JPS6284415A - Thin film magnetic head - Google Patents

Thin film magnetic head

Info

Publication number
JPS6284415A
JPS6284415A JP22507985A JP22507985A JPS6284415A JP S6284415 A JPS6284415 A JP S6284415A JP 22507985 A JP22507985 A JP 22507985A JP 22507985 A JP22507985 A JP 22507985A JP S6284415 A JPS6284415 A JP S6284415A
Authority
JP
Japan
Prior art keywords
nonmagnetic
layer
magnetic
insulating layer
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22507985A
Other languages
Japanese (ja)
Inventor
Mitsutaka Nishikawa
西川 光貴
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP22507985A priority Critical patent/JPS6284415A/en
Publication of JPS6284415A publication Critical patent/JPS6284415A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/313Disposition of layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/312Details for reducing flux leakage between the electrical coil layers and the magnetic cores or poles or between the magnetic cores or poles
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To permit easy gap depth working by embedding a low magnetic layer, nonmagnetic conductive layer and further nonmagnetic insulating layer into a recess of a nonmagnetic substrate which is preliminarily grooved and providing an upper magnetic layer in a position approximately equal to the horizontal plane of the substrate. CONSTITUTION:The hollow groove is formed to the nonmagnetic substrate 11 by a dicing machine and the non-conductive nonmagnetic film 12 is formed thereon if the nonmagnetic substrate has electrical conductivity. The lower magnetic layer 13 is then formed in the bottom of the recess. The insulating layer 15 is formed thereon by photolithography and a conductive coil 16 and insulating layer 17 are formed thereon. The insulating layer 17 is formed in the position approximately equal to the top surface of the recess. A nonmagnetic inorg. material 14 such as SiO2 or Al2O3 is further stuck thereto to obtain a gap length and the upper magnetic layer 18 is formed. A bar arrayed with 24 pieces of the thin film heads like a 3-inch bar is subjected to gap depth working at one time. The inner gap of the upper and lower magnetic poles is thereby increased and the magnetic leakage is decreased. The head efficiency is thus improved.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は薄膜磁気ヘッドに係り、さらに詳しくは基板上
に磁性膜や導電膜、非磁性絶縁膜を形成し、磁気回路パ
ターン上に保護膜を付着せしめた構造の薄膜磁気ヘッド
に関するものである。
[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a thin film magnetic head, and more specifically, a magnetic film, a conductive film, and a nonmagnetic insulating film are formed on a substrate, and a protective film is formed on a magnetic circuit pattern. The present invention relates to a thin film magnetic head having a structure in which .

〔発明の概要〕[Summary of the invention]

本発明は、軟磁性材料からなる上部および下部磁性層間
に導体材料からなるコイルをはさんで成る磁気ヘッドに
おいて、下部磁性層及び導体層さらに非磁性絶縁層があ
らかじめ溝加工を施された非磁性基板の凹部に埋め込み
、上部磁性層は〜、基板水平面と略同等位置に構成した
薄膜磁気ヘッドでギャップデプス加工を容易にし、また
トラック巾寸法のバラツキも極小におさえることが可能
となる効果がある。
The present invention provides a magnetic head in which a coil made of a conductive material is sandwiched between upper and lower magnetic layers made of a soft magnetic material. The thin-film magnetic head is embedded in the concave part of the substrate and the upper magnetic layer is positioned approximately at the same position as the horizontal surface of the substrate, which facilitates gap depth processing and has the effect of minimizing variations in track width dimensions. .

〔従来の技術〕[Conventional technology]

従来の薄膜磁気ヘッドの断面図を第2図に示す。 FIG. 2 shows a cross-sectional view of a conventional thin film magnetic head.

非磁性基板21上に、必要に応じて非磁性絶縁層22が
形成されその上に下部磁性層25を設ける。
A nonmagnetic insulating layer 22 is formed on the nonmagnetic substrate 21 as required, and a lower magnetic layer 25 is provided thereon.

その上に、ギャップ長となる非磁性絶縁層24を積層す
る。さらに非磁性絶縁層25を形成する。
A nonmagnetic insulating layer 24 serving as the gap length is laminated thereon. Furthermore, a nonmagnetic insulating layer 25 is formed.

この非磁性絶縁層は多くは、フォトレジストを71−ド
ベークして用いる。その上に、導体となるコイル26t
−形成し、さらに非磁性絶縁層27を積層する。さらに
、その上に上部磁性層28を形成する。その時、上部磁
性層は下部磁性層と・・ツクギャップ部に於いて接合さ
れる。したがって、上部磁性層と下部磁性層との段差は
、コイル一層としても約十数ミタロン以上の段差となる
This nonmagnetic insulating layer is often made of a 71-debaked photoresist. On top of that, a coil 26t that becomes a conductor
- form and further laminate the nonmagnetic insulating layer 27. Further, an upper magnetic layer 28 is formed thereon. At that time, the upper magnetic layer is joined to the lower magnetic layer at the gap. Therefore, the height difference between the upper magnetic layer and the lower magnetic layer is about 10-odd micrometers or more even if the coil is a single layer.

また、その上部磁性層の上に保護膜としてS10゜とか
M@O@  の保護層29t−形成するのが一般的であ
る。
Further, it is common to form a protective layer 29t of S10° or M@O@ as a protective film on the upper magnetic layer.

〔発明が解決しようとする問題点及び目的〕一般に薄膜
磁気ヘッドは、非磁性フェライトあるいはセラミック基
板の平面状に下部ポール層、絶縁層、コイル、上部ポー
ル層、保護膜層が形成されている。すなわち、基板上に
、各層が積層された構造となっている。そのために、各
層の成形は上部になるにしたがって段差が生じ、マスク
アライメントの精度が悪くなる欠点を有している。
[Problems and Objects to be Solved by the Invention] Generally, a thin film magnetic head has a lower pole layer, an insulating layer, a coil, an upper pole layer, and a protective film layer formed on a flat surface of a nonmagnetic ferrite or ceramic substrate. That is, it has a structure in which each layer is laminated on a substrate. For this reason, the molding of each layer has a disadvantage in that steps increase toward the top, resulting in poor mask alignment accuracy.

また、特に、トラック巾は、段差が高くなるにつれ、ト
ラック巾公差に入れるのは困難となる。非磁性絶縁層2
5によってギャップデプス0の位置が決定されるが、そ
の絶縁層に有機物を用いた場合はハートベーク条件を厳
密におこなってもフォトレジストの流れがばらつきギャ
ップデプスの寸法公差通シに加工するのは非常に困難さ
を要する。
In addition, in particular, as the level difference becomes higher, it becomes difficult to fit the track width into the track width tolerance. Nonmagnetic insulating layer 2
5 determines the position of gap depth 0, but if an organic material is used for the insulating layer, the flow of the photoresist will vary even if the heartbake conditions are strictly applied. It requires great difficulty.

また、非磁性絶縁層を無機物で生成する方法もあるが、
段差上の平・坦化が技術的に難しく、またコストも高く
なる欠点を有する。
There is also a method of creating a non-magnetic insulating layer using an inorganic material.
It has the drawback that it is technically difficult to planarize and planarize the difference in level, and the cost is also high.

また、特開昭58−25516の従来例第1図に示され
ている如く、凹部に下部磁性層を形成した例もあるが、
それらのコイル、及び上部絶縁層は凹部よりも上部に形
成されるため上記の如く、ギャップデプスを寸法公差通
りに加工するのは難しい。
There are also examples in which a lower magnetic layer is formed in the recessed portions, as shown in FIG. 1 of the conventional example of JP-A-58-25516.
Since these coils and the upper insulating layer are formed above the recess, it is difficult to process the gap depth to meet the dimensional tolerances, as described above.

さらに詳しくは、薄膜磁気ヘッドはギャップデプス加工
をバーで多数個を一度に加工するため、それぞれ非磁性
絶縁膜で規制されるギャップデプス0の位置がばらつい
ていると、その加工で歩留)は非常に低下する。
More specifically, since the gap depth of thin-film magnetic heads is processed in large numbers at once using a bar, if the position of the gap depth 0, which is regulated by a non-magnetic insulating film, varies, the yield rate of the processing will be reduced. very low.

したがって、本発明は、かかる問題点を解決するもので
トラック巾を容易に決定出来しかもギャップデプス加工
を容易にした薄膜磁気ヘッドを提供するものである。
Therefore, the present invention solves these problems and provides a thin film magnetic head in which the track width can be easily determined and the gap depth can be easily processed.

〔間憩点を解決するための手段〕[Means for resolving intermittent points]

本発明は、軟磁性材料からなる上部および下部ポール間
に導体材料からなるコイルをはさんで収る磁気ヘッドに
おいて、下部磁性層及び非磁性導体!−さらに非磁性絶
縁層があらかじめ溝加工を施された非磁性基板の凹部に
埋め込まれ、上部磁性層は基板水平面と略同等位置にあ
る構造をもつ薄膜磁気ヘッドである。
The present invention provides a magnetic head in which a coil made of a conductive material is sandwiched between upper and lower poles made of a soft magnetic material, including a lower magnetic layer and a non-magnetic conductor. - Furthermore, it is a thin film magnetic head having a structure in which a nonmagnetic insulating layer is embedded in a recessed part of a nonmagnetic substrate that has been grooved in advance, and the upper magnetic layer is located at approximately the same position as the horizontal surface of the substrate.

〔実施例〕〔Example〕

本発明の構成断面図を第1図に示す。まず、非磁性基板
IIに凹部の溝をダイシングマシンで入れ込む。その寸
法はヨーク長との関係によって決められるものである。
A cross-sectional view of the structure of the present invention is shown in FIG. First, a concave groove is cut into the nonmagnetic substrate II using a dicing machine. Its dimensions are determined by its relationship with the yoke length.

但し、非磁性基板が電気導電性の場合は非導電非磁性膜
12を形成する必要がある。その方法としては、非導電
非磁性膜をあらかじめ凹部の深さよシも厚く形成し、し
かる後にダイシングマシンで溝加工をほどこしても良い
However, if the nonmagnetic substrate is electrically conductive, it is necessary to form the nonconductive nonmagnetic film 12. As a method, a non-conductive non-magnetic film may be formed in advance to be as thick as the depth of the recess, and then grooves may be formed using a dicing machine.

次に、下部磁性層15を凹部の底部に周知の方法、っオ
リフォトリソグラフィーを使用して形成する。
Next, a lower magnetic layer 15 is formed at the bottom of the recess using a well-known method, ori-photolithography.

さらに絶縁層15を形成する。本発明者らは、フォトレ
ジストを用いた。ノヘードペーク条件としては240℃
×60分を採用した。次に導電コイル16を形成しさら
に絶縁層17f、形成する。以上は全て周知の方法で形
成可能であり、それらは全て凹部に埋め込まれている。
Furthermore, an insulating layer 15 is formed. The inventors used photoresist. 240℃ for nohede pake conditions
*60 minutes was adopted. Next, a conductive coil 16 is formed, and an insulating layer 17f is further formed. All of the above can be formed by known methods, and all of them are embedded in the recess.

特に絶縁層17は凹部の上面と略同等の位置にする必要
がある。さらに、ギャップ長を作製するためS10.も
しくはM、01等の非磁性無機物14を付着させる。次
に上部磁性層18を作製する。これも周知の方法で簡単
に作製可能である。この時、トランク巾は全て公差内に
おさまっていた。本発明の薄膜磁気ヘッドは全て公差通
りの20±1μになったが、従来の単純な積層の薄膜磁
気ヘッドでは20±5μとなり、歩留りは非常に低くな
る。
In particular, the insulating layer 17 needs to be located at approximately the same position as the upper surface of the recess. Furthermore, in order to create a gap length, S10. Alternatively, a non-magnetic inorganic substance 14 such as M, 01, etc. is attached. Next, the upper magnetic layer 18 is produced. This can also be easily produced by a well-known method. At this time, all trunk widths were within tolerance. All of the thin film magnetic heads of the present invention have a tolerance of 20±1 μm, but a conventional simple laminated thin film magnetic head has a thickness of 20±5 μm, which results in a very low yield.

次にギヤツブデプス刀ロエであるが、5インチの棒状に
薄膜ヘッドが24ケ並んでいるバーを一度にギャップデ
プス加工を施したところ、ギャップデプスは全て公差で
ある2±1μに収まった。従来例ではs±4μ程度であ
った。これは、ギャップデプスの公差から大巾に外れ、
約60%の不良となる。
Next, regarding the gear depth sword Roe, when we performed gap depth processing on a 5-inch bar with 24 thin film heads lined up at once, the gap depths were all within the tolerance of 2±1μ. In the conventional example, it was about s±4μ. This greatly deviates from the gap depth tolerance,
Approximately 60% of the products are defective.

なお、この後、磁性層等を保護する目的で、保護層19
を形成するのが好ましい。
Note that after this, in order to protect the magnetic layer etc., a protective layer 19 is formed.
It is preferable to form

なお、本発明の実施例は、磁性1@、絶縁層、コイルと
も凹部に形成したがコイルの一部が凹部以外に形成され
ても良い。
In the embodiment of the present invention, the magnetic layer 1@, the insulating layer, and the coil are all formed in the recessed portion, but a portion of the coil may be formed outside the recessed portion.

〔発明の効果〕〔Effect of the invention〕

本発明の構af:有する薄膜磁気ヘッドによれば下記の
様な効果がある。
The thin film magnetic head having the structure af of the present invention has the following effects.

fl+  ギャップデプス加工を容易にする薄膜磁気ヘ
ッドの構造を有する (2)トラック巾を決定する位[杖が平面状にあるため
トランク巾公差を小さく出来る。
fl+ It has a thin-film magnetic head structure that facilitates gap depth processing. (2) To determine the track width, the trunk width tolerance can be reduced because the rod is flat.

(3)  凹部を深くとることによシ、上部及び下部磁
極のインナーギャップが大きくなり磁気漏れが少なくな
りヘッド効率も高くなる。
(3) By making the recess deep, the inner gap between the upper and lower magnetic poles becomes larger, magnetic leakage decreases, and head efficiency increases.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明による薄膜磁気ヘッドの断面図。 第2図は従来例による薄膜磁気ヘッドの断面図である。 tt、2t・・・非磁性基板 12.22・・・非導電非磁性層 15.25・・・下部磁性層 14.24・・・ギャップ長形成層(非磁性絶縁層)+
5.17.25.27・・・非磁性絶縁層16.26・
・・導゛遊コイル 18.28・・・上部磁性層 19.29・・・保護層 G、D・・・・・・・・・ギヤツブデプス以   上
FIG. 1 is a sectional view of a thin film magnetic head according to the present invention. FIG. 2 is a sectional view of a conventional thin film magnetic head. tt, 2t... Non-magnetic substrate 12.22... Non-conductive non-magnetic layer 15.25... Lower magnetic layer 14.24... Gap length forming layer (non-magnetic insulating layer) +
5.17.25.27...Nonmagnetic insulating layer 16.26.
...Left coil 18.28...Top magnetic layer 19.29...Protective layer G, D...Gear tube depth or more

Claims (1)

【特許請求の範囲】[Claims] 軟磁性体材料からなる上部および下部ポール間に導体材
料からなるコイルをはさんで成る磁気ヘッドにおいて、
下部磁性層及び非磁性導体層さらに非磁性絶縁層が、あ
らかじめ溝加工を施された非磁性基板の凹部に埋め込ま
れ、上部磁性層は基板水平面と略同等位置にある薄膜磁
気ヘッド。
In a magnetic head consisting of a coil made of a conductive material sandwiched between upper and lower poles made of a soft magnetic material,
A thin-film magnetic head in which a lower magnetic layer, a non-magnetic conductor layer, and a non-magnetic insulating layer are embedded in a grooved recess of a non-magnetic substrate, and the upper magnetic layer is located at approximately the same position as the horizontal surface of the substrate.
JP22507985A 1985-10-09 1985-10-09 Thin film magnetic head Pending JPS6284415A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22507985A JPS6284415A (en) 1985-10-09 1985-10-09 Thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22507985A JPS6284415A (en) 1985-10-09 1985-10-09 Thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS6284415A true JPS6284415A (en) 1987-04-17

Family

ID=16823685

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22507985A Pending JPS6284415A (en) 1985-10-09 1985-10-09 Thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS6284415A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH027213A (en) * 1988-06-27 1990-01-11 Matsushita Electric Ind Co Ltd Thin film magnetic head
EP0752700A2 (en) * 1995-07-05 1997-01-08 Sony Corporation Complex type thin film magnetic head and production method thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH027213A (en) * 1988-06-27 1990-01-11 Matsushita Electric Ind Co Ltd Thin film magnetic head
EP0752700A2 (en) * 1995-07-05 1997-01-08 Sony Corporation Complex type thin film magnetic head and production method thereof
EP0752700A3 (en) * 1995-07-05 1998-01-14 Sony Corporation Complex type thin film magnetic head and production method thereof

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