JPS628404A - Insulating paste - Google Patents

Insulating paste

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Publication number
JPS628404A
JPS628404A JP14602885A JP14602885A JPS628404A JP S628404 A JPS628404 A JP S628404A JP 14602885 A JP14602885 A JP 14602885A JP 14602885 A JP14602885 A JP 14602885A JP S628404 A JPS628404 A JP S628404A
Authority
JP
Japan
Prior art keywords
weight
oxide
paste
insulating
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14602885A
Other languages
Japanese (ja)
Other versions
JPH056281B2 (en
Inventor
栄一 浅田
哲也 田中
浜田 一利
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shoei Chemical Inc
Original Assignee
Shoei Chemical Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shoei Chemical Inc filed Critical Shoei Chemical Inc
Priority to JP14602885A priority Critical patent/JPS628404A/en
Publication of JPS628404A publication Critical patent/JPS628404A/en
Publication of JPH056281B2 publication Critical patent/JPH056281B2/ja
Granted legal-status Critical Current

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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、非酸化性雰囲気中において比較的低温で焼成
し得る絶縁層形成用厚膜ガラスペースト、特に卑金属導
体を用いた厚膜多層回路の絶縁層を製造するのに有用な
絶縁性ガラスペーストに関する。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a thick film glass paste for forming an insulating layer which can be fired at a relatively low temperature in a non-oxidizing atmosphere, particularly for the insulation of thick film multilayer circuits using base metal conductors. Insulating glass paste useful for manufacturing layers.

従来の技術 多層回路を製造する一つの方法に、焼成されたセラミッ
ク基板上に第一導体層として厚膜導体ペーストを印刷、
焼成し、次いで上下の導体を分離、絶縁するために絶縁
ペーストを印刷、焼成し、そ   □の上に第二の導体
層を形成する工程を順次繰返すことにより、厚膜方式で
導体層と絶縁層を交互に積層していく方法がある。この
ような厚膜多層回路に使用される絶縁ペーストとしては
、膜構造を強化するために酸化物フィラーを含有するガ
ラスペースト、又は部分結晶性のガラスペーストを用い
るのが一般的である。
Prior Art One method of manufacturing multilayer circuits involves printing a thick film conductor paste as the first conductor layer on a fired ceramic substrate.
By sequentially repeating the process of printing and baking an insulating paste to separate and insulate the upper and lower conductors, and then forming a second conductor layer on top of it, the conductor layer and insulation can be created using a thick film method. There is a method of stacking layers alternately. The insulating paste used in such thick film multilayer circuits is generally a glass paste containing an oxide filler or a partially crystalline glass paste in order to strengthen the film structure.

近年エレクトロニクス業界において、高信頼性の卑金属
システムを採用することが強く要望されている。厚膜導
体についてもAg/Pd SAu 1Ag/Ptなどの
負金属系からCO,N+などの卑金属系への移行の検討
がなされているが、これに伴ってこれら卑金属導体と適
合し、N2など卑金属を酸化させないような雰囲気中で
焼成できる絶縁ペーストも開発されている。
In recent years, there has been a strong desire in the electronics industry to employ highly reliable base metal systems. Regarding thick film conductors, consideration is being given to transitioning from negative metal systems such as Ag/Pd SAu 1Ag/Pt to base metal systems such as CO and N+. Insulating pastes that can be fired in an atmosphere that does not oxidize have also been developed.

N2中で焼成できる絶縁ペーストは、例えば次のような
ものが知られている。特開昭47−9633号公報は、
pb○を含まない部分結晶性ガラスが開示されており、
特公昭59−3419号公報にはやはりPbOを含まな
い硼珪酸ガラスとアルミニウム酸化物を主成分とし、銅
導体と適合する厚膜多層用絶縁ペーストが記載されてい
る。特公昭59−14203号公報にはガラスと結晶性
多成分酸化物又はその前駆体とからなる誘電体組成物が
、特開昭55−130009号公報には珪酸亜鉛とアル
カリ土類珪酸塩とからなるガラス質相と酸化亜鉛含有セ
ラミック相を主成分とするペーストが、特公昭59−2
7119号公報には部分失透性硼珪酸バリウムマグネシ
ウムガラスとピンホール減少用成分とからなる絶縁ペー
ストがそれぞれ開示されている。更に特開昭55−38
882号公報には活性成分としての酸化アルミニウムと
、ガラス、及び酸化剤として焼成中低原子価に還元され
得る金属酸化物、例えばCe酸化物、pr 60++ 
、pr 02 、希土類酸化物などから構成される絶縁
ペーストが示されている。これらの絶縁ペーストはいず
れも800℃〜1000℃程度の比較的高温で焼成する
必要がある。
For example, the following insulating pastes that can be fired in N2 are known. Japanese Patent Application Laid-Open No. 47-9633 is
A partially crystalline glass that does not contain pb○ is disclosed,
Japanese Patent Publication No. 59-3419 also describes an insulating paste for thick film multilayers which is composed mainly of borosilicate glass and aluminum oxide, which do not contain PbO, and which is compatible with copper conductors. Japanese Patent Publication No. 59-14203 discloses a dielectric composition composed of glass and a crystalline multi-component oxide or its precursor, and JP-A-55-130009 discloses a dielectric composition composed of zinc silicate and an alkaline earth silicate. A paste whose main components are a glassy phase and a ceramic phase containing zinc oxide was published in Japanese Patent Publication No. 59-2.
Publication No. 7119 discloses an insulating paste comprising partially devitrified barium magnesium borosilicate glass and a pinhole reducing component. Furthermore, JP-A-55-38
No. 882 discloses aluminum oxide as an active ingredient, glass, and as an oxidizing agent a metal oxide that can be reduced to a low valence during calcination, such as Ce oxide, pr 60++.
, pr 02 , rare earth oxides, and the like. All of these insulating pastes need to be fired at a relatively high temperature of about 800°C to 1000°C.

ところで卑金属系厚膜多層回路は、導体層と絶縁層のみ
で構成される場合と、厚膜抵抗体や厚膜コンデンサを組
込んで多層化する場合があるが、後者において、特に抵
抗材料にN2中焼成が可能でかつ実用上満足いくような
優れた特性を有するものがないため、空気中焼成タイプ
で従来量も一般的に使用されている酸化ルテニウム系抵
抗ペーストが代用される。しかしこの抵抗体は、非酸化
性雰囲気中で700℃以上の高温で再焼成を行うと還元
されて電気特性が変化するので、抵抗体を焼付形成した
後に導体ペーストや絶縁ペーストをN2中においてKF
Mで焼付けして多層化を行うのが極めて困難であった。
By the way, base metal thick film multilayer circuits may be composed of only conductor layers and insulating layers, or may be multilayered by incorporating thick film resistors and thick film capacitors, but in the latter case, N2 Since there is no material that can be baked in the air and has excellent properties that are practically satisfactory, a ruthenium oxide-based resistance paste, which is of the air-fired type and is commonly used in conventional quantities, is used instead. However, if this resistor is refired at a high temperature of 700°C or higher in a non-oxidizing atmosphere, it will be reduced and its electrical characteristics will change.
It was extremely difficult to create multiple layers by baking with M.

抵抗体にダメージを与えない程度の低温で前述の絶縁ペ
ーストを焼付けすると、絶縁性が不充分であったり、接
着強度が劣るなど全く実用に耐えない。
If the above-mentioned insulating paste is baked at a low temperature that does not damage the resistor, the insulation will be insufficient and the adhesive strength will be poor, making it completely unusable.

特開昭58−2093号公報には、活性成分としてのセ
ラミック充填材と、PbO−3i02−AI203ガラ
ス及び酸化度2以上の酸化鉛を主成分とし、非酸化性雰
囲気中600℃以下の温度で焼成される絶縁ペーストが
開示されている。しかしここに示されたガラスペースト
をアルミナ基板上に焼付けると、絶縁性が充分でなく、
又耐水性にも劣る欠点がある。
JP-A No. 58-2093 discloses that the main ingredients are a ceramic filler as an active ingredient, PbO-3i02-AI203 glass, and lead oxide with an oxidation degree of 2 or more, and a temperature of 600°C or less in a non-oxidizing atmosphere. An insulating paste that is fired is disclosed. However, when the glass paste shown here is baked onto an alumina substrate, the insulation is insufficient.
It also has the disadvantage of poor water resistance.

又CdO高含有ガラスを使用した低温焼成タイプのガラ
スペーストも知られているが、空孔が多く、又絶縁抵抗
、耐湿性、耐水性ともに十分でなく、現在まで実用上満
足できる性能を有するN2中低温焼成用絶縁ペーストは
得られていない。
In addition, a low-temperature firing type glass paste using CdO-rich glass is known, but it has many pores and has insufficient insulation resistance, moisture resistance, and water resistance. Insulating paste for medium and low temperature firing has not been obtained.

発明が解決しようとする問題点 本発明の目的は、N2などの非酸化性雰囲気中において
、低温、例えば650℃以下の温度で焼成でき、従って
酸化ルテニウム抵抗の特性に影響を与えないですみ、し
かも絶縁性、機械的強度などの電気的・物理的特性の優
れた絶縁ペーストを得ることにある。
Problems to be Solved by the Invention It is an object of the present invention to be able to sinter in a non-oxidizing atmosphere such as N2 at a low temperature, for example, at a temperature of 650° C. or lower, and therefore not to affect the characteristics of the ruthenium oxide resistor. Moreover, the objective is to obtain an insulating paste with excellent electrical and physical properties such as insulation and mechanical strength.

問題点を解決するための手段 本発明者等はガラスの組成を検討することによって従来
の問題を解決し、650℃以下の低温で焼成しても優れ
た特性を有する絶縁層を形成し得るガラスペーストの開
発に成功した。
Means for Solving the Problems The present inventors solved the conventional problems by examining the composition of glass, and developed a glass that can form an insulating layer with excellent properties even when fired at a low temperature of 650°C or lower. Successfully developed a paste.

即ち本発明は、A0重量基準で Si  02    27〜36% Al2O31〜  3% 82 03     5〜15% Pb o     45〜52% Ca F2    1〜 3% Zn0      1〜 3% かうなるガラス粉末35〜90重量%と、B、酸化物フ
ィラー10〜35重量%と、C0酸化剤0゛〜30重量
%とを有機ビヒクル中に分散させてなる絶縁ペーストで
ある。
That is, in the present invention, based on the weight of A0, Si 02 27-36% Al2O3 1-3% 82 03 5-15% Pbo 45-52% Ca F2 1-3% Zn0 1-3% 35-90% by weight %, B, 10 to 35% by weight of an oxide filler, and 0 to 30% by weight of a CO oxidizing agent are dispersed in an organic vehicle.

作」し 本発明の絶縁ペーストは、ガラス成分として軟化点の低
いPbOを多く含む硼珪酸鉛アルミニウムガラスを用い
、比較的多量にst 02を配合することにより流動性
の制御を行って、焼成時の急激な粘度低下による導体層
からの導電成分の移動とそれによる絶縁不良を阻止し、
かつ5102を多量に含有することに起因する軟化点の
上昇及び耐水性の低下をCaFz及びZnOを配合する
ことにより防止したことが特徴である。
The insulating paste of the present invention uses lead aluminum borosilicate glass containing a large amount of PbO, which has a low softening point, as a glass component, and controls fluidity by blending a relatively large amount of ST02. This prevents the migration of conductive components from the conductor layer due to the sudden drop in viscosity and the resulting insulation failure.
It is also characterized in that the increase in softening point and the decrease in water resistance caused by containing a large amount of 5102 are prevented by incorporating CaFz and ZnO.

ガラスの構成成分中、Si 02は27重層%未満では
軟化点が下がりすぎ、適切な粘度特性が得られない。3
6重量%を越えると軟化温度が高くなりすぎ、低温焼成
では高い膜強度が得られなくなる。
Among the constituent components of the glass, if Si 02 is less than 27%, the softening point is too low and appropriate viscosity characteristics cannot be obtained. 3
If it exceeds 6% by weight, the softening temperature becomes too high and high film strength cannot be obtained by low-temperature firing.

Al2O3は失透防止及び耐候性の向上の目的で使用す
る。1重量%未満ではこの効果が現われず、3重量%を
越えると融点が高くなって好ましくない。
Al2O3 is used for the purpose of preventing devitrification and improving weather resistance. If it is less than 1% by weight, this effect will not be exhibited, and if it exceeds 3% by weight, the melting point will become high, which is not preferable.

B2O3は5重量%より少ないと軟化点が高くなりすぎ
、15重量%より多いと軟化点が低すぎる。
If B2O3 is less than 5% by weight, the softening point will be too high, and if it is more than 15% by weight, the softening point will be too low.

CaF2は融剤として軟化点上昇を抑える目的で用いら
れる。1重団%未満では効果がなく、3重量%より多い
と失透するので好ましくない。
CaF2 is used as a flux for the purpose of suppressing the rise in softening point. If it is less than 1% by weight, there is no effect, and if it is more than 3% by weight, devitrification occurs, which is not preferable.

ZnOは化学的耐久性、特に耐水性向上の目的で配合す
る。配合量が1重量%より少ないとこの効果が弱く、3
重量%を越えると失透し易いので好ましくない。
ZnO is blended for the purpose of improving chemical durability, especially water resistance. If the blending amount is less than 1% by weight, this effect will be weak;
Exceeding this percentage by weight is not preferred because it tends to devitrify.

ガラス粉末はペーストの全無機質成分中35〜905〜
90重量る。
Glass powder accounts for 35 to 905 of the total inorganic components of the paste.
It weighs 90.

酸化物フィラーは、焼成膜の流動性の制御及び有機ビヒ
クルの燃焼残渣であるカーボンを焼成中に膜からスムー
ズに除去するために、ペーストの全無機質成分中10〜
35重ω%の範囲で配合する。10重重最未満では膜が
ガラス質になって再焼成時に流動し易いため、パターン
が拡がったり、電極成分と相互作用して電極のカーリン
グや半田付は性不良を起こしたり、絶縁層の絶縁不良な
どのトラブルを生じ、又脱カーボンも不充分となる。
The oxide filler accounts for 10 to 10% of the total inorganic components of the paste in order to control the fluidity of the fired film and to smoothly remove carbon, which is a combustion residue of the organic vehicle, from the film during firing.
It is blended within the range of 35 wt ω%. If the weight is less than 10 weight, the film becomes glassy and easily flows during re-firing, which may cause the pattern to spread, interact with the electrode components, cause curling of the electrode, poor soldering properties, and poor insulation of the insulating layer. Problems such as these may occur, and decarbonization may also become insufficient.

35重量%を越えると膜強度が弱く、脆くなるので好ま
しくない。酸化物としては例えば酸化アルミニウム、酸
化マグネシウム、酸化ランタン、酸化チタンなどこの種
の絶縁ペーストに一般的に用いられているものが使用で
きる。
If it exceeds 35% by weight, the film strength will be weak and it will become brittle, which is not preferable. As the oxide, those commonly used in this type of insulation paste, such as aluminum oxide, magnesium oxide, lanthanum oxide, and titanium oxide, can be used.

酸化剤は非酸化性雰囲気中で焼成する際、有機ビヒクル
の完全燃焼を促進し、カーボン残渣を残さないために配
合されるもので、たとえば従来公知のPb 02 、P
I)s 04 、Ce 02 、pr 02、pr 6
on、TaO2、Co 304、Nd 203、S「0
2などがあげられる。とくにPb0zの効果が大きい。
The oxidizing agent is blended to promote complete combustion of the organic vehicle and leave no carbon residue during firing in a non-oxidizing atmosphere. For example, conventionally known Pb 02 and P
I) s 04 , Ce 02 , pr 02, pr 6
on, TaO2, Co 304, Nd 203, S'0
2 etc. can be mentioned. The effect of Pb0z is particularly large.

配合割合は全無機質成分中0〜30重量%で、ガラスの
組成や焼成条件によっては全く配合しなくてもよいが、
通常5重量%以上用いることが望ましい。
The blending ratio is 0 to 30% by weight of the total inorganic components, and depending on the composition of the glass and firing conditions, it may not be blended at all.
It is usually desirable to use 5% by weight or more.

無機成分の配合比は、好ましくはガラス粉末55〜70
重量%、酸化物フィラー15〜30重量%と、酸化剤1
0〜25重量%である。
The blending ratio of the inorganic components is preferably glass powder 55-70.
% by weight, 15-30% by weight of oxide filler and 1% of oxidizing agent.
It is 0 to 25% by weight.

尚、各成分とも径10A1以下の微細粉末を用いること
が望ましい。
Note that it is desirable to use fine powder with a diameter of 10 A1 or less for each component.

有機ビヒクルは通常の厚膜ペーストに使用されるもので
あればいかなるものでもよく、樹脂、溶剤、可塑剤、そ
の他の添加剤を適宜選択して用いる。樹脂分としては特
にエチルセルロース、エチルヒト0キシエチルセルロー
ス、ニトロセルロース、メタクリレート樹脂、ブチラー
ル樹脂など、低酸素分圧の雰囲気中において比較的低温
で完全燃焼しやすいものを用いるのがよい。
Any organic vehicle may be used as long as it is used in ordinary thick film pastes, and resins, solvents, plasticizers, and other additives may be appropriately selected and used. As the resin component, it is particularly preferable to use a resin that can be easily completely combusted at a relatively low temperature in an atmosphere of low oxygen partial pressure, such as ethyl cellulose, ethyl oxyethyl cellulose, nitrocellulose, methacrylate resin, and butyral resin.

f1 次に実施例をあげて本発明を具体的に説明する。f1 Next, the present invention will be specifically explained with reference to Examples.

尚実施例中%及び部はすべて重量基準である。In the examples, all percentages and parts are based on weight.

実施例1〜5 ガラス原料粉末を表1の組成になるよう秤m、混合して
ルツボに入れ、電気炉中1300〜1450℃で188
間加熱溶融した。溶融物を水中に投入して急冷、粉砕し
、平均粒径3肩のガラス粉末を製造した。
Examples 1 to 5 Glass raw material powders were weighed and mixed to have the composition shown in Table 1, placed in a crucible, and heated at 188 °C at 1300 to 1450 °C in an electric furnace.
It was melted by heating for a while. The melt was poured into water, rapidly cooled, and pulverized to produce a glass powder with an average particle size of 3.

次にこの粉末と平均粒径0.54のAl2O3粉−末及
びPbO2粉末とを表1に示した割合で混合し、有機ビ
ヒクルとしてエチルセル0−スの20%ブチルカルピト
ール溶液をガラス、Al2O3、PbO2の合計100
部に対して10部加え、更に粘度調整のためブチルカル
ピトールとジブチルフタレートを適当量添加して混練し
、それぞれ絶縁ペーストを製造した。
Next, this powder, Al2O3 powder and PbO2 powder with an average particle size of 0.54 were mixed in the proportions shown in Table 1, and a 20% butyl calpitol solution of ethyl cellulose was added to glass, Al2O3, Total of PbO2 100
and further added appropriate amounts of butyl calpitol and dibutyl phthalate to adjust the viscosity and kneaded them to produce insulating pastes.

1インチx1インチの96%アルミナ基板上に、下部導
体として銅ペーストを幅0.5n間隔、2mm(5本)
の櫛状パターンにスクリーン中欄し、N2雰囲気中60
0℃で焼成した。この上に上記絶縁ペーストを印刷し、
150℃で乾燥後、N2中最高温度600℃で焼成を行
って膜厚404の絶縁層を形成した。次いでその上に銅
ペーストを下部電極パターンと直交するように同様な櫛
状パターンに印刷し、下部電極と同様に焼成してテスト
サンプルを作成した。
Copper paste is placed as a lower conductor on a 1 inch x 1 inch 96% alumina board with a width of 0.5n at intervals of 2 mm (5 pieces).
The screen was placed in a comb-like pattern, and the
It was fired at 0°C. Print the above insulating paste on top of this,
After drying at 150° C., baking was performed in N2 at a maximum temperature of 600° C. to form an insulating layer with a thickness of 404 mm. Next, copper paste was printed on it in a similar comb-like pattern perpendicular to the lower electrode pattern, and fired in the same manner as the lower electrode to create a test sample.

それぞれのテストサンプルに対して次の試験を行い、結
果を表1に併せて示した。
The following tests were conducted on each test sample, and the results are also shown in Table 1.

■絶縁抵抗の測定: 上部・下部導体間に50Vの直流電圧を印加し、絶縁抵
抗を測定した。
■Measurement of insulation resistance: A DC voltage of 50 V was applied between the upper and lower conductors to measure insulation resistance.

■耐湿負荷寿命試験: 60℃相対湿度95%の高温高湿槽中で50Vの直流電
圧を100時間連続的に印加した後サンプルを取出して
室温で1時間放置し、絶縁抵抗を測定した。
■Humidity load life test: After applying a DC voltage of 50 V continuously for 100 hours in a high temperature and high humidity bath at 60° C. and 95% relative humidity, the sample was taken out and left at room temperature for 1 hour, and the insulation resistance was measured.

(以下余白) 表1 比較例1〜4 表2に示す組成のガラス粉末、酸化物フィラー、Pb 
Oz粉末を所定の割合で混合し、有機ビヒクル中に均一
に分散させて得た絶縁ペーストを用い、実施例と同様に
性能試験を行った。各成分の配合色及び試験結果を併せ
て表2に示す。
(Margin below) Table 1 Comparative Examples 1 to 4 Glass powder, oxide filler, and Pb having the composition shown in Table 2
Performance tests were conducted in the same manner as in the examples using an insulating paste obtained by mixing Oz powder in a predetermined ratio and uniformly dispersing it in an organic vehicle. Table 2 shows the blended colors and test results of each component.

(以下余白) 表2 表1と表2を比較すると、本発明の絶縁ペーストはいず
れも比較例に示したものより絶縁性、耐湿性ともにはる
かに優れていることがわかる。尚比較例1及び2は膜強
度が弱く、脆いので多層回路用には不適であった。
(The following is a blank space) Table 2 Comparing Tables 1 and 2, it can be seen that the insulating pastes of the present invention are both far superior in insulation properties and moisture resistance to those shown in the comparative examples. Note that Comparative Examples 1 and 2 had low film strength and were brittle, so they were unsuitable for multilayer circuits.

効果 本発明の絶縁ペーストはN2などの非酸化性雰囲気中、
650℃以下の低温で焼成しても、カーボンの残留のな
い高絶縁性の連続膜を形成することができる。又耐湿性
、耐水性に優れており、多層回路の層間絶縁膜として極
めて良好な特性を示す。従って卑金属導体を使用する厚
膜多層回路の絶縁層形成に極めて有用である。しかも6
50℃以下の低温で焼成できるので、酸化ルテニウム系
抵抗体を形成した後に絶縁層を非酸化性雰囲気中で焼付
ける場合でも、抵抗特性を悪化させることがない。
Effect The insulating paste of the present invention can be used in a non-oxidizing atmosphere such as N2,
Even when fired at a low temperature of 650° C. or lower, a highly insulating continuous film without residual carbon can be formed. It also has excellent moisture resistance and water resistance, and exhibits extremely good properties as an interlayer insulating film for multilayer circuits. Therefore, it is extremely useful for forming insulating layers of thick film multilayer circuits using base metal conductors. And 6
Since it can be fired at a low temperature of 50° C. or lower, the resistance characteristics will not deteriorate even if the insulating layer is baked in a non-oxidizing atmosphere after forming the ruthenium oxide resistor.

更に本発明のペーストは導体間の絶縁の他、回路保護被
覆用やアンダーグレーズとしても使用することができる
Further, the paste of the present invention can be used not only for insulation between conductors but also for circuit protection coating and underglaze.

Claims (1)

【特許請求の範囲】 1 A、重量基準で SiO_2 27〜36% Al_2O_3 1〜3% B_2O_3 5〜15% PbO 45〜52% CaF_2 1〜3% ZnO 1〜% からなるガラス粉末35〜90重量%と、 B、酸化物フィラー10〜35重量%と、 C、酸化剤0〜30重量%と を有機ビヒクル中に分散させてなる絶縁ペースト。 2 酸化物フィラーが酸化アルミニウム、酸化マグネシ
ウム、酸化ランタン、酸化チタンからなる群から選ばれ
た1種又は2種以上である特許請求の範囲第1項記載の
絶縁ペースト。 3 酸化剤がPbO_2、Pb_3O_4、CeO_2
、PrO_2、Pr_6O_1_1、TeO_3、Co
_3O_4、Nd_2O_3、SrO_2からなる群か
ら選ばれた1種又は2種以上の粉末である特許請求の範
囲第1項又は第2項記載の絶縁ペースト。 4 A、ガラス粉末が55〜70重量%、B、酸化物フ
ィラーが15〜30重量%、C、酸化剤が10〜25重
量%である特許請求の範囲第1項乃至第3項のいずれか
に記載の絶縁ペースト。
[Claims] 1 A, 35-90% by weight of glass powder consisting of: SiO_2 27-36% Al_2O_3 1-3% B_2O_3 5-15% PbO 45-52% CaF_2 1-3% ZnO 1-% An insulating paste comprising: B. 10 to 35% by weight of an oxide filler; C. 0 to 30% by weight of an oxidizing agent dispersed in an organic vehicle. 2. The insulating paste according to claim 1, wherein the oxide filler is one or more selected from the group consisting of aluminum oxide, magnesium oxide, lanthanum oxide, and titanium oxide. 3 Oxidizing agents are PbO_2, Pb_3O_4, CeO_2
, PrO_2, Pr_6O_1_1, TeO_3, Co
The insulating paste according to claim 1 or 2, which is one or more powders selected from the group consisting of _3O_4, Nd_2O_3, and SrO_2. 4. Any one of claims 1 to 3, wherein A, glass powder is 55 to 70% by weight, B, oxide filler is 15 to 30% by weight, and C, oxidizing agent is 10 to 25% by weight. Insulating paste described in .
JP14602885A 1985-07-03 1985-07-03 Insulating paste Granted JPS628404A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14602885A JPS628404A (en) 1985-07-03 1985-07-03 Insulating paste

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14602885A JPS628404A (en) 1985-07-03 1985-07-03 Insulating paste

Publications (2)

Publication Number Publication Date
JPS628404A true JPS628404A (en) 1987-01-16
JPH056281B2 JPH056281B2 (en) 1993-01-26

Family

ID=15398471

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14602885A Granted JPS628404A (en) 1985-07-03 1985-07-03 Insulating paste

Country Status (1)

Country Link
JP (1) JPS628404A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62260733A (en) * 1986-05-02 1987-11-13 Asahi Glass Co Ltd Sealing composition
JPH02124744A (en) * 1988-11-01 1990-05-14 Asahi Glass Co Ltd Paste composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62260733A (en) * 1986-05-02 1987-11-13 Asahi Glass Co Ltd Sealing composition
JPH02124744A (en) * 1988-11-01 1990-05-14 Asahi Glass Co Ltd Paste composition

Also Published As

Publication number Publication date
JPH056281B2 (en) 1993-01-26

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