JPS6289137U - - Google Patents
Info
- Publication number
- JPS6289137U JPS6289137U JP18044185U JP18044185U JPS6289137U JP S6289137 U JPS6289137 U JP S6289137U JP 18044185 U JP18044185 U JP 18044185U JP 18044185 U JP18044185 U JP 18044185U JP S6289137 U JPS6289137 U JP S6289137U
- Authority
- JP
- Japan
- Prior art keywords
- reaction chamber
- gas phase
- semiconductor manufacturing
- baffle plates
- exhaust system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 239000000872 buffer Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18044185U JPS6289137U (ko) | 1985-11-22 | 1985-11-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18044185U JPS6289137U (ko) | 1985-11-22 | 1985-11-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6289137U true JPS6289137U (ko) | 1987-06-08 |
Family
ID=31124401
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18044185U Pending JPS6289137U (ko) | 1985-11-22 | 1985-11-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6289137U (ko) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01294598A (ja) * | 1988-05-23 | 1989-11-28 | Sumitomo Electric Ind Ltd | 気相成長装置 |
| KR20030068628A (ko) * | 2002-02-15 | 2003-08-25 | 주성엔지니어링(주) | 반도체 제조용 챔버 |
| JP2010034392A (ja) * | 2008-07-30 | 2010-02-12 | Tokyo Electron Ltd | 弁体、粒子進入阻止機構、排気制御装置及び基板処理装置 |
| JP2012186483A (ja) * | 2005-03-02 | 2012-09-27 | Tokyo Electron Ltd | 排気ポンプ |
| JP2015119041A (ja) * | 2013-12-18 | 2015-06-25 | 東京エレクトロン株式会社 | 粒子逆流防止部材及び基板処理装置 |
| JP2017017180A (ja) * | 2015-07-01 | 2017-01-19 | 東京エレクトロン株式会社 | プラズマ処理装置およびそれに用いる排気構造 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5329237A (en) * | 1976-08-31 | 1978-03-18 | Tokyo Shibaura Electric Co | Gas reaction device |
-
1985
- 1985-11-22 JP JP18044185U patent/JPS6289137U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5329237A (en) * | 1976-08-31 | 1978-03-18 | Tokyo Shibaura Electric Co | Gas reaction device |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01294598A (ja) * | 1988-05-23 | 1989-11-28 | Sumitomo Electric Ind Ltd | 気相成長装置 |
| KR20030068628A (ko) * | 2002-02-15 | 2003-08-25 | 주성엔지니어링(주) | 반도체 제조용 챔버 |
| JP2012186483A (ja) * | 2005-03-02 | 2012-09-27 | Tokyo Electron Ltd | 排気ポンプ |
| JP2012227531A (ja) * | 2005-03-02 | 2012-11-15 | Tokyo Electron Ltd | 反射装置、連通管、排気システム、該システムの洗浄方法、記憶媒体、及び基板処理装置 |
| JP2013007383A (ja) * | 2005-03-02 | 2013-01-10 | Tokyo Electron Ltd | 排気ポンプ |
| JP2013015145A (ja) * | 2005-03-02 | 2013-01-24 | Tokyo Electron Ltd | 排気ポンプ及び排気システム |
| JP2010034392A (ja) * | 2008-07-30 | 2010-02-12 | Tokyo Electron Ltd | 弁体、粒子進入阻止機構、排気制御装置及び基板処理装置 |
| JP2015119041A (ja) * | 2013-12-18 | 2015-06-25 | 東京エレクトロン株式会社 | 粒子逆流防止部材及び基板処理装置 |
| JP2017017180A (ja) * | 2015-07-01 | 2017-01-19 | 東京エレクトロン株式会社 | プラズマ処理装置およびそれに用いる排気構造 |
| TWI702650B (zh) * | 2015-07-01 | 2020-08-21 | 日商東京威力科創股份有限公司 | 電漿處理裝置及使用於此之排氣構造 |