JPS6290834A - Ion source - Google Patents

Abstract

PURPOSE:To facilitate cleaning of electrodes so as to increase the reliability of insulation, by enabling detachment between the electrodes such that one of the electrodes and the other electrode are attached to the plasma chamber and the treatment chamber, respectively, in order to increase the creeping insulation distance between the electrodes. CONSTITUTION:An acceleration electrode 1 is attached to a plasma chamber 3 while a decelerating electrode 2 is attached to a treatment chamber 4. The plasma chamber 3 and the treatment chamber 4 are mechanically connected to each other through an insulating material 5 and vacuum-sealed with packings 6 and 7. The gas introduced into the plasma chamber 3 is ionized with the thermions of a filament 8 and the ionized gas is led out into the treatment chamber 4 through the holes of the accelerating and decelerating electrodes 1 and 2. Both the accelerating and decelerating electrodes 1 and 2 can be easily cleaned and their cleaning can be easily confirmed by detaching the plasma chamber 3 from the treatment chamber 4 by using a hinge 9 as the rotation center. Since the insulating materials 5 and 10 provide an adequate creeping distance, the reliability of insulation is insured.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to an electrode structure of an ion source, and particularly to an ion source suitable for application to microfabrication.

[Background of the invention]

An ion source is composed of a plasma chamber and a plurality of electrodes, etc., but in conventional equipment, as described in Japanese Patent Application No. 58-244027, a structure in which a plurality of electrodes are assembled together and attached to a plasma chamber or a processing chamber is used. It has become. Therefore, in order to clean the dirt between the electrodes, it must be dismantled, and the length of the insulating support that insulates the electrodes is not long enough, which poses problems in terms of insulation.

[Purpose of the invention]

An object of the present invention is to provide an ion source whose ffi electrode is easy to clean and whose insulation is highly reliable.

[Summary of the invention]

The present invention has a structure in which one of the plurality of electrodes is attached to the plasma chamber side and the other to the processing chamber side, thereby increasing the creepage insulation distance between the electrodes, making it easier to open the electrodes, and simplifying cleaning. It is something that

[Embodiments of the invention]

An embodiment of the present invention will be described below with reference to FIGS. 1 and 2.

In FIG. 1, an accelerating electrode 1 is attached to a plasma chamber 3, and a decelerating electrode 2 is attached to a processing chamber 4. The plasma chamber 3 and the processing chamber 4 are mechanically connected via an insulator 5 and vacuum-sealed with a gasket 6.7. The gas introduced into the plasma chamber 3 is ionized by the thermoelectrons of the filament 8, and is drawn out into the processing chamber 4 through holes provided in the acceleration electrode 1 and the deceleration electrode 2.

According to this structure, as shown in FIG. 2, by opening the plasma chamber 3 with the hinge 9 as the center of rotation, both the acceleration electrode 1 and the deceleration electrode 2 can be easily cleaned and checked. . Further, since the insulators 5 and 10 can each have a sufficient creepage distance, insulation reliability can be ensured.

[Effects of the Invention] According to the present invention, since the electrodes of the ion source can be opened without disassembling them, stains on the electrodes caused by sputtering can be easily cleaned, and maintainability and reliability can be improved.

[Brief explanation of drawings]

FIG. 1 is a longitudinal cross-sectional view of one embodiment of the ion source of the invention, and FIG.
This figure is a longitudinal cross-sectional view when the ion source is open, for explaining the effect of FIG. 1. DESCRIPTION OF SYMBOLS 1... Acceleration electrode, 2... Deceleration electrode, 3... Plasma chamber, 4... Processing chamber, 5... Insulator, 6, 7...
Patchkin, 8...Filament, 9...Hinge, 1
0...Insulating support.

Claims (1)

[Claims] 1. In an ion source equipped with a plasma chamber and a plurality of electrodes for extracting ions from the plasma chamber, at least one of the plurality of electrodes is attached to the plasma chamber, and the other electrodes are An ion source installed in a processing chamber that is electrically insulated and mechanically connected to the plasma chamber. 2. The ion source according to claim 1, wherein the plasma chamber is mechanically connected to the processing chamber via a hinge. 3. The ion source according to claim 1, wherein the electrode attached to the plasma chamber is electrically insulated and mechanically connected to the plasma chamber.