JPS6314132A - Electrochromic display element - Google Patents
Electrochromic display elementInfo
- Publication number
- JPS6314132A JPS6314132A JP61157849A JP15784986A JPS6314132A JP S6314132 A JPS6314132 A JP S6314132A JP 61157849 A JP61157849 A JP 61157849A JP 15784986 A JP15784986 A JP 15784986A JP S6314132 A JPS6314132 A JP S6314132A
- Authority
- JP
- Japan
- Prior art keywords
- electrolyte
- transparent conductor
- tungsten
- soln
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 19
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910001930 tungsten oxide Inorganic materials 0.000 claims abstract description 12
- 239000003792 electrolyte Substances 0.000 claims abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 239000000463 material Substances 0.000 claims abstract description 10
- 238000004070 electrodeposition Methods 0.000 claims abstract description 8
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 7
- 239000010937 tungsten Substances 0.000 claims abstract description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 4
- 238000004040 coloring Methods 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims 1
- 239000004020 conductor Substances 0.000 abstract description 11
- 239000010409 thin film Substances 0.000 abstract description 8
- 239000011521 glass Substances 0.000 abstract description 6
- 125000006850 spacer group Chemical group 0.000 abstract description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 3
- 229920006362 Teflon® Polymers 0.000 abstract description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract description 3
- SSWAPIFTNSBXIS-UHFFFAOYSA-N dioxido(dioxo)tungsten;iron(2+) Chemical compound [Fe+2].[O-][W]([O-])(=O)=O SSWAPIFTNSBXIS-UHFFFAOYSA-N 0.000 abstract description 3
- 239000000843 powder Substances 0.000 abstract description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 abstract description 3
- 239000004593 Epoxy Substances 0.000 abstract description 2
- 239000000853 adhesive Substances 0.000 abstract description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 2
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 abstract description 2
- 239000007784 solid electrolyte Substances 0.000 abstract description 2
- 229910000314 transition metal oxide Inorganic materials 0.000 abstract description 2
- 229910002090 carbon oxide Inorganic materials 0.000 abstract 1
- 238000005245 sintering Methods 0.000 abstract 1
- 229910006587 β-Al2O3 Inorganic materials 0.000 abstract 1
- 239000010408 film Substances 0.000 description 19
- 239000000243 solution Substances 0.000 description 19
- 238000000034 method Methods 0.000 description 6
- 239000008151 electrolyte solution Substances 0.000 description 5
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000003456 ion exchange resin Substances 0.000 description 4
- 229920003303 ion-exchange polymer Polymers 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004042 decolorization Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910003437 indium oxide Inorganic materials 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- XMVONEAAOPAGAO-UHFFFAOYSA-N sodium tungstate Chemical compound [Na+].[Na+].[O-][W]([O-])(=O)=O XMVONEAAOPAGAO-UHFFFAOYSA-N 0.000 description 2
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 description 2
- 229910000906 Bronze Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- ALOAEEKRZQMXKD-UHFFFAOYSA-N carbonic acid pyrene Chemical compound C(O)(O)=O.C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C34 ALOAEEKRZQMXKD-UHFFFAOYSA-N 0.000 description 1
- 239000003729 cation exchange resin Substances 0.000 description 1
- 229940023913 cation exchange resins Drugs 0.000 description 1
- GTKRFUAGOKINCA-UHFFFAOYSA-M chlorosilver;silver Chemical compound [Ag].[Ag]Cl GTKRFUAGOKINCA-UHFFFAOYSA-M 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 238000002484 cyclic voltammetry Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- MKCDXXDWWZVCJG-UHFFFAOYSA-M lithium;4-methyl-1,3-dioxolan-2-one;perchlorate Chemical compound [Li+].[O-]Cl(=O)(=O)=O.CC1COC(=O)O1 MKCDXXDWWZVCJG-UHFFFAOYSA-M 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- CXKGGJDGRUUNKU-UHFFFAOYSA-N oxotungsten;hydrate Chemical compound O.[W]=O CXKGGJDGRUUNKU-UHFFFAOYSA-N 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 description 1
- -1 tungstic acid peroxide Chemical class 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000012463 white pigment Substances 0.000 description 1
Landscapes
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はエレクトロクロミック表示素子に係り、特に製
造コストの低減に好適なタングステン酸化物電析薄膜を
用いたエレクトロクロミック表示素子に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an electrochromic display element, and particularly to an electrochromic display element using a tungsten oxide electrodeposited thin film suitable for reducing manufacturing costs.
従来、エレクトロクロミンク表示素子に用いられるエレ
クトロクロミック物質である非晶質酸化タングステン薄
膜は、主として蒸着によって形成されてきた(特開昭4
7−8983)。Conventionally, amorphous tungsten oxide thin films, which are electrochromic substances used in electrochromic display elements, have been mainly formed by vapor deposition (Japanese Patent Application Laid-open No.
7-8983).
上記従来技術は、真空技術を使用しているため薄膜形成
のコストが高く、とくに本発明の大面積エレクトロクロ
ミック表示素子に適用するには問題がある。このため、
より低コストでタングステン酸化物薄膜を形成する技術
の開発が望まれていた。Since the above-mentioned conventional technology uses vacuum technology, the cost of forming a thin film is high, which is particularly problematic when applied to the large-area electrochromic display element of the present invention. For this reason,
It has been desired to develop a technique for forming tungsten oxide thin films at lower cost.
本発明の目的は、簡便な方法でタングステン酸化物薄膜
を形成する技術を提供することにある。An object of the present invention is to provide a technique for forming a tungsten oxide thin film using a simple method.
上記目的は、タングステン酸化物薄膜を簡便な電析法で
形成することによって、達成される。The above object is achieved by forming a tungsten oxide thin film by a simple electrodeposition method.
タングステン酸化物の薄膜を電析によって形成するには
、タングステン酸化物がアルカリ水溶液に極めてよく溶
解することから、電析液は酸性でなければならない。In order to form a thin film of tungsten oxide by electrodeposition, the electrodepositing solution must be acidic because tungsten oxide dissolves extremely well in aqueous alkaline solutions.
ところで、タングステン酸塩水溶液に塩酸などの−iを
加えて、液を酸性にすると不溶性の酸化タングステン水
和物(WO,・nH,o) を生じる。従って、この
ままでは電解液に使用できない。By the way, when -i such as hydrochloric acid is added to a tungstate aqueous solution to make the solution acidic, an insoluble tungsten oxide hydrate (WO, .nH, o) is produced. Therefore, it cannot be used as an electrolyte as it is.
また、タングステン酸ナトリウム(NalWO,)のよ
うなタングステン酸塩を陽イオン交換樹脂で処理すると
Hs (HaWaO*t )と推定されるある種のポ
リ酸が生ずることが、ジャーナル・オブ・ザ・レス−コ
モン・メタルス 2 (1960年) 第360頁から
第371頁(Journal of theLess−
Common Metals 2(1960) pp3
6ト371)において論じられている。イオン交換樹脂
で処理したばかりのこの溶液は肉眼では透明である。し
かし、しばらくすると溶液は濁り、さらに白いペースト
状の沈澱が生ずるとされる。従って、イオン交換樹脂で
処理したポリタングステン酸の溶液も電析液に使用でき
ない。Additionally, the Journal of the Responsibility reported that when tungstate salts such as sodium tungstate (NalWO) are treated with cation exchange resins, a type of polyacid, estimated to be Hs (HaWaO*t), is produced. -Common Metals 2 (1960) Pages 360 to 371 (Journal of the Less-
Common Metals 2 (1960) pp3
6, page 371). This solution, freshly treated with ion exchange resin, is clear to the naked eye. However, after a while, the solution becomes cloudy and a white paste-like precipitate appears. Therefore, a solution of polytungstic acid treated with an ion exchange resin cannot be used as an electrodeposition solution.
ところが、イオン交換樹脂で処理した溶液に少量の過酸
化水素水を添加すると沈澱を生じなくなる。これは、溶
液中に過酸化タングステン酸が生てい
じているためと考えられ炒(RRichardson、
前述)。However, when a small amount of hydrogen peroxide is added to a solution treated with an ion exchange resin, no precipitation occurs. This is thought to be due to the presence of tungstic acid peroxide in the solution.
(mentioned above).
しかも、過酸化水素の添加量が適切な場合には、溶液に
一対の電極を浸して電気分解すると陰極側に青く蕾色し
た被膜が生じることが本発明の過程で明らかKなった。Moreover, it has become clear in the course of the present invention that when the amount of hydrogen peroxide added is appropriate, a bluish-colored film is formed on the cathode side when a pair of electrodes is immersed in the solution and electrolyzed.
この被膜は、いわゆるタングステンブロンズと考えられ
、Hx WOsなる組成式で表わされる化合物と考えら
れる。過酸化水素の量がより少ない場合には、生じる被
膜は茶色となり、また、過酸化水素の量がより多い場合
には。This coating is considered to be so-called tungsten bronze, and is considered to be a compound represented by the composition formula HxWOs. If the amount of hydrogen peroxide is lower, the resulting coating will be brown, and if the amount of hydrogen peroxide is higher.
無色の被膜が得られる。これらの被膜は、それぞれ、タ
ングステンの酸化状態が4価および6価の状態の被膜と
考えられる。A colorless coating is obtained. These films are considered to be films in which the oxidation state of tungsten is tetravalent and hexavalent, respectively.
上記の被膜は、過酸化水素とタングステンとのモル比が
1対6から1対1までの範囲ですみやかに生成し、過酸
化水素の量がこれ以上の場合には生成速度が遅くなる。The above film is formed quickly when the molar ratio of hydrogen peroxide to tungsten is in the range of 1:6 to 1:1, and when the amount of hydrogen peroxide is higher than this, the formation rate becomes slow.
また、電析時の電流密度が小さい場合には、析出し難く
なる。100μA//12以上の電流密寂とするのが望
ましい。Furthermore, if the current density during electrodeposition is low, it becomes difficult to deposit. It is desirable that the current density be 100 μA//12 or more.
また、上記電析被膜は、電極でプロトンやアルカリ金属
イオンとともKt子を同時に注入・放出することにより
発・消色し、エレクトロクロミック表示素子あるいは光
透過可変素子への応用が可能である。これらの素子は、
酸化タングステン蒸着膜を発色膜とした素子と同様な方
法で作成できる。電解質に電解液を用いたエレクトロク
ロミック表示素子の一例を第1図に示す。Further, the electrodeposited film develops and discolors by simultaneously injecting and releasing Kt atoms with protons and alkali metal ions at the electrode, and can be applied to electrochromic display elements or variable light transmission elements. These elements are
It can be produced in the same manner as an element using a tungsten oxide vapor deposited film as a coloring film. An example of an electrochromic display element using an electrolyte as an electrolyte is shown in FIG.
第1図において、1は表示極側のガラス基板、2は透明
導電体、3は発色材料層、4は例えば−酸化ケイ素の蒸
着膜などで形成される透明導電体2の保護膜、5は電解
液、6は対向電極、7は対向電極側のガラス基板、8は
スペーサ、9は電解液中に挿入された背景材である。In FIG. 1, 1 is a glass substrate on the display electrode side, 2 is a transparent conductor, 3 is a coloring material layer, 4 is a protective film for the transparent conductor 2 formed of, for example, a vapor deposited film of silicon oxide, and 5 is a protective film for the transparent conductor 2. An electrolyte solution, 6 a counter electrode, 7 a glass substrate on the counter electrode side, 8 a spacer, and 9 a background material inserted into the electrolyte solution.
電解液5には、例えば、L i CI O4のプb、ピ
レンカーボネート溶液の如きLi−塩の有機溶液が用い
られ、その中に挿入される背景材9には、多孔性アルミ
ナ基板、酸化チタンを充填したテフロンシート等が用い
られる。電解液の代りにNa−β−A/、、0.等の固
体電解質を使用することも可能アある。対向電極6は、
ガラス基板上に設けた透明導電体6′と該透明導電体に
設けた例えばカーボンと非晶質タングステン酸鉄Few
CWO4)s等の遷移金属酸化物扮末とを混合焼結し
た焼結体6〃を用いて形成される。この場合、焼結体6
“は電解液5と接する部分に設け、スペーサ8とは透明
導電体6′が直接に接するようにしてエポキシ等の接着
剤を用いて接着される。For the electrolytic solution 5, an organic solution of Li-salt such as LiCIO4 or pyrene carbonate solution is used, and the background material 9 inserted therein includes a porous alumina substrate, titanium oxide, etc. A Teflon sheet etc. filled with is used. Na-β-A/,,0. It is also possible to use solid electrolytes such as The counter electrode 6 is
A transparent conductor 6' provided on a glass substrate and carbon and amorphous iron tungstate Few provided on the transparent conductor.
It is formed using a sintered body 6 which is mixed and sintered with a transition metal oxide powder such as CWO4)s. In this case, the sintered body 6
" is provided at a portion in contact with the electrolytic solution 5, and the transparent conductor 6' is bonded to the spacer 8 using an adhesive such as epoxy so that it is in direct contact with the spacer 8.
以下1本発明の内容を具体的実施例でより詳細に説明す
る。Hereinafter, the content of the present invention will be explained in more detail with reference to specific examples.
実施例 1
タングステン酸ナトリウム0.015モルを100m1
K溶解し、あらかじめH型とした強酸型イオン交換樹脂
カラムに流しこんに0カラムから滴下される溶液は黄色
をおびており、透明であった。Example 1 0.015 mol of sodium tungstate in 100 ml
The solution, which was poured into a strong acid type ion exchange resin column in which K was dissolved and made into an H type in advance, was dripped from the 0 column and was yellowish and transparent.
ついで、純水をカラムに流し込み、カラム中に生じたタ
ングステン酸を流し出した。流し出した溶液の総量を4
00mtとした。この溶液に市販の過酸゛化水素水と水
を添加し、総量を500mtとし、過酸化水素とタング
ステンとのモル比が2対3でちる潜抜を調製した。この
溶液のタングステンの濃度は0.03mot/lである
。¥i4製した溶液を1日室温で放置したのち、これを
電解液として、300 p A/ cm” C1t流密
度のもとて30分閲見析した。ここで、陰極電極には、
ガラス基板上に形成したシート抵抗が10Ω/筋2の酸
化インジウムを主成分とする透明導電膜を使用し、陽極
電極には、金の板を使用した。電析の結果、厚さ0.6
μmの青色着色被膜が得られた。Then, pure water was poured into the column to flush out the tungstic acid generated in the column. The total amount of solution poured out is 4
00mt. A commercially available dihydrogen peroxide solution and water were added to this solution to make a total amount of 500 mt, and a dipping was prepared in which the molar ratio of hydrogen peroxide to tungsten was 2:3. The concentration of tungsten in this solution is 0.03 mot/l. After the prepared solution was left at room temperature for one day, it was used as an electrolyte and analyzed for 30 minutes at a flow density of 300 pA/cm" C1t. Here, the cathode electrode was
A transparent conductive film mainly composed of indium oxide and having a sheet resistance of 10 Ω/stripe 2 was formed on a glass substrate, and a gold plate was used as the anode electrode. As a result of electrodeposition, the thickness was 0.6
A blue colored coating of .mu.m was obtained.
実施例 2
実施例1に示した方法と同様な方法で作成した青色着色
被膜を熱処理し、1mot/4の過塩素酸リチウムのプ
ロピレンカーボネート溶液中での発・消色反応の可逆性
におよぼす熱処理温度の影4’y!tサイクリック・ボ
ルタメトリによって調べた実施例でちる。ボルダモグラ
ムの測定は、対向電極を金の板、参照電極を銀−塩化銀
電標として測定した。青色着色被膜は100C,1時間
以上の熱処理により無色透明な被膜となる。また、エレ
クトロクロミック反応は、第2図に示したようにLoo
C,1時間以上、220C11時間以下で熱処理を行な
った場合に優れた可逆性を示す。なお、ポルタモグラム
は掃引速度を0.IV/Sとして判定した。Example 2 A blue colored film prepared by a method similar to that shown in Example 1 was heat-treated, and the heat treatment affected the reversibility of the color development/decolorization reaction in a 1 mot/4 lithium perchlorate propylene carbonate solution. Temperature shadow 4'y! This is an example investigated by t-cyclic voltammetry. The Boldamogram was measured using a gold plate as the counter electrode and a silver-silver chloride electric standard as the reference electrode. The blue colored film becomes a colorless and transparent film by heat treatment at 100C for 1 hour or more. In addition, the electrochromic reaction is caused by Loo as shown in Figure 2.
Excellent reversibility is shown when heat treatment is performed for C, 1 hour or more and 220C, 11 hours or less. Note that the portamogram has a sweep speed of 0. It was determined as IV/S.
実施例 3
実施例1と同様にしてガラス基板上に、配線部分を一酸
化ケイ素の蒸着膜で被った酸化インジウム(Inxoa
)を主成分とするシート抵抗10Ω/cIn!のバタン
化された透明導電膜部分に゛社析発色膜ヲ0.6μm形
成した。これを、18CI’で1時間大気中で熱処理し
た。熱処理後の電析膜の膜厚は0.4μmであった。こ
うして作成した聚示極を用いて第1図に示した素子を作
成した。Example 3 In the same manner as in Example 1, indium oxide (Inxoa) with the wiring portion covered with a vapor-deposited film of silicon monoxide was placed on a glass substrate.
) is the main component, and the sheet resistance is 10Ω/cIn! A 0.6 μm thick color-forming film was formed on the exposed transparent conductive film portion. This was heat treated at 18 CI' for 1 hour in the air. The thickness of the electrodeposited film after the heat treatment was 0.4 μm. The device shown in FIG. 1 was fabricated using the thus fabricated polarizer.
第1図の電解液5には1moA/lのLiC20+のプ
ロピレンカーボネート溶液を用い、その中に挿入する背
景材9には、白色顔料である酸化チタン粉末を充填した
多孔性テフロンシート’を使用した。対向電極6には活
物質である非晶質タングステン酸鉄とカーボンとの重量
比が2:1の混合焼結体6“を透明導4体6′上に形成
した電極を使用した。A 1 moA/l LiC20+ propylene carbonate solution was used as the electrolytic solution 5 in Fig. 1, and a porous Teflon sheet filled with titanium oxide powder, which is a white pigment, was used as the background material 9 inserted therein. . As the counter electrode 6, an electrode was used in which a mixed sintered body 6'' of amorphous iron tungstate as an active material and carbon in a weight ratio of 2:1 was formed on a transparent conductor 4 6'.
作成した素子に1.2V、IHzの方形波を印加して、
発・消色サイクルを繰り返した。発・消色時に注入・放
出される電荷は約5mC/CIr1”であった。また、
””C7cm”の電荷が注入された発色時の消去時に対
するコントラスト比は約3.0であった。Applying a 1.2V, IHz square wave to the created element,
The cycle of developing and decoloring was repeated. The charge injected and released during color development and decolorization was approximately 5 mC/CIr1''.
The contrast ratio during color development with charge of "C7 cm" injected to that during erasing was about 3.0.
さらに1発・消色を107サイクル繰り返しても、はと
んど劣化は認められなかった。Even after repeating 107 cycles of one shot and decoloring, almost no deterioration was observed.
上述の如く、本発明によれば、簡便かつ安価な方法で発
色材料を形成することができ、エレクトロクロミック表
示素子の低コスト化が可能であり、その工業的価値は高
い。As described above, according to the present invention, a coloring material can be formed by a simple and inexpensive method, and the cost of an electrochromic display element can be reduced, and its industrial value is high.
第1図は、本発明のエレクトロクロミック光示素子の断
面図、第2図は、本発明の詳細な説明するだめの図であ
る。
1・・・基板、2・・・透明導電体、3・・・発色材料
層、4・・・保護膜、5・・・電解液、6・・・対向′
B極、7・・・基板。
8・・・スペーサ、9・・・背景材。FIG. 1 is a sectional view of an electrochromic display device of the present invention, and FIG. 2 is a diagram for explaining the present invention in detail. DESCRIPTION OF SYMBOLS 1... Substrate, 2... Transparent conductor, 3... Coloring material layer, 4... Protective film, 5... Electrolyte, 6... Opposing'
B pole, 7... board. 8... Spacer, 9... Background material.
Claims (1)
とを混合して得られる溶液から、電析により陰極側に析
出させて得たタングステン酸化物を発色材料とし、対向
電極を形成した基板との間に電解質を挾持したことを特
徴とするエレクトロクロミック表示素子。 2、上記電析により陰極側に析出させて得たタングステ
ン酸化物を100℃、1時間以上、220℃、1時間以
下の条件で熱処理し、発色膜として用いたことを特徴と
する特許請求の範囲第1項に記載のエレクトロクロミッ
ク表示素子。[Claims] 1. Tungsten oxide is deposited on the cathode side by electrodeposition from a solution obtained by mixing tungsten or its compound, hydrogen peroxide, and water as a coloring material, and the counter electrode is An electrochromic display element characterized in that an electrolyte is sandwiched between a formed substrate and an electrolyte. 2. The tungsten oxide obtained by depositing on the cathode side by the above electrodeposition is heat-treated at 100°C for 1 hour or more and 220°C for 1 hour or less, and used as a coloring film. The electrochromic display element according to scope 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61157849A JPS6314132A (en) | 1986-07-07 | 1986-07-07 | Electrochromic display element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61157849A JPS6314132A (en) | 1986-07-07 | 1986-07-07 | Electrochromic display element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6314132A true JPS6314132A (en) | 1988-01-21 |
Family
ID=15658706
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61157849A Pending JPS6314132A (en) | 1986-07-07 | 1986-07-07 | Electrochromic display element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6314132A (en) |
-
1986
- 1986-07-07 JP JP61157849A patent/JPS6314132A/en active Pending
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