JPS6273497A - Nonvolatile memory circuit - Google Patents

Nonvolatile memory circuit

Info

Publication number
JPS6273497A
JPS6273497A JP60212941A JP21294185A JPS6273497A JP S6273497 A JPS6273497 A JP S6273497A JP 60212941 A JP60212941 A JP 60212941A JP 21294185 A JP21294185 A JP 21294185A JP S6273497 A JPS6273497 A JP S6273497A
Authority
JP
Japan
Prior art keywords
read out
nonvolatile memory
cells
out system
written
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60212941A
Other languages
Japanese (ja)
Inventor
Yoshiyuki Terajima
義幸 寺島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP60212941A priority Critical patent/JPS6273497A/en
Publication of JPS6273497A publication Critical patent/JPS6273497A/en
Pending legal-status Critical Current

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  • Read Only Memory (AREA)
  • Non-Volatile Memory (AREA)

Abstract

PURPOSE:To make unnecessary the usage of a high pressure resistant transistor in a read out system by separating a write system and the read out system. CONSTITUTION:B1-Bn have functions to switch high voltages impressed from a terminal W by every line unit. The fundamental cells A(1,1)-A(m,n) of a nonvolatile memory are constituted with four cells and pull-down transistors E1-Em are inserted to a VSS side as resistors because a read signal from a fundamental cell is a binary signal whether it is at a VDD level or at a floating level. When a data is written, a line selection is performed at C1-Cn and a row selection at P1-Pm. When reading, the line selection is performed at r1-rn. Lines on which the high voltages are applied are F1-Fn, separating the read out system.

Description

【発明の詳細な説明】 〔埋菓上の利用分野〕 本発明は電子時計用集積回珀に内戚する不揮発性メモリ
の結線、構成に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application in Confectionery] The present invention relates to the wiring and configuration of a nonvolatile memory included in an integrated circuit for an electronic watch.

〔従来の技術〕[Conventional technology]

従来不揮発性メモリとしてFAMO日を便用したlPR
OMのセル構成は第2図に示したように2トランジスタ
(FAMO8+FAMO8に直列に接続された書込制御
トランジスタ)であった。
IPR using FAMO date as conventional non-volatile memory
The cell configuration of the OM was two transistors (FAMO8+write control transistor connected in series to FAMO8) as shown in FIG.

このセルはマトリクスに並べられ、IPAMO8と直列
に接続されたトランジスタのゲートはY fx)方向に
セル同志結線され、FAMO8のドレインはX (Y)
方向に結線されていた。
These cells are arranged in a matrix, and the gates of transistors connected in series with IPAMO8 are connected to each other in the Y fx) direction, and the drains of FAMO8 are connected in the X (Y) direction.
wired in the direction.

〔発明が解決しようとする間4点及び目的〕しかし従来
の技術は書込糸と読出系が同一系のため、書込のための
高1圧が填2図のIJI〜Dmに刀口わり、プルダウン
のトランジスタ及び、これらのIJ1〜!Jmの信号を
受けて動作するセンス丁ンブの入力系を高電圧から保護
する必要があった。本発明はこのような問題点を解決す
るもので、その目的とするところは、特殊な高1耐圧ト
ランジスタの使用をやめ、より間車な周辺回路を提供す
ることにある。
[Four points and objectives to be solved by the invention] However, in the conventional technology, the writing thread and the reading system are the same system, so the high pressure 1 for writing is reduced to IJI~Dm in Figure 2, Pull-down transistors and these IJ1~! It was necessary to protect the input system of the sense terminal, which operates in response to the Jm signal, from high voltage. The present invention is intended to solve these problems, and its purpose is to eliminate the use of special high-voltage transistors and provide a more compact peripheral circuit.

〔間魂点を解決するための手段〕[Means for resolving intertemporal points]

本発明は、不揮発性メモリセル内で書込系と読出系を分
離し、書込用の高電圧が続出系に伝達されないようなセ
ル構造、結線としたことを特徴とする。基本セルは曳り
FAMO6,γ2)4i込制御トラ/シスタ、(3)読
出トランジスタ、■読出制御トランジスlの4素子で構
成され、■と(りは直列に接続され、(3)と■は直列
に接続され、(りのゲートと■のゲートが結情さルてい
る。更に基本セルはマトリクス状に並べ、それぞれのセ
ル同志を結線する。r2)のゲートはX or Y方向
、(りのドレインはXα)方向、■のゲートはY (X
)方向、■のドレインはY (’X)方向に結線するこ
とを特徴とする。
The present invention is characterized in that a write system and a read system are separated in a nonvolatile memory cell, and the cell structure and wiring are such that a high voltage for writing is not transmitted to the subsequent system. The basic cell consists of four elements: FAMO6, γ2) 4i integrated control transistor/sister, (3) read transistor, ■ read control transistor l, ■ and (ri are connected in series, and (3) and ■ are They are connected in series, and the gates of (ri and ■) are connected.Furthermore, the basic cells are arranged in a matrix, and each cell is connected to each other.The gate of r2 is connected in the X or Y direction, The drain of is in the Xα) direction, and the gate of ■ is in the Y (X
) direction, and the drain of ■ is connected in the Y ('X) direction.

〔作用〕[Effect]

本発明の上記の構成によれば、4込系に2素子を割り当
て、続出系に池の2素子を当て、FAMOSノ浮遊ゲー
トと読小ゲートジスタのゲートを結線して、(置接高電
圧が続出系に加わらないようにした。
According to the above configuration of the present invention, two elements are assigned to the four-input system, two elements are applied to the continuation system, and the floating gate of the FAMOS and the gate of the small gate transistor are connected. I tried not to join the series.

〔実施例〕〔Example〕

第1図が本発明のセルの結線構成全示す図である。B1
〜BnはW端子より印加された高電圧全行単位に切換え
る機能を持つ。A(1,1)〜A(m、n)は不揮発性
メモリの基本セルで4素子よシ嘴成されている。E1〜
Kmはプルダウントランジスタで、基本セルからの続出
信号がVDDレベルかフローティングレベルかの二1直
信号のため、Vθ日側に抵抗として挿入している。
FIG. 1 is a diagram showing the entire wiring configuration of a cell according to the present invention. B1
~Bn has a function of switching the high voltage applied from the W terminal in units of all rows. A(1,1) to A(m,n) are basic cells of a non-volatile memory and are made up of four elements. E1~
Km is a pull-down transistor, which is inserted as a resistor on the Vθ side because the continuous signal from the basic cell is a direct signal of either VDD level or floating level.

本マトリクスにおいてブータラ書込む場合。When writing bootara in this matrix.

01〜Onで行選択、P1〜Pmで列選択を行なう。読
出す場合はr1〜rnで行選択を行なう。
01 to On selects a row, and P1 to Pm selects a column. When reading, row selection is performed using r1 to rn.

高電圧のカロわるラインはF1〜Fnとなり、続出系と
分離されている。
The high voltage lines F1 to Fn are separated from the continuous system.

第5図は属1図の実施例である。まず基本セルA(1,
1)か1図と対応しく以下同一記号は対応を示す)、5
01が読出制−用、502が続出用、505は書込制御
用、504がFAMO8である。またB1は505〜5
07の5素子によってII成される。まず書込みの場合
、W端子に寅の高電圧が印加される。この時505と5
06はインバータを構成していてC1がVl)Dレベル
の時5Q7はONし、C1が78日レベルのとき507
idOFFする。C1〜anによって書込みの行が選択
されると、PIからP m I) レベルがvnnかV
SSかによってFAMO8に書込まれるか否かが決定さ
れる。もしA(1,13が書込1れる状態(C設電され
ていると仮定すると、負I7)高直圧の、フロわったと
きろ04のゲートはアバランシェ降伏ニより電子が圧入
される。同時にS02のゲートも同一1(立にバイアス
されるため、0′N状態になる。
FIG. 5 is an example of the genus 1 diagram. First, basic cell A (1,
1) or 1 (corresponding to Figure 1, the same symbols below indicate correspondence), 5
01 is for read control, 502 is for continuous output, 505 is for write control, and 504 is FAMO8. Also, B1 is 505-5
II is formed by five elements of 07. First, in the case of writing, a high voltage is applied to the W terminal. At this time 505 and 5
06 constitutes an inverter, and when C1 is at the Vl)D level, 5Q7 is ON, and when C1 is at the 78th level, 507
Turn id OFF. When the writing line is selected by C1 to an, the level is changed from PI to P m I) to vnn or V.
Whether or not it is written to the FAMO 8 is determined depending on whether it is SS or not. If A (1, 13 is written as 1) (assuming that C is connected, negative I7) is at a high direct voltage and floats, electrons will be injected into the gate of coil 04 due to avalanche breakdown. At the same time, the gate of S02 is also biased to the same 1 (high), so it becomes 0'N state.

これが4込まれた状態である。逆に書込1れない状ルは
502がOF?となっている。
This is the state in which 4 have been inserted. On the other hand, if there is no write 1, 502 is OF? It becomes.

d出しは矢のように行なわれる。TゴルフTのどれか1
つt Vssレベルにすることにより、基本セルの50
1がONL、書込まれていれば1.1+は’JDD、4
込まれていなければDlばVssとなる。
The d-extraction is done like an arrow. T golf T any one
By setting the Vss level, the basic cell's 50
1 is ONL, if written, 1.1+ is 'JDD, 4
If it is not loaded, Dl becomes Vss.

第4図は本発明による他の実施列である。書込む場合記
5図では行単位で書込むが、第4図は列単位で6込む。
FIG. 4 is another implementation according to the invention. When writing, in Figure 5, data is written in row units, but in Figure 4, data is written in column units.

また(′21〜Onはどnか1つをVDDレベルにする
のではなく、ランダムにアドレスが可能となる。逆に7
1〜71は書込みたい列のみをV81iレベルとし、そ
れ以外は’Vnpとするようなレベルの与えガミしなけ
ればならない。書込み及び読出しの原理は第5図同様で
ある。
Also, ('21~On) can be randomly addressed instead of setting one to the VDD level.On the other hand, 7
1 to 71 must be given levels such that only the column to be written is set to V81i level, and the rest are set to 'Vnp. The writing and reading principles are the same as in FIG.

第5図と第4図の庚い方は、データ人力に対して、デー
タ出力がどのような形襟となるかで相違する。即ち第5
図では書込んだデータはD!〜1.1mまでのパラレル
データで出力される。44図は例えばIJ+に注目すれ
ば、書込んだデータはLlIよりヅリアルに出力される
。時計用集積回路、特にアナログクォーツ用ICでは内
戚する不運発注メモリは、多くても501)it程度で
あるため、盾本セルの素子数より周辺回路の素子と加え
合わせた総合面積の小さくなるように第51.傾、第4
図全便い分ければよい。
The differences between Figures 5 and 4 depend on the shape of the data output compared to the human data input. That is, the fifth
In the figure, the written data is D! Parallel data up to 1.1m is output. In Fig. 44, for example, if we pay attention to IJ+, the written data is output more realistically from LlI. In a watch integrated circuit, especially an analog quartz IC, the unlucky order memory is about 501) IT at most, so the total area including peripheral circuit elements is smaller than the number of elements in the main cell. Like the 51st. Tilt, 4th
All you have to do is separate all the figures.

〔発明の効果〕〔Effect of the invention〕

以上述べた発明によれば、1込糸と続出系全分離するこ
と釦より、続出系に高耐圧トランジスタを便り必要がな
く、回路の信頼性が上昇する。また基本セルは従来の2
個より4個に増70したが、時計用東漬回路内の小各鎗
メモリとして便りことを考1イすれば、周辺回路が間車
となることで、占有面+貢の増那とはならない。
According to the invention described above, since the first thread and the continuous thread system are completely separated, there is no need to use a high voltage transistor in the continuous thread system, and the reliability of the circuit is improved. In addition, the basic cell is the conventional 2
70 pieces was increased from 1 piece to 4 pieces, but if you consider the fact that it is a small memory in the Tozuke circuit for watches, the peripheral circuit becomes an intermediate wheel, so the occupied surface + the increase in the number of pieces is It won't happen.

【図面の簡単な説明】[Brief explanation of drawings]

圭1図、本発明の回路図。 鷹2図、従来の不揮発性メモリの回路図。 慎5,4図、本発明の実刈例の回路図。 A(1、I ) 〜A(m、n )−4本セルB1〜B
n・・・讐込直圧切俣用セル E1〜Cm・・・プルダウントランジスタ以   上
Figure 1 is a circuit diagram of the present invention. Figure 2 is a circuit diagram of a conventional non-volatile memory. Figures 5 and 4 are circuit diagrams of actual cutting examples of the present invention. A(1,I) ~A(m,n)-4 cells B1~B
n...Cells E1 to Cm for direct voltage cut-off...Pull-down transistor or more

Claims (1)

【特許請求の範囲】[Claims]  FAMOS(Aloating−gateAvala
nche−injec−tionMOS)を有する時計
用集積回路において、(1)FAMOS、(2)書込制
御トランジスタ、(3)読出トランジスタ、(4)読出
制御トランジスタの四素子で構成され(1)と(2)は
直列に接続され、(3)と(4)は直列に接続され、(
1)のゲートと(3)のゲートが結線され、(1)〜(
4)を基本セルとしてマトリクス状に並べ、(2)のゲ
ート同志、(1)のドレイン同志、(4)のゲート同志
、(3)のドレイン同志をそれぞれX方向Y方向にそれ
ぞれ結線したことを特徴とする不揮発性メモリ回路。
FAMOS (Aloating-gate Avala
In a watch integrated circuit having an MOS (injection MOS), it is composed of four elements: (1) FAMOS, (2) a write control transistor, (3) a read transistor, and (4) a read control transistor. 2) are connected in series, (3) and (4) are connected in series, and (
Gates (1) and (3) are connected, and (1) to (
4) are arranged in a matrix as basic cells, and the gates of (2) are connected together, the drains of (1) are connected together, the gates of (4) are connected together, and the drains of (3) are connected together in the X and Y directions, respectively. Characteristic non-volatile memory circuit.
JP60212941A 1985-09-26 1985-09-26 Nonvolatile memory circuit Pending JPS6273497A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60212941A JPS6273497A (en) 1985-09-26 1985-09-26 Nonvolatile memory circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60212941A JPS6273497A (en) 1985-09-26 1985-09-26 Nonvolatile memory circuit

Publications (1)

Publication Number Publication Date
JPS6273497A true JPS6273497A (en) 1987-04-04

Family

ID=16630828

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60212941A Pending JPS6273497A (en) 1985-09-26 1985-09-26 Nonvolatile memory circuit

Country Status (1)

Country Link
JP (1) JPS6273497A (en)

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