JPS6290261A - Antiwear protective film for thermal head - Google Patents

Antiwear protective film for thermal head

Info

Publication number
JPS6290261A
JPS6290261A JP60229851A JP22985185A JPS6290261A JP S6290261 A JPS6290261 A JP S6290261A JP 60229851 A JP60229851 A JP 60229851A JP 22985185 A JP22985185 A JP 22985185A JP S6290261 A JPS6290261 A JP S6290261A
Authority
JP
Japan
Prior art keywords
film
protective film
thermal head
heat conductivity
antiwear
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60229851A
Other languages
Japanese (ja)
Inventor
Masayasu Yamaguchi
山口 雅靖
Kunihiro Nagao
長尾 邦廣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP60229851A priority Critical patent/JPS6290261A/en
Publication of JPS6290261A publication Critical patent/JPS6290261A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00Electric solid-state thin-film or thick-film devices, not otherwise provided for

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electronic Switches (AREA)
  • Non-Adjustable Resistors (AREA)

Abstract

PURPOSE:To make it possible to enhance hardness and scratch strength, to impact excellent antiwear property and to enhance cracking resistance and heat conductivity, by providing an antiwear protective film for a thermal head containing Al, O and N as main elements. CONSTITUTION:An antiwear protective film for a thermal head is composed of an Al-O-N type substance, more concretely, a substance represented by AlNxO1-x(x=0.5-0.98). If x is smaller than 0.5, heat conductivity is lowered and said film becomes improper as one for a high speed printer and, if exceeds 0.98, the close adhesiveness of the film if lowered. If x is within a range of 0.5-0.98, heat conductivity is high, and so is the close adhesiveness of the film. The film can be formed using a sputtering method. When this method is employed, powdery aluminum nitride or oxide is mixed in a film composition as a film-forming stock in required ratio and the resulting mixture is pressed to form a target. By this method, the film has high hardness and relatively high heat conductivity and is suitable for a high-speed printer and also excellent i an antiwear property, chemical stability, scratch resistance, etc.

Description

【発明の詳細な説明】 〔技術分野〕 本発明はサーマルヘッド用耐摩耗性保諌膜に関する。[Detailed description of the invention] 〔Technical field〕 The present invention relates to a wear-resistant insulation film for a thermal head.

〔従来技術とその問題点〕[Prior art and its problems]

サーマルヘッドはコンピュータ、ワードプロセッサ、7
アクシミル等の印字ヘッドとして広く用いられている。
Thermal head is computer, word processor, 7
It is widely used as a print head such as Aximil.

サーマルヘッドは非晶質シリコン等の抵抗発熱体のドツ
トを多数配列し、それらを選択的に通電することにより
印字リボンを用紙に熱転写して印字するように構成した
ものである。
The thermal head is constructed by arranging a large number of dots of resistive heating elements such as amorphous silicon, and selectively energizing them to thermally transfer a printing ribbon onto a sheet of paper to print.

用紙はサーマルヘッドの面に摺接しながら移送されるか
ら、耐摩耗性が高い保護膜により抵抗発熱体の表面を保
護する必要がある。
Since the paper is transferred while sliding against the surface of the thermal head, it is necessary to protect the surface of the resistance heating element with a protective film having high wear resistance.

サーマルヘッドにおけるドツト状印字要素は第1図に示
されているように、下から順にアルミナ等の基板1、蓄
熱用のグレーズガラス層2、ポリシリコン等の発熱体層
3、電極4.5、及び耐摩耗性保護膜6より成る。図の
7は発熱部となる。
As shown in FIG. 1, the dot-shaped printing elements in the thermal head include, in order from the bottom, a substrate 1 made of alumina or the like, a glazed glass layer 2 for heat storage, a heat generating layer 3 made of polysilicon, etc., an electrode 4.5, and a wear-resistant protective film 6. 7 in the figure is a heat generating part.

保護膜6には一般に硬度が高く、熱によるクラックが発
生せず、摩耗し難く、シかも湿気やアルカリ等に対して
安定なことが要求され、従来種々の材料が研究されてい
る。
The protective film 6 is generally required to have high hardness, not to crack due to heat, to be resistant to wear, and to be stable against moisture, alkali, etc., and various materials have been researched in the past.

従来使用されている耐摩耗性保護膜にはTa20B、S
 10% A 120s 、B4C% S i 0XN
y  等が知られている。しかし、これらの保護膜には
一長一短があって未だ充分に満足でない。Ta205 
 はビッカース硬度がやや低く (600〜800kg
/mm” )、耐摩耗性に問題があり、また抵抗発熱体
を酸化する傾向があるのでSin、層を耐摩耗性保護膜
の下に介在する必要があり、低温で再結晶化し易く応力
変化によるクラックが発生し易い欠点があり、さらに抵
抗発熱体の下地であるアルミナ基板及びグレーズ層より
熱膨張係数がかなり小さく熱パルスの印加でクラックを
生じ易い。一方、SiCは電気抵抗が低く、電気化学的
な反応により耐摩耗性が低下するので、SiQ、等の膜
を下層として形成する必要があり、またクラックが発生
し易い。またA I、0..84C,等は内部応力が大
きくクラックが発生し易い。さらに、S r Ox N
 yは熱膨張係数が下地よりもかなり小さく、熱パルス
の印加によりクラックを生じる問題がある。従って、耐
摩耗性が高いだけでなく耐クラツク性、耐熱疲労性にす
ぐれた保mMが要請されている。
Conventionally used wear-resistant protective films include Ta20B and S.
10% A 120s, B4C% S i 0XN
y etc. are known. However, these protective films have advantages and disadvantages and are still not fully satisfactory. Ta205
has a slightly lower Vickers hardness (600 to 800 kg)
/mm”), has a problem with wear resistance and tends to oxidize the resistance heating element, so a layer of Sin must be interposed under the wear-resistant protective film, and it is easy to recrystallize at low temperatures and stress changes. Furthermore, SiC has a disadvantage that it is easily cracked due to the application of heat pulses due to its thermal expansion coefficient which is considerably smaller than that of the alumina substrate and glaze layer that are the base of the resistance heating element.On the other hand, SiC has low electrical resistance and As wear resistance decreases due to chemical reactions, it is necessary to form a film such as SiQ as a lower layer, and cracks are likely to occur.Also, AI, 0.84C, etc. have large internal stress and are prone to cracking. is likely to occur.Furthermore, S r Ox N
The coefficient of thermal expansion of y is considerably smaller than that of the base material, and there is a problem in that cracks occur when a heat pulse is applied. Accordingly, there is a need for an M that not only has high wear resistance but also excellent crack resistance and thermal fatigue resistance.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、耐クラツク性が高く、耐熱疲労性にす
ぐれたサーマルヘッド用S*耗性保h kを提供するこ
とである。
An object of the present invention is to provide an S* wear-retaining material for a thermal head that has high crack resistance and excellent thermal fatigue resistance.

〔発明の概要〕[Summary of the invention]

本発明のサーマルヘッド用耐摩耗性保設膜はA1.0及
びNを主たる元素とするものであり、より具体的にはA
lN0   (ただしくL5≦X≦x   1−x Cl2O)で表わされる組成を有する化合物である。
The wear-resistant maintenance film for thermal heads of the present invention contains A1.0 and N as main elements, and more specifically, A1.0 and N are the main elements.
It is a compound having a composition represented by lN0 (L5≦X≦x 1-x Cl2O).

本発明のサーマルヘッドは硬度が高い一方で、熱伝導性
が比較的大きく、高速プリンタ用のサーマルヘッドの保
護膜として好適である。また耐摩耗、化学的安定性、引
掻き強度、等の面でもすぐれている。
The thermal head of the present invention has high hardness and relatively high thermal conductivity, and is suitable as a protective film for a thermal head for high-speed printers. It also has excellent wear resistance, chemical stability, scratch strength, etc.

〔発明の構成の詳細〕[Details of the structure of the invention]

本発明のサーマルヘッド用耐摩耗性保MMは、Al−0
−N系の物質、より具体的にはAlNx0l−x(z=
0.5〜CL9B)で表わされる物質である。
The wear-resistant MM for thermal heads of the present invention is Al-0
-N-based materials, more specifically AlNx0l-x (z=
0.5 to CL9B).

Xがα5よりも小さいと熱転4率が低下して高速プリン
タ用には不適当となる。またXがα98を超えると、膜
の密着性が低下する。Xが15〜α98の範囲にあれば
熱伝導率が高く、シかも密着性も良い、以下に示すよう
に、本発明の保護膜は他の種々の面でも従来の保inに
比して遜色がない。
If X is smaller than α5, the heat transfer rate will decrease, making it unsuitable for high-speed printers. Moreover, when X exceeds α98, the adhesion of the film decreases. If X is in the range of 15 to α98, the thermal conductivity is high and the adhesiveness is good.As shown below, the protective film of the present invention is inferior to the conventional protective film in various other aspects as well. There is no.

本発明の保説膜は、例えばスパッタ法を用いて成膜する
ことができる。この方法によるときは成膜原料としてア
ルミニウム窒化物や酸化物の粉末、例えばA I N、
 A Ivys  を膜組成に対応した所要比率に混合
し、プレスしてターゲットとし、またArガス及び必要
ならざらにN 2.01ガスを用い、Rpe力を加えて
Arイオンによりターゲットを出撃してスパッタを起こ
させ、例えばアルミナ基板にガラスグレーズを形成し、
さらに発熱体膜を成膜したものの表面に成膜する。N、
及び/又はO,ガスを導入する場合には反応性のスパッ
ター成膜が可能で、膜組成の調整を行うことができる。
The adhesive film of the present invention can be formed using, for example, a sputtering method. When this method is used, aluminum nitride or oxide powder, such as AIN, is used as a film forming raw material.
A Ivys is mixed in the required ratio corresponding to the film composition, pressed to make a target, and using Ar gas and N2.01 gas if necessary, Rpe force is applied and the target is ejected with Ar ions to perform sputtering. For example, by forming a glass glaze on an alumina substrate,
Furthermore, a heating element film is formed on the surface of the film. N,
When introducing O and/or gas, reactive sputtering film formation is possible, and the film composition can be adjusted.

次に、本発明の詳細な説明する。Next, the present invention will be explained in detail.

実施例 AIN及びAI、O,粉末をモル比5:2の割合で混合
し、プレスしてターゲットとした。投入電力tsKW、
Ar圧3Pa、基板温度350″Cで発熱体上にRFス
パッタ成膜した。この膜について各種テストをしたとこ
ろ次の結果を得た。
Example AIN, AI, O, and powder were mixed at a molar ratio of 5:2 and pressed to form a target. Input power tsKW,
A film was formed by RF sputtering on a heating element at an Ar pressure of 3 Pa and a substrate temperature of 350''C. Various tests were conducted on this film, and the following results were obtained.

発熱体ドツト当りα7Wの電力を11秒間パルス通電し
、その間の表面温度変化を測定したところ第2図の結果
を得た。対照として’ra、o、  保護膜に対して同
じ実験を行った。hlo  N  ttは、x   1
−x 発熱の開始後直ちに表面に伝熱をし、また発熱停止後直
ちに低い温度に戻るが、’ra、o、  保り膜は温度
の立上り及び立下りが遅い。従って、本発明の保護膜は
高速プリンタ用に適することが分る。
When a power of α7W was pulsed for 11 seconds per heating element dot and the change in surface temperature during that time was measured, the results shown in FIG. 2 were obtained. As a control, the same experiment was performed on 'ra, o, and protective films. hlo N tt is x 1
-x Heat is transferred to the surface immediately after the start of heat generation, and the temperature returns to a low temperature immediately after the heat generation stops, but the 'ra, o, and protective film's temperature rises and falls slowly. Therefore, it can be seen that the protective film of the present invention is suitable for high-speed printers.

その他の特性については、次の通りであった。Other characteristics were as follows.

t ビッカース硬度は1800〜2000呼/mm”で
あり、Ta!QB  よりも硬い。
The Vickers hardness is 1,800 to 2,000 cores/mm, which is harder than Ta!QB.

2 表面の引掻き強度は450JFであり、T a 2
 Q 5の2701よりも大きい。なお、この引掻き強
度はダイヤモンド針を用いた引掻き試験機(新案科学(
株)製HEIDON −14型)によって測定した。
2 The scratch strength of the surface is 450 JF, and T a 2
It is larger than 2701 of Q5. This scratch strength was measured using a scratch tester (New Science) using a diamond needle.
It was measured using a HEIDON-14 model manufactured by Co., Ltd.

五 M 径12 mmの61球にダイヤモンドペースト
を付着させた耐摩耗試験では35秒であり、Ta!O,
の7秒より長い。
In a wear test using 61 balls with a diameter of 12 mm and diamond paste attached, the time was 35 seconds, and Ta! O,
longer than 7 seconds.

4、 パルス周期7m秒、印加電力12W/ドツトにて
108パルスの繰返し加熱試験後でも結晶化が起こらな
かった(電子線回折でハローが見られなかった)。
4. Even after repeated heating tests of 108 pulses with a pulse period of 7 msec and applied power of 12 W/dot, no crystallization occurred (no halo was observed in electron beam diffraction).

五 強酸、強アルカリに対して安定である。5. Stable against strong acids and strong alkalis.

乙 比抵抗は10110m以上で電気的に安定である。B: It is electrically stable with a specific resistance of 10110 m or more.

〔作用効果〕[Effect]

上記から分るように、本発明のAl−N−0系の保護膜
は、硬度が高く、引掻き強度が高く、耐摩耗性に優れ、
結晶化が起こらないので耐クラツク性が高く、また伝熱
性が高いので高速印字に適するなど、優れた耐摩耗性保
護膜を提供することができる。
As can be seen from the above, the Al-N-0-based protective film of the present invention has high hardness, high scratch strength, and excellent wear resistance.
Since crystallization does not occur, it has high crack resistance, and because of its high heat conductivity, it is suitable for high-speed printing, making it possible to provide an excellent wear-resistant protective film.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はサーマルヘッドの要部断面図、及び第2図は熱
パルス印加と保護膜表面温度の関係を示すグラフである
FIG. 1 is a sectional view of a main part of the thermal head, and FIG. 2 is a graph showing the relationship between heat pulse application and protective film surface temperature.

Claims (1)

【特許請求の範囲】 1、Al、O及びNを主たる構成元素としたサーマルヘ
ッド用耐摩耗性保護膜。 2、AlN_xO_1_−_x(ただし0.5≦x≦0
.98)で表わされる組成を有する前記第1項記載の耐
摩耗性保護膜。
[Claims] 1. A wear-resistant protective film for a thermal head whose main constituent elements are Al, O, and N. 2, AlN_xO_1_-_x (0.5≦x≦0
.. 98) The wear-resistant protective film according to item 1 above, having a composition represented by:
JP60229851A 1985-10-17 1985-10-17 Antiwear protective film for thermal head Pending JPS6290261A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60229851A JPS6290261A (en) 1985-10-17 1985-10-17 Antiwear protective film for thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60229851A JPS6290261A (en) 1985-10-17 1985-10-17 Antiwear protective film for thermal head

Publications (1)

Publication Number Publication Date
JPS6290261A true JPS6290261A (en) 1987-04-24

Family

ID=16898678

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60229851A Pending JPS6290261A (en) 1985-10-17 1985-10-17 Antiwear protective film for thermal head

Country Status (1)

Country Link
JP (1) JPS6290261A (en)

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