JPH0653317B2 - Plasma jet device - Google Patents
Plasma jet deviceInfo
- Publication number
- JPH0653317B2 JPH0653317B2 JP61155430A JP15543086A JPH0653317B2 JP H0653317 B2 JPH0653317 B2 JP H0653317B2 JP 61155430 A JP61155430 A JP 61155430A JP 15543086 A JP15543086 A JP 15543086A JP H0653317 B2 JPH0653317 B2 JP H0653317B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma jet
- processed
- detection plate
- distance
- mantle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Arc Welding In General (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、トーチの陰極棒とそれを囲む外套との間にプ
ラズマジェットを発生せしめ、該プラズマジェットによ
り被加工材料を加工するプラズマジェット装置に関す
る。The present invention relates to a plasma jet device for generating a plasma jet between a cathode rod of a torch and a jacket surrounding the torch, and processing the material to be processed by the plasma jet. Regarding
第５図は従来のプラズマジェット装置を示す図である。
同図において、１は陰極棒（タングステン棒）、２は狭
窄ノズル３を有する外套、４はプラズマガス通路、５は
プラズマジェット、６は直流電源、７は被加工材料であ
る。不活性のアルゴンガスＡｒをプラズマガスとしてプ
ラズマガス通路４に流し、直流電源６により電圧を陰極
棒１と外套２との間に印加してプラズマジェット５を発
生させ、そのプラズマジェットにより被加工材料７を加
工する。特に、狭窄ノズル３の径が１mm以上で、プラズ
マジェット電流ＩＪが数１０Ａ以上のプラズマジェット
装置にあっては、プラズマジェットの状態が安定してい
るので、被加工材料７に良い加工を施すことができる。FIG. 5 is a diagram showing a conventional plasma jet device.
In the figure, 1 is a cathode rod (tungsten rod), 2 is a jacket having a constricting nozzle 3, 4 is a plasma gas passage, 5 is a plasma jet, 6 is a DC power source, and 7 is a material to be processed. Argon gas A r inert flowed into the plasma gas passage 4 as the plasma gas, a voltage to generate plasma jet 5 is applied between the cathode bar 1 and the mantle 2 by the DC power supply 6, the work by the plasma jet Material 7 is processed. In particular, in a plasma jet apparatus in which the diameter of the constriction nozzle 3 is 1 mm or more and the plasma jet current I J is several tens of amperes or more, the state of the plasma jet is stable, so that the material 7 to be processed is subjected to good processing. be able to.
しかし、このような従来のプラズマジェット装置にあっ
ては、狭窄ノズルと被加工材料間の距離を一定にするこ
とができないので、狭窄ノズルと被加工材料との接触に
よる破損事故を防止することができないという欠点があ
った。However, in such a conventional plasma jet device, since the distance between the constriction nozzle and the material to be processed cannot be made constant, it is possible to prevent damage accidents due to contact between the constriction nozzle and the material to be processed. There was a drawback that I could not.
本発明は以上の問題点を解決するために、トーチの陰極
棒とそれを囲む外套との間にプラズマジェットを発生せ
しめ、該プラズマジェットにより被加工材料を加工する
プラズマジェット装置において、上記被加工材料の位置
に導電性検出板を配設し、上記外套と導電性検出板間の
電圧或いは外套と導電性検出板間を通流する電流を検出
して、外套の先端部と導電性検出板との距離が略一定に
なるように制御することにより、狭窄ノズルと被加工材
料間の距離を略一定にすることを特徴とするプラズマジ
ェット装置を提供するものである。In order to solve the above problems, the present invention provides a plasma jet device for producing a plasma jet between a cathode rod of a torch and an outer jacket surrounding the torch, and processing the workpiece material by the plasma jet. A conductive detecting plate is arranged at the position of the material, and the voltage between the mantle and the conductive detecting plate or the current flowing between the mantle and the conductive detecting plate is detected to detect the tip of the mantle and the conductive detecting plate. The present invention provides a plasma jet device characterized in that the distance between the constriction nozzle and the material to be processed is made substantially constant by controlling the distance to be substantially constant.
外套の先端部と導電性検出板間の距離は、狭窄ノズルと
被加工材料間の距離でもあるので、このように、外套と
導電性検出板間の電圧或いは外套と導電性検出板間を通
流する電流を検出して、外套の先端部と導電性検出板と
の距離が略一定になるように制御することにより、狭窄
ノズルと被加工材料間の距離を略一定にすることができ
る。Since the distance between the tip of the mantle and the conductive detection plate is also the distance between the constriction nozzle and the material to be processed, the voltage between the mantle and the conductive detection plate or the distance between the mantle and the conductive detection plate is thus set. By detecting the flowing current and controlling the distance between the tip of the mantle and the conductive detection plate to be substantially constant, the distance between the constriction nozzle and the material to be processed can be made substantially constant.
また、外套の先端部はプラズマジェットによって消耗せ
ず、従って、外套の先端部と導電性検出板間の距離は加
工時間の経過により変化しないので、外套の先端部と導
電性検出板間の距離の制御を頻繁に行う必要がなく、制
御が容易である。In addition, the tip of the mantle is not consumed by the plasma jet, and therefore the distance between the tip of the mantle and the conductive detection plate does not change with the lapse of processing time. The control is easy because it does not require frequent control.
このようなことが相まって、狭窄ノズルと被加工材料と
の接触による破損事故を防止できることができると共
に、より安定した加工を被加工材料に施すことができ
る。Combined with this, it is possible to prevent damage accidents due to contact between the constriction nozzle and the material to be processed, and it is possible to perform more stable processing on the material to be processed.
第１及び第２図は本発明の一実施例を説明するための図
である。第１図において、８は導電性検出板、９は電流
検出器、１０はフィルタ回路、１１は増幅回路、１２は
比較回路、１３は設定回路、１４はＡ／Ｄ変換回路であ
る。第５図に示すようにして被加工材料７に加工を施し
ているプラズマジェット装置において、狭窄ノズル３と
被加工材料７間の距離が一定であることを確認する、或
いは一定になるように補正する必要が生じた場合には、
被加工材料７を除去すると共に、被加工材料７のあった
位置に導電性検出板８を配設して、第１図に示すような
回路とする。すると、直流電源６→外套２→プラズマジ
ェット５→導電性検出板８→電流検出器９→直流電源６
の経路で検出電流Ｉが流れる。外套２の先端部と導電性
検出板８間の距離Ｈと検出電流Ｉとの関係は第２図に示
すようになる。その検出電流Ｉをフィルタ回路１０、増
幅回路１１を介して比較回路１２で予め設定回路１３で
設定されている設定値と比較する。その比較値が或る値
を越えた時に比較回路１２は信号をＡ／Ｄ変換回路１４
に送出し、Ａ／Ｄ変換回路は出力信号を送出して外套２
の先端部と導電性検出板８との距離が一定になるように
制御する。外套２の先端部と導電性検出板８間の距離
は、狭窄ノズル３と被加工材料７間の距離でもあるの
で、このように、外套２と導電性検出板８間を通流する
電流を検出して、外套２の先端部と導電性検出板８との
距離が一定になるように制御することにより、狭窄ノズ
ル３と被加工材料７間の距離を一定にすることができ
る。また、外套２の先端部はプラズマジェットによって
消耗せず、従って、外套２の先端部と導電性検出板８間
の距離は加工時間の経過により変化しないので、外套２
の先端部と導電性検出板８間の距離の制御を頻繁に行う
必要がなく、制御が容易である。このようなことが相ま
って、狭窄ノズル３と被加工材料７との接触による破損
事故を防止することができると共に、より安定した加工
を被加工材料７に施すことができる。1 and 2 are diagrams for explaining one embodiment of the present invention. In FIG. 1, 8 is a conductive detection plate, 9 is a current detector, 10 is a filter circuit, 11 is an amplification circuit, 12 is a comparison circuit, 13 is a setting circuit, and 14 is an A / D conversion circuit. In the plasma jet device that processes the material 7 to be processed as shown in FIG. 5, confirm that the distance between the narrowing nozzle 3 and the material 7 to be processed is constant, or correct it so that it becomes constant. If you need to
The material 7 to be processed is removed, and the conductive detection plate 8 is disposed at the position where the material 7 to be processed was present to form a circuit as shown in FIG. Then, the DC power supply 6 → jacket 2 → plasma jet 5 → conductive detection plate 8 → current detector 9 → DC power supply 6
The detection current I flows through the path. The relationship between the detection current I and the distance H between the tip of the jacket 2 and the conductive detection plate 8 is as shown in FIG. The detected current I is compared with a set value preset in the setting circuit 13 in the comparison circuit 12 via the filter circuit 10 and the amplification circuit 11. When the comparison value exceeds a certain value, the comparison circuit 12 converts the signal into the A / D conversion circuit 14
And the A / D conversion circuit sends the output signal to the jacket 2
Control is performed so that the distance between the tip of the and the conductive detection plate 8 becomes constant. Since the distance between the tip of the mantle 2 and the conductive detection plate 8 is also the distance between the constriction nozzle 3 and the material 7 to be processed, the current flowing between the mantle 2 and the conductive detection plate 8 is thus set. The distance between the constriction nozzle 3 and the material 7 to be processed can be made constant by detecting and controlling the distance between the tip of the outer jacket 2 and the conductive detection plate 8 to be constant. Further, the tip of the outer jacket 2 is not consumed by the plasma jet, and therefore, the distance between the tip of the outer jacket 2 and the conductive detection plate 8 does not change with the lapse of processing time.
It is not necessary to frequently control the distance between the tip of the and the conductive detection plate 8, and the control is easy. In combination with this, it is possible to prevent damage accidents due to contact between the constriction nozzle 3 and the material 7 to be processed, and to perform more stable processing on the material 7 to be processed.
第３図は本発明の他の一実施例を説明するための図であ
る。この実施例は、外套２と導電性検出板８間の電圧を
検出して、外套２の先端部と導電性検出板８との距離が
一定になるように制御することにより、狭窄ノズル３と
被加工材料７間の距離を一定にするものであり、第１図
の実施例とほぼ同様の効果が得られる。FIG. 3 is a diagram for explaining another embodiment of the present invention. In this embodiment, by detecting the voltage between the outer jacket 2 and the conductive detection plate 8 and controlling the distance between the tip of the outer jacket 2 and the conductive detection plate 8 to be constant, the narrowed nozzle 3 and The distance between the workpieces 7 is made constant, and the same effect as that of the embodiment shown in FIG. 1 can be obtained.
第４図は本発明の他の一実施例を説明するための図であ
る。この実施例は、第１図の回路において、電流検出器
９と直流電源１５の直列接続回路を外套２と導電性検出
板８間に接続したものであり、第１図の実施例とほぼ同
様の効果が得られる。FIG. 4 is a diagram for explaining another embodiment of the present invention. In this embodiment, a circuit in which a current detector 9 and a DC power supply 15 are connected in series in the circuit of FIG. 1 is connected between the mantle 2 and the conductive detection plate 8 and is almost the same as the embodiment of FIG. The effect of is obtained.
以上の実施例は、被加工材料７が非導電性である場合に
ついて述べたが、被加工材料７が導電性である場合に
は、被加工材料７が導電性検出板８を兼ねることができ
る。この場合には、狭窄ノズル３と被加工材料７間の距
離が一定になるように常時制御することができる。In the above embodiments, the case where the work material 7 is non-conductive has been described, but when the work material 7 is conductive, the work material 7 can also serve as the conductive detection plate 8. . In this case, it is possible to constantly control the distance between the constriction nozzle 3 and the material 7 to be processed to be constant.
以上述べたように、本発明は、トーチの陰極棒とそれを
囲む外套との間にプラズマジェットを発生せしめ、該プ
ラズマジェットにより被加工材料を加工するプラズマジ
ェット装置において、上記被加工材料の位置に導電性検
出板を配設し、上記外套と導電性検出板間の電圧或いは
外套と導電性検出板間を通流する電流を検出して、外套
の先端部と導電性検出板との距離が略一定になるように
制御することにより、狭窄ノズルと被加工材料間の距離
を略一定にすることを特徴とするプラズマジェット装置
である。本発明はこのような特徴を有するので、狭窄ノ
ズルと被加工材料との接触による破損事故を防止するこ
とができると共に、より安定した加工を被加工材料に施
すことができる。特に、プラズマジェットの状態が安定
している狭窄ノズルの径が１mm以上でプラズマジェット
電流が数１０Ａ以上のプラズマジェット装置に適用して
有用である。As described above, according to the present invention, in the plasma jet apparatus for generating a plasma jet between the cathode rod of the torch and the jacket surrounding the torch, and processing the workpiece with the plasma jet, the position of the workpiece is set. A conductive detection plate is installed in the sensor, and the voltage between the mantle and the conductive detection plate or the current flowing between the mantle and the conductive detection plate is detected to detect the distance between the tip of the mantle and the conductive detection plate. Is a plasma jet device characterized in that the distance between the constriction nozzle and the material to be processed is made substantially constant by controlling so as to be substantially constant. Since the present invention has such characteristics, it is possible to prevent a damage accident due to contact between the constriction nozzle and the material to be processed, and to perform more stable processing on the material to be processed. In particular, it is useful when applied to a plasma jet device in which the diameter of the narrowed nozzle in which the state of the plasma jet is stable is 1 mm or more and the plasma jet current is several tens A or more.
第１図及び第２図は本発明の一実施例を説明するための
図、第３図及び第４図はそれぞれ本発明の他の一実施例
を説明するための図、第５図は従来のプラズマジェット
装置を説明するための図である。 １……陰極棒、２……外套 ３……狭窄ノズル、４……プラズマガス通路 ５……プラズマジェット、６、１５……直流電源 ７……被加工材料、８……導電性検出板 ９……電流検出器、１０……フィルタ回路 １１……増幅回路、１２……比較回路 １３……設定回路、１４Ａ……Ａ／Ｄ変換回路1 and 2 are diagrams for explaining one embodiment of the present invention, FIGS. 3 and 4 are diagrams for explaining another embodiment of the present invention, and FIG. 5 is a conventional example. FIG. 3 is a diagram for explaining the plasma jet device of FIG. DESCRIPTION OF SYMBOLS 1 ... Cathode rod, 2 ... Overcoat 3 ... Constriction nozzle, 4 ... Plasma gas passage 5 ... Plasma jet, 6, 15 ... DC power supply 7 ... Workpiece material, 8 ... Conductivity detection plate 9 ... current detector, 10 ... filter circuit 11 ... amplification circuit, 12 ... comparison circuit 13 ... setting circuit, 14A ... A / D conversion circuit
Claims (2)
プラズマジェットを発生せしめ、該プラズマジェットに
より被加工材料を加工プラズマジェット装置において、 上記被加工材料の位置に導電性検出板を配設し、上記外
套と導電性検出板間の電圧或いは外套と導電性検出板間
を通流する電流を検出して、外套の先端部と導電性検出
板との距離が略一定になるように制御することにより、
狭窄ノズルと被加工材料間の距離を略一定にすることを
特徴とするプラズマジェット装置。Claim: What is claimed is: 1. A plasma jet is generated between a cathode rod of a torch and a jacket surrounding the torch, and a material to be processed is processed by the plasma jet. The voltage between the mantle and the conductive detection plate or the current flowing between the mantle and the conductive detection plate is detected so that the distance between the tip of the mantle and the conductive detection plate becomes substantially constant. By controlling
A plasma jet device characterized in that a distance between a constriction nozzle and a material to be processed is made substantially constant.
ものであることを特徴とする特許請求の範囲第１項に記
載のプラズマジェット装置。2. The plasma jet apparatus according to claim 1, wherein the material to be processed and the conductive detection plate are the same.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61155430A JPH0653317B2 (en) | 1986-07-02 | 1986-07-02 | Plasma jet device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61155430A JPH0653317B2 (en) | 1986-07-02 | 1986-07-02 | Plasma jet device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6313675A JPS6313675A (en) | 1988-01-20 |
| JPH0653317B2 true JPH0653317B2 (en) | 1994-07-20 |
Family
ID=15605844
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61155430A Expired - Lifetime JPH0653317B2 (en) | 1986-07-02 | 1986-07-02 | Plasma jet device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0653317B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0795372A1 (en) * | 1990-04-17 | 1997-09-17 | Kabushiki Kaisha Komatsu Seisakusho | Standoff control method and apparatus for plasma cutting machine |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4170727A (en) * | 1978-05-19 | 1979-10-09 | Thermal Dynamics Corporation | Thermal torch height acquisition circuit |
-
1986
- 1986-07-02 JP JP61155430A patent/JPH0653317B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6313675A (en) | 1988-01-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |