JPS63148636A - Terminating point detector for ion milling equipment - Google Patents
Terminating point detector for ion milling equipmentInfo
- Publication number
- JPS63148636A JPS63148636A JP29488786A JP29488786A JPS63148636A JP S63148636 A JPS63148636 A JP S63148636A JP 29488786 A JP29488786 A JP 29488786A JP 29488786 A JP29488786 A JP 29488786A JP S63148636 A JPS63148636 A JP S63148636A
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- sample
- terminating point
- transmitted
- collector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000992 sputter etching Methods 0.000 title claims description 6
- 238000010884 ion-beam technique Methods 0.000 claims abstract description 25
- 230000003287 optical effect Effects 0.000 claims 1
- 238000001514 detection method Methods 0.000 abstract description 4
- 238000003801 milling Methods 0.000 abstract description 4
- 238000000034 method Methods 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はイオンミリング装置に係り、特に光学的に透明
な試料の終点検出に好適なイオンミリング用終点検出機
に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an ion milling apparatus, and particularly to an end point detector for ion milling suitable for detecting the end point of an optically transparent sample.
従来のレーザ光を利用した終点検出機では、光学的に透
明な試料では、レーザ光の透過率の差がホさいため、終
点検出が非常に困難であった。With conventional end point detectors that use laser light, it is extremely difficult to detect the end point in optically transparent samples because the difference in transmittance of the laser light is small.
上記の従来技術は、光学的に透明な試料の終点検出につ
いて配慮がされておらず、透明な試料では、実用上問題
があった。The above-mentioned conventional technology does not take into account the end point detection of an optically transparent sample, and has a practical problem with a transparent sample.
本発明の目的は光学的に透明な試料でも確実に終点検出
することにある。An object of the present invention is to reliably detect the end point even in an optically transparent sample.
上記目的は回転試料ホルダの背面にイオンビームコレク
タを設は試料を透過した、イオンビームを捕集し終点検
出信号として利用することにより達成される。The above object is achieved by installing an ion beam collector on the back of the rotating sample holder to collect the ion beam that has passed through the sample and using it as an end point detection signal.
イオンガンから出たイオンビームは回転試料ステージ上
にセットされた試料をミリングし薄くしていく、ミリン
グが進み試料にピンホールが開いた時点でイオンビーム
が試料を透過し、回転試料ホルダ背面のイオンビームコ
レクタに到達するようになる。これをイオンビーム電流
として取り出し終点検出を行なえばレーザ光を利用せず
に、光学的に透明な試料でも確実に終点検出することが
出来る。The ion beam emitted from the ion gun mills and thins the sample set on the rotating sample stage. As the milling progresses and a pinhole is opened in the sample, the ion beam passes through the sample, and the ions on the back of the rotating sample holder. It will now reach the beam collector. By extracting this as an ion beam current and detecting the end point, it is possible to reliably detect the end point even in an optically transparent sample without using laser light.
以下1本発明の一実施例を第1図により説明する。 An embodiment of the present invention will be described below with reference to FIG.
排気ユニット3によって排気されている真空チャンバー
1の中に回転試料ホルダ4が設置され。A rotating sample holder 4 is installed in a vacuum chamber 1 that is evacuated by an exhaust unit 3.
その上面に試料5が、また背面には、イオンビームコレ
クター6が、それぞれ固定されている。試料5はイオン
ガン2より照射される。イオンビームによってミリング
され、しだいに薄くなっていく。ミリングが進み試料5
にピンホールが開くとイオンビームコレクター6に透過
イオンビーム9が入射する。A sample 5 is fixed on the top surface, and an ion beam collector 6 is fixed on the back surface. The sample 5 is irradiated by the ion gun 2. It is milled by an ion beam and gradually becomes thinner. Milling progresses and sample 5
When the pinhole is opened, the transmitted ion beam 9 enters the ion beam collector 6.
イオンビームコレクター6に入射した透過イオンビーム
9を終点検出回路7でイオンビーム電流として検出し本
体制御回路8に信号を送り1本体側の動作を停止させる
。The transmitted ion beam 9 incident on the ion beam collector 6 is detected as an ion beam current by the end point detection circuit 7, and a signal is sent to the main body control circuit 8 to stop the operation of the main body 1.
本実施例によれば光学的に透明な試料でも確実に終点検
出が出来る。According to this embodiment, the end point can be reliably detected even in an optically transparent sample.
本発明によれば光学的に透明な試料でも確実に終点検出
が出来るので、試料のミリング過多を防ぐとともに試料
を選ばず、終点検出出来るので、イオンミリング装置の
無人運転に効果がある。According to the present invention, the end point can be reliably detected even with an optically transparent sample, thereby preventing excessive milling of the sample and detecting the end point regardless of the sample, which is effective in unmanned operation of the ion milling apparatus.
第1図は本発明の一実施例の縦断面図である。 FIG. 1 is a longitudinal sectional view of one embodiment of the present invention.
Claims (1)
ガンとイオンビームの光軸上に設けられた回転試料ホル
ダより成るイオンミリング装置に於て、回転試料ホルダ
背面にイオンビーム電流捕集用のイオンビームコレクタ
を設けたことを特徴とするイオンミリング装置用終点検
出機。1. In an ion milling device consisting of a vacuum chamber, an ion gun installed in the vacuum chamber, and a rotating sample holder installed on the optical axis of the ion beam, an ion beam collector for collecting ion beam current is installed on the back of the rotating sample holder. An end point detector for an ion milling device, characterized by being provided with.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29488786A JPS63148636A (en) | 1986-12-12 | 1986-12-12 | Terminating point detector for ion milling equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29488786A JPS63148636A (en) | 1986-12-12 | 1986-12-12 | Terminating point detector for ion milling equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63148636A true JPS63148636A (en) | 1988-06-21 |
Family
ID=17813535
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP29488786A Pending JPS63148636A (en) | 1986-12-12 | 1986-12-12 | Terminating point detector for ion milling equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63148636A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01159952A (en) * | 1987-12-15 | 1989-06-22 | Origin Electric Co Ltd | Ion beam sensing method for charged particle irradiating device |
JPH05154103A (en) * | 1991-12-04 | 1993-06-22 | Topcon Corp | Ophthalmic measuring instrument |
JP2003502166A (en) * | 1999-06-22 | 2003-01-21 | プレジデント・アンド・フェローズ・オブ・ハーバード・カレッジ | Control of dimensional features of the solid state |
-
1986
- 1986-12-12 JP JP29488786A patent/JPS63148636A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01159952A (en) * | 1987-12-15 | 1989-06-22 | Origin Electric Co Ltd | Ion beam sensing method for charged particle irradiating device |
JPH05154103A (en) * | 1991-12-04 | 1993-06-22 | Topcon Corp | Ophthalmic measuring instrument |
JP2003502166A (en) * | 1999-06-22 | 2003-01-21 | プレジデント・アンド・フェローズ・オブ・ハーバード・カレッジ | Control of dimensional features of the solid state |
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