JPS6312153U - - Google Patents

Info

Publication number
JPS6312153U
JPS6312153U JP10514786U JP10514786U JPS6312153U JP S6312153 U JPS6312153 U JP S6312153U JP 10514786 U JP10514786 U JP 10514786U JP 10514786 U JP10514786 U JP 10514786U JP S6312153 U JPS6312153 U JP S6312153U
Authority
JP
Japan
Prior art keywords
etching
analysis
sample
ion gun
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10514786U
Other languages
English (en)
Other versions
JPH0539561Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1986105147U priority Critical patent/JPH0539561Y2/ja
Publication of JPS6312153U publication Critical patent/JPS6312153U/ja
Application granted granted Critical
Publication of JPH0539561Y2 publication Critical patent/JPH0539561Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)

Description

【図面の簡単な説明】
第１図は本考案の一実施例を示す概略断面図、
第２図は同実施例の要部を示す斜視図、第３図は
同実施例の要部を示す概略断面図、第４図は従来
の表面分析装置を示す概略断面図である。 ６……試料、６ａ……分析用試料位置、６ｂ…
…エツチング用試料位置、８……分析用励起源、
１０……エネルギー分析器、１２……検出器、２
０……真空槽、２２……エツチング用イオン銃、
２４……カバー。

Claims (1)

    【実用新案登録請求の範囲】
  1. 分析用の励起源及び測定系を備えた真空槽に、
    エツチング用のイオン銃を設け、エツチング用の
    試料位置と分析用の試料位置を異ならせるととも
    に、エツチング用の試料位置ではイオン銃の出口
    と試料とを取り囲むカバーを設けた表面分析装置
    。
JP1986105147U 1986-07-08 1986-07-08 Expired - Lifetime JPH0539561Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986105147U JPH0539561Y2 (ja) 1986-07-08 1986-07-08

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986105147U JPH0539561Y2 (ja) 1986-07-08 1986-07-08

Publications (2)

Publication Number Publication Date
JPS6312153U true JPS6312153U (ja) 1988-01-26
JPH0539561Y2 JPH0539561Y2 (ja) 1993-10-07

Family

ID=30979301

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986105147U Expired - Lifetime JPH0539561Y2 (ja) 1986-07-08 1986-07-08

Country Status (1)

Country Link
JP (1) JPH0539561Y2 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02216042A (ja) * 1989-02-16 1990-08-28 Nobuo Mikoshiba 反射電子線回折装置
JPH0792062A (ja) * 1993-03-04 1995-04-07 Natl Res Inst For Metals 透過型電子顕微鏡用薄膜試料のその場作製および観察 方法並びにその装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61135460U (ja) * 1985-02-14 1986-08-23

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61135460U (ja) * 1985-02-14 1986-08-23

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02216042A (ja) * 1989-02-16 1990-08-28 Nobuo Mikoshiba 反射電子線回折装置
JPH0792062A (ja) * 1993-03-04 1995-04-07 Natl Res Inst For Metals 透過型電子顕微鏡用薄膜試料のその場作製および観察 方法並びにその装置

Also Published As

Publication number Publication date
JPH0539561Y2 (ja) 1993-10-07

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