JPS6287954A - パタ−ン形成法 - Google Patents

パタ−ン形成法

Info

Publication number
JPS6287954A
JPS6287954A JP60229307A JP22930785A JPS6287954A JP S6287954 A JPS6287954 A JP S6287954A JP 60229307 A JP60229307 A JP 60229307A JP 22930785 A JP22930785 A JP 22930785A JP S6287954 A JPS6287954 A JP S6287954A
Authority
JP
Japan
Prior art keywords
rays
chlorination
thin film
sensitivity
rate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60229307A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0357468B2 (https=
Inventor
Yoshiki Suzuki
鈴木　淑希
Nobuyuki Yoshioka
信行 吉岡
Noriaki Ishio
石尾　則明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP60229307A priority Critical patent/JPS6287954A/ja
Publication of JPS6287954A publication Critical patent/JPS6287954A/ja
Publication of JPH0357468B2 publication Critical patent/JPH0357468B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP60229307A 1985-10-14 1985-10-14 パタ−ン形成法 Granted JPS6287954A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60229307A JPS6287954A (ja) 1985-10-14 1985-10-14 パタ−ン形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60229307A JPS6287954A (ja) 1985-10-14 1985-10-14 パタ−ン形成法

Publications (2)

Publication Number Publication Date
JPS6287954A true JPS6287954A (ja) 1987-04-22
JPH0357468B2 JPH0357468B2 (https=) 1991-09-02

Family

ID=16890088

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60229307A Granted JPS6287954A (ja) 1985-10-14 1985-10-14 パタ−ン形成法

Country Status (1)

Country Link
JP (1) JPS6287954A (https=)

Also Published As

Publication number Publication date
JPH0357468B2 (https=) 1991-09-02

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