JPS61243166A - Hard film and its production - Google Patents

Abstract

PURPOSE:To form a laminated hard film having wear resistance and long life by sputtering a carbon target by an ion beam by an inert gas in a hydrogen atmosphere then sputtering the target by an ion beam of an inert gas added with hydrogen. CONSTITUTION:The carbon target 21 is sputtered by the ion beam 23 of the inert gas such as Ar generated from an ion beam source 22 to form about 100Angstrom film. Hydrogen is then incorporated into Ar to form about 100Angstrom film. The film formation to about 100Angstrom is further continued while the hydrogen to be incorporated is gradually increased so that the entire film thickness is made about 1,000Angstrom . The hard film 11 in which the compsn. ratio of the hydrogen is graded from the substrate 12 toward the surface by the inter-diffusion of the film is thus formed. Such hard film 11 has the characteristic of large adhesive power on the substrate 12 side and has the high hardness and has the wear resistance and chemical resistance on the surface. The longer life is thus obtd.

Description

DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a hard film having a long service life and wear resistance, and a method for manufacturing the same.

2. Prior Art Conventional wear-resistant films include organic hardeners and silicone coatings that impart scratch resistance to the surfaces of metal nitrogen and compounds such as TiN, and plastics.

Problems to be Solved by the Invention However, it cannot be said that these films have sufficient wear resistance, and a long-life film with wear resistance close to that of diamond and a smooth surface is desired. It was boring. Furthermore, a film with high hardness has weak adhesion to a substrate and tends to cause peeling problems, so a film with high adhesion has been desired. Also, wear resistance,
There was a desire for something that had both environmental resistance and chemical resistance, as well as excellent transparency.

Means for Solving the Problems In order to solve the above problems, the present invention sputters a carbon target in a hydrogen atmosphere using an inert gas ion beam to form a film, and then injects hydrogen gas into the inert gas. By sputtering with the applied ion beam, a film is obtained in which the composition ratio of hydrogen in the film is larger on the surface side than on the substrate contacting part side. As a result, the present inventors have realized a film that has extremely strong adhesion to the substrate, high hardness, and excellent wear resistance. Further, even if the film thickness is 1000 Å or less, it has sufficient abrasion resistance and also has high transparency. Furthermore, by using argon as an inert gas, the film could be formed very stably. By gradually changing the gas pressure ratio of the hydrogen gas used in the ion beam within 6% to form a multilayer film, we were able to form a film with strong adhesion and wear resistance. In addition, by forming a layered film by changing the gas pressure ratio of hydrogen gas used as an ion beam once by 10% or more, it is possible to form a film that has conductivity on the substrate side and insulation on the surface side. We were able to form a film with a wide range of uses, which has wear resistance and can have a conductive path inside the film.

Function The present invention creates a long-life film that has sufficient wear resistance compared to conventional coating films and has strong adhesion to the substrate by creating the above-mentioned structure using the above-mentioned manufacturing method. Since it can be realized with a film thickness of 1000λ or less, it also has excellent transparency for infrared light and the like. In addition, because it is a low-temperature process, it can be created on substrates that deform at high temperatures.
Because it is smooth, has excellent wear resistance, and has an inorganic composition,
We were able to create a long-lasting hard film with excellent chemical resistance.

Example (Example 1) FIG. 1 shows a hard membrane 11 according to an embodiment of the present invention.

FIG. 2 schematically shows an apparatus used in an embodiment of the hard membrane manufacturing method of the present invention. As shown in FIG. 2, a carbon target 21 is sputtered in a hydrogen atmosphere by an ion beam 23 of argon gas generated by an ion beam source 22.
A film of about 100 people was formed, then about 3% hydrogen gas was mixed with argon to form a film of 100 people, and then hydrogen gas was mixed with argon gas at 6% and 9 times, gradually increasing. However, the film is formed by about 1,008 layers each, so that the total film thickness is about 1,000 layers. The composition ratio of hydrogen in the film is due to film interdiffusion, resulting in a hard film 11 with a gradient from the substrate 12 to the surface. This hard membrane 11
The film has a property of strong adhesion on the substrate 12 side, and a film with extremely high hardness, abrasion resistance, and chemical resistance on the surface, so that a long service life can be realized.

(Example 2) FIG. 3 shows a hard membrane according to an example of the present invention. Carbon target in hydrogen atmosphere with ion energy of 1.2 KeV
, sputtering with an ion beam of 60mA argon gas to create a hard film 31 of about 600mA, then mix about 20% hydrogen gas with argon gas and sputtering with an ion beam of the same energy to form a hard film 31 of about 600mA. A membrane 32 is created. The hard film 31 has a resistivity of 1o
-3Ω・α, whereas the hard film 32 has a resistivity of 1
It has internal conductivity of about 0.03Ω, and can be used to form a conductive film pattern by using a mask, expanding its uses.

Effects of the Invention The hard film and the method for producing the same of the present invention enable a coating film that is extremely smooth, has strong adhesion, and has a long life, and the industrial value of the present invention is great.

[Brief explanation of drawings]

FIG. 1 is a cross-sectional view of a hard membrane in an embodiment of the present invention, FIG. 2 is a schematic diagram of a manufacturing apparatus in an embodiment of the present invention, and FIG. 3 is a cross-sectional view of a hard membrane in an embodiment of the present invention. It is. 11... Hard film, 21... Carbon target, 23... Ion beam, 31, 32...
...Dural membrane.

Claims (6)

[Claims] (1) A hard film containing at least carbon and characterized in that the composition ratio of hydrogen within the film is greater on the surface than in the substrate contact area. (2) The hard film according to claim 1, wherein the film thickness is 1000 Å or less. (3) A carbon target is sputtered with an ion beam using an inert gas in a hydrogen atmosphere to form a film, and then a laminated film is formed by sputtering with an ion beam containing an inert gas and hydrogen gas. A method for manufacturing a hard membrane. (4) The method for producing a hard film according to claim 3, characterized in that argon is used as the inert gas. (5) The method for producing a hard film according to claim 3, wherein the production is performed by changing the gas pressure ratio of the hydrogen gas used as the ion beam at least five times within 5%. (6) The gas pressure of hydrogen gas used as an ion beam is 1
4. The method for producing a hard film according to claim 3, wherein the hard film is produced by changing it once by 0% or more.