JPS627848A - Wear resistant film and its production - Google Patents

Abstract

PURPOSE:To provide a film which has a smooth surface, high adhesive power to a substrate and has internally wear resistance by incorporating C into the film and making the hydrogen compsn. ratio in the film larger than the hydrogen compsn. ratio in the contact part of a substrate and the film surface. CONSTITUTION:A C target 21 is sputtered with an ion beam 23 consisting of gaseous Ar and 10% gaseous H2 having prescribed energy and the film at about 100Angstrom is formed on the substrate 24. The ratio of the pressure of the gaseous H2 in Ar is gradually increased to mix the gaseous H2 up to about 50% and after about 200Angstrom film is formed, about 1000Angstrom film is formed while 50% gaseous H2 is maintained. H2 is thereafter introduced into the chamber to the extent that the H2 atmosphere attains about 5X10<-3>Torr. The pressure of the gaseous H2 in the beam 23 is gradually decreased and about 200Angstrom film is formed until Ar attains 100%. The intended long-life wear-resistant film 11 having such a gradient as shown by the hydrogen concn. characteristic of the figure is thus formed on the substrate 12.

Description

DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a wear-resistant film that has wear resistance, very low friction, and has a long service life, and a method for producing the same.

Conventional technology Conventional wear-resistant films include hard coatings such as carbides such as SIC, nitrides such as TiN, oxides, etc.
! ! Wax, polymeric Teflon, sulfides, halogen compounds, and the like have been used as rR lubricants with low friction.

Problems to be Solved by the Invention These wear-resistant films cannot be said to have sufficient hardness.
Easy to mold, long life, and low friction.
A film that is extremely smooth and has excellent transparency has been desired.

In addition, a film with high hardness has a weak adhesion to a substrate and has the problem of peeling, and a film with a high adhesion has been desired. There was also a need for a formation method that was inexpensive and easy to produce.

The present invention solves the above-mentioned problems, and aims to provide a long-life wear-resistant film that has a smooth surface, strong adhesion on the substrate side, and wear resistance on the inside, and a method for producing the same. It is something to do.

Means for Solving the Problems In order to solve the above problems, the present invention adds hydrogen to an inert gas at varying gas pressure ratios, and maximizes the hydrogen gas pressure ratio when producing the inside of the membrane. A film is formed by sputtering a carbon target using an ion beam, and as a result, a film can be obtained in which at least part of the hydrogen composition ratio inside the film is larger than that in the substrate contact area and the surface area. As a result, a film with very strong adhesion to the substrate, high hardness, excellent wear resistance, and low surface friction was realized.

In addition, by using argon as an inert gas, it is possible to form a film very stably, and by forming the film using an ion beam in a hydrogen atmosphere, the adhesion is further increased and a smooth film can be formed. can be formed.

Function: This structure enables the formation of a long-life film that has sufficient wear resistance and strong adhesion to the substrate compared to conventional coating films.Friction is also extremely low, making it smooth and durable. Furthermore, we were able to create a wear-resistant film that has excellent abrasion resistance and, due to its inorganic composition, excellent chemical resistance.The manufacturing method also maximizes the gas pressure ratio of the hydrogen gas applied when creating the inside of the film. It's very easy as all you need to do is

EXAMPLE An example of the present invention will be described below based on the drawings. 1st
The figure shows a wear-resistant film 11 according to an embodiment of the present invention, and 12 is a substrate. FIG. 2 schematically shows an apparatus used in an embodiment of the method for manufacturing a wear-resistant film of the present invention.

As shown in FIG. 2, a carbon target 21 is first irradiated with an ion energy of 1.2, for example, generated by an ion beam source 22.
klliV, sputtered with an ion beam 23 of argon gas and 10% hydrogen gas at 60 mA, and
A film about the size of a human being is formed on the substrate 24. 25 is a support for the substrate 24. Next, gradually increase the hydrogen gas pressure ratio in argon. Then, hydrogen gas is gradually mixed to about 50% to form a film with a thickness of about 200 layers, and then a film with a thickness of about 1000 layers is formed while maintaining 50% hydrogen gas. Afterwards, the hydrogen atmosphere is approximately 5x 10-3 To
Hydrogen is introduced into the chamber to the extent that rr is reached, and the gas pressure of the hydrogen gas in the ion beam 23 is gradually lowered to create a film thickness of about 200 people until the argon content reaches 100%.

The hydrogen composition ratio in the film created in this way is the first
A very hard film is formed inside the film, with a gradient as shown in the hydrogen 11 degree characteristic in the figure, but the hardness of the contact parts of the substrate 12 becomes slightly smaller, and the adhesive force with the substrate increases, causing peeling. It is possible to prevent this and achieve a long-life membrane. Further, the hydrogen gas pressure ratio is selected to be an appropriate value to ensure stable film formation depending on the type of substrate. In addition, the film thickness depends on the smoothness of the substrate surface; for flat substrates, several hundred people including the hard parts are effective, while for substrates with rough surfaces, about several thousand people are required including the hard parts. Further, by reducing the composition ratio of hydrogen, the surface of the film can be formed into a smooth surface with low adhesion force, and although the frictional force is reduced, a smooth and wear-resistant film can be realized. Therefore, as a whole, this wear-resistant film has characteristics of strong adhesion on the substrate side, extremely hardness and wear resistance inside the film, and smooth characteristics of low frictional force on the surface. We have realized a forming method that is easy to use, has chemical resistance, and has a long service life.

Effects of the Invention According to the wear-resistant film and the method for producing the same of the present invention, a wear-resistant film that is extremely smooth, has strong adhesion, and has a long life can be obtained.
This is made possible by an easy production method, and its industrial value is extremely large.

[Brief explanation of the drawing]

FIG. 1 is a cross-sectional view of a hard membrane and a characteristic diagram showing the hydrogen concentration in the membrane in one embodiment of the present invention, and FIG. 2 is a schematic diagram of a manufacturing apparatus in one embodiment of the present invention.

Claims (1)

[Claims] 1. A wear-resistant film containing at least carbon, and characterized in that the composition ratio of hydrogen in at least a portion of the interior of the film is larger than the composition ratio of hydrogen in the substrate contact area and the surface of the film. 2. Add hydrogen gas to inert gas while changing the gas pressure ratio,
A method of manufacturing a wear-resistant film that forms a film by sputtering a carbon target with an ion beam that maximizes the gas pressure ratio of hydrogen gas added when creating the inside of the film. 3. The method for producing a wear-resistant film according to claim 2, characterized in that argon is used as the inert gas. 4. The method for producing a wear-resistant film according to claim 2, wherein the film is formed using an ion beam in a hydrogen atmosphere.