JPS6275533A - イオンビ−ム加工方法および装置 - Google Patents

イオンビ−ム加工方法および装置

Info

Publication number
JPS6275533A
JPS6275533A JP60215003A JP21500385A JPS6275533A JP S6275533 A JPS6275533 A JP S6275533A JP 60215003 A JP60215003 A JP 60215003A JP 21500385 A JP21500385 A JP 21500385A JP S6275533 A JPS6275533 A JP S6275533A
Authority
JP
Japan
Prior art keywords
spot
ion beam
ion
diameter
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60215003A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0466347B2 (enExample
Inventor
Akira Shimase
朗 嶋瀬
Satoshi Haraichi
聡 原市
Hiroshi Yamaguchi
博司 山口
Takeoki Miyauchi
宮内　建興
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60215003A priority Critical patent/JPS6275533A/ja
Publication of JPS6275533A publication Critical patent/JPS6275533A/ja
Publication of JPH0466347B2 publication Critical patent/JPH0466347B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60215003A 1985-09-30 1985-09-30 イオンビ−ム加工方法および装置 Granted JPS6275533A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60215003A JPS6275533A (ja) 1985-09-30 1985-09-30 イオンビ−ム加工方法および装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60215003A JPS6275533A (ja) 1985-09-30 1985-09-30 イオンビ−ム加工方法および装置

Publications (2)

Publication Number Publication Date
JPS6275533A true JPS6275533A (ja) 1987-04-07
JPH0466347B2 JPH0466347B2 (enExample) 1992-10-22

Family

ID=16665093

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60215003A Granted JPS6275533A (ja) 1985-09-30 1985-09-30 イオンビ−ム加工方法および装置

Country Status (1)

Country Link
JP (1) JPS6275533A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6753253B1 (en) * 1986-06-18 2004-06-22 Hitachi, Ltd. Method of making wiring and logic corrections on a semiconductor device by use of focused ion beams

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6753253B1 (en) * 1986-06-18 2004-06-22 Hitachi, Ltd. Method of making wiring and logic corrections on a semiconductor device by use of focused ion beams

Also Published As

Publication number Publication date
JPH0466347B2 (enExample) 1992-10-22

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees