JPS6314371Y2 - - Google Patents

Info

Publication number
JPS6314371Y2
JPS6314371Y2 JP9924481U JP9924481U JPS6314371Y2 JP S6314371 Y2 JPS6314371 Y2 JP S6314371Y2 JP 9924481 U JP9924481 U JP 9924481U JP 9924481 U JP9924481 U JP 9924481U JP S6314371 Y2 JPS6314371 Y2 JP S6314371Y2
Authority
JP
Japan
Prior art keywords
pressure
gas
branch point
filter
cut valve
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9924481U
Other languages
Japanese (ja)
Other versions
JPS5823158U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9924481U priority Critical patent/JPS5823158U/en
Publication of JPS5823158U publication Critical patent/JPS5823158U/en
Application granted granted Critical
Publication of JPS6314371Y2 publication Critical patent/JPS6314371Y2/ja
Granted legal-status Critical Current

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  • Electron Beam Exposure (AREA)

Description

【考案の詳細な説明】 本考案は電子線露光装置等において試料交換室
等の真空を解除して不活性ガスを該室内に導入す
るための装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for releasing a vacuum in a sample exchange chamber or the like and introducing an inert gas into the chamber in an electron beam exposure apparatus or the like.

例えば電子線露光装置においては、試料交換室
や露光室を種々の要請によつて真空解除しなけれ
ばならない場合が多いが、そのような場合真空解
除される室を清浄に保つと共に水分から遠ざける
ため窒素ガス等の不活性ガスをこれら室内に室内
の圧力が大気圧よりやや高くなるまで導入した
後、該室内に封じ込めるようにしている。
For example, in electron beam exposure equipment, it is often necessary to release the vacuum in the sample exchange chamber or exposure chamber due to various requests, but in such cases it is necessary to keep the vacuum released chamber clean and away from moisture. Inert gas such as nitrogen gas is introduced into these chambers until the pressure inside the chambers becomes slightly higher than atmospheric pressure, and then the chambers are sealed.

この際、装置の稼動効率を良くするため、上述
したガス導入に要する時間が短かいことが好まし
い。従つてガス供給側の圧力を高くすることが行
なわれているが、ガス供給側の圧力を高くする
と、ガスが導入される側の室の圧力もガスが導入
されるに伴つてガス供給側の圧力に近づいて来て
しまい、最終的にはガス供給側の圧力と同じにな
つてしまうため、このような室の蓋のロツクを解
除すると、蓋が勢い良く開いて装置にシヨツクを
与えるという不都合を生じる。又、ガスが導入さ
れる側の室の圧力が高くなると、室の極めて低い
圧力を測定するために室に取り付けられた真空計
を損うことがある。
At this time, in order to improve the operating efficiency of the apparatus, it is preferable that the time required for the above-mentioned gas introduction be short. Therefore, the pressure on the gas supply side is increased, but when the pressure on the gas supply side is increased, the pressure in the chamber on the side where the gas is introduced also decreases as the gas is introduced. The pressure approaches the pressure and eventually becomes the same as the pressure on the gas supply side, so if the lid of such a chamber is unlocked, the lid will open forcefully and cause a shock to the equipment, which is an inconvenience. occurs. Also, if the pressure in the chamber into which the gas is introduced increases, it may damage a vacuum gauge attached to the chamber to measure the very low pressure in the chamber.

本考案はこのような従来の電子線装置等のガス
導入装置の欠点を解決すべくなされたもので、以
下図面に基づき本考案の一実施例を詳述する。
The present invention has been made to solve the drawbacks of conventional gas introduction devices such as electron beam devices, and one embodiment of the present invention will be described in detail below with reference to the drawings.

図面において1は窒素ガスボンベであり、該ガ
スボンベ1は圧力調整バルブ2を介してフイルタ
ー3に接続されている。該フイルター3はガスボ
ンベ1から供給される窒素ガスに含まれる不純物
粒子を除去するためのもので、該フイルター3の
コンダクタンスは小さい。該フイルター3は電磁
的に開閉される第1のカツトバルブ4を介して真
空排気された試料交換室5に接続される。フイル
ター3と第1のカツトバルブ4とを接続する流路
6には分岐点7から副流路8が分岐しており、該
副流路8の先端には該分岐点7と大気側との連通
を制御する第2のカツトバルブ9が設けられてい
る。又分岐点7と該第2のカツトバルブ9との間
には分岐点側から大気側への圧力が一定値例えば
0.1Kg/cm2以上の時のみ自動的に開状態となるよ
うに動作するリリーフバルブ10が設けられてい
る。
In the drawing, 1 is a nitrogen gas cylinder, and the gas cylinder 1 is connected to a filter 3 via a pressure regulating valve 2. The filter 3 is for removing impurity particles contained in the nitrogen gas supplied from the gas cylinder 1, and the conductance of the filter 3 is small. The filter 3 is connected to an evacuated sample exchange chamber 5 via a first cut valve 4 which is electromagnetically opened and closed. A sub-channel 8 branches off from a branch point 7 in the channel 6 that connects the filter 3 and the first cut valve 4, and at the tip of the sub-channel 8 there is a connection between the branch point 7 and the atmosphere side. A second cut valve 9 is provided for controlling the. Further, between the branch point 7 and the second cut valve 9, the pressure from the branch point side to the atmosphere side is set at a constant value, for example.
A relief valve 10 is provided which automatically opens only when the pressure is 0.1 Kg/cm 2 or more.

このような構成において、ガス導入に要する時
間を短かくするため圧力調整バルブ2を調整して
ガスボンベ1からのガス供給圧を例えば大気圧よ
り0.5Kg/cm2高い圧力に設定しておく。
In such a configuration, in order to shorten the time required for gas introduction, the pressure regulating valve 2 is adjusted to set the gas supply pressure from the gas cylinder 1 to, for example, 0.5 kg/cm 2 higher than atmospheric pressure.

試料交換室5が高真空に保たれている時には第
1、第2のカツトバルブ4,9及びリリーフバル
ブは閉じられており、従つて比較的長時間経過し
た状態においては分岐点7の圧力もガス供給圧で
ある大気圧より0.5Kg/cm2高い圧力になつている。
When the sample exchange chamber 5 is maintained at a high vacuum, the first and second cut valves 4 and 9 and the relief valve are closed, and therefore, after a relatively long period of time, the pressure at the branch point 7 also decreases to the gas level. The pressure is 0.5Kg/ cm2 higher than the atmospheric pressure, which is the supply pressure.

そこで試料交換室5に窒素ガスを導入しようと
する時には、第2のカツトバルブ9を開くと共
に、第1のカツトバルブ4を開く。その結果リリ
ーフバルブ10に対して分岐点7側から大気側に
0.5Kg/cm2の圧力がかかるためリリーフバルブ1
0も開状態となる。従つて分岐点7部分に存在す
るガスは試料交換室5及び大気側へ移動できる状
態となるが、試料交換室5の圧力が大気圧に比し
て極めて小さいため、分岐点7部分に存在するガ
ス及びフイルター3を通して供給されるガスの大
部分が試料交換室5へと移動し、試料交換室5の
圧力が上昇して行くと共にフイルター3のコンダ
クタンスが小さいため分岐点7部分の圧力は低下
して行く。その結果試料交換室5の圧力と分岐点
7部分の圧力は同一になるが、この圧力はリリー
フバルブ10が大気圧より0.1Kg/cm2高い圧力を
境界にして自動的に開閉するため略この大気圧よ
り0.1Kg/cm2高い圧力に保持される。そこで操作
者は第1、第2のカツトバルブ4,9を閉じれ
ば、試料交換室5を大気圧より0.1Kg/cm2だけ高
い圧力の窒素ガスで満たすことができる。
Therefore, when introducing nitrogen gas into the sample exchange chamber 5, the second cut valve 9 and the first cut valve 4 are opened. As a result, from the branch point 7 side to the atmosphere side with respect to the relief valve 10.
Relief valve 1 due to pressure of 0.5Kg/ cm2
0 is also in the open state. Therefore, the gas present at the branch point 7 is in a state where it can move to the sample exchange chamber 5 and the atmosphere, but since the pressure in the sample exchange chamber 5 is extremely low compared to the atmospheric pressure, the gas present at the branch point 7 is Most of the gas and the gas supplied through the filter 3 move to the sample exchange chamber 5, and the pressure in the sample exchange chamber 5 increases, and the pressure at the branch point 7 decreases because the conductance of the filter 3 is small. Go. As a result, the pressure in the sample exchange chamber 5 and the pressure at the branch point 7 become the same, but this pressure is approximately the same because the relief valve 10 automatically opens and closes at a pressure 0.1 kg/cm 2 higher than atmospheric pressure. The pressure is maintained at 0.1Kg/ cm2 higher than atmospheric pressure. Then, by closing the first and second cut valves 4 and 9, the operator can fill the sample exchange chamber 5 with nitrogen gas at a pressure 0.1 kg/cm 2 higher than atmospheric pressure.

上述したように本案装置によればガス供給側の
圧力をガス導入に要する時間を短縮するため高く
した場合にも、ガスが導入される室の最終圧力を
ガス供給側の圧力より低い所望の設定圧力にでき
るため、この設定圧力を選択することにより室の
蓋のロツクを解除した際に蓋が勢い良く開いて装
置にシヨツクを与えるという事態を回避できる。
As mentioned above, according to the present device, even when the pressure on the gas supply side is increased to shorten the time required for gas introduction, the final pressure in the chamber into which gas is introduced can be set to a desired value lower than the pressure on the gas supply side. By selecting this set pressure, it is possible to avoid a situation where the lid of the chamber opens forcefully and gives a shock to the apparatus when the chamber lid is unlocked.

又、バルブ9,10は第1のカツトバルブ4を
閉じた際に高真空に保たれる室5と連通されない
ため、これらバルブ9,10に高価な高真空用の
ものを使用しなくても良い。
Furthermore, since the valves 9 and 10 are not communicated with the chamber 5 which is kept at a high vacuum when the first cut valve 4 is closed, it is not necessary to use expensive valves for a high vacuum for these valves 9 and 10.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本考案の一実施例を示すためのものであ
る。 1:ガスボンベ、2:圧力調整バルブ、3:フ
イルター、4:第1のカツトバルブ、5:露光
室、6:流路、7:分岐点、8:副流路、9:第
2のカツトバルブ、10:リリーフバルブ。
The drawings are for illustrating one embodiment of the present invention. 1: Gas cylinder, 2: Pressure adjustment valve, 3: Filter, 4: First cut valve, 5: Exposure chamber, 6: Channel, 7: Branch point, 8: Sub-channel, 9: Second cut valve, 10 :Relief valve.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] ガスボンベと、該ガスボンベから供給されるガ
スに含まれる不純物粒子を除くためのフイルター
と、該フイルターを通過したガスを真空に保持さ
れた部屋に導入する際に開かれるカツトバルブと
を備えた装置において、前記フイルターとカツト
バルブとを接続する流路を分岐させて副流路を形
成し、該副流路の先端に該分岐点と大気側との連
通を制御するための第2のカツトバルブを設ける
と共に、該分岐点と該第2のカツトバルブとの間
に分岐点側から大気側への圧力が一定圧力以上の
場合のみ自動的に開状態となるリリーフバルブを
設けたことを特徴とする電子線装置等のガス導入
装置。
In an apparatus equipped with a gas cylinder, a filter for removing impurity particles contained in the gas supplied from the gas cylinder, and a cut valve that is opened when introducing the gas that has passed through the filter into a room maintained in a vacuum, branching the flow path connecting the filter and the cut valve to form a sub-flow path, and providing a second cut valve at the tip of the sub-flow path for controlling communication between the branch point and the atmosphere side; An electron beam device, etc., characterized in that a relief valve is provided between the branch point and the second cut valve, and the relief valve is automatically opened only when the pressure from the branch point side to the atmosphere side is equal to or higher than a certain pressure. gas introduction device.
JP9924481U 1981-07-03 1981-07-03 Gas introduction equipment such as electron beam equipment Granted JPS5823158U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9924481U JPS5823158U (en) 1981-07-03 1981-07-03 Gas introduction equipment such as electron beam equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9924481U JPS5823158U (en) 1981-07-03 1981-07-03 Gas introduction equipment such as electron beam equipment

Publications (2)

Publication Number Publication Date
JPS5823158U JPS5823158U (en) 1983-02-14
JPS6314371Y2 true JPS6314371Y2 (en) 1988-04-22

Family

ID=29893985

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9924481U Granted JPS5823158U (en) 1981-07-03 1981-07-03 Gas introduction equipment such as electron beam equipment

Country Status (1)

Country Link
JP (1) JPS5823158U (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4930754B2 (en) 2006-01-25 2012-05-16 エスアイアイ・ナノテクノロジー株式会社 Charged particle beam equipment

Also Published As

Publication number Publication date
JPS5823158U (en) 1983-02-14

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