JPS63113540A - Method for coating photosensitive resin - Google Patents

Method for coating photosensitive resin

Info

Publication number
JPS63113540A
JPS63113540A JP25976586A JP25976586A JPS63113540A JP S63113540 A JPS63113540 A JP S63113540A JP 25976586 A JP25976586 A JP 25976586A JP 25976586 A JP25976586 A JP 25976586A JP S63113540 A JPS63113540 A JP S63113540A
Authority
JP
Japan
Prior art keywords
substrate
photosensitive resin
resin liquid
frame body
contour shape
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25976586A
Other languages
Japanese (ja)
Inventor
Kiyoaki Nakanishi
中西 清明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP25976586A priority Critical patent/JPS63113540A/en
Publication of JPS63113540A publication Critical patent/JPS63113540A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

PURPOSE:To permit reduction of the amt. of a photosensitive resin to be used by imposing a frame body having nearly the same contour shape as the contour shape of a substrate on the substrate, pouring a prescribed amt. of the photosensitive resin liquid on the substrate enclosed with the frame body and diffusing and coating said liquid on the substrate. CONSTITUTION:The substrate 12 which is an object to be treated and the frame body 13 made of a stainless steel or the like having nearly the same contour shape as the contour shape of the substrate are imposed on a support 11 having cruciform supporting bars 10. Positioning pins 14 are then advanced to integrally fix the substrate 12 and the frame body 13 and the prescribed photosensitive resin liquid 16 is poured onto the surface of the substrate 12 from a beaker 15. After the prescribed amt. of the photosensitive resin liquid 16 is poured, the heights at the four corners of the substrate 12 are changed so that the resin liquid 16 is spread over the entire surface of the substrate 12. The frame body 13 is then removed and the substrate 12 is integrally rotated by the support 11 to diffuse the poured resin liquid 16 over the entire front surface of the substrate 12. The reduction in the amt. of the photosensitive resin liquid to be used is thereby permitted.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、感光性樹脂の塗布方法に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a method for coating a photosensitive resin.

[従来の技術とその問題点] 従来、液晶フィルターを製造する場合、第2図に示すよ
うにまず支持体1上に被処理体の基板2を設置し、これ
を位置決めピン3で固定する。次いで、基板2上にビー
カー4から所定の感光性樹脂液5を注入し、これを基板
2の四隅の水平高さを変化させることにより表面全面に
拡散させて、然る後、基板2を高速回転させて感光性樹
脂を薄膜状に塗布していた。しかしながら、基板2は必
ずしも水平状態に設置されておらず、また、基板2が3
00X300m程度の大きなものである場合には、ビー
カー4から注入された感光性樹脂液5が基板2の表面全
面に拡散塗布する前にその一部が基板2から漏れ落ちる
。このため感光性樹脂の使用量は、100〜200cc
と必要以上に多くなる問題があった。このような感光性
樹脂の無駄をなくすには、作業者の熟練を必要とすると
共に、作業時間も長くなる問題があった。
[Prior art and its problems] Conventionally, when manufacturing a liquid crystal filter, as shown in FIG. Next, a predetermined photosensitive resin liquid 5 is injected onto the substrate 2 from the beaker 4, and is diffused over the entire surface by changing the horizontal height of the four corners of the substrate 2. After that, the substrate 2 is moved at high speed. The photosensitive resin was applied in a thin film by rotating it. However, the board 2 is not necessarily installed horizontally, and the board 2 is
If the photosensitive resin liquid 5 is as large as 00 x 300 m, a portion of the photosensitive resin liquid 5 injected from the beaker 4 leaks from the substrate 2 before it is spread and coated over the entire surface of the substrate 2. Therefore, the amount of photosensitive resin used is 100 to 200 cc.
There was a problem that there were more than necessary. In order to eliminate such wastage of photosensitive resin, there is a problem that not only the skill of the operator is required but also the working time becomes long.

本発明は、かかる点に鑑みてなされたものであり、感光
性樹脂の使用量を節約できると共に作業者の熟練を不要
とし、かつ、作業時間を短縮させることができる感光性
樹脂の塗布方法を提供するものである。
The present invention has been made in view of these points, and provides a photosensitive resin coating method that can save the amount of photosensitive resin used, eliminates the need for operator skill, and shortens working time. This is what we provide.

[問題点を解決するための手段] 本発明は、被処理体の基板を支持体上に固定した後、該
基板と略同じ輪郭形状を有する枠体を該基板上に載置し
、該枠体で囲まれた前記基板上に任意の感光性樹脂液を
所定量注入して、該感光性樹脂液を基板面上に行渡らせ
、前記枠体を取去り、然る後、該基板を回転させて前記
感光性樹脂を前記基板上に薄膜状に拡散塗布させること
を特徴とする感光性樹脂の塗布方法である。
[Means for Solving the Problems] The present invention provides a method of fixing a substrate of an object to be processed on a support, placing a frame having substantially the same contour shape as the substrate on the substrate, and A predetermined amount of any photosensitive resin liquid is injected onto the substrate surrounded by the body, the photosensitive resin liquid is spread over the substrate surface, the frame body is removed, and then the substrate is This is a photosensitive resin coating method characterized in that the photosensitive resin is spread and coated onto the substrate in the form of a thin film by rotating the substrate.

[作用〕 本発明にかかる感光性樹脂の塗布方法によれば、基板と
略同じ輪郭形状を有する枠体を基板上に載置して、枠体
で囲まれた基板上に感光性樹脂液を所定量注入し、これ
を基板上に拡散塗布するようにしたので、枠体によって
感光性樹脂液が基板外に漏れ落ちることかがなく感光性
樹脂の使用量を節約できると共に作業者の熟練を不要と
し、かつ、作業時間を短縮させることができる。
[Function] According to the photosensitive resin coating method of the present invention, a frame having substantially the same outline shape as the substrate is placed on the substrate, and a photosensitive resin liquid is applied onto the substrate surrounded by the frame. By injecting a predetermined amount and spreading it onto the substrate, the photosensitive resin liquid does not leak out of the substrate due to the frame, which reduces the amount of photosensitive resin used and improves the skill of the operator. It is not necessary and the working time can be shortened.

〔実施例] 以下、本発明の実施例について図面を参照して説明する
[Examples] Examples of the present invention will be described below with reference to the drawings.

第1図に示す如く、まず、十字形の支持棒10を有する
支持体11上に被処理体の基板12を設置する。次いで
、基板12上にこれと略同じ輪郭形状を有する例えばス
テンレス鋼やアクリル樹脂からなる厚さ1〜2In!R
の枠体13を載置する。次いで、支持棒10上の位置決
めビン14を前進させて基板12と枠体13の位置を一
体に固定する。
As shown in FIG. 1, first, a substrate 12 to be processed is placed on a support 11 having a cross-shaped support rod 10. As shown in FIG. Next, on the substrate 12, a film having approximately the same contour shape and made of, for example, stainless steel or acrylic resin and having a thickness of 1 to 2 In! R
The frame body 13 of is placed. Next, the positioning pin 14 on the support rod 10 is advanced to fix the positions of the substrate 12 and the frame 13 together.

次ぎに、枠体13で囲まれた基板12の表面にビーカー
15から所定の感光性樹脂液16を注入する。感光性樹
脂液16の所定量が注入されたところで注入を止め、基
板12の四隅の高さを変化させて感光性樹脂液16を基
板12の全面に行渡らせる。この時枠体13は、感光性
樹脂液16が基板外に逸脱するのを防ぐ堤防のような役
目を果たす。次に枠体13を取外し、支持体11によっ
て基板12を一体に回転させて注入した感光性樹脂液1
6を基板12の表面全面に拡散させる。然る後、位置決
めビン14による固定を解除して枠体13を除去し厚さ
0.5〜10μmの樹脂層を形成した基板12を得る。
Next, a predetermined photosensitive resin liquid 16 is injected from the beaker 15 onto the surface of the substrate 12 surrounded by the frame 13. When a predetermined amount of the photosensitive resin liquid 16 has been injected, the injection is stopped, and the heights of the four corners of the substrate 12 are changed to spread the photosensitive resin liquid 16 over the entire surface of the substrate 12. At this time, the frame body 13 functions like a dike to prevent the photosensitive resin liquid 16 from escaping to the outside of the substrate. Next, the frame 13 was removed, the substrate 12 was rotated together with the support 11, and the photosensitive resin liquid 1 was injected.
6 is diffused over the entire surface of the substrate 12. Thereafter, the fixation by the positioning pin 14 is released and the frame 13 is removed to obtain the substrate 12 on which the resin layer with a thickness of 0.5 to 10 μm is formed.

このようにこの感光性樹脂の塗布方法によれば、基板1
2と略同じ輪郭形状を有する枠体13を基板上に固定し
て、枠体13で囲まれた基板12上に感光性樹脂液16
を注入して拡散塗布するので、基板12か漏れ落ちを防
止して感光性樹脂液16の使用量を節約できる。しかも
、作業者の熟練を不要として、かつ、作業時間を短縮さ
せることができる。なお、枠体13の直下の基板12の
周辺部分は、本来塗布特性が悪く切捨てとなる領域であ
るので枠体13を載置しても何等問題はない。
According to this photosensitive resin coating method, the substrate 1
A frame body 13 having approximately the same outline shape as 2 is fixed on a substrate, and a photosensitive resin liquid 16 is placed on the substrate 12 surrounded by the frame body 13.
Since the photosensitive resin liquid 16 is injected and diffused, it is possible to prevent the substrate 12 from leaking and to save the amount of the photosensitive resin liquid 16 used. Moreover, the operator does not need to be skilled and the working time can be shortened. Incidentally, since the peripheral portion of the substrate 12 directly under the frame 13 is an area that originally has poor coating characteristics and is cut off, there is no problem even if the frame 13 is placed thereon.

また、枠体13は、数回乃至数10回の塗布操作をワン
セットとしてその作業後に洗浄することにより毎回でも
使用することができる。なお、枠体13の材質は、金属
やプラスチックを始め種々のものが使用できる。
Further, the frame body 13 can be used each time by performing a set of coating operations several to several tens of times and cleaning it after each coating operation. Note that various materials can be used for the frame body 13, including metal and plastic.

[発明の効果] 以上説明した如く、本発明にかかる感光性樹脂の塗布方
法によれば、感光性樹脂の使用量を節約できると共に作
業者の熟練を不要とし、かつ、作業時間を短縮させるこ
とができるものである。
[Effects of the Invention] As explained above, according to the photosensitive resin coating method according to the present invention, the amount of photosensitive resin used can be reduced, operator skill is not required, and working time can be shortened. It is something that can be done.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明方法を示す説明図、第2図は、従来の
感光性の樹脂の塗布方法を示す説明図である。 11・・・支持体、12・・・基板、13・・・枠体、
14・・・位置決めビン、15・・・ビーカー、16・
・・感光性樹脂液。
FIG. 1 is an explanatory diagram showing the method of the present invention, and FIG. 2 is an explanatory diagram showing a conventional method of coating a photosensitive resin. 11... Support body, 12... Substrate, 13... Frame body,
14...Positioning bottle, 15...Beaker, 16.
...Photosensitive resin liquid.

Claims (1)

【特許請求の範囲】[Claims] 被処理体の基板を支持体上に固定した後、該基板と略同
じ輪郭形状を有する枠体を該基板上に載置し、該枠体で
囲まれた前記基板上に任意の感光性樹脂液を所定量注入
して、該感光性樹脂液を基板面上に行渡らせ、前記枠体
を取去り、然る後、該基板を回転させて前記感光性樹脂
を前記基板上に薄膜状に拡散塗布させることを特徴とす
る感光性樹脂の塗布方法。
After fixing the substrate of the object to be processed on the support, a frame having approximately the same outline shape as the substrate is placed on the substrate, and an arbitrary photosensitive resin is placed on the substrate surrounded by the frame. A predetermined amount of liquid is injected to spread the photosensitive resin liquid over the substrate surface, the frame is removed, and the substrate is then rotated to spread the photosensitive resin onto the substrate in the form of a thin film. A method for applying a photosensitive resin, which is characterized by applying the photosensitive resin in a diffused manner.
JP25976586A 1986-10-31 1986-10-31 Method for coating photosensitive resin Pending JPS63113540A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25976586A JPS63113540A (en) 1986-10-31 1986-10-31 Method for coating photosensitive resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25976586A JPS63113540A (en) 1986-10-31 1986-10-31 Method for coating photosensitive resin

Publications (1)

Publication Number Publication Date
JPS63113540A true JPS63113540A (en) 1988-05-18

Family

ID=17338651

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25976586A Pending JPS63113540A (en) 1986-10-31 1986-10-31 Method for coating photosensitive resin

Country Status (1)

Country Link
JP (1) JPS63113540A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0330874A (en) * 1988-11-08 1991-02-08 Nokia Unterhaltung Electron Deutsche Gmbh Method and apparatus for applying thin film to base plate for plane display

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0330874A (en) * 1988-11-08 1991-02-08 Nokia Unterhaltung Electron Deutsche Gmbh Method and apparatus for applying thin film to base plate for plane display

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