膜としてAlをそれぞれ使用し、GeSbTe
記録膜の膜厚を10nmから20nm、ZnS−SiO
2 第二保護膜の膜厚を15nmから30nm、Al反射
膜の膜厚を50nmから150nmとし、第一保護膜Z
nS−SiO2 の膜厚を80nmから120nmの範囲
に設定している。
In the phase change type optical disk of the present invention, ZnS-SiO 2 is used as the first protective film, GeSbTe is used as the phase change type information recording film, and ZnS-SiO 2 is used as the second protective film.
By using Al as the reflection film, and GeSbTe
The film thickness of the recording film is 10 nm to 20 nm, ZnS-SiO
2 The thickness of the second protective film is 15 nm to 30 nm, and the thickness of the Al reflective film is 50 nm to 150 nm.
The film thickness of nS-SiO 2 is set in the range of 80 nm to 120 nm.

【0016】[0016]

【実施例】次に、本発明の実施例について図面を参照し
て説明する。
Embodiments of the present invention will now be described with reference to the drawings.

【0017】図1は本発明による相変化型光ディスクの
一実施例の反射率、吸収率特性を示す図である。
FIG. 1 is a diagram showing the reflectance and absorptance characteristics of an embodiment of the phase change type optical disk according to the present invention.

【0018】本実施例の相変化型光ディスクでは、反射
率特性、ならびに吸収率特性において、非晶質記録マー
クの反射率を結晶部分に比べて大きくし、それにより、
結晶部分の吸収率を非晶質に比べて大きくした点に特徴
がある。
In the phase change type optical disk of the present embodiment, the reflectance and the absorptivity characteristics of the amorphous recording mark are set to be higher than that of the crystalline portion.
The feature is that the absorptance of the crystal part is made larger than that of the amorphous part.

【0019】図2は、本実施例の相変化型光ディスクの
断面図である。
FIG. 2 is a sectional view of the phase change type optical disk of this embodiment.

【0020】本実施例の相変化型光ディスクは、透明基
板1上に、第一保護膜2、記録膜3、第二保護膜4、反
射膜5を積層した構成になっている。反射膜5上には保
護用として紫外線硬化樹脂6を塗布している。透明基板
1には、円盤状のガラスもしくはプラスチックが用いら
れる。第一保護膜2と 第二保護膜4には、SiO2
Si3 N4 、AlN、TiO2 、ZnS、ZnS−Si
2 などの誘電体材料が用いられる。記録膜3として
は、カルコゲナイド系材料であるGeSbTe系,In
SbTe系,InSe系,InTe系,AsTeGe
系,TeOx−GeSn系,TeSeSn系,SbSe
Bi系,BiSeGe系などが用いられる。反射膜6に
は、反射率が高くかつ熱伝導率が大きい材料、特に、A
l,Au,Cu,Agなどの金属が用いられる。なお、
最上層には保護用に紫外線硬化型樹脂6が塗布される。
The phase change type optical disk of this embodiment has a structure in which a first protective film 2, a recording film 3, a second protective film 4, and a reflective film 5 are laminated on a transparent substrate 1. An ultraviolet curable resin 6 is applied on the reflective film 5 for protection. Disc-shaped glass or plastic is used for the transparent substrate 1. The first protective film 2 and the second protective film 4 are made of SiO 2 ,
Si3 N4, AlN, TiO 2, ZnS, ZnS-Si
A dielectric material such as O 2 is used. As the recording film 3, a chalcogenide-based material such as GeSbTe-based or In
SbTe system, InSe system, InTe system, AsTeGe
System, TeOx-GeSn system, TeSeSn system, SbSe
Bi type, BiSeGe type, etc. are used. The reflective film 6 is made of a material having a high reflectance and a high thermal conductivity, especially A
Metals such as 1, Au, Cu, and Ag are used. In addition,
An ultraviolet curable resin 6 is applied to the uppermost layer for protection.

【0021】本実施例の特徴は、吸収率差を制御した光
ディスクの構成にある。非晶質記録マークの反射率を結
晶部分に比べて大きくし、それにより、結晶部分の吸収
率が非晶質に比べて大きい状態を実現する。
The feature of this embodiment lies in the structure of the optical disc in which the difference in absorption rate is controlled. The reflectance of the amorphous recording mark is made higher than that of the crystalline portion, whereby the state where the absorptance of the crystalline portion is higher than that of the amorphous portion is realized.

【0022】図1は、ZnS−SiO2 第一保護膜の膜
厚を変えたときの、光ディスク反射率と吸収率の変化を
示したグラフである。例えば、GeSbTe記録膜の膜
厚15nm、ZnS−SiO2 第二保護膜の膜厚20n
m、Al反射膜の膜厚60nmとしたとき、第一保護膜
の膜厚80nmから120nmの範囲で、所望の条件が
実現できる。
FIG. 1 is a graph showing changes in optical disk reflectance and absorptance when the film thickness of the ZnS-SiO2 first protective film is changed. For example, the GeSbTe recording film has a film thickness of 15 nm, and the ZnS-SiO 2 second protective film has a film thickness of 20 n.
When the film thickness of the Al reflective film is 60 nm, the desired condition can be realized within the range of the film thickness of the first protective film from 80 nm to 120 nm.

【0023】さらに、GeSbTe記録膜の膜厚を10
nmから20nm、ZnS−SiO2 第二保護膜の膜厚
を15nmから30nm、Al反射膜の膜厚を50nm
から150nmとし、第一保護膜の膜厚を80nmから
120nmの範囲に設定した範囲では、現在使用できる
レーザ波長領域で、非晶質記録マークの反射率を結晶部
分に比べて大きくし、それにより、結晶部分の吸収率が
非晶質に比べて大きい状態が実現できる。
Further, the thickness of the GeSbTe recording film is set to 10
nm to 20 nm, the thickness of the ZnS-SiO 2 second protective film is 15 nm to 30 nm, and the thickness of the Al reflection film is 50 nm.
To 150 nm and the thickness of the first protective film is set in the range of 80 nm to 120 nm, the reflectance of the amorphous recording mark is made larger than that of the crystalline portion in the laser wavelength region that can be used at present, and It is possible to realize a state in which the absorptance of the crystal part is larger than that of the amorphous part.

【0024】次に、使用するレーザ波長を830nmに
設定し、非晶質記録マークの反射率を結晶部分に比べて
大きくし、それにより、結晶部分の吸収率が非晶質に比
べて大きい状態を実現できるように光ディスクの構成を
決定し、光ディスクを作成した。基板1には直径130
mm、厚さ1.2mmのプリグルーブ付きポリカーボネ
ート基板を用いた。第一保護膜2および第二保護膜4に
はZnS−SiO2 混合膜を、記録膜3にはGeSbT
eを、反射膜5にはAlを用い、マグネトロンスパッタ
法により連続成膜した。
Next, the laser wavelength to be used is set to 830 nm and the reflectance of the amorphous recording mark is made larger than that of the crystalline portion, so that the absorptance of the crystalline portion is larger than that of the amorphous portion. The structure of the optical disc was determined so that the above could be realized, and the optical disc was created. The substrate 1 has a diameter of 130
A polycarbonate substrate with a pregroove having a thickness of 1.2 mm and a thickness of 1.2 mm was used. The first protective film 2 and the second protective film 4 are ZnS—SiO 2 mixed films, and the recording film 3 is GeSbT.
e was continuously formed by a magnetron sputtering method using Al for the reflection film 5.

【0025】各層の膜厚は第一保護膜100nm、記録
膜15nm、第二保護膜20nm、反射膜60nmとし
た。このディスクでは、波長830nmにおける吸収率
は結晶に対して80%、非晶質に対して55%であり、
反射率は結晶に対して11%、非晶質に対して21%で
あった。
The film thickness of each layer was 100 nm for the first protective film, 15 nm for the recording film, 20 nm for the second protective film, and 60 nm for the reflective film. In this disc, the absorption rate at a wavelength of 830 nm is 80% for crystals and 55% for amorphous materials.
The reflectance was 11% for crystals and 21% for amorphous.

【0026】次に、前記光ディスクにオーバライトを行
い、特性を評価した。測定には、波長830nmの半導
体レーザを搭載した光ヘッドを用いた。初期化処理後の
光ディスクを回転数3600rpmにて回転させ、半径
30mmのトラックに8.4MHz(Duty50%)
信号と2.2MHz(Duty50%)信号を交互にオ
ーバライトした。再生信号の二次高調波歪が最小となる
ように、記録パワと消去パワをそれぞれ10mW、5m
Wに設定した。
Next, the optical disk was overwritten and the characteristics were evaluated. An optical head equipped with a semiconductor laser having a wavelength of 830 nm was used for the measurement. The optical disk after initialization processing is rotated at a rotation speed of 3600 rpm, and a track with a radius of 30 mm is 8.4 MHz (Duty 50%).
The signal and the 2.2 MHz (Duty 50%) signal were alternately overwritten. The recording power and the erasing power are 10 mW and 5 m, respectively, so that the second harmonic distortion of the reproduced signal is minimized.
Set to W.

【0027】オーバライト時の再生信号ジッタは、2回
微分によるパルス化後の値として、3.0nsであっ
た。初期化直後の初記録時のジッタと大差なく、良好な
オーバライトジッタ特性を示すことが確認された。
The reproduced signal jitter at the time of overwriting was 3.0 ns as a value after pulsing by twice differentiation. It was confirmed that there was not much difference from the jitter at the time of the first recording immediately after initialization, and that it showed good overwrite jitter characteristics.

【0028】[0028]

【発明の効果】以上説明したように、本発明の相変化型
光ディスクでは、使用するレーザ波長に対して、非晶質
記録マークの反射率を結晶部分に比べて大きくし、それ
により、結晶部分の吸収率を非晶質に比べて大きい状態
にすることにより、オーバライト時のビット形状歪を抑
え、オーバライト時の再生信号のジッタ増加を小さく抑
えることができるという効果を奏する。
As described above, in the phase change type optical disk of the present invention, the reflectance of the amorphous recording mark is made larger than that of the crystalline portion with respect to the laser wavelength used, whereby the crystalline portion is By making the absorptivity of B to be larger than that of amorphous, it is possible to suppress the bit shape distortion at the time of overwriting and to suppress the increase in the jitter of the reproduced signal at the time of overwriting.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明による相変化型光ディスクの一実施例の
反射率、吸収率特性を示す図である。
FIG. 1 is a diagram showing reflectance and absorptance characteristics of an embodiment of a phase change optical disk according to the present invention.

【図2】本実施例の相変化型光ディスクの断面図であ
る。
FIG. 2 is a cross-sectional view of a phase change type optical disc of this embodiment.

【図3】相変化型光ディスクの吸収率制御について説明
するための相変化型光ディスクの断面図である。
FIG. 3 is a cross-sectional view of a phase-change optical disk for explaining absorption rate control of the phase-change optical disk.

【図4】相変化型光ディスクの吸収率制御について説明
するための相変化記録メカニズムを示した図である。
FIG. 4 is a diagram showing a phase change recording mechanism for explaining absorption rate control of a phase change type optical disc.

【符号の説明】[Explanation of symbols]

1 基板 2 第一保護膜 3 記録膜 4 第二保護膜 5 反射膜 6 紫外線硬化樹脂 31 基板 32 第一保護膜 33 記録膜 34 第二保護膜 35 反射膜 36 紫外線硬化樹脂 1 Substrate 2 First protective film 3 Recording film 4 Second protective film 5 Reflective film 6 UV curable resin 31 Substrate 32 First protective film 33 Recording film 34 Second protective film 35 Reflective film 36 Ultraviolet curable resin

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 透明基板と、前記透明基板上に形成され
た第一の保護膜と、前記第一保護膜上に形成された相変
化型情報記録膜と、前記相変化型情報記録膜上に形成さ
れた第二の保護膜と、前記第二の保護膜上に形成された
反射膜とを有し、前記相変化型情報記録膜の結晶と非晶
質間の可逆的な相変化を用い、レ−ザ光照射による前記
相変化型情報記録膜の相状態変化によって情報の記録・
再生・消去を行う相変化型光ディスクにおいて、 前記相変化型情報記録膜に記録される非晶質記録マーク
の反射率をRa、前記相変化型情報記録膜の結晶部分の
反射率をRc、前記非晶質記録マークの吸収率をAa、
前記結晶部分の吸収率をAcとしたとき、 Ra>Rc ならびに Ac>Aa であることを特徴とする相変化型光ディスク。
1. A transparent substrate, a first protective film formed on the transparent substrate, a phase change type information recording film formed on the first protective film, and a phase change type information recording film. A second protective film formed on the second protective film and a reflective film formed on the second protective film, and a reversible phase change between the crystal and the amorphous phase change information recording film is prevented. Recording of information by changing the phase state of the phase-change type information recording film by laser light irradiation.
In a phase-change type optical disc for reproducing / erasing, a reflectance of an amorphous recording mark recorded on the phase-change information recording film is Ra, a reflectance of a crystal part of the phase-change information recording film is Rc, The absorption rate of the amorphous recording mark is Aa,
Ra: Rc and Ac> Aa, where Ac is the absorptance of the crystalline portion.
【請求項2】 前記第一保護膜としてZnS−SiO2
を、前記相変化型情報記録膜としてGeSbTeを、前
記第二保護膜としてZnS−SiO2 を、前記反射膜と
してAlをそれぞれ使用し、前記GeSbTe記録膜の
膜厚を10nmから20nm、前記ZnS−SiO2
二保護膜の膜厚を15nmから30nm、前記Al反射
膜の膜厚を50nmから150nmとし、前記第一保護
膜ZnS−SiO2 の膜厚を80nmから120nmの
範囲に設定したことを特徴とする請求項1記載の相変化
型光ディスク。
2. ZnS—SiO 2 as the first protective film
GeSbTe is used as the phase change type information recording film, ZnS-SiO 2 is used as the second protective film, and Al is used as the reflective film. The GeSbTe recording film has a thickness of 10 nm to 20 nm, and ZnS- The thickness of the SiO 2 second protective film is set to 15 nm to 30 nm, the thickness of the Al reflective film is set to 50 nm to 150 nm, and the thickness of the first protective film ZnS-SiO 2 is set to 80 nm to 120 nm. The phase change type optical disk according to claim 1, which is characterized in that.
JP06203544A 1994-08-29 1994-08-29 Phase change optical disk Expired - Lifetime JP3080844B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP06203544A JP3080844B2 (en) 1994-08-29 1994-08-29 Phase change optical disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP06203544A JP3080844B2 (en) 1994-08-29 1994-08-29 Phase change optical disk

Publications (2)

Publication Number Publication Date
JPH0863781A true JPH0863781A (en) 1996-03-08
JP3080844B2 JP3080844B2 (en) 2000-08-28

Family

ID=16475905

Family Applications (1)

Application Number Title Priority Date Filing Date
JP06203544A Expired - Lifetime JP3080844B2 (en) 1994-08-29 1994-08-29 Phase change optical disk

Country Status (1)

Country Link
JP (1) JP3080844B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0867868A2 (en) * 1997-03-27 1998-09-30 Mitsubishi Chemical Corporation Optical information recording medium
EP0965984A1 (en) * 1997-02-28 1999-12-22 Asahi Kasei Kogyo Kabushiki Kaisha Phase-changeable optical recording medium, method of manufacturing the same, and method of recording information on the same
US6456584B1 (en) 1998-05-15 2002-09-24 Matsushita Electric Industrial Co., Ltd. Optical information recording medium comprising a first layer having a phase that is reversibly changeable and a second information layer having a phase that is reversibly changeable
EP1293974A1 (en) * 2000-06-16 2003-03-19 Mitsubishi Chemical Corporation Optical information recording medium

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01149238A (en) * 1987-12-04 1989-06-12 Matsushita Electric Ind Co Ltd Optical information recording medium
JPH0414485A (en) * 1990-05-08 1992-01-20 Matsushita Electric Ind Co Ltd Optical information recording reproducing erasing member
JPH04134644A (en) * 1990-09-25 1992-05-08 Matsushita Electric Ind Co Ltd Optical information recording member
JPH05298748A (en) * 1992-04-17 1993-11-12 Matsushita Electric Ind Co Ltd Optical information recording medium and designing method for structure thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01149238A (en) * 1987-12-04 1989-06-12 Matsushita Electric Ind Co Ltd Optical information recording medium
JPH0414485A (en) * 1990-05-08 1992-01-20 Matsushita Electric Ind Co Ltd Optical information recording reproducing erasing member
JPH04134644A (en) * 1990-09-25 1992-05-08 Matsushita Electric Ind Co Ltd Optical information recording member
JPH05298748A (en) * 1992-04-17 1993-11-12 Matsushita Electric Ind Co Ltd Optical information recording medium and designing method for structure thereof

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0965984A1 (en) * 1997-02-28 1999-12-22 Asahi Kasei Kogyo Kabushiki Kaisha Phase-changeable optical recording medium, method of manufacturing the same, and method of recording information on the same
US6335069B1 (en) 1997-02-28 2002-01-01 Asahi Kasei Kabushiki Kaisha Phase-changeable optical recording medium, method of manufacturing the same, and method of recording information on the same
EP0965984A4 (en) * 1997-02-28 2005-01-19 Asahi Chemical Ind Phase-changeable optical recording medium, method of manufacturing the same, and method of recording information on the same
EP0867868A2 (en) * 1997-03-27 1998-09-30 Mitsubishi Chemical Corporation Optical information recording medium
EP0867868A3 (en) * 1997-03-27 1999-10-06 Mitsubishi Chemical Corporation Optical information recording medium
US6456584B1 (en) 1998-05-15 2002-09-24 Matsushita Electric Industrial Co., Ltd. Optical information recording medium comprising a first layer having a phase that is reversibly changeable and a second information layer having a phase that is reversibly changeable
EP1293974A1 (en) * 2000-06-16 2003-03-19 Mitsubishi Chemical Corporation Optical information recording medium
EP1293974A4 (en) * 2000-06-16 2005-05-25 Mitsubishi Chem Corp Optical information recording medium

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