JPS6284416A - Production of magnetic head - Google Patents
Production of magnetic headInfo
- Publication number
- JPS6284416A JPS6284416A JP22508085A JP22508085A JPS6284416A JP S6284416 A JPS6284416 A JP S6284416A JP 22508085 A JP22508085 A JP 22508085A JP 22508085 A JP22508085 A JP 22508085A JP S6284416 A JPS6284416 A JP S6284416A
- Authority
- JP
- Japan
- Prior art keywords
- film
- protective film
- coil
- magnetic head
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
- G11B5/3106—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing where the integrated or assembled structure comprises means for conditioning against physical detrimental influence, e.g. wear, contamination
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は薄膜磁気ヘッドの上部保護膜の製造方法に関す
る。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing an upper protective film of a thin film magnetic head.
本発明は薄膜磁気ヘッドにおいて、上部保護膜を８１０
．またはＡｇ、Ｏ，などの無機材料をスノ（゛ツタリン
グしたのち、低融点ガラスを流し込むことにより保護膜
を形成するものである。The present invention provides a thin film magnetic head in which the upper protective film is 810 mm thick.
．． Alternatively, a protective film is formed by snotering an inorganic material such as Ag, O, etc., and then pouring low-melting glass.
従来用いられている薄膜磁気ヘッドの構成例を第２図に
示す。図において、１は基板、２は磁性膜、５はコイル
、４はＳ１０．または鳩０．からなる絶縁膜、５は有機
性樹脂からなる絶縁膜である。FIG. 2 shows an example of the configuration of a conventionally used thin film magnetic head. In the figure, 1 is a substrate, 2 is a magnetic film, 5 is a coil, 4 is S10. Or pigeon 0. 5 is an insulating film made of organic resin.
このように、従来用いられている薄膜磁気ヘッドでは、
コイルＳ１絶縁膜４の厚みのために生じる段差上に、保
ＷＩｉＭＡ６をス／くツタリングにより形成している。In this way, conventionally used thin film magnetic heads have
The protective WIiMA 6 is formed by scattering on the step caused by the thickness of the coil S1 insulating film 4.
〔発明が解決しようとする問題点及び目的〕しかし、前
述の従来技術では次のような問題点を有する。コイルと
絶縁膜の厚みから生じる段差のため、Ｓｉｎ、あるいは
Ａｔ ＠ Ｏ＠のスパッタリングの付き回りが悪く、ま
た保護膜を平坦化するのに長時間のスパッタリングが必
要であった。[Problems and Objectives to be Solved by the Invention] However, the above-mentioned prior art has the following problems. Due to the difference in level caused by the thickness of the coil and the insulating film, sputtering coverage of Sin or At@O@ was poor, and long sputtering was required to flatten the protective film.
しかし、本発明によりスパッタリングの付き回りにかか
わらず安定した保護膜を短時間で形成する製造方法を提
供することにある。However, it is an object of the present invention to provide a manufacturing method that can form a stable protective film in a short time regardless of sputtering.
このような目的を達成するために、本発明は、１磁性膜
上にｓｉｏ、あるいはＭｌｏ、の無機材料をスパッタリ
ングしたのち、低融点ガラスを流し込んで保護膜を形成
するものである。In order to achieve such an object, the present invention sputters an inorganic material such as sio or Mlo on a magnetic film, and then pours low melting point glass to form a protective film.
以下、実施例を用いて本発明を説明する。The present invention will be explained below using examples.
第１図は、本発明により製造した薄膜磁気ヘッドの一例
を示す断面図である。図において、第２図と同様は６は
Ｓ１０．からなる保護膜であるが、その断面形状は、上
部磁性１−に追従している。FIG. 1 is a sectional view showing an example of a thin film magnetic head manufactured according to the present invention. In the figure, as in FIG. 2, 6 is S10. The cross-sectional shape of the protective film follows the upper magnetic field 1-.
さらに、日１０．上に鉛系低融点を流し込むことにより
、保−膜を平坦化させている。Furthermore, day 10. The protective film is flattened by pouring a lead-based low melting point on top.
第１図にもとづいて詳細に説明する。This will be explained in detail based on FIG.
薄膜磁気ヘッドは、基板１の上に下部保護膜８を形成し
、下部磁性膜９、ギヤツブ材として絶縁膜４を順次積層
し、コイル５の絶縁をはかるために絶縁膜５とコイル５
ｔｌ−形成し、その上に上部磁性膜ＩＯを積層し、薄膜
磁気ヘッドを保護するために、Ｓ１０．からなる保護膜
６をスパッタリングで形成したのち、低融点鉛系ガラス
からなる保護［７を４００℃の溶融状態で流し込むこと
により形成する。The thin film magnetic head includes a lower protective film 8 formed on a substrate 1, a lower magnetic film 9, and an insulating film 4 as a gear material, which are sequentially laminated, and the insulating film 5 and the coil 5 are stacked in order to insulate the coil 5.
S10. After forming the protective film 6 by sputtering, the protective film 6 made of low melting point lead-based glass is poured in in a molten state at 400°C.
そして、絶縁膜５、コイルへの材料は薄膜磁気ヘッドの
信頼性をはかるため、それぞれポリイミド系有機樹脂、
銅を用いている。In order to ensure the reliability of the thin film magnetic head, the materials for the insulating film 5 and the coil are polyimide organic resin,
It uses copper.
また、保護膜７の作業温暖を４００℃としたのは、ポリ
イミド系樹脂の絶縁膜が４５０℃以上で分解し、信頼性
が失なわれるからである。Further, the working temperature of the protective film 7 is set to 400° C. because the polyimide resin insulating film decomposes at temperatures above 450° C., resulting in loss of reliability.
以上述べたように本発明によれば、薄膜磁気ヘッドの保
護膜を、ガラスを流し込み形成する仁とによって以下の
ような効果を有する。As described above, according to the present invention, the following effects are achieved by forming the protective film of the thin film magnetic head by pouring glass.
ｉｌｌ 無機材料の保護膜の形成にあたり、全部分を
スパッタリングする必要がないので、作業時間が短縮さ
れる。ill When forming a protective film of inorganic material, it is not necessary to sputter all parts, so the working time is shortened.
（２）基板上の段差部にかかわらず、安ポした保護膜が
得られる。(2) A secure protective film can be obtained regardless of the level difference on the substrate.
本発明は、上部保護膜に関するものであるが、下部磁性
膜を基板上に設けた溝の中に形成する構造においては、
下部保護膜にも適用できるため、実用上有益な発明であ
る。The present invention relates to an upper protective film, but in a structure in which a lower magnetic film is formed in a groove provided on a substrate,
This invention is useful in practice because it can also be applied to the lower protective film.
第１図は本発明の薄膜磁気ヘッドの購ａを示す断面図、
第２図は従来法による薄膜磁気ヘッドの構造を示す断面
図である。
１・・・基板 ２・・・磁性膜 ５・・・コイル ４・
・・絶縁膜 ５・・・有機性１１脂からなる絶縁膜 ６
・・・保護膜７・・・ガラスからなる保護膜 ８・・・
下部保画膜９・・・下部磁性膜 ＩＯ・・・上部磁性膜
。
以 上FIG. 1 is a sectional view showing the thin film magnetic head of the present invention;
FIG. 2 is a sectional view showing the structure of a conventional thin film magnetic head. 1... Substrate 2... Magnetic film 5... Coil 4.
...Insulating film 5...Insulating film made of organic 11 fat 6
...Protective film 7...Protective film made of glass 8...
Lower image retention film 9...lower magnetic film IO...upper magnetic film. that's all
Claims (1)
料を用い、上記磁性膜を上記コイルと絶縁膜とを介して
対向し端部で相互に結合した上部磁性膜と下部磁性膜と
によつて構成する薄膜磁気ヘッドの上部保護膜の形成に
おいて、無機材料からなる保護膜をスパッタリングで形
成したのち、上記保護膜上に、ガラスを流し込む工程を
有することを特徴とする薄膜磁気ヘッドの製造方法。An organic material is used as an insulating film between the coils and between the coil and the magnetic film, and the magnetic film is formed by an upper magnetic film and a lower magnetic film that face each other with the coil and the insulating film in between and are coupled to each other at their ends. A method for manufacturing a thin-film magnetic head comprising the step of forming an upper protective film of the thin-film magnetic head by forming a protective film made of an inorganic material by sputtering, and then pouring glass onto the protective film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22508085A JPS6284416A (en) | 1985-10-09 | 1985-10-09 | Production of magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22508085A JPS6284416A (en) | 1985-10-09 | 1985-10-09 | Production of magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6284416A true JPS6284416A (en) | 1987-04-17 |
Family
ID=16823698
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22508085A Pending JPS6284416A (en) | 1985-10-09 | 1985-10-09 | Production of magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6284416A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0616317A2 (en) * | 1993-03-16 | 1994-09-21 | Sharp Kabushiki Kaisha | Thin film magnetic head and method of manufacturing the same |
-
1985
- 1985-10-09 JP JP22508085A patent/JPS6284416A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0616317A2 (en) * | 1993-03-16 | 1994-09-21 | Sharp Kabushiki Kaisha | Thin film magnetic head and method of manufacturing the same |
| EP0616317A3 (en) * | 1993-03-16 | 1995-06-14 | Sharp Kk | Thin film magnetic head and method of manufacturing the same. |
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