JPS6299475A - Thin film forming device - Google Patents

Abstract

PURPOSE:To perform film formation of a stabilized thin film for a long period by providing a meshy plate material between a partition glass plate and a protective film and running the protective film on the surface of the plate material. CONSTITUTION:In a thin film forming device, a meshy plate material 16 large in the degree of aperture is provided in an inserted state between a partition glass plate 2 and a protective film 4. The protective film 4 is run on the surface of this plate material 16. By this mechanism, both running impossibility caused because the protective film 4 is stuck on the plate 2 and film formation impossibility caused because a reaction product is stuck on the plate 2 are prevented. Therefore quantity of light reached on a base plate 8 is made much and the stabilized film formation is performed over a long period.

Description

[Detailed Description of the Invention] r+1 (Field of Application of Industry 1) This invention relates to a thin film forming apparatus for forming a thin film on a substrate.

Cf, Y bundle technology] FIG. 3 is a schematic diagram showing the structure of a conventional device.

In the figure, J-, +i-r, (11 is a source for separating reactive gas by photochemical reaction), (2) is a partition gas plate that separates the reaction chamber (3) and the light source (1). , (/1) is <
V+ Ribo Ichikawa's protective film. Said HoX! f film (/
11 +, 1 If the decomposition products of the reactive gas adhere to the partition glass plate (2) and block the light from the light source (1), which j
1) It runs on the surface of the partition glass plate (2) and does not transmit light itself.

(511,'l Drives the protective film (4) (uJJ mechanism, (61, f71 is the first reaction 1'l gas supply or D1 gas \lada, (8) is J, ( : Tsuki,
+41) l! A substrate holding material that holds the substrate (8) facing the light source (1), (10) a substrate holder that heats the substrate (8) to the desired temperature for film formation, and (11) each of the items listed in 1- Component(
1) to (10) are built-in vacuum containers, (12) is the first board (8) installed in this vacuum container, 1llll=
1 opening/closing plate, (] 3) installed in the vacuum exhaust path, t2 valves, (+
4) is a vacuum pump, and (15) is a leak valve that changes the inside of the vacuum container (I+) from vacuum to atmospheric pressure.

Next (C) The operation will be explained. First, a person opens the opening/closing plate (12) at exit 11 and holds the board (8) with the holding material (9+-J).
2, then close the opening/closing plate (12) (15). Next, close the leak valve (15), open the valve (13), and vacuum bonnet 7 (
14) The film forming pressure (e.g.
Torr) has a vacuum of υ1 qi. Then Tanabata 0f11
71, the substrate (8) is deposited 1Ai 1 degree (for example, 280
℃) and t), +ls unit (II
Turn on the reactant f1 gas (e.g. Si□1]6, N11
．． A mixed gas) is supplied from the gas pipe (15), and the other gas enters the reaction chamber (3) and flows through the gas header (
7) More exhaust. As a result, the light source (1
), an M film (for example, a silicon nitride film) is formed by a photochemical reaction. In the case of (B), the reaction product (V) adheres to the surface of the protective film (4) facing the substrate (8) (7) and blocks the light reaching the surface of the substrate (8), so the protective film Move (4) in the direction of the arrow (ladle) and
(by supplying a film to reduce the fear of light reaching the substrate (8) surface (7).

[Problem to be solved by the invention (Problem 7)] The conventional thin film forming apparatus is configured as described above in 1. Then, the two are attracted and come into close contact with each other, making it difficult for the protective film (4) to run. However, there is a problem that the formation performance of the γ1,9 film will deteriorate. When it is sucked into the partition glass plate (≧), and then separated by a distance, the reaction product will stick to the partition + glass plate (2) surface by one layer.Therefore, the same as above 1; , 1: There was a problem.

Party B's invention is to solve the problems listed in 1-:? :
However, the protective film (4) adheres tightly to the partition glass plate (2), resulting in an inability to run, and reaction products wrap around and adhere to the partition glass plate. How to prevent membrane failure 11-? ), the first objective is to obtain a thin film forming apparatus capable of forming films stably over a long period of time.

[Means for Solving the Problems] The thin film forming apparatus according to the present invention has a structure in which a net [ ]-shaped plate is provided between the partition glass plate and the protective film.
11. This is a sea urchin 17 that runs on the surface of the plate material.

[Function] In the invention of B, since the mesh-like plate material has a large aperture ratio, the loss of Y of the light source 1 is small and the reaction f1 gas can be decomposed efficiently. Since the contact area with the membrane is small, it does not become impossible to run due to small lrc.

[Embodiments of the invention]

Hereinafter, one embodiment of the invention of B will be described with reference to the drawings. 1st
In the figure, (1) to (15) are the same as the conventional device shown in FIG. 3, and (7) has the same function. (16)
) is a mesh-like plate material with a partition glass plate (2) and a protective film (4).
) is also set in the state Wl l. Board material (1
6) is not shown in Figure 2. l: The opening ratio of sea urchins is large (the opening ratio of B can be about 95% by the etching method).
It is the shape.

Next, regarding the invention of B, the operation for performing the configuration is the same as that described for the conventional device shown in FIG.
The explanation will be omitted.

〔Effect of the invention〕

As described above, according to the invention of Party B, by installing the mesh-like plate material between the partition glass plate and the protective film, it is possible to avoid the inability to drive due to adhesion of the protective film and the adhesion of reaction products to the partition glass plate. There is no. On the other hand, the amount of light reaching the substrate 1- increases, eliminating the deterioration in film-forming performance, and V) providing a thin 11ψ-forming device capable of stable film formation over a long period of time.

[Brief explanation of drawings]

FIG. 1 is a schematic diagram showing the structure of a thin film forming apparatus according to an embodiment of the present invention, FIG. 2 is a perspective view of a mesh plate used in FIG. 1, and FIG. 3 is a conventional thin film forming apparatus. FIG. 2 is a schematic diagram of the device. In the figure, (1) is a light source, (2) is a partition glass plate, (4) is a protective film, (5) is a drive mechanism for chemical 3!1 film, (6) is a gas header, (8) (,1 substrate , (9) is the substrate holding material, (1
0) is a heater, (11) is a vacuum chamber, and (16) is a mesh plate. Note that the same reference numerals in each figure indicate the same or corresponding parts. Agent Patent Attorney Tadashi Sato Figure 1, Figure 3, continuation hli Author (formula, February 6, 1986) ++

Claims (1)

[Claims] (1) A light source that decomposes reactive gas in a reaction chamber by photochemical reaction, and a partition glass plate that separates the reaction chamber and the light source;
a gas header for supplying and exhausting the reactive gas;
A vacuum container containing a substrate holding plate, a heater that heats the substrate to a film forming temperature, a protective film that protects the partition glass plate from fogging during film forming, a traveling mechanism for the protective film, and each of the above components. 1. A thin film forming apparatus comprising: a mesh-like plate material provided between the partition glass plate and the protective film.