JPS63148636A - Terminating point detector for ion milling equipment - Google Patents

Terminating point detector for ion milling equipment

Info

Publication number
JPS63148636A
JPS63148636A JP29488786A JP29488786A JPS63148636A JP S63148636 A JPS63148636 A JP S63148636A JP 29488786 A JP29488786 A JP 29488786A JP 29488786 A JP29488786 A JP 29488786A JP S63148636 A JPS63148636 A JP S63148636A
Authority
JP
Japan
Prior art keywords
ion beam
sample
terminating point
transmitted
collector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP29488786A
Other languages
Japanese (ja)
Inventor
Koichi Miyazawa
宏一 宮澤
Yoshinori Numata
沼田 吉典
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Naka Seiki Ltd
Original Assignee
Hitachi Naka Seiki Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Naka Seiki Ltd filed Critical Hitachi Naka Seiki Ltd
Priority to JP29488786A priority Critical patent/JPS63148636A/en
Publication of JPS63148636A publication Critical patent/JPS63148636A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To facilitate detecting the terminating point of treatment of a sample without fail even if the sample is optically transparent by a method wherein an ion beam collector is provided on the rear of a rotary sample holder and an ion beam transmitted through the sample is captured and utilized as a terminating point detection signal. CONSTITUTION:A rotary sample holder 4 is provided in a vacuum chamber 1 which is evacuated by an evacuation unit 3 and a sample 5 and an ion beam collector 6 are fixed to the front surface and the back surface of the holder 4 respectively. An ion beam is applied to the sample 5 and the sample 5 is milled by the ion beam and gradually made to be thinner with the progress of milling. If a pin hole is drilled in the sample 5, the transmitted ion beam 9 enters the ion beam collector 6. The transmitted ion beam 9 captured by the ion beam collector 6 is detected by a terminating point detecting circuit 7 as an ion beam current and a signal is transmitted to a main part control circuit 8 to terminate the operation of the main part. With this constitution, the terminating point can be detected without fail even if the sample is optically transparent.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はイオンミリング装置に係り、特に光学的に透明
な試料の終点検出に好適なイオンミリング用終点検出機
に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an ion milling apparatus, and particularly to an end point detector for ion milling suitable for detecting the end point of an optically transparent sample.

〔従来の技術〕[Conventional technology]

従来のレーザ光を利用した終点検出機では、光学的に透
明な試料では、レーザ光の透過率の差がホさいため、終
点検出が非常に困難であった。
With conventional end point detectors that use laser light, it is extremely difficult to detect the end point in optically transparent samples because the difference in transmittance of the laser light is small.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上記の従来技術は、光学的に透明な試料の終点検出につ
いて配慮がされておらず、透明な試料では、実用上問題
があった。
The above-mentioned conventional technology does not take into account the end point detection of an optically transparent sample, and has a practical problem with a transparent sample.

本発明の目的は光学的に透明な試料でも確実に終点検出
することにある。
An object of the present invention is to reliably detect the end point even in an optically transparent sample.

〔問題点を解決するための手段〕[Means for solving problems]

上記目的は回転試料ホルダの背面にイオンビームコレク
タを設は試料を透過した、イオンビームを捕集し終点検
出信号として利用することにより達成される。
The above object is achieved by installing an ion beam collector on the back of the rotating sample holder to collect the ion beam that has passed through the sample and using it as an end point detection signal.

〔作用〕[Effect]

イオンガンから出たイオンビームは回転試料ステージ上
にセットされた試料をミリングし薄くしていく、ミリン
グが進み試料にピンホールが開いた時点でイオンビーム
が試料を透過し、回転試料ホルダ背面のイオンビームコ
レクタに到達するようになる。これをイオンビーム電流
として取り出し終点検出を行なえばレーザ光を利用せず
に、光学的に透明な試料でも確実に終点検出することが
出来る。
The ion beam emitted from the ion gun mills and thins the sample set on the rotating sample stage. As the milling progresses and a pinhole is opened in the sample, the ion beam passes through the sample, and the ions on the back of the rotating sample holder. It will now reach the beam collector. By extracting this as an ion beam current and detecting the end point, it is possible to reliably detect the end point even in an optically transparent sample without using laser light.

〔実施例〕〔Example〕

以下1本発明の一実施例を第1図により説明する。 An embodiment of the present invention will be described below with reference to FIG.

排気ユニット3によって排気されている真空チャンバー
1の中に回転試料ホルダ4が設置され。
A rotating sample holder 4 is installed in a vacuum chamber 1 that is evacuated by an exhaust unit 3.

その上面に試料5が、また背面には、イオンビームコレ
クター6が、それぞれ固定されている。試料5はイオン
ガン2より照射される。イオンビームによってミリング
され、しだいに薄くなっていく。ミリングが進み試料5
にピンホールが開くとイオンビームコレクター6に透過
イオンビーム9が入射する。
A sample 5 is fixed on the top surface, and an ion beam collector 6 is fixed on the back surface. The sample 5 is irradiated by the ion gun 2. It is milled by an ion beam and gradually becomes thinner. Milling progresses and sample 5
When the pinhole is opened, the transmitted ion beam 9 enters the ion beam collector 6.

イオンビームコレクター6に入射した透過イオンビーム
9を終点検出回路7でイオンビーム電流として検出し本
体制御回路8に信号を送り1本体側の動作を停止させる
The transmitted ion beam 9 incident on the ion beam collector 6 is detected as an ion beam current by the end point detection circuit 7, and a signal is sent to the main body control circuit 8 to stop the operation of the main body 1.

本実施例によれば光学的に透明な試料でも確実に終点検
出が出来る。
According to this embodiment, the end point can be reliably detected even in an optically transparent sample.

〔発明の効果〕〔Effect of the invention〕

本発明によれば光学的に透明な試料でも確実に終点検出
が出来るので、試料のミリング過多を防ぐとともに試料
を選ばず、終点検出出来るので、イオンミリング装置の
無人運転に効果がある。
According to the present invention, the end point can be reliably detected even with an optically transparent sample, thereby preventing excessive milling of the sample and detecting the end point regardless of the sample, which is effective in unmanned operation of the ion milling apparatus.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例の縦断面図である。 FIG. 1 is a longitudinal sectional view of one embodiment of the present invention.

Claims (1)

【特許請求の範囲】[Claims] 1、真空チャンバーと真空チャンバー内に設けたイオン
ガンとイオンビームの光軸上に設けられた回転試料ホル
ダより成るイオンミリング装置に於て、回転試料ホルダ
背面にイオンビーム電流捕集用のイオンビームコレクタ
を設けたことを特徴とするイオンミリング装置用終点検
出機。
1. In an ion milling device consisting of a vacuum chamber, an ion gun installed in the vacuum chamber, and a rotating sample holder installed on the optical axis of the ion beam, an ion beam collector for collecting ion beam current is installed on the back of the rotating sample holder. An end point detector for an ion milling device, characterized by being provided with.
JP29488786A 1986-12-12 1986-12-12 Terminating point detector for ion milling equipment Pending JPS63148636A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29488786A JPS63148636A (en) 1986-12-12 1986-12-12 Terminating point detector for ion milling equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29488786A JPS63148636A (en) 1986-12-12 1986-12-12 Terminating point detector for ion milling equipment

Publications (1)

Publication Number Publication Date
JPS63148636A true JPS63148636A (en) 1988-06-21

Family

ID=17813535

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29488786A Pending JPS63148636A (en) 1986-12-12 1986-12-12 Terminating point detector for ion milling equipment

Country Status (1)

Country Link
JP (1) JPS63148636A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01159952A (en) * 1987-12-15 1989-06-22 Origin Electric Co Ltd Ion beam sensing method for charged particle irradiating device
JPH05154103A (en) * 1991-12-04 1993-06-22 Topcon Corp Ophthalmic measuring instrument
JP2003502166A (en) * 1999-06-22 2003-01-21 プレジデント・アンド・フェローズ・オブ・ハーバード・カレッジ Control of dimensional features of the solid state

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01159952A (en) * 1987-12-15 1989-06-22 Origin Electric Co Ltd Ion beam sensing method for charged particle irradiating device
JPH05154103A (en) * 1991-12-04 1993-06-22 Topcon Corp Ophthalmic measuring instrument
JP2003502166A (en) * 1999-06-22 2003-01-21 プレジデント・アンド・フェローズ・オブ・ハーバード・カレッジ Control of dimensional features of the solid state

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