JPS63108156U - - Google Patents

Info

Publication number
JPS63108156U
JPS63108156U JP33587U JP33587U JPS63108156U JP S63108156 U JPS63108156 U JP S63108156U JP 33587 U JP33587 U JP 33587U JP 33587 U JP33587 U JP 33587U JP S63108156 U JPS63108156 U JP S63108156U
Authority
JP
Japan
Prior art keywords
ion
secondary electrons
ions
secondary ions
irradiating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP33587U
Other languages
English (en)
Japanese (ja)
Other versions
JPH076609Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987000335U priority Critical patent/JPH076609Y2/ja
Publication of JPS63108156U publication Critical patent/JPS63108156U/ja
Application granted granted Critical
Publication of JPH076609Y2 publication Critical patent/JPH076609Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP1987000335U 1987-01-06 1987-01-06 集束イオンビーム加工装置 Expired - Lifetime JPH076609Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987000335U JPH076609Y2 (ja) 1987-01-06 1987-01-06 集束イオンビーム加工装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987000335U JPH076609Y2 (ja) 1987-01-06 1987-01-06 集束イオンビーム加工装置

Publications (2)

Publication Number Publication Date
JPS63108156U true JPS63108156U (US07655688-20100202-C00086.png) 1988-07-12
JPH076609Y2 JPH076609Y2 (ja) 1995-02-15

Family

ID=30777213

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987000335U Expired - Lifetime JPH076609Y2 (ja) 1987-01-06 1987-01-06 集束イオンビーム加工装置

Country Status (1)

Country Link
JP (1) JPH076609Y2 (US07655688-20100202-C00086.png)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009536776A (ja) * 2005-05-11 2009-10-15 イーエル‐ムル テクノロジーズ リミテッド 二次イオン、ならびに、直接およびまたは間接二次電子のための粒子検出器
JP2017224596A (ja) * 2016-05-03 2017-12-21 レインツリー サイエンティフィック インストゥルメンツ (シャンハイ) コーポレーションRaintree Scientific Instruments (Shanghai) Corporation 帯電粒子検出装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4895294A (US07655688-20100202-C00086.png) * 1972-03-17 1973-12-06

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4895294A (US07655688-20100202-C00086.png) * 1972-03-17 1973-12-06

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009536776A (ja) * 2005-05-11 2009-10-15 イーエル‐ムル テクノロジーズ リミテッド 二次イオン、ならびに、直接およびまたは間接二次電子のための粒子検出器
JP2017224596A (ja) * 2016-05-03 2017-12-21 レインツリー サイエンティフィック インストゥルメンツ (シャンハイ) コーポレーションRaintree Scientific Instruments (Shanghai) Corporation 帯電粒子検出装置

Also Published As

Publication number Publication date
JPH076609Y2 (ja) 1995-02-15

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