JPS63153525U - - Google Patents
Info
- Publication number
- JPS63153525U JPS63153525U JP4556187U JP4556187U JPS63153525U JP S63153525 U JPS63153525 U JP S63153525U JP 4556187 U JP4556187 U JP 4556187U JP 4556187 U JP4556187 U JP 4556187U JP S63153525 U JPS63153525 U JP S63153525U
- Authority
- JP
- Japan
- Prior art keywords
- electrodes
- processing chamber
- dry etching
- magnetic field
- high frequency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001312 dry etching Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 2
- 238000005530 etching Methods 0.000 claims 1
- 230000005284 excitation Effects 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4556187U JPS63153525U (fr) | 1987-03-30 | 1987-03-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4556187U JPS63153525U (fr) | 1987-03-30 | 1987-03-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63153525U true JPS63153525U (fr) | 1988-10-07 |
Family
ID=30864407
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4556187U Pending JPS63153525U (fr) | 1987-03-30 | 1987-03-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63153525U (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02211625A (ja) * | 1989-02-13 | 1990-08-22 | Hitachi Ltd | プラズマ処理装置 |
-
1987
- 1987-03-30 JP JP4556187U patent/JPS63153525U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02211625A (ja) * | 1989-02-13 | 1990-08-22 | Hitachi Ltd | プラズマ処理装置 |