JPS6313675A - Plasma jet device - Google Patents
Plasma jet deviceInfo
- Publication number
- JPS6313675A JPS6313675A JP15543086A JP15543086A JPS6313675A JP S6313675 A JPS6313675 A JP S6313675A JP 15543086 A JP15543086 A JP 15543086A JP 15543086 A JP15543086 A JP 15543086A JP S6313675 A JPS6313675 A JP S6313675A
- Authority
- JP
- Japan
- Prior art keywords
- detection plate
- nozzle
- plasma jet
- circuit
- distance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 claims abstract description 34
- 238000001514 detection method Methods 0.000 claims abstract description 29
- 238000000034 method Methods 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 abstract description 5
- 238000010586 diagram Methods 0.000 description 9
- 239000007789 gas Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- KEUKAQNPUBYCIC-UHFFFAOYSA-N ethaneperoxoic acid;hydrogen peroxide Chemical compound OO.CC(=O)OO KEUKAQNPUBYCIC-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000017531 blood circulation Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Landscapes
- Arc Welding In General (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
不発明はトーチの陰極棒とそれt囲む外套との間にグラ
ズマジエツ)k発生せしめ、該プラズマジェットにより
被加工材刺會加工するプラズマジェット装置に関する。[Detailed Description of the Invention] [Industrial Application Field] The invention is a plasma jet device that generates plasma between a cathode rod of a torch and a jacket surrounding it, and pierces a workpiece with the plasma jet. Regarding.
オフ図は従来のプラズマジェット装置を示す図である。 The off view is a diagram showing a conventional plasma jet device.
同図において、1は陰極棒(タングステン伸」、2は狭
詐ノズル6會有する外套、4はプラズマガス通路、5は
プラズマジェット、6は直流電源、7Fi被加工材料で
ろる。不活性のアルゴンガスAr會プラズマガスとして
プラズマガス通路4に流し、直流電源乙により電圧を陰
極棒1と外套2との間に印加してプラズマジェット5奮
発生させ、そのプラズマジェットにより被加工材料7會
加工する0特に狭搾ノズル6の径が111111以上で
、プラズマジェット電流工、が数1OA以上のプラズマ
ジェット装置にあっては、プラズマジェットの状態が安
定しているので被加工材料7に良い加工1)f!ij’
ことができる。In the figure, 1 is a cathode rod (tungsten steel), 2 is a jacket with 6 narrow nozzles, 4 is a plasma gas passage, 5 is a plasma jet, 6 is a DC power source, and 7Fi is a material to be processed.Inert argon Ar gas is flowed into the plasma gas passage 4 as a plasma gas, and voltage is applied between the cathode rod 1 and the mantle 2 by a DC power supply B to generate a plasma jet 5, and the workpiece material 7 is processed by the plasma jet. 0 Particularly in plasma jet apparatuses in which the diameter of the narrowing nozzle 6 is 111111 mm or more and the plasma jet electric current is several 1 OA or more, the plasma jet condition is stable, so the processing is good for the workpiece material 71) f! ij'
be able to.
しかシ、従来のプラズマジェット装置にあっては、狭搾
ノズルと被加工材料間の距離を一定にすることができな
いので、狭搾ノズルと被加工材料との接触による破損事
故ケ防止することができないという欠点があった。However, in conventional plasma jet equipment, it is not possible to maintain a constant distance between the constriction nozzle and the workpiece material, so it is difficult to prevent damage caused by contact between the constriction nozzle and the workpiece material. The drawback was that it couldn't be done.
〔問題点’kj!$決するための手段〕本発明は以上の
問題点全解決するために、トーチの一極棒とそれt囲む
外套との間にプラズマジェット奮発生せしめ、該プラズ
マジェットにより被加工材料ケ加工するプラズマジェッ
ト装置において、上記被加工材料の位置に4電性検出板
を配設して、上記1SJf他棒と導電性検出板間の電圧
或は陰極棒と導電性検出板間を通流する[流を検出する
ことにより、狭搾ノズルと被加工材料間の距1llII
′に略一定にすることを特徴と丁ルフラズマジェット装
置r提供するものである。[Problem 'kj! [Means for Solving the Problems] In order to solve all the above problems, the present invention generates a plasma jet between the one-pole rod of the torch and the jacket surrounding it, and processes the material to be processed by the plasma jet. In the jet device, a four-electrode detection plate is arranged at the position of the workpiece material, and the voltage between the 1SJf other rod and the conductive detection plate or the voltage flowing between the cathode rod and the conductive detection plate [flow] is set at the position of the workpiece material. By detecting the distance 1llII between the narrowing nozzle and the workpiece material
The present invention provides a plasma jet device characterized in that the radial angle is kept approximately constant.
本発明は上記のような構成になっているので、狭搾ノズ
ルと被加工N L)間の距離r略一定にして、狭搾ノズ
ルと被加工材料との接触による破損事故を防止すると共
に、より安定した加工を被加工材料に施すことができる
。Since the present invention has the above-described configuration, the distance r between the narrowing nozzle and the workpiece NL) is kept approximately constant to prevent damage accidents due to contact between the narrowing nozzle and the workpiece material, and It is possible to perform more stable processing on the workpiece material.
第1図及び第2図は本発明の一実施世jヶ説明するため
の図である。第1図において、8は導電性検出板、9は
電流検出器、10はフィルタ回路、11は増幅回路、1
2は比較回路、16は設定N路、14はA/D変換回路
である。オフ図に示すようにして被加工材料7に加工音
節しているプラズマジェット装置において、狭搾ノズル
6と被加工材料7間の距離が一定であることケ確認する
、或は一定になるように補正する必要が生じた場合には
、被加工材料7全除去すると共に、被加工材料7のあっ
た位置に導電性検出板8を配設して、第1図に示すよう
な回路とする○すると、@流電源6→プラズマジェット
5→導電性検出板8→電流検出器9→直流電源6の径路
で検出゛直流■が流れる。狭搾ノズル6と導電性検出板
8間の距MWと検出電流■との関係は第2図に示すよう
になる。その検出′電流l會フィルタ回路10、増幅回
路11勿介して比較回路12で予め設定1o1路16で
設定されている設定値と比較する。その比較値が成る値
を越えた時に比較回mllまイぎ号?]l−A/D変挽
回路14に送出し、 A/1)変換回路は出力信号?送
出して狭搾ノズル6と導電性検出板8との距離が一定に
なるように制御する0このようにして狭搾ノズル6と被
加工拐科7との接触による破損事故を防止することがで
きる〇第6図は本発明の他の一実施例忙睨明するための
図でめる0この実施例は外套2と導電性検出板8間のl
ta:’に検出することによp狭搾ノズル6と導電性検
出板8との距離が一定になるように制御するものである
。その他は第1図の実施例で説明したのと#lは同様で
あり、同様の効果が得られる。FIGS. 1 and 2 are diagrams for explaining one embodiment of the present invention. In FIG. 1, 8 is a conductive detection plate, 9 is a current detector, 10 is a filter circuit, 11 is an amplifier circuit, 1
2 is a comparison circuit, 16 is a setting N path, and 14 is an A/D conversion circuit. In the plasma jet device that processes the workpiece material 7 as shown in the off-line diagram, make sure that the distance between the narrowing nozzle 6 and the workpiece material 7 is constant, or keep it constant. If it becomes necessary to make corrections, remove the entire workpiece material 7 and place a conductive detection plate 8 at the position where the workpiece material 7 was, creating a circuit as shown in Figure 1. Then, the detected direct current flows through the path of @current power source 6→plasma jet 5→conductive detection plate 8→current detector 9→DC power source 6. The relationship between the distance MW between the constriction nozzle 6 and the conductive detection plate 8 and the detection current (2) is shown in FIG. The detected current is compared with a set value previously set in the setting 1/1 path 16 by the comparison circuit 12 via the filter circuit 10 and the amplifier circuit 11. When the comparison value exceeds the value, what is the comparison time? ]l-Sent to A/D conversion circuit 14, A/1) Is the conversion circuit an output signal? It is controlled so that the distance between the narrowing nozzle 6 and the conductive detection plate 8 is constant. In this way, damage accidents due to contact between the narrowing nozzle 6 and the workpiece 7 can be prevented. 〇 Figure 6 shows another embodiment of the present invention for easy viewing. 〇 This embodiment shows the distance between the mantle 2 and the conductive detection plate 8.
By detecting ta:', the distance between the p narrowing nozzle 6 and the conductive detection plate 8 is controlled to be constant. The rest of #l is the same as that described in the embodiment of FIG. 1, and the same effects can be obtained.
第4図は本発明の他の一実施例を説明するための図であ
る。この実施例は第1図の回路において、血流1!源1
sh寛流検出器9に直列接続したものであり、第1図の
実施例とはぼ同様の効果が得られる1、尚、第3図の実
施例のように外套2と導電性検出板8間の電圧を検出し
てもよいO
第5図は本発明の他の一実施例を説明するための図でお
る。この実施例は第1図の回路において、電流検出器9
を外套2と導電性検出板8間に接続したものでおり、第
1図の実施例とほぼ同様の効果が得られる。尚、第6図
の実施例のように外套2と導電性検出板8間の電圧を検
出してもよい。FIG. 4 is a diagram for explaining another embodiment of the present invention. In this embodiment, in the circuit shown in FIG. 1, the blood flow is 1! Source 1
sh relaxation detector 9 in series, and can obtain almost the same effect as the embodiment shown in FIG. 1. However, as in the embodiment shown in FIG. 5 is a diagram for explaining another embodiment of the present invention. This embodiment uses the current detector 9 in the circuit shown in FIG.
is connected between the mantle 2 and the conductive detection plate 8, and almost the same effect as the embodiment shown in FIG. 1 can be obtained. Incidentally, the voltage between the mantle 2 and the conductive detection plate 8 may be detected as in the embodiment shown in FIG.
第6図は本発明の他の一実施例を説明するための図であ
る。この実施例は第5図の回路において、直流電源15
會電流検出器9に直列接続したものであり、第1図の実
施例とほぼ同様の効果が得られる。尚、第3図の実施例
のように外套2と導電性検出板8間の電圧全検出しても
よい。FIG. 6 is a diagram for explaining another embodiment of the present invention. This embodiment uses the DC power supply 15 in the circuit shown in FIG.
This is connected in series to the social current detector 9, and substantially the same effect as the embodiment shown in FIG. 1 can be obtained. Incidentally, the entire voltage between the mantle 2 and the conductive detection plate 8 may be detected as in the embodiment shown in FIG.
以上の実施例は被加工材料7が非導電性である場合につ
いて述べたが、被加工材料7が導電性である場合には、
被加工材料7が電流検出板8を兼ねることができる0こ
の場合には狭搾ノズル6と被加工材料7間の距離が一定
になるように常時制御することができる。The above embodiments have been described for the case where the workpiece material 7 is non-conductive, but when the workpiece material 7 is conductive,
The workpiece material 7 can also serve as the current detection plate 8. In this case, the distance between the narrowing nozzle 6 and the workpiece material 7 can be constantly controlled to be constant.
以上述べたように本発明は、トーチの陰極棒とそれ會囲
む外套との間にプラズマジェットi発生せしめ、核プラ
ズマジェットにより被加工材料を加工するプラズマジェ
ット装置において、上記被加工材料の位置に導電性検出
板全配設して、上記陰極棒と導電性検出板間の電圧或は
陰極棒と導電性検出板間を通流する電流上検出すること
により、狭搾ノズルと被加工材料間の距離を略一定にす
ることを特徴とするプラズマジェット装置である。本発
明はこのような特徴全方するので、狭搾ノズルと被加工
材料との接触による破損事故會防止することができる。As described above, the present invention provides a plasma jet apparatus for processing a workpiece material by generating a plasma jet i between a cathode rod of a torch and a jacket surrounding it, and applying a nuclear plasma jet to a position of the workpiece material. By installing all conductive detection plates and detecting the voltage between the cathode rod and the conductive detection plate or the current flowing between the cathode rod and the conductive detection plate, it is possible to detect the difference between the narrowing nozzle and the workpiece material. This is a plasma jet device characterized by keeping the distance between the two sides substantially constant. Since the present invention has all of these features, it is possible to prevent damage caused by contact between the squeezing nozzle and the workpiece material.
%にプラズマジェットの状態か安定している狭搾ノズル
の径がla+以上でプラズマジエツ)[流が数1OA以
上のプラズマジェット装置に適用してM用である。%, the plasma jet state is stable when the diameter of the constriction nozzle is la+ or more.
牙1図及び第2図は本発明の一実施例’iaF!Aする
ための図、第6図乃至第6図は夫々本発明の他の一実施
例を説明するための図、オフ図は従来のプラズマジェッ
ト装置全説明するための図でおる。
1・・・陰極棒 2・・・外套6・・・狭搾
ノズル 4・・・グラズマガス通路5・・・プラ
ズマジェット 6,15・・・直流電源7・・・被加工
材料 8・・・導電性検出板9・・・電流検出器
10・・・フィルタ回路11・・・増幅回路
12・・・比較回路16・・・設定回路
14・・・A/D変換回路特許出願人 オリジン電気
株式会社
垢2 図
第3 同
第4凹Figure 1 and Figure 2 are examples of the present invention. Figures A and 6 are diagrams for explaining another embodiment of the present invention, respectively, and the off-line diagrams are diagrams for explaining the entire conventional plasma jet device. 1... Cathode rod 2... Mantle 6... Narrowing nozzle 4... Glazma gas passage 5... Plasma jet 6, 15... DC power source 7... Material to be processed 8... Conductive Sex detection plate 9...Current detector 10...Filter circuit 11...Amplification circuit
12... Comparison circuit 16... Setting circuit
14... A/D conversion circuit patent applicant Origin Electric Co., Ltd. 2 Figure 3 4th concave
Claims (2)
マジェットを発生せしめ、該プラズマジェットにより被
加工材料を加工するプラズマジェット装置において、上
記被加工材料の位置に導電性検出板を配設して、上記陰
極棒と導電性検出板間の電圧或は陰極棒と導電性検出板
間を通流する電流を検出することにより、狭搾ノズルと
被加工材料間の距離を略一定にすることを特徴とするプ
ラズマジェット装置。(1) In a plasma jet device that generates a plasma jet between a cathode rod of a torch and a jacket surrounding it, and processes a workpiece material with the plasma jet, a conductive detection plate is disposed at the position of the workpiece material. The distance between the constriction nozzle and the material to be processed can be kept approximately constant by detecting the voltage between the cathode rod and the conductive detection plate or the current flowing between the cathode rod and the conductive detection plate. A plasma jet device characterized by:
あることを特徴とする特許請求の範囲第1項記載のプラ
ズマジェット装置。(2) The plasma jet apparatus according to claim 1, wherein the material to be processed and the conductive detection plate are the same.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61155430A JPH0653317B2 (en) | 1986-07-02 | 1986-07-02 | Plasma jet device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61155430A JPH0653317B2 (en) | 1986-07-02 | 1986-07-02 | Plasma jet device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6313675A true JPS6313675A (en) | 1988-01-20 |
JPH0653317B2 JPH0653317B2 (en) | 1994-07-20 |
Family
ID=15605844
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61155430A Expired - Lifetime JPH0653317B2 (en) | 1986-07-02 | 1986-07-02 | Plasma jet device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0653317B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0795373A1 (en) * | 1990-04-17 | 1997-09-17 | Kabushiki Kaisha Komatsu Seisakusho | Standoff control method and apparatus for plasma cutting machine |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54152644A (en) * | 1978-05-19 | 1979-12-01 | Thermal Dynamics Corp | Plasma torch equipment |
-
1986
- 1986-07-02 JP JP61155430A patent/JPH0653317B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54152644A (en) * | 1978-05-19 | 1979-12-01 | Thermal Dynamics Corp | Plasma torch equipment |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0795373A1 (en) * | 1990-04-17 | 1997-09-17 | Kabushiki Kaisha Komatsu Seisakusho | Standoff control method and apparatus for plasma cutting machine |
Also Published As
Publication number | Publication date |
---|---|
JPH0653317B2 (en) | 1994-07-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |