JPS63125665A - Ｔａ−Ｗ系非晶質合金薄膜の製造方法 - Google Patents
Ｔａ−Ｗ系非晶質合金薄膜の製造方法Info
- Publication number
- JPS63125665A JPS63125665A JP27018186A JP27018186A JPS63125665A JP S63125665 A JPS63125665 A JP S63125665A JP 27018186 A JP27018186 A JP 27018186A JP 27018186 A JP27018186 A JP 27018186A JP S63125665 A JPS63125665 A JP S63125665A
- Authority
- JP
- Japan
- Prior art keywords
- alloy
- amorphous
- substrate
- sputtering
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 24
- 239000000956 alloy Substances 0.000 title claims abstract description 24
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 238000004544 sputter deposition Methods 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 239000010409 thin film Substances 0.000 claims description 25
- 229910000808 amorphous metal alloy Inorganic materials 0.000 claims description 19
- 239000000203 mixture Substances 0.000 claims description 9
- 239000013077 target material Substances 0.000 claims description 7
- 150000002500 ions Chemical class 0.000 claims description 2
- 238000002425 crystallisation Methods 0.000 abstract description 13
- 230000008025 crystallization Effects 0.000 abstract description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 8
- 238000005260 corrosion Methods 0.000 abstract description 7
- 230000007797 corrosion Effects 0.000 abstract description 7
- 239000007788 liquid Substances 0.000 abstract description 7
- 229910000521 B alloy Inorganic materials 0.000 abstract description 6
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 4
- 229910001080 W alloy Inorganic materials 0.000 abstract description 3
- 239000000498 cooling water Substances 0.000 abstract description 2
- 238000007796 conventional method Methods 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000010791 quenching Methods 0.000 description 3
- 230000000171 quenching effect Effects 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000004455 differential thermal analysis Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 239000012770 industrial material Substances 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27018186A JPS63125665A (ja) | 1986-11-12 | 1986-11-12 | Ｔａ−Ｗ系非晶質合金薄膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27018186A JPS63125665A (ja) | 1986-11-12 | 1986-11-12 | Ｔａ−Ｗ系非晶質合金薄膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63125665A true JPS63125665A (ja) | 1988-05-28 |
| JPH0581670B2 JPH0581670B2 (enExample) | 1993-11-15 |
Family
ID=17482653
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27018186A Granted JPS63125665A (ja) | 1986-11-12 | 1986-11-12 | Ｔａ−Ｗ系非晶質合金薄膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63125665A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01165761A (ja) * | 1987-12-22 | 1989-06-29 | Mitsui Eng & Shipbuild Co Ltd | 雰囲気中における低摩擦性、耐焼付性並びに低摩耗性部材 |
| JP2006150462A (ja) * | 2004-11-25 | 2006-06-15 | Mitsubishi Materials Kobe Tools Corp | 高反応性被削材の高速切削加工で硬質被覆層がすぐれた耐摩耗性を発揮する表面被覆超硬合金製切削工具 |
| CN105324512A (zh) * | 2013-07-12 | 2016-02-10 | 惠普发展公司，有限责任合伙企业 | 非晶薄金属膜 |
-
1986
- 1986-11-12 JP JP27018186A patent/JPS63125665A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01165761A (ja) * | 1987-12-22 | 1989-06-29 | Mitsui Eng & Shipbuild Co Ltd | 雰囲気中における低摩擦性、耐焼付性並びに低摩耗性部材 |
| JP2006150462A (ja) * | 2004-11-25 | 2006-06-15 | Mitsubishi Materials Kobe Tools Corp | 高反応性被削材の高速切削加工で硬質被覆層がすぐれた耐摩耗性を発揮する表面被覆超硬合金製切削工具 |
| CN105324512A (zh) * | 2013-07-12 | 2016-02-10 | 惠普发展公司，有限责任合伙企业 | 非晶薄金属膜 |
| EP2978870A4 (en) * | 2013-07-12 | 2016-12-21 | Hewlett Packard Development Co Lp | END AMORPHOUS METAL FILM |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0581670B2 (enExample) | 1993-11-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |