JPS63125667A - Ｔａ−Ｗ系非晶質合金薄膜の製造方法 - Google Patents

Ｔａ−Ｗ系非晶質合金薄膜の製造方法

Info

Publication number
JPS63125667A
JPS63125667A JP27018386A JP27018386A JPS63125667A JP S63125667 A JPS63125667 A JP S63125667A JP 27018386 A JP27018386 A JP 27018386A JP 27018386 A JP27018386 A JP 27018386A JP S63125667 A JPS63125667 A JP S63125667A
Authority
JP
Japan
Prior art keywords
alloy
substrate
amorphous
thin film
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP27018386A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0582465B2 (enrdf_load_stackoverflow
Inventor
Tsutomu Yoshitake
務 吉武
Yoshimi Kubo
佳実 久保
Hitoshi Igarashi
五十嵐　等
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP27018386A priority Critical patent/JPS63125667A/ja
Publication of JPS63125667A publication Critical patent/JPS63125667A/ja
Publication of JPH0582465B2 publication Critical patent/JPH0582465B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP27018386A 1986-11-12 1986-11-12 Ｔａ−Ｗ系非晶質合金薄膜の製造方法 Granted JPS63125667A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27018386A JPS63125667A (ja) 1986-11-12 1986-11-12 Ｔａ−Ｗ系非晶質合金薄膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27018386A JPS63125667A (ja) 1986-11-12 1986-11-12 Ｔａ−Ｗ系非晶質合金薄膜の製造方法

Publications (2)

Publication Number Publication Date
JPS63125667A true JPS63125667A (ja) 1988-05-28
JPH0582465B2 JPH0582465B2 (enrdf_load_stackoverflow) 1993-11-19

Family

ID=17482679

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27018386A Granted JPS63125667A (ja) 1986-11-12 1986-11-12 Ｔａ−Ｗ系非晶質合金薄膜の製造方法

Country Status (1)

Country Link
JP (1) JPS63125667A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0582465B2 (enrdf_load_stackoverflow) 1993-11-19

Similar Documents

Publication Publication Date Title
EP0553228B1 (en) Vapour deposition apparatus and method
US4172718A (en) Ta-containing amorphous alloy layers and process for producing the same
JPH05214521A (ja) チタンスパッタリングターゲット
JPS63125667A (ja) Ｔａ−Ｗ系非晶質合金薄膜の製造方法
JPS63125669A (ja) Ｔａ−Ｗ系非晶質合金薄膜の製造方法
JPS63125668A (ja) Ｔａ−Ｗ系非晶質合金薄膜の製造方法
JPS63125666A (ja) Ｔａ系非晶質合金薄膜の製造方法
JPS63130768A (ja) Ｔａ系非晶質合金薄膜の製造方法
JPS63130766A (ja) Ｔａ系非晶質合金薄膜の製造方法
JPS63125663A (ja) Ｔａ−Ｗ系非晶質合金薄膜の製造方法
JPS63125665A (ja) Ｔａ−Ｗ系非晶質合金薄膜の製造方法
JPS63125664A (ja) Ｔａ系非晶質合金薄膜の製造方法
JPS6169931A (ja) 化学反応による金属間化合物のアモルフアス化方法
JPH0578194A (ja) グラフアイト結晶の作製方法
JPH0448860B2 (enrdf_load_stackoverflow)
JPH0448861B2 (enrdf_load_stackoverflow)
JPS63125670A (ja) Ｔａ−Ｗ系非晶質合金薄膜の製造方法
JPH02228434A (ja) 水素吸蔵合金の製造方法
JPH0558056B2 (enrdf_load_stackoverflow)
JPH03173832A (ja) 電荷移動錯体の作成方法
Pelleg Fabrication
KR100548904B1 (ko) 금속 증발용 보트의 제조방법 및 제조장치
Marchal et al. THE CRYSTALLIZATION OF Fe-Au AMORPHOUS ALLOYS
JPS6362839A (ja) Ｔａ−Ｗ系非晶質合金及びその製造方法
JPS63125662A (ja) Ｔａ系非晶質合金薄膜の製造方法

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term