JPS63119235U - - Google Patents
Info
- Publication number
- JPS63119235U JPS63119235U JP1104987U JP1104987U JPS63119235U JP S63119235 U JPS63119235 U JP S63119235U JP 1104987 U JP1104987 U JP 1104987U JP 1104987 U JP1104987 U JP 1104987U JP S63119235 U JPS63119235 U JP S63119235U
- Authority
- JP
- Japan
- Prior art keywords
- vacuum vessel
- cooling water
- reactive
- utility
- scope
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000498 cooling water Substances 0.000 claims description 2
- 238000000992 sputter etching Methods 0.000 claims 1
- 239000012212 insulator Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Description
第１図は本考案の絶縁体を付けたフランジの縦
断面図で、真空容器内にある。第２図は従来のフ
ランジの縦断面図で、真空容器内にある。
１……フランジ付き冷却水配管（材質；ステン
レス）、２……電極（材質；アルミ）、３……六
角穴付きボルト、４……ローリング、５……絶縁
体。
FIG. 1 is a longitudinal cross-sectional view of a flange with an insulator according to the present invention inside a vacuum vessel. FIG. 2 is a longitudinal cross-sectional view of a conventional flange inside a vacuum vessel. 1...Flanged cooling water pipe (material: stainless steel), 2...Electrode (material: aluminum), 3...Hexagon socket head bolt, 4...Rolling, 5...Insulator.
Claims (1)
絶縁体を付けたフランジを有するリアクテイブ・
イオン・エツチング装置。 Cooling water seals on opposing electrodes in the vacuum vessel,
Reactive with insulated flange
Ion etching equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1104987U JPS63119235U (en) | 1987-01-27 | 1987-01-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1104987U JPS63119235U (en) | 1987-01-27 | 1987-01-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63119235U true JPS63119235U (en) | 1988-08-02 |
Family
ID=30797915
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1104987U Pending JPS63119235U (en) | 1987-01-27 | 1987-01-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63119235U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01107541A (en) * | 1987-10-21 | 1989-04-25 | Hitachi Ltd | Dry processing device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6034522B2 (en) * | 1976-09-20 | 1985-08-09 | モンサント・カンパニ− | Production method of serum albumin fraction |
-
1987
- 1987-01-27 JP JP1104987U patent/JPS63119235U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6034522B2 (en) * | 1976-09-20 | 1985-08-09 | モンサント・カンパニ− | Production method of serum albumin fraction |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01107541A (en) * | 1987-10-21 | 1989-04-25 | Hitachi Ltd | Dry processing device |