JPS6295739A - Production of magnetic recording medium - Google Patents

Production of magnetic recording medium

Info

Publication number
JPS6295739A
JPS6295739A JP23811085A JP23811085A JPS6295739A JP S6295739 A JPS6295739 A JP S6295739A JP 23811085 A JP23811085 A JP 23811085A JP 23811085 A JP23811085 A JP 23811085A JP S6295739 A JPS6295739 A JP S6295739A
Authority
JP
Japan
Prior art keywords
substrate
film
magnetic
voltage
recording medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23811085A
Other languages
Japanese (ja)
Inventor
Kazuhiko Dai
提 和彦
Hiroshi Sugawara
宏 菅原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP23811085A priority Critical patent/JPS6295739A/en
Publication of JPS6295739A publication Critical patent/JPS6295739A/en
Pending legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To obtain a smooth surface by applying a high-frequency bias voltage to a substrate and selectively resputtering a film grown on the projecting parts of the substrate in the stage of forming a high permeability magnetic film on the substrate by a sputtering method. CONSTITUTION:Ar is introduced into a vessel 8 to maintain a prescribed vacuum degree therein. A high-frequency voltage is impressed from a power source 3 to a target 1 to generated plasma and a high permeability Fe-Ni alloy film is formed on the Al alloy substrate 4 formed by subjecting the surface to an alumite treatment from Fe-Ni 2. Electrons from the plasma are accumulated in the substrate and the same state as the state in which a negative bias voltage is impressed is attained when the high-frequency voltage is impressed from a power source 6 to a substrate holder 5. The Ar<+> ions in the plasma arrive at the substrate and balance near the substrate 4. The average negative DC bias is thus determined. The film grown on the projecting parts of the substrate is selectively resputtered by the Ar<+> ions arriving at the substrate, by which the surface is smoothed and the vertical magnetic recording medium having a good surface characteristic is obtd. The spacing quantity between a magnetic head and the medium is decreased and the substantial reproduction voltage is obtd.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は垂直記録に適した磁気記録媒体の製造方法に
関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a magnetic recording medium suitable for perpendicular recording.

〔従来の技術〕[Conventional technology]

短波長記録特性の優れた磁気記録として垂直記録がある
。これにおいては、媒体の膜面に垂直方向が磁化容易軸
である垂直記録媒体が必要となる。
Perpendicular recording is an example of magnetic recording with excellent short wavelength recording characteristics. This requires a perpendicular recording medium whose axis of easy magnetization is perpendicular to the film surface of the medium.

このような媒体に信号を記録すると残留磁化は媒体の膜
面に垂直方向を向き、従って、信号が短波長になる程媒
体内反磁界は減少し、優れた再生出力が得られる。垂直
記録媒体は現在非磁性基体上にパーマロイ等の高透磁率
磁性体薄膜を介してC。
When a signal is recorded on such a medium, the residual magnetization is oriented perpendicularly to the film surface of the medium, and therefore, the shorter the signal wavelength, the smaller the demagnetizing field within the medium, resulting in superior reproduction output. Perpendicular recording media are currently made by using a high-permeability magnetic thin film such as permalloy on a non-magnetic substrate.

とCr t−主成分とし垂直方向に磁化容易軸を有する
磁性層をスパッタリング等で形成されたものが多く開発
されている。
Many materials have been developed in which a magnetic layer containing Cr t- as the main component and having an axis of easy magnetization in the perpendicular direction is formed by sputtering or the like.

しかしながら、磁気記録では電子計算機用大容量磁気デ
ィスク装置のように、データの転送レートを高めるため
に磁気ディスクを高速で回転させ、磁気ヘッドを媒体か
ら一定のスペーシング量だけ浮上させて用いる場合が多
く、その場合スペーシング量が大きくなると、記録時に
は媒体に加わるヘッド磁界強度が弱まり、その分布が広
がるために媒体を飽和記録することや媒体に急峻な磁化
転移を残すことが困難になったり、再生時には再生ヘッ
ドの巻き線に鎖交する磁束量が減少し、再生電圧が低下
するということになる。従って、良好な記録再生特性を
得るためには、ヘッド・媒体間スペーシングは小さい方
が望ましい。
However, in magnetic recording, as in large-capacity magnetic disk drives for electronic computers, magnetic disks are rotated at high speed in order to increase the data transfer rate, and magnetic heads are sometimes used by floating a certain amount of spacing above the medium. In many cases, when the amount of spacing increases, the intensity of the head magnetic field applied to the medium during recording weakens, and its distribution widens, making it difficult to saturate the medium or leave steep magnetic transitions on the medium. During reproduction, the amount of magnetic flux interlinking with the windings of the reproducing head decreases, resulting in a decrease in the reproducing voltage. Therefore, in order to obtain good recording and reproducing characteristics, it is desirable that the spacing between the head and the medium be small.

このヘッド争媒体間スペーシングを出来る限シ小さくな
るようにするためには、記録媒体の表面性を良くしたり
、ヘッドの先端の形状及びヘッド・媒体間の潤滑などに
工夫をこらすことが必要である。
In order to minimize the spacing between the head and the medium, it is necessary to improve the surface properties of the recording medium, and to devise ways to improve the shape of the tip of the head and the lubrication between the head and the medium. It is.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかしながら、従来の製法による磁気記録媒体、特に磁
気ディスクの基板においては、その表面性はアルミ合金
基板上をアルマイト処理したものを研磨して仕上けたり
、N1−Pメッキを施した後、研磨して仕上げているが
、突起等によシ必ずしも表面性としては十分でなく、安
定した浮上を得るためには、スペーシング量が0.25
〜0.3−mと大きくなり、十分な再生電圧を得ること
ができないという問題点があった。
However, the surface quality of magnetic recording media, especially magnetic disk substrates manufactured using conventional methods, is achieved by polishing an aluminum alloy substrate that has been alumite-treated, or by applying N1-P plating and then polishing. However, the surface finish is not necessarily sufficient due to protrusions, etc., and in order to obtain stable levitation, the spacing amount should be 0.25
0.3-m, and there was a problem that a sufficient reproduction voltage could not be obtained.

この発明は上記のような問題点を解消するためになされ
たもので、垂直磁気記録媒体の表面性が良好になシ、磁
気ヘッドと媒体間のスペーシング量が小さくなるように
した磁気記録媒体の製造方法を提供することを目的とし
ている。
This invention was made to solve the above-mentioned problems, and provides a magnetic recording medium in which the perpendicular magnetic recording medium has good surface properties and the spacing between the magnetic head and the medium is small. The purpose is to provide a manufacturing method for.

〔問題点を解決するための手段〕[Means for solving problems]

この発明に係る磁気記録媒体の製造方法は、基体に高周
波バイヤス電圧を印加した状態で高透磁率磁性体膜を形
成するようにしたものである。
A method for manufacturing a magnetic recording medium according to the present invention is such that a high permeability magnetic film is formed while a high frequency bias voltage is applied to a substrate.

〔作用〕[Effect]

この発明においては、基体にスパッタ法により高透磁率
磁性膜を形成する際、基体に高周波バイヤス電圧を加え
ることにより、基体の突起部に成長した膜が選択的に再
スパツタされ表面が平滑化される。
In this invention, when forming a high permeability magnetic film on a substrate by sputtering, by applying a high frequency bias voltage to the substrate, the film grown on the protrusions of the substrate is selectively sputtered again and the surface is smoothed. Ru.

〔実施例〕〔Example〕

以下、図面〈よシこの発明の詳細な説明する。 Hereinafter, the present invention will be described in detail with reference to the drawings.

図面はこの発明、の一実施例の磁気記録媒体の製造方法
において使用するスパッタリング装置を示す断面構成図
で、図において、(1)はターゲット電極、(2)は高
透磁率磁性体膜形成用のilのターゲット、この場合F
e−Niターゲッ)、(3)はスパッタ電源、(4)は
表面にアルマイト処理を施したアルミ合金基板、即ち基
体、(5)は電極兼用の導電性基板ホルダー、(6)は
高周波電源、(7)はシールド板、(8)は真空槽、(
9)はシャッター、σQは高透磁率磁性体膜の膜面と垂
直方向に磁化容易軸を有する磁性体膜形成用の第2のタ
ーゲット、この場合Co −Crターゲットである。
The drawing is a cross-sectional configuration diagram showing a sputtering apparatus used in a method of manufacturing a magnetic recording medium according to an embodiment of the present invention. il target, in this case F
e-Ni target), (3) is a sputtering power source, (4) is an aluminum alloy substrate with an alumite treatment on the surface, that is, the base, (5) is a conductive substrate holder that also serves as an electrode, (6) is a high frequency power source, (7) is a shield plate, (8) is a vacuum chamber, (
9) is a shutter, and σQ is a second target for forming a magnetic film having an axis of easy magnetization perpendicular to the film surface of the high permeability magnetic film, in this case a Co--Cr target.

次に動作について説明する。Next, the operation will be explained.

真空槽(8]内t” 1O−7Torr台まで排気した
後、純アルゴン(Ar)ガスを導入し一定の真空度(例
えば1〜2 X 10  Torr )に保ち、スパッ
タ電源(3)によりターゲット電極(1)に負の直流高
電圧又は高周波電圧を印加するとプラズマが発生しFe
−Niターゲット(2)からスパッタされて、表面にア
ルマイト処理を施したアルミ合金基板(4)上に高透磁
率磁性体膜即ち、高透磁率Fe−Ni合金膜が成長する
After evacuating the inside of the vacuum chamber (8) to a level of 10-7 Torr, pure argon (Ar) gas is introduced to maintain a constant degree of vacuum (for example, 1 to 2 X 10 Torr), and the sputtering power source (3) is used to connect the target electrode. When a negative DC high voltage or high frequency voltage is applied to (1), plasma is generated and Fe
A high permeability magnetic film, that is, a high permeability Fe--Ni alloy film is grown on the aluminum alloy substrate (4) whose surface has been subjected to an alumite treatment by sputtering from the -Ni target (2).

この際、導電性基板ホルダー(電極兼用)(5)に高周
波電源(6)により高周波電圧を印加すると、プラズマ
から最初に電子だけが基板(4)に到着し、次第に電子
が蓄積されてくる。これによシ基板(4)は負のバイア
ス電圧を印加されたのと同じ状態になり、その結果今後
はプラズマ中の電子はバイアスによる反撥音叉けて基板
(4)に到着するのが難しくなる。それに対してプラズ
マ中のAr+イオンは負のバイアスの加速を受けて基板
(4)に到着する。
At this time, when a high frequency voltage is applied to the conductive substrate holder (also used as an electrode) (5) by a high frequency power source (6), only electrons from the plasma arrive at the substrate (4) at first, and the electrons are gradually accumulated. As a result, the substrate (4) will be in the same state as if a negative bias voltage had been applied, and as a result, it will be difficult for electrons in the plasma to reach the substrate (4) due to the repulsion caused by the bias. . On the other hand, Ar+ ions in the plasma are accelerated by a negative bias and arrive at the substrate (4).

この結果、−周期の間に基板(4)K到着する電子とイ
オンの量が約9合うところで、基板(4)付近では平衡
状態になり、平均的な負の直流バイアスとして定まって
くる。誘起される直流バイアス電圧は高周波電源(6)
により印加するピークツーピーク電圧の半分にほぼ等し
い。
As a result, when the amount of electrons and ions arriving at the substrate (4)K during the - period is equal to about 9, an equilibrium state is reached near the substrate (4), and an average negative DC bias is established. The induced DC bias voltage is a high frequency power supply (6)
approximately equal to half the peak-to-peak voltage applied by

ここで基板に到着したAr+イオンによシ基板の突起部
に成長した膜が選択的に再スパツタされ、表面を平滑化
し、良好な表面性が得られることになる。
At this point, the Ar+ ions that have arrived at the substrate selectively re-sputter the film that has grown on the protrusions of the substrate, smoothing the surface and providing good surface properties.

なお、基板(4)に誘起される直流バイアスの値がター
ゲットに印加される電圧に等しいか若しくは大きいと、
磁性膜の成長は起こらなくなるので、それより低く抑え
なければならない。
Note that if the value of the DC bias induced in the substrate (4) is equal to or larger than the voltage applied to the target,
Since growth of the magnetic film will not occur, it must be kept lower than that.

このようにして、高透磁率磁性体膜、この場合Fe−N
i合金膜を成膜した後、次にCo−CrターゲットσC
により Co−Cr t−スパッタして高透磁率磁性体
膜面と垂直方向に磁化容易軸を磁性体膜を形成し、表面
性の良い垂直磁気記録ディスクを作成する。
In this way, a high permeability magnetic film, in this case Fe-N
After forming the i alloy film, the Co-Cr target σC
Co-Cr t-sputtering is performed to form a magnetic film with an axis of easy magnetization perpendicular to the surface of the high magnetic permeability magnetic film, thereby producing a perpendicular magnetic recording disk with good surface properties.

このようにして作成したディスクは従来のディスクでは
安定した浮上が得られないような0.054m〜0.1
μmの小さいスペーシングで駆動させることができた。
The disks created in this way have a distance between 0.054 m and 0.1 m, where stable levitation cannot be obtained with conventional disks.
It was possible to drive with a small spacing of μm.

なお、上記実施例において高透磁率材料としてFe−N
i合金を用いたが、MO−Fe−Ni合金、 Mo−C
u−Fe−Ni合金、 Co−Tiなどの非晶質合金で
あってもよい。
In addition, in the above example, Fe-N was used as the high magnetic permeability material.
i alloy was used, but MO-Fe-Ni alloy, Mo-C
It may also be an amorphous alloy such as u-Fe-Ni alloy or Co-Ti.

〔発明の効果〕〔Effect of the invention〕

以上のように、この発明によれば基体に高周波バイヤス
電圧を印加した状態で高透磁率磁性体膜を形成するよう
にしたので、垂直磁気記録媒体の表面性が良好になシス
ベーシング量を小さくすることができ、十分な再生電圧
を得ることのできる磁気記録媒体の製造方法を得ること
ができるという効果がある。
As described above, according to the present invention, since a high permeability magnetic film is formed while a high frequency bias voltage is applied to the substrate, the surface properties of the perpendicular magnetic recording medium are good and the amount of cisbasing is reduced. This has the effect that it is possible to obtain a method of manufacturing a magnetic recording medium that can obtain a sufficient reproduction voltage.

【図面の簡単な説明】[Brief explanation of drawings]

図はこの発明の一実施例の磁気記録媒体の製造方法で使
用されるスパッタリング装置を示す断面構成図である。 (1)・・・ターゲット電極、(2)・・・Fe−Ni
ターゲット、(3)・・・スパッタ電源、(4)・・・
アルミ合金基板、(5)・・・導電性基板ホルダー、(
6)・・・高周波電源、(7)・・・シールド板、(3
)・・・真空槽、(9)・・・シャッター、α0・・・
co−Crターゲット
The figure is a cross-sectional configuration diagram showing a sputtering apparatus used in a method of manufacturing a magnetic recording medium according to an embodiment of the present invention. (1)...Target electrode, (2)...Fe-Ni
Target, (3)... Sputtering power supply, (4)...
Aluminum alloy substrate, (5)... conductive substrate holder, (
6)...High frequency power supply, (7)...Shield plate, (3
)...Vacuum chamber, (9)...Shutter, α0...
co-Cr target

Claims (2)

【特許請求の範囲】[Claims] (1)基体にスパッタ法により高透磁率磁性体膜を形成
し、この高透磁率磁性体膜にそれの膜面と垂直方向に磁
化容易軸を有する磁性体膜を形成するものにおいて、上
記基体に高周波バイヤス電圧を印加した状態で高透磁率
磁性体膜を形成するようにしたことを特徴とする磁気記
録媒体の製造方法。
(1) A high permeability magnetic film is formed on a substrate by sputtering, and a magnetic film having an axis of easy magnetization perpendicular to the film surface is formed on the high permeability magnetic film, in which A method of manufacturing a magnetic recording medium, characterized in that a high permeability magnetic film is formed while a high frequency bias voltage is applied to the magnetic recording medium.
(2)高透磁率磁性体膜の膜面と垂直方向に磁化容易軸
を有する磁性体膜はCoとCrを主成分とするものであ
る特許請求の範囲第1項記載の磁気記録媒体の製造方法
(2) Manufacturing a magnetic recording medium according to claim 1, wherein the magnetic film having an axis of easy magnetization in a direction perpendicular to the film surface of the high magnetic permeability magnetic film contains Co and Cr as main components. Method.
JP23811085A 1985-10-22 1985-10-22 Production of magnetic recording medium Pending JPS6295739A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23811085A JPS6295739A (en) 1985-10-22 1985-10-22 Production of magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23811085A JPS6295739A (en) 1985-10-22 1985-10-22 Production of magnetic recording medium

Publications (1)

Publication Number Publication Date
JPS6295739A true JPS6295739A (en) 1987-05-02

Family

ID=17025323

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23811085A Pending JPS6295739A (en) 1985-10-22 1985-10-22 Production of magnetic recording medium

Country Status (1)

Country Link
JP (1) JPS6295739A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002115051A (en) * 2000-10-05 2002-04-19 Anelva Corp Bias sputtering device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002115051A (en) * 2000-10-05 2002-04-19 Anelva Corp Bias sputtering device

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