JPS6284448A - Stamper for optical memory element substrate - Google Patents

Stamper for optical memory element substrate

Info

Publication number
JPS6284448A
JPS6284448A JP22459885A JP22459885A JPS6284448A JP S6284448 A JPS6284448 A JP S6284448A JP 22459885 A JP22459885 A JP 22459885A JP 22459885 A JP22459885 A JP 22459885A JP S6284448 A JPS6284448 A JP S6284448A
Authority
JP
Japan
Prior art keywords
stamper
layer
aln
optical memory
guide tracks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22459885A
Other languages
Japanese (ja)
Inventor
Akira Takahashi
明 高橋
Michinobu Saegusa
理伸 三枝
Kazuo Ban
和夫 伴
Tomoyuki Miyake
知之 三宅
Yoshiteru Murakami
善照 村上
Kenji Oota
賢司 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP22459885A priority Critical patent/JPS6284448A/en
Publication of JPS6284448A publication Critical patent/JPS6284448A/en
Pending legal-status Critical Current

Links

Landscapes

  • Manufacturing Optical Record Carriers (AREA)

Abstract

PURPOSE:To increase the surface hardness of a stamper and to improve the durability thereof by forming a nitride layer on a base material of the stamper for an optical memory element substrate and forming information bits, guide tracks, etc. on the nitride layer. CONSTITUTION:An AlN layer 2 is formed by a sputtering method or the like on a metallic sheet 1 and a photosensitive layer 3 is formed thereon. An information signal or guide tracks are recorded by laser light, etc. on the photosensitive layer 3 and thereafter said layer is developed. The AlN layer 2 is etched by the depth necessary for the guide tracks with the photosensitive layer 3 as a mask. The photosensitive layer 3 on the AlN layer 2 is removed by oxygen plasma, etc. and the stamper having the surface consisting of the AlN layer 2 is obtd. Since the stamper surface is the nitride layer 2 having extremely high Mohs' hardness (the Mohs' hardness is 7 in the case of AlN), the wear resistance is remarkably improved.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明はレーザ光等の光学的手段により情報の記録・再
生・消去等を行う光メモリ素子の製造に用いられる光メ
モリ素子基板用スタンパの改良に関するものである。
Detailed Description of the Invention (Field of Industrial Application) The present invention relates to an improvement in a stamper for an optical memory element substrate used for manufacturing an optical memory element that records, reproduces, erases, etc. information using optical means such as a laser beam. It is something.

(従来の技術) 近年、大容量、高密度、高速アクセス化の可能な光メモ
リ素子への要望が高まる中で、アクリル樹脂等の合成樹
脂を基板とする光メモリ素子の研究開発が活発に行われ
ている。
(Prior Art) In recent years, as the demand for optical memory devices capable of large capacity, high density, and high-speed access has increased, research and development of optical memory devices using synthetic resins such as acrylic resin as substrates has been actively conducted. There is.

従来、このような合成樹脂基板の製造にはスタンパを必
要とし、この種のスタンパは多くの場合衣の2種の方法
で製造された。
Conventionally, the production of such synthetic resin substrates requires a stamper, and this type of stamper has been produced in many cases by two methods.

第1の方法は、ガラス板−にに感光層を形成し、その感
光層にレーザ光等で情報信号またはガイドトラックを記
録した後、導電膜をコートし、次に電鋳法によりスタン
パを製造する方法である。
The first method is to form a photosensitive layer on a glass plate, record information signals or guide tracks on the photosensitive layer with a laser beam, etc., coat it with a conductive film, and then manufacture a stamper by electroforming. This is the way to do it.

また、第2の方法は、金属板上に感光層を形成し、その
感光層にレーザ光等で情報信号またはガイドトラックを
記録した後、前記感光層をマスクとして金属板をエツチ
ングし、この金属板をスタンパとする方法である。
In the second method, a photosensitive layer is formed on a metal plate, information signals or guide tracks are recorded on the photosensitive layer using a laser beam, etc., and then the metal plate is etched using the photosensitive layer as a mask. This method uses a board as a stamper.

(発明が解決しようとする問題点) ところで、従来、上記第2の方法において使用される金
属にはNiが用いられてきたが、スタンパとしての表面
硬度が十分ではなく、このため繰り返し使用していくう
ちに表面形状が崩れてくるという問題点があった。この
ような現象は、基板に使用する合成樹脂の粘度が高い場
合や流動性の悪い状態での使用時に顕著で、スタンパの
寿命を縮める原因となってきた。
(Problems to be Solved by the Invention) Conventionally, Ni has been used as the metal used in the second method, but its surface hardness as a stamper is not sufficient, and for this reason, it cannot be used repeatedly. There was a problem in that the surface shape deteriorated over time. Such a phenomenon is noticeable when the synthetic resin used for the substrate has a high viscosity or when used in a state with poor fluidity, and has been a cause of shortening the life of the stamper.

(問題点を解決するための手段) 本発明の光メモリ素子基板用スタンパは、基材上に窒化
物層が形成され、この窒化物層に情報ビット、ガイドト
ラック等が形成されたものである。
(Means for Solving the Problems) The stamper for an optical memory element substrate of the present invention has a nitride layer formed on a base material, and information bits, guide tracks, etc. are formed on this nitride layer.

(作用) 情報ビット、ガイドトラック等が形成されるスタンパ表
面が窒化物層であることにより、スタンパの表面硬度が
高く、耐久性に優れたものとなる。
(Function) Since the surface of the stamper on which information bits, guide tracks, etc. are formed is a nitride layer, the stamper has high surface hardness and excellent durability.

(実施例) 以下、本発明の一実施例を図面を参照して説明する。(Example) Hereinafter, one embodiment of the present invention will be described with reference to the drawings.

第4図において、本発明に係る光メモリ素子基板用スタ
ンパは、例えばガラス板またはAj!、Ni等の金属板
からなる基材l上に窒化物層2が形成され、この窒化物
層2に情報ビット、ガイドトラック等が形成されたもの
である。
In FIG. 4, the stamper for an optical memory element substrate according to the present invention is, for example, a glass plate or Aj! A nitride layer 2 is formed on a base material l made of a metal plate such as , Ni, etc., and information bits, guide tracks, etc. are formed on this nitride layer 2.

上記窒化物層2としては、例えばA I N、 SiN
As the nitride layer 2, for example, A I N, SiN
.

TiN、TaN、BN等が挙げられる。Examples include TiN, TaN, and BN.

次に、上記のようになる光メモリ素子基板用スタンパの
製造方法の一実施例を第1図乃至第4図により説明する
Next, an embodiment of the method for manufacturing the stamper for an optical memory element substrate as described above will be described with reference to FIGS. 1 to 4.

工程fil・・・第1図 ガラス板、またはAff、Ni等の金属板lの上にA/
N層2をスパッタ法等により形成し、そのA7!N層2
−1−に感光層3をスピナー法、スプレー法またはディ
ップ方式等により形成する。
Process fil...Fig. 1 A/
N layer 2 is formed by sputtering method etc., and the A7! N layer 2
A photosensitive layer 3 is formed on -1- by a spinner method, a spray method, a dip method, or the like.

工程(2)・・・第2図 上記感光層3にレーザ光等で情報信号またはガイドトラ
ックを記録し、その後現像する。第2図は現像した後の
状態を示している。
Step (2)...FIG. 2 An information signal or a guide track is recorded on the photosensitive layer 3 with a laser beam or the like, and then developed. FIG. 2 shows the state after development.

工程(3)・・・第3図 次にCF、またはCHF 3のブラズーンガスで感光層
3をマスクとしてA7!N層2をガイドトラックに必要
な深さだけエツチングする。第3図はエツチング終了後
の状態を示している。
Step (3)...Figure 3 Next, using CF or CHF 3 Blazoon gas as a mask, A7! Etch the N layer 2 to the depth required for the guide track. FIG. 3 shows the state after etching is completed.

工程(4)・・・第4図 AIN層2−1−の感光層3を酸素プラズマ等で取り除
き表面が/ltN層2であるスタンパを得る。
Step (4)...FIG. 4 The photosensitive layer 3 of the AIN layer 2-1- is removed by oxygen plasma or the like to obtain a stamper whose surface is the /ltN layer 2.

本発明によれば、スタンパ表面はモース硬度の極めて硬
い窒化物層2であるため(A IlNの場合モース硬度
は7)、耐摩耗性は大幅に向上する。
According to the present invention, since the surface of the stamper is a nitride layer 2 with extremely hard Mohs hardness (Mohs hardness is 7 in the case of AlIN), wear resistance is greatly improved.

なお、情報信号やガイドトラックを記録するのはレーザ
光以外に紫外線を用いて密着露光方式にて行なってもよ
い。
Note that recording of information signals and guide tracks may be performed by a contact exposure method using ultraviolet light instead of laser light.

(発明の効果) 以−L、本発明によれば、スタンパの寿命が大幅に長く
なるだけでなく、スタンパの金属にNi以外の材料が使
えるようになる。
(Effects of the Invention) According to the present invention, not only the life of the stamper is significantly extended, but also a material other than Ni can be used for the metal of the stamper.

【図面の簡単な説明】[Brief explanation of drawings]

第1図乃至第4図は、本発明に係る光メモリ素子基板用
スタンパの製造方法の一実施例を示す工程図である。 1・・・基材     2・・・窒化物層3・・・感光
層 第7図
FIGS. 1 to 4 are process diagrams showing one embodiment of a method for manufacturing a stamper for an optical memory element substrate according to the present invention. 1... Base material 2... Nitride layer 3... Photosensitive layer Fig. 7

Claims (1)

【特許請求の範囲】[Claims] 1)基材上に窒化物層が形成され、この窒化物層に情報
ビット、ガイドトラック等が形成されたことを特徴とす
る光メモリ素子基板用スタンパ。
1) A stamper for an optical memory element substrate, characterized in that a nitride layer is formed on a base material, and information bits, guide tracks, etc. are formed on this nitride layer.
JP22459885A 1985-10-08 1985-10-08 Stamper for optical memory element substrate Pending JPS6284448A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22459885A JPS6284448A (en) 1985-10-08 1985-10-08 Stamper for optical memory element substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22459885A JPS6284448A (en) 1985-10-08 1985-10-08 Stamper for optical memory element substrate

Publications (1)

Publication Number Publication Date
JPS6284448A true JPS6284448A (en) 1987-04-17

Family

ID=16816230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22459885A Pending JPS6284448A (en) 1985-10-08 1985-10-08 Stamper for optical memory element substrate

Country Status (1)

Country Link
JP (1) JPS6284448A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100752356B1 (en) 2006-04-06 2007-08-30 다이섹(주) The manufacturing process of ain cover plate and the ain cover plate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100752356B1 (en) 2006-04-06 2007-08-30 다이섹(주) The manufacturing process of ain cover plate and the ain cover plate

Similar Documents

Publication Publication Date Title
US7850441B2 (en) Mold structure
CN1236159A (en) Metallic stamper and optical disk and manufacture method thereof
JPS619848A (en) Guide groove forming method of optical recording medium
US20080014456A1 (en) Process of producing master carrier for magnetic transfer
JPS6284448A (en) Stamper for optical memory element substrate
US20050011767A1 (en) Manufacturing method for a magnetic recording medium stamp and manufacturing apparatus for a magnetic recording medium stamp
KR920007209A (en) Magnetic memory device and manufacturing method thereof
JPS6284447A (en) Stamper for optical memory element substrate
JPH0373938B2 (en)
JPS6427049A (en) Optical disk, substrate for optical disk and its production
JP2658023B2 (en) Master disc making method for flat information record carrier
JPS61296549A (en) Production of optical memory element
JPH01161302A (en) Manufacture of holographic rating
JPS6262450A (en) Manufacture of stamper
JPH052779A (en) Production of stamper
JP2000348393A (en) Stamper for optical disk and its production
JP2753388B2 (en) Manufacturing method of stamper
JPS59186154A (en) Manufacture of mother disc for video disc
JPS6079351A (en) Manufacture of stamper
JPH0314910B2 (en)
JPH01188332A (en) Molding stamper for information record carrier and its manufacture
JPH059775A (en) Production of stamper
JP2000090487A (en) Recording medium and its production
JPS56153544A (en) Manufacture for optical signal recording medium
JPH06349115A (en) Production of stamper