JPS63110649A - Prober - Google Patents

Prober

Info

Publication number
JPS63110649A
JPS63110649A JP25619086A JP25619086A JPS63110649A JP S63110649 A JPS63110649 A JP S63110649A JP 25619086 A JP25619086 A JP 25619086A JP 25619086 A JP25619086 A JP 25619086A JP S63110649 A JPS63110649 A JP S63110649A
Authority
JP
Japan
Prior art keywords
measurement
chip
measuring
mounting table
probe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP25619086A
Other languages
Japanese (ja)
Other versions
JPH07114226B2 (en
Inventor
Wataru Karasawa
唐沢 渉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP61256190A priority Critical patent/JPH07114226B2/en
Publication of JPS63110649A publication Critical patent/JPS63110649A/en
Publication of JPH07114226B2 publication Critical patent/JPH07114226B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To allow a mount occupy but a small space of movement during a measuring period and thereby construct a small-size unit by a method wherein a driving means for a measuring probe to scan a specimen and a drive controlling means to control the driving means are provided. CONSTITUTION:A prove card X-Y driving mechanism 12 causes a probe card 5 to travel for a measuring probe 1 to reach a point p1 over the first chip to be subjected to measurement. When the X-Y movement is completed, a mount Z-direction driving mechanism 11 causes a wafer mount 4 to rise for the establishment of contact between the measuring prove 1 and an electrode on the chip for measurement. When the measurement is completed of the first chip, the wafer mount 4 descends, the prove cards 5 travels, and the measuring probe 1 reaches a point just over a chip to be subjected to measurement next. Similar processes are repeated until the measuring probe 1 arrives at a position p2 over the last chip to be subjected to measurement. With all the scanning movement of the measuring prove 1 being undertaken by the prove card X-Y driving mechanism 12, the wafer mount 4 needs but a small distance 4c to cover during the alignment process. This contributes to the realization of a small-size unit.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明はプローブ装置に係り、特に測定用触針を移動さ
せて測定を行うプローブ装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a probe device, and particularly to a probe device that performs measurements by moving a measuring stylus.

(従来の技術) 従来、半導体ウェハの製造工程において半導体ウェハ表
面に多数形成された半導体素子(以下チップ)の電気的
諸特性を試験する場合、チップの良品・不良品の判定を
行い、不良チップに不良マークを付するプローブ装置が
使用されている。
(Prior art) Conventionally, when testing the electrical characteristics of semiconductor elements (hereinafter referred to as chips) formed in large numbers on the surface of a semiconductor wafer in the semiconductor wafer manufacturing process, it is necessary to determine whether the chips are good or defective. A probe device is used that marks the product as defective.

このプローブ装置では、可動台例えばX−Yテーブル上
に設けられたウェハ載置台に半導体ウェハを載置して、
半導体ウェハと対向配置しチップの電極と同じ位置・配
列を有する測定用触針をチップの電極に順次当接して測
定検査を行う。この時不良品と判定されたチップにはイ
ンク等でマーキングを行う。
In this probe device, a semiconductor wafer is placed on a wafer mounting table provided on a movable table, for example, an X-Y table.
Measurement and inspection are carried out by sequentially contacting the electrodes of the chip with measuring probes that are arranged opposite to the semiconductor wafer and have the same position and arrangement as the electrodes of the chip. At this time, chips determined to be defective are marked with ink or the like.

このようなプローブ装置による測定では、予め入力した
測定しようとする半導体ウェハの測定パラメータ例えば
半導体ウェハの径やチップの配列パターン、形状等に基
づいてウェハ載置台を移動させて測定対象チップを測定
用触針の垂下に搬送した後、ウェハ載置台を上昇させて
チップの電極と測定用触針とを接触させて測定を行って
いた。
In measurement using such a probe device, the wafer mounting table is moved based on the measurement parameters of the semiconductor wafer to be measured that have been entered in advance, such as the diameter of the semiconductor wafer, the arrangement pattern of the chips, the shape, etc. After the wafer is transported under the stylus, the wafer mounting table is raised to bring the electrodes of the chip into contact with the measurement stylus to perform measurements.

(発明が解決しようとする問題点) しかしながら従来のプローブ装置では、プローブカード
が固定式であるため、測定時における半導体ウェハのX
−Y方向の移動は仝てウェハ載置台の移動により行わな
ければならずウェハ載置台の移動スペースが大きくなる
という問題があった。
(Problems to be Solved by the Invention) However, in conventional probe devices, since the probe card is fixed, the X of the semiconductor wafer during measurement is
Movement in the −Y direction must be performed by moving the wafer mounting table, which poses a problem in that the movement space for the wafer mounting table becomes large.

例えば第4図に示すように測定用触針1の初期位置が図
中点pで示す如く半導体ウェハ2中央のチップ上にある
状態で測定を開始した場合、半導体ウェハ2の最上段に
位置するチップ3を測定しようとすれば、チップ3aが
点pに位置する測定用触鉗下にくるようにウェハ載置台
4をY軸方向に対し4aの位置まで移動させ、また、最
下段のチップ3bを測定する場合は上記移動の逆方向へ
移動しウェハ載置台4を4bの位置まで移動させる。従
って、半導体ウェハ2の直径をLとすればY軸方向に対
して約2Lのウェハ載置台移動スペースが必要となり、
X軸方向に対しても同様であるので、ウェハ載置台4の
形状・面積が半導体ウェハ2とほぼ等しいとすれば、ウ
ェハ載置台の面積の約4倍のウェハ載置台移動スペース
が必要で、装置の小形化を図る上で大きな障害となって
いた。
For example, as shown in FIG. 4, if measurement is started with the initial position of the measuring stylus 1 on the chip at the center of the semiconductor wafer 2, as indicated by point p in the figure, the measuring probe 1 will be located at the top of the semiconductor wafer 2. To measure the chip 3, move the wafer mounting table 4 to the position 4a in the Y-axis direction so that the chip 3a is under the measuring probe located at point p, and also move the wafer mounting table 4 to the position 4a in the Y-axis direction, and When measuring , the wafer mounting table 4 is moved in the opposite direction of the movement described above to the position 4b. Therefore, if the diameter of the semiconductor wafer 2 is L, approximately 2L of wafer mounting table movement space is required in the Y-axis direction.
The same applies to the X-axis direction, so if the shape and area of the wafer mounting table 4 are approximately equal to the semiconductor wafer 2, a space for moving the wafer mounting table that is approximately four times the area of the wafer mounting table is required. This has been a major obstacle in reducing the size of the device.

本発明は、上述した問題点を解決するためになされたも
ので、測定時における載置台の移動スペースを小さくし
て装置が小形化できるプローブ装置を提供することを目
的とする。
The present invention has been made in order to solve the above-mentioned problems, and an object of the present invention is to provide a probe device that can be downsized by reducing the movement space of a mounting table during measurement.

[発明の構成] (問題点を解決するための手段) 本発明のプローブ装置は、表面に半導体素子を多数形成
した被測定物と測定用触針とを相対的に移動させて各半
導体素子を測定するプローブ装置において、上記測定用
触針を被測定物上で走査させるための駆動手段と、この
駆動手段を制御する駆動制御手段とを備えたことを特徴
とするものである。
[Structure of the Invention] (Means for Solving the Problems) The probe device of the present invention moves a measurement probe and an object having a large number of semiconductor elements formed on its surface relative to each other to detect each semiconductor element. The measuring probe device is characterized in that it comprises a driving means for causing the measuring stylus to scan over the object to be measured, and a driving control means for controlling the driving means.

(作 用) 測定用触針を移動させて被測定物上を走査させることで
、被測定物の移動量が小さくなり、測定用スペースを大
幅に縮小することができる。
(Function) By moving the measurement stylus to scan the object to be measured, the amount of movement of the object to be measured is reduced, and the space for measurement can be significantly reduced.

(実施例) 以下、本発明の一実施例について図を参照にしながら説
明する。
(Example) Hereinafter, an example of the present invention will be described with reference to the drawings.

第1図は実施例のプローブ装置(以下プローバ)の構成
を示す図で、ウェハ載置台4上には図示を省略したウェ
ハカセットから取出された半導体ウェハ2が載置されて
いる。そしてこのウェハ載置台4を3次元方向に移動さ
せるために、載置台X−Y駆動機構10および載置台Z
方向駆動機構11が設けられている。
FIG. 1 is a diagram showing the configuration of a probe device (hereinafter referred to as a prober) according to an embodiment. A semiconductor wafer 2 taken out from a wafer cassette (not shown) is placed on a wafer mounting table 4. As shown in FIG. In order to move this wafer mounting table 4 in three-dimensional directions, a mounting table X-Y drive mechanism 10 and a mounting table Z are used.
A directional drive mechanism 11 is provided.

ウェハ載置台4上面には、測定用電極となる測定用触針
1を半導体ウェハ2面側に装着したプローブカード5が
対向配置されており、このプローブカード5は測定用触
針1が測定対象チップ上にくるようにプローブカードを
移動させるためのプローブカードX−Y駆動は構」2に
装着されている。
On the upper surface of the wafer mounting table 4, a probe card 5 with a measuring probe 1, which serves as a measuring electrode, attached to the semiconductor wafer 2 side is arranged facing the probe card 5, and the probe card 5 has a measuring probe 1 attached to the surface of the semiconductor wafer. A probe card X-Y drive for moving the probe card over the chip is attached to the structure 2.

プローブカードX−Y駆動機構12、載置台X−Y駆動
機構10および載置台Z方向駆動機構11は、プローバ
CPU13内の駆動制御機構14により制御されており
、その制御は予め測定パラメータ入力機構15により測
定パラメータ記憶機@16に記憶させた測定すべき半導
体ウェハの測定パラメータ例えばウェハ径、チップの配
列パターンや測定順序等に基づいて行われる。
The probe card X-Y drive mechanism 12, the mounting table X-Y driving mechanism 10, and the mounting table Z-direction driving mechanism 11 are controlled by a drive control mechanism 14 in the prober CPU 13, and the control is performed in advance by the measurement parameter input mechanism 15. The measurement is performed based on the measurement parameters of the semiconductor wafer to be measured stored in the measurement parameter storage @16, such as the wafer diameter, chip arrangement pattern, and measurement order.

測定用触針1はテスター17内の測定回路18と接続さ
れており、ここで測定された測定結果はテスターインタ
ーフェイス19を介してプローバCPU13へ送られる
The measurement stylus 1 is connected to a measurement circuit 18 in a tester 17, and the measurement results measured here are sent to the prober CPU 13 via a tester interface 19.

このような構成のプローバの測定動作は、ウェハ載置台
4上に半導体ウェハ2を載置した後載置台X−Y駆動機
構10によりウェハ載置台4が移動して位置合ぜが行な
われ、そして第2図に示すようにプローブカードX−Y
駆動機構12によりプローブカード5が移動して測定用
触針1を最初に測定するチップ上p1に移動する。X−
Y方向の移動が終了すると載置台Z方向駆動機構11に
よりウェハ載置台4を上昇させて測定用触針1とチップ
上の電極とを接触させて測定を行う。最初のチップの測
定が終了するとウェハ載置台4が下降してプローブカー
ド5が移動し次測定のチップ上に測定用触針1が移動す
る。これら動作を繰返してR後の測定チップの位置p2
まで測定用融層1が移動する。
In the measurement operation of the prober having such a configuration, after the semiconductor wafer 2 is placed on the wafer mounting table 4, the wafer mounting table 4 is moved by the mounting table X-Y drive mechanism 10 to perform positioning. Probe card X-Y as shown in Figure 2
The probe card 5 is moved by the drive mechanism 12, and the measurement stylus 1 is moved to the top p1 of the chip to be measured first. X-
When the movement in the Y direction is completed, the wafer mounting table 4 is raised by the mounting table Z direction drive mechanism 11 to bring the measurement stylus 1 into contact with the electrodes on the chip to perform measurement. When the measurement of the first chip is completed, the wafer mounting table 4 is lowered, the probe card 5 is moved, and the measuring probe 1 is moved onto the next chip to be measured. By repeating these operations, the position of the measuring chip after R is p2.
The measuring melt layer 1 moves up to .

このようにウェハ載置台4のX−Y方向の移動は測定開
始前の位置合わせ時のみでおり、測定中においてはウェ
ハ載置台4の移動はZ方向のみに限定される。即ち測定
用触針1の走査は全てプローブカードX−Y駆動機構1
2で行うのでウェハ載置台4の移動は図中4Cで示す如
く位置合わせ時におけるわずかな移動量だけとなり、従
来装置のようなウェハ載置台4側で走査動作を行うプロ
ーバに比へてウェハ載置台4の移動面積はほぼ1/4と
なる。
In this way, the movement of the wafer mounting table 4 in the X-Y direction is only for positioning before starting measurement, and during the measurement, the movement of the wafer mounting table 4 is limited only to the Z direction. In other words, all scanning of the measuring probe 1 is performed by the probe card X-Y drive mechanism 1.
2, the movement of the wafer mounting table 4 is only a small amount during alignment, as shown by 4C in the figure, and compared to a prober that performs the scanning operation on the wafer mounting table 4 side like the conventional device, the wafer mounting table 4 is moved by a small amount as shown by 4C in the figure. The moving area of the table 4 is approximately 1/4.

ところで、プローブカードを走査させる@造とすること
で、当然プローバ上面部にこの移動スペースを確保する
必要が生じるが、プローブ装置の空間は従来デッドスペ
ースとなっているので問題はない。
By the way, by using the @ structure for scanning the probe card, it is naturally necessary to secure a movement space on the upper surface of the prober, but this is not a problem because the space of the probe device is conventionally a dead space.

本発明の他の実施例として、ウェハ載置台とプローブカ
ードの双方で走査をする構造としてもよい。例えば第3
図に示すように、半導体ウェハ2の最上段の点p4に位
置するチップ3aを測定しようとする場合は、ウェハ載
置台4と半導体ウェハ2中央部の点pに位置する測定用
触針1とをそれぞれ点pと点p4の中間点p3の位置へ
と移動させる。同様にして半導体ウェハ最下段のチップ
3bや横方向のチップの測定を行なう。このようにする
ことでウェハ載置台4の移動量は半導体ウェハの直径を
Lとすれば約1.5Lとなり、前述した第1の実施例に
比べ・ウェハ載置台4の移動スペースは大きくなるがプ
ローブカードの移動スペースは小さくなり、ブローバの
上面部のデッドスペースが少ない場合には本実施例は好
適である。
As another embodiment of the present invention, a structure may be adopted in which scanning is performed by both the wafer mounting table and the probe card. For example, the third
As shown in the figure, when trying to measure the chip 3a located at the topmost point p4 of the semiconductor wafer 2, the wafer mounting table 4 and the measuring probe 1 located at the center point p of the semiconductor wafer 2 are used. are moved to the position of the intermediate point p3 between the points p and p4, respectively. Similarly, the chips 3b at the bottom of the semiconductor wafer and the chips in the lateral direction are measured. By doing this, the amount of movement of the wafer mounting table 4 is approximately 1.5L, where L is the diameter of the semiconductor wafer, and compared to the first embodiment described above, the movement space of the wafer mounting table 4 is larger. This embodiment is suitable when the space for moving the probe card is small and there is little dead space on the upper surface of the blower.

ところで上述した各実施例では測定時における測定用触
針1とチップの電極との接触はウェハ載置台4を昇降さ
せることで行ったが本発明はこれに限定されるものでは
なく、プローブカード5を昇降ざUる構造としてもよく
、ざらに測定開始前の位置合わせ動作をプローブカード
X−Y駆動機構12で行う構造とすればウェハ載置台を
固定式にすることができ、測定エリアをさらに小さくす
ることができる。
By the way, in each of the above-mentioned embodiments, the contact between the measuring probe 1 and the electrode of the chip during measurement was carried out by raising and lowering the wafer mounting table 4, but the present invention is not limited to this, and the probe card 5 Alternatively, if the probe card X-Y drive mechanism 12 performs the positioning operation before starting measurement, the wafer mounting table can be fixed, and the measurement area can be further expanded. Can be made smaller.

[発明の効果] 以上説明したように本発明のプローブ装置によれば被測
定物載置台の移動スペースが大幅に小さくなるので、プ
ローブ装置の小形化が実現できる。
[Effects of the Invention] As explained above, according to the probe device of the present invention, the movement space of the object to be measured table is significantly reduced, so that the probe device can be downsized.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明による実施例の構成を示す図、第2図は
実施例のウェハ載置台の移動量を示す図、第3図は他の
実施例のウェハ載置台の移動量を示す図、第4図は従来
装置のウェハ載置台の移動量を示す図である。 1・・・・・・測定用触針、2・・・・・・半導体ウェ
ハ、3・・・・・・デツプ、4・・・・・・ウェハ載置
台、5・・・・・・プローブカード、12・・・・・・
プローブカードX−Y駆動機溝、14・・・・・・駆動
制御機構。 出願人  東京エレクトロン株式会社 代理人  弁理士  須 山 佐 − D 第3】
FIG. 1 is a diagram showing the configuration of an embodiment according to the present invention, FIG. 2 is a diagram showing the amount of movement of the wafer mounting table in the embodiment, and FIG. 3 is a diagram showing the amount of movement of the wafer mounting table in another embodiment. , FIG. 4 is a diagram showing the amount of movement of the wafer mounting table of the conventional apparatus. 1... Measuring stylus, 2... Semiconductor wafer, 3... Depth, 4... Wafer mounting stand, 5... Probe Card, 12...
Probe card X-Y drive groove, 14... Drive control mechanism. Applicant Tokyo Electron Ltd. Agent Patent Attorney Suyama Sa - D 3rd]

Claims (1)

【特許請求の範囲】  表面に半導体素子を多数形成した被測定物と測定用触
針とを相対的に移動させて各半導体素子を測定するプロ
ーブ装置において、 前記測定用触針を前記被測定物上で走査させるための駆
動手段と、前記駆動手段を制御する制御手段とを備えた
ことを特徴とするプローブ装置。
[Scope of Claims] A probe device that measures each semiconductor element by moving a measurement stylus relative to an object to be measured having a large number of semiconductor elements formed on its surface, comprising: What is claimed is: 1. A probe device comprising: a drive means for scanning above the probe; and a control means for controlling the drive means.
JP61256190A 1986-10-28 1986-10-28 Probe device and probing method Expired - Lifetime JPH07114226B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61256190A JPH07114226B2 (en) 1986-10-28 1986-10-28 Probe device and probing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61256190A JPH07114226B2 (en) 1986-10-28 1986-10-28 Probe device and probing method

Publications (2)

Publication Number Publication Date
JPS63110649A true JPS63110649A (en) 1988-05-16
JPH07114226B2 JPH07114226B2 (en) 1995-12-06

Family

ID=17289158

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61256190A Expired - Lifetime JPH07114226B2 (en) 1986-10-28 1986-10-28 Probe device and probing method

Country Status (1)

Country Link
JP (1) JPH07114226B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0653178A (en) * 1992-06-16 1994-02-25 Hughes Aircraft Co Apparatus and method for optimum scanning of two-dimensional surface of one or more objects

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52128071A (en) * 1976-04-20 1977-10-27 Nec Corp Automatic test unit
JPS5486283A (en) * 1977-12-21 1979-07-09 Hitachi Ltd Inspection method and probe card used for its method
JPS5821879U (en) * 1981-08-05 1983-02-10 日本電気株式会社 Electronic circuit testing equipment
JPS6138575U (en) * 1984-08-14 1986-03-11 日立電子エンジニアリング株式会社 Probe position adjustment device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52128071A (en) * 1976-04-20 1977-10-27 Nec Corp Automatic test unit
JPS5486283A (en) * 1977-12-21 1979-07-09 Hitachi Ltd Inspection method and probe card used for its method
JPS5821879U (en) * 1981-08-05 1983-02-10 日本電気株式会社 Electronic circuit testing equipment
JPS6138575U (en) * 1984-08-14 1986-03-11 日立電子エンジニアリング株式会社 Probe position adjustment device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0653178A (en) * 1992-06-16 1994-02-25 Hughes Aircraft Co Apparatus and method for optimum scanning of two-dimensional surface of one or more objects

Also Published As

Publication number Publication date
JPH07114226B2 (en) 1995-12-06

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