JPS627280B2 - - Google Patents

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Publication number
JPS627280B2
JPS627280B2 JP10158582A JP10158582A JPS627280B2 JP S627280 B2 JPS627280 B2 JP S627280B2 JP 10158582 A JP10158582 A JP 10158582A JP 10158582 A JP10158582 A JP 10158582A JP S627280 B2 JPS627280 B2 JP S627280B2
Authority
JP
Japan
Prior art keywords
plating
silver
plated
base
gold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10158582A
Other languages
Japanese (ja)
Other versions
JPS58217693A (en
Inventor
Koichi Shimamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SONITSUKUSU KK
Original Assignee
SONITSUKUSU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SONITSUKUSU KK filed Critical SONITSUKUSU KK
Priority to JP10158582A priority Critical patent/JPS58217693A/en
Publication of JPS58217693A publication Critical patent/JPS58217693A/en
Publication of JPS627280B2 publication Critical patent/JPS627280B2/ja
Granted legal-status Critical Current

Links

Description

【発明の詳細な説明】 本発明は、極めて微小域の被メツキ処理部へ、
金や金合金或いは白金属金属又はニツケルを微小
部分的に下地メツキ処理し、且つその表面には下
地メツキ径より小径の銀メツキを処理した微小部
分銀メツキ処理物及びそのメツキ方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention provides an extremely small area for plating processing.
The present invention relates to a micro-partially silver-plated product in which gold, gold alloy, platinum metal, or nickel is subjected to base plating treatment in minute portions, and the surface thereof is coated with silver plating having a diameter smaller than the diameter of the base plating, and a method for plating the same.

即ち、本発明は、集積回路素子(以下IC)の
リードフレームに於けるボンデイングエリアや、
超小型スイツチやリレー類のコンタクター、コネ
クター等、或いはプリント基板のリード部等のよ
うに極めて微小部分で且つ高導電性を必要とする
部分に対し、金や金合金或いは白金属金属やニツ
ケルで微小部分域の下地メツキを形成し、その下
地メツキの表面にはこれより更に微小範囲の銀を
直接メツキしてあつて、在来の銀メツキ手段で必
要不可欠であつた置換防止処理手段や剥離処理手
段を省略可能とし、銀メツキ処理コストの大巾低
兼化と銀メツキ層の密着力等を含むメツキ品位を
大巾に向上せしめるようにした微小部分銀メツキ
処理物及びそのメツキ方法に係る。
That is, the present invention provides a bonding area in a lead frame of an integrated circuit element (hereinafter referred to as IC),
For parts that are extremely small and require high conductivity, such as contactors and connectors of ultra-small switches and relays, or lead parts of printed circuit boards, we use gold, gold alloys, platinum metals, and nickel to conduct very small parts. Undercoat plating is formed in a partial area, and the surface of the undercoating is directly plated with silver in a finer range than this, which eliminates the substitution prevention treatment and peeling treatment that are indispensable in conventional silver plating methods. This invention relates to a micro-partially silver-plated product and a method for plating the same, in which the means can be omitted, the cost of silver-plating can be greatly reduced, and the quality of plating, including the adhesion of the silver-plated layer, can be greatly improved.

一般にICリードフレームのボンデイングエリ
アや、コンタクター或いはプリント基板のリード
部等に於いて、真に高導電性を必要とする範囲は
極めて微小域であるため、可能な限り狭い範囲に
金等を部分メツキ処理していた。
Generally, in the bonding area of an IC lead frame, the lead part of a contactor, or a printed circuit board, the area that truly requires high conductivity is extremely small, so it is necessary to partially plate gold, etc. in the narrowest possible area. It was being processed.

然し乍ら上記各製品は極めて多量生産されるた
め、仮令部分メツキであつても貴金属の消費量の
多大化と、メツキ処理のコストアツプ化を無視で
きないのが実情である。
However, since each of the above-mentioned products is produced in extremely large quantities, the reality is that even if it is only partially plated, the consumption of precious metals increases and the cost of plating processing cannot be ignored.

このことから、金等の代用としてより廉価な銀
メツキを利用する場合が多くなつているが、この
銀メツキ手段としては第1図に図示の工程を経て
処理されるのが周知である。
For this reason, cheaper silver plating is increasingly being used as a substitute for gold, etc., and it is well known that silver plating is carried out through the steps shown in FIG.

先ず被メツキ部材を脱脂工程1で苛性ソーダ液
等による脱脂処理を行なつた後水洗工程2でこの
苛性ソーダ液を洗浄し、次に酸洗工程3で濃塩酸
等により金属表面の不純物や酸化物を除去した後
水洗工程2により洗浄する。
First, the part to be plated is degreased with a caustic soda solution in a degreasing step 1, then the caustic soda solution is washed away in a water washing step 2, and then impurities and oxides on the metal surface are removed with concentrated hydrochloric acid in a pickling step 3. After removal, washing is performed in water washing step 2.

次の下地メツキ工程4では、後述の如く被メツ
キ部材の全面に銅メツキ処理を行ない下地メツキ
を形成し、水洗工程2を経て置換防止処理工程5
に被メツキ部材を移送する。ここでは後述の理由
により置換防止剤に浸漬し、次段の銀メツキ工程
6に於いて所定箇所に銀メツキを部分メツキした
後、水洗工程2で水洗する。
In the next base plating step 4, copper plating is performed on the entire surface of the member to be plated as described later to form a base plating, and then through the water washing step 2, the replacement prevention treatment step 5
The member to be plated is transferred to. Here, for the reason described later, it is immersed in a substitution prevention agent, and after silver plating is partially plated at predetermined locations in the next silver plating step 6, it is washed with water in a water washing step 2.

次の剥離工程7では、余剰範囲の下地メツキを
剥離するため剥離剤に浸漬し、水洗工程2を経て
完了する。
In the next stripping step 7, the substrate is dipped in a stripping agent to strip off the excess base plating, and is completed through the water washing step 2.

在来の銀メツキ処理には、このように多段階の
処理工程を必要とするが、下地メツキ工程4で
は、被メツキ部材の素地に対応して全面に下地処
理する。例えば、鉄素地の場合は先ず鉄素地用ス
トライクメツキを処理した後銅素地用メツキを行
なう必要があり、銅合金等の場合にも銅素地用ス
トライクメツキを処理する。
The conventional silver plating process requires a multi-step process as described above, but in the base plating step 4, a base coat is applied to the entire surface in accordance with the base material of the member to be plated. For example, in the case of an iron base, it is necessary to first perform strike plating for the iron base and then plating for the copper base, and strike plating for the copper base must also be performed in the case of a copper alloy or the like.

つまりメツキを必要としない部分迄多段ストラ
イクメツキを処理することが屡々行なわれ、資材
費や工数が無駄になると云う問題があつた。
In other words, multi-stage strike plating is often applied to parts that do not require plating, resulting in a waste of materials and man-hours.

又、置換防止処理工程5も必要不可欠である。
即ち、銀メツキ浴(例えばシアン化銀)に於ける
銀メツキの析出電位は非常に卑であるため、銅や
銅合金の素地或いは下地処理した被メツキ部材を
ここに浸漬するだけで置換反応により銀が析出す
るが、この時析出される環元銀は下地に対する密
着性が極めて弱い。
Further, the substitution prevention treatment step 5 is also essential.
In other words, since the deposition potential of silver plating in a silver plating bath (for example, silver cyanide) is very base, simply immersing a copper or copper alloy substrate or a base-treated member to be plated in the bath causes a substitution reaction. Silver is precipitated, but the ring base silver precipitated at this time has extremely weak adhesion to the base.

従つてメツキ強度を保持させるためにはこの置
換反応を防止しなければならず、置換防止を被メ
ツキ物に処理する必要がある。
Therefore, in order to maintain the plating strength, it is necessary to prevent this substitution reaction, and it is necessary to treat the object to be plated to prevent substitution.

更に、銀メツキ工程6では、被メツキ部材をカ
ソード電極に接続し、又マスキング用のマスクを
配置する一方、アノード電極に接続し、且つマス
クを介して被メツキ部材と対向するノズルからメ
ツキ液を噴射させるようにしてある。
Furthermore, in the silver plating step 6, the member to be plated is connected to the cathode electrode, and a mask for masking is arranged, while the plating liquid is applied from a nozzle connected to the anode electrode and facing the member to be plated through the mask. It is made to spray.

然し上記在来手段では、メツキ済液や余剰液が
ノズル乃至マスクの透孔部分で拡散したり滞留し
易い上、マスキング境界部からの浸潤も生じ易い
ため、メツキ処理径の微小化や正確さは固より、
多量処理工程に於けるメツキ効率の低下やメツキ
品位の劣化等が避け難いものであつた。
However, with the above-mentioned conventional means, the plated liquid and surplus liquid tend to diffuse or stay in the nozzle or the through-hole part of the mask, and they also tend to infiltrate from the masking boundary, so it is difficult to miniaturize the diameter of the plating process and improve accuracy. From solid,
In large-volume processing processes, it is difficult to avoid a decrease in plating efficiency and deterioration in plating quality.

従つて、従来は正確な極微小部分メツキではな
く、概ねスポツト的なメツキ処理と云う程度であ
り、銀等のメツキ資材の消費コストやメツキ処理
コストが嵩み、而かもメツキ品位にバラつきが生
じると云う不都合な問題があつた。
Therefore, in the past, it was not accurate plating in very small parts, but only spot plating, which increased the consumption cost of plating materials such as silver and the plating processing cost, and also caused variations in the quality of plating. There was an inconvenient problem.

又更に、在来手段では剥離工程7を必要とす
る。
Furthermore, conventional means require a stripping step 7.

これは、被メツキ部材の真に必要とする処以外
にも下地メツキが形成される結果、これが酸化腐
蝕や化学変化による被膜形成等により例えばハン
ダ付けが困難になる等の問題を生じたり、銀メツ
キ層への悪影響を生じる等の問題があるので、余
剰の下地メツキを剥離する必要がある。
As a result of the base plating being formed in areas other than those that are truly required on the part to be plated, this may cause problems such as the formation of a film due to oxidative corrosion or chemical changes, such as making it difficult to solder, or Since there are problems such as an adverse effect on the plating layer, it is necessary to peel off the excess base plating.

このため剥離剤の中に銀メツキ処理物を浸漬し
て下地メツキを剥離した後水洗処理することにな
る。
For this reason, the silver-plated product is immersed in a release agent to remove the base plating, and then washed with water.

このように在来の銀メツキ工程では置換防止処
理工程5や、剥離工程7及びそれに伴う水洗工程
2を要するため処理コストが嵩み、且つこれらの
液剤の付着によるメツキ品位の劣化がある上、銀
メツキ工程6に於ける処理コストの嵩みや銀等の
資材消費量が多くなる等機多の問題があつた。
As described above, the conventional silver plating process requires the substitution prevention treatment step 5, the stripping step 7, and the accompanying water washing step 2, which increases the processing cost.In addition, the plating quality deteriorates due to the adhesion of these liquids. There were many problems in the silver plating step 6, such as increased processing costs and increased consumption of materials such as silver.

本発明は、叙上の問題に鑑み成されたもので、
被メツキ部材に銀メツキを処理する際、置換防止
処理工程及び剥離工程を省略して全体の処理工数
を簡素化し、且つ銀メツキ工程の処理効率を大巾
に改善して、銀他の資材消費量の抑制と相俟つて
処理工費を大巾に低廉化するようにした微小部分
銀メツキ方法の提供を目的とするものである。
The present invention was made in view of the above problems, and
When silver plating is applied to parts to be plated, the replacement prevention process and peeling process are omitted, simplifying the overall processing time, and greatly improving the processing efficiency of the silver plating process, reducing the consumption of silver and other materials. The object of the present invention is to provide a method for silver plating in small areas, which reduces the amount of silver plating and significantly reduces processing costs.

又、本発明の他の目的とする処は、被メツキ部
材の真に必要な部分にのみ下地メツキ乃至銀メツ
キを極微小域に処理し、且つ高品位のメツキ処理
品が廉価に得られ、更に微小部分メツキされた筒
所を着色化して他との識別性を付与させ得るよう
にした微小部分銀メツキ処理物の提供にある。
Another object of the present invention is to perform base plating or silver plating only on the truly necessary parts of the plated member, and to obtain high-quality plated products at low cost. Furthermore, it is an object of the present invention to provide a micro-partially silver-plated product in which the micro-partially plated cylindrical part is colored to make it distinguishable from others.

即ち、本発明にあつては、被メツキ部材の所定
箇所に金や金合金或いは白金属金属又はニツケル
で微小部分下地メツキを処理し、更にこの下地メ
ツキ面上に直接微小部分銀メツキを処理し、置換
防止処理や剥離処理を不要としたものである。
That is, in the present invention, a predetermined portion of the member to be plated is coated with gold, a gold alloy, a platinum metal, or nickel in minute areas, and then silver plating is applied directly on the plated surface in minute areas. , which eliminates the need for replacement prevention treatment or peeling treatment.

以下、本発明の実施例を第2図以下に基づき説
明する。
Hereinafter, embodiments of the present invention will be described based on FIG. 2 and subsequent figures.

先ず、本発明に係るメツキ処理工程の全体を説
明すると、被メツキ部材は、前記した脱脂工程
1、水洗工程2及び酸洗い工程3と水洗工程2で
前記公知例と同じく脱脂及び洗浄処理した後、下
地メツキ工程11に移送される。
First, to explain the entire plating process according to the present invention, the member to be plated is degreased and washed in the above-described degreasing process 1, water washing process 2, pickling process 3, and water washing process 2 in the same way as in the known example. , and transferred to the base plating step 11.

ここでは、後述するメツキ装置を用いて、真に
銀メツキを必要とする微小部分域に対して下地メ
ツキを処理する。
Here, a plating device to be described later is used to perform base plating on a minute area that truly requires silver plating.

この下地メツキは、被メツキ部材の素地が鉄や
銅乃至銅合金でも銀が確固と密着可能なイオン化
傾向の素材を使用してあつて、本発明では金、金
と銀の合金、金とニツケルの合金、ニツケル、或
いは周期律表第8族の白金属金属、例えばオスミ
ウム等を利用し、且つそのメツキ面積及び厚さも
極めて微小なものとしてある。
This base plating uses a material with a tendency to ionize to which silver can firmly adhere even if the base material of the plated member is iron, copper or copper alloy. The plating area and thickness are made to be extremely small.

次に、下地メツキ付の被メツキ部材は水洗工程
2で洗浄した後直接次段の銀メツキ工程12に移
送し、ここで前記金や金合金或いは白金属金属又
はニツケルで微小メツキした上面に、これより微
小径(=真にメツキを必要とする部分)の銀メツ
キを処理するが、これも後述のメツキ装置で行な
う。このように下地メツキの上に銀メツキされた
処理品は、最終段の水洗工程2によりメツキ液を
洗浄して全処理が完了する。
Next, the plated member with the base plating is washed in a water washing step 2 and then directly transferred to the next silver plating step 12, where the upper surface that has been minutely plated with gold, gold alloy, platinum metal, or nickel is Silver plating of minute diameters (=portions that truly require plating) is then performed, and this is also done using a plating device, which will be described later. The treated product, which has been silver-plated on the base plating in this way, is cleaned of the plating solution in the final washing step 2, and the entire process is completed.

上記下地メツキ工程11と銀メツキ工程12で
使用するメツキ装置は、先に本発明の出願人が提
供した発明(特願昭54年第100722号「微少面積の
メツキ方法及びその装置」、特願昭56年第134493
号「微小部分メツキ方法及びその装置」、特願昭
56年第134494号「部分メツキ方法及びその装
置」、特願昭56年第125783号「微小部分メツキ方
法及びその装置」……他)を使用する。
The plating device used in the base plating step 11 and the silver plating step 12 is an invention previously provided by the applicant of the present invention (Japanese Patent Application No. 100722 of 1982 entitled "Method and Apparatus for Plating a Small Area"). 1982 No. 134493
No. ``Small part plating method and device'', patent application
No. 134494 of 1983, "Partial plating method and device", Patent application No. 125783 of 1982, "Minute partial plating method and device"...etc.).

例えば、被メツキ部材がICのリードフレーム
20であつて、銀メツキ処理部がボンデイングエ
リアである場合、第3図に概略を図示したメツキ
装置を使用する。
For example, when the member to be plated is an IC lead frame 20 and the silver plating processing area is a bonding area, a plating apparatus schematically shown in FIG. 3 is used.

これは上記ボンデイングエリアをマスキングし
且つ透孔21が穿設されたマスク22と、このマ
スク22と嵌合して密閉空間23を形成する外套
管24と、この外套管24内に透孔21と対向し
且つ加圧メツキ液を噴射するノズル25を配設
し、上記外套管24と連通する吸気管26を図示
しない吸気機構に接続して、外套管24内を所定
値迄負圧にするようにしてあり、マスク22には
必要に応じて任意の外気導入溝(図示せず)を形
成しても良い。
This includes a mask 22 that masks the bonding area and has a through hole 21 formed therein, a jacket tube 24 that fits with this mask 22 to form a sealed space 23, and a through hole 21 in this jacket tube 24. A nozzle 25 is disposed facing each other and injects a pressurized plating liquid, and an intake pipe 26 communicating with the jacket pipe 24 is connected to an intake mechanism (not shown), so that the inside of the jacket pipe 24 is brought to a negative pressure to a predetermined value. An arbitrary outside air introduction groove (not shown) may be formed in the mask 22 as necessary.

尚、ノズル25はアノード側に、又リードフレ
ーム20はカソード側に接続し且つ両者共直流電
源に接続してある。
Note that the nozzle 25 is connected to the anode side, the lead frame 20 is connected to the cathode side, and both are connected to a DC power source.

而して、前記下地メツキ工程11に配設したメ
ツキ装置には、金や金合金或いは白金属金属又は
ニツケル用メツキ液をノズル25に加圧供給し、
又銀メツキ工程12のノズル25には銀メツキ液
を加圧供給する。
Then, in the plating device disposed in the base plating step 11, a plating liquid for gold, gold alloy, platinum metal, or nickel is supplied under pressure to the nozzle 25,
Further, a silver plating liquid is supplied under pressure to the nozzle 25 of the silver plating step 12.

又、両メツキ装置共、メツキ対象物とマスク2
2の透孔21の位置は予め精度良く機械的に設定
してある。上記工程に係るメツキ処理によると、
リードフレーム20のボンデイングエリアにマス
ク22を介して噴射されるメツキ液は、同装置の
外套管24内部が負圧であるため余剰液及び使用
済液が強制的に外部へ排除される処から、透孔2
1の加工形態及び寸法で決定された微小部分にの
み正確にメツキできる。
Also, in both plating devices, the plating target and mask 2
The position of the second through hole 21 is mechanically set in advance with good precision. According to the plating process related to the above process,
The plating liquid is injected into the bonding area of the lead frame 20 through the mask 22 from a place where excess liquid and used liquid are forcibly expelled to the outside due to the negative pressure inside the mantle tube 24 of the device. Through hole 2
It is possible to accurately plate only a minute part determined by the processing form and dimensions of 1.

又、被メツキ部の処に接するメツキ液は常時新
鮮であり而かも滞留や浸潤現象が無いので、メツ
キ効率やメツキ品位が極めて良好となり、特に多
量処理には好適である。(尚、詳細については、
前記発明に於いて開示してあるためここでの説明
を省略する。) ちなみに、本実施例では、第4図に図示したよ
うに金等の貴金属又はニツケルによる下地メツキ
部Aには、直径D1=0.3mm厚さ0.01μ、その表面
に処理した銀メツキ部Bは、直径D2=0.25mm厚さ
3〜5μと云う微小部分メツキが、極めて短時間
のうちに多量処理できて実用化レベルであること
が確認された。
Furthermore, since the plating liquid that comes into contact with the part to be plated is always fresh and there is no stagnation or infiltration phenomenon, the plating efficiency and plating quality are extremely good, and it is particularly suitable for processing large quantities. (For details, please refer to
Since it has been disclosed in the above invention, the explanation here will be omitted. ) Incidentally, in this example, as shown in FIG. 4, the base plated part A made of precious metal such as gold or nickel has a diameter D 1 =0.3 mm and a thickness of 0.01 μm, and a silver plated part B treated on the surface. It was confirmed that plating of small parts with a diameter D 2 =0.25 mm and a thickness of 3 to 5 μm can be performed in large quantities in an extremely short period of time and is at a practical level.

更に、説明する迄もなく、下地メツキのニツケ
ルは、酸化され易く而かもその皮膜は強靭である
から、この上に銀メツキしても置換を起しにくい
上高電流密度に於いてはそのメツキ皮膜の密着性
を劣化させない。一方下地の金や金合金或いは白
金属金属は、他種金属と比較してもイオン化傾向
が銀イオンに比べ小であるから還元銀の析出がな
く、特性的にも安定しているので、鉄素地や銅合
金素地との密着力が強く、且つ銀とも密着力が強
いため、確固とした銀メツキ処理ができる。
Furthermore, needless to be explained, the nickel used as the base plating is easily oxidized and its film is tough, so even if silver is plated on top of it, it is difficult to cause substitution, and the plating is difficult to oxidize at high current densities. Does not deteriorate the adhesion of the film. On the other hand, the underlying gold, gold alloy, or platinum metal has a smaller ionization tendency than silver ions compared to other metals, so there is no precipitation of reduced silver, and the properties are stable, so iron It has strong adhesion to substrates and copper alloy substrates, as well as strong adhesion to silver, allowing for reliable silver plating.

尚、下地メツキ径(D1)>銀メツキ径(D2)で
あるから、銀メツキの位置ズレは防止可能であ
る。
Incidentally, since the base plating diameter (D 1 )>the silver plating diameter (D 2 ), misalignment of the silver plating can be prevented.

このように処理した銀メツキでは、下地メツキ
処理品を銀メツキ処理する際に環元銀が析出する
ことが無いため、従来の銀メツキ処理工程の如く
置換防止処理を必要としない。
In the silver plating treated in this way, ring source silver does not precipitate when the base plating treated product is silver plated, so there is no need for substitution prevention treatment as in the conventional silver plating process.

更に、下地メツキ及び銀メツキ共真に必要とす
る処だけ微小部分メツキするから、下地メツキを
剥離する必要が無くなり、メツキ全工程に於いて
大巾な工数軽減化が可能である。又、本発明では
金や金合金等を下地メツキしても、その材料費は
極めて低廉である。
Furthermore, since both base plating and silver plating are plated in minute portions only where truly necessary, there is no need to peel off the base plating, and the man-hours in the entire plating process can be greatly reduced. Further, in the present invention, even if gold or gold alloy is used as the base plating, the material cost is extremely low.

例えば前記リードフレーム20に使用する場合
でも、1ケ所が直径0.3mm厚さ0.01μ程度である
から、全メツキ面積の金を合わせても非常に微量
で済む。
For example, even when used in the lead frame 20, since one place has a diameter of 0.3 mm and a thickness of about 0.01 μm, the total amount of gold required for the entire plating area is very small.

勿論、銀の方も1ケ所が直径0.25mm厚さ3μ〜
5μであるため銀の総量も微量で済む。
Of course, the silver one has a diameter of 0.25mm and a thickness of 3μ.
Since it is 5 μm, the total amount of silver is only a small amount.

而かも上記両メツキ共極めて短時間のうちに処
理できるため、工程の省略化と相俟つて処理コス
トは、在来の銀メツキ手段と比較して大巾に引下
げ可能である。更には、金や金合金及びニツケル
等はそれ自体が光輝性に富むため素地と下地との
識別性が高く、特に金合金の場合はその合金物に
対応して種々の色相が表われるための識別性が一
段と高くなり、その上に銀メツキをしたりボンデ
イングする時等センサーで検出し易く、位置決め
に好適であり、それらの処理精度をより高め得
る。
Furthermore, since both of the above plating processes can be performed in an extremely short time, the processing costs can be reduced significantly compared to conventional silver plating methods due to the simplification of steps. Furthermore, since gold, gold alloys, and nickel are themselves rich in brightness, it is highly distinguishable between the base and the base, and in the case of gold alloys in particular, various hues appear depending on the alloy. The identifiability is further improved, and it is easy to detect with a sensor when silver plating or bonding is performed on it, and it is suitable for positioning, and the processing accuracy can be further improved.

以上述べたように本発明によれば、下地メツキ
に金や金合金或いは白金属金属やニツケルを使用
し且つ必要な部分に微小部分メツキすると共に、
その下地メツキ面上に、より微小部分的に銀メツ
キ処理するようにしてあるから、次のような特徴
を有する。
As described above, according to the present invention, gold, gold alloy, platinum metal, or nickel is used as the base plating, and minute portions are plated in the necessary areas, and
Since the base plating surface is silver-plated in smaller parts, it has the following characteristics.

(1) 下地メツキの金や金合金或いは白金属金属や
ニツケルが被メツキ部材の素地と銀メツキ面の
両方に対し強い密着力があり、且つ環元銀の発
生が無いため微小部分メツキであつても極めて
メツキ強度が高く、又耐熱性に優れているため
メツキ部の特性を充分維持できる。
(1) The gold, gold alloy, platinum metal, or nickel of the base plating has strong adhesion to both the base material of the plated part and the silver plating surface, and there is no generation of ring base silver, so it is possible to plate small parts. However, it has extremely high plating strength and excellent heat resistance, so the properties of the plating area can be sufficiently maintained.

(2) 銀メツキ処理工程で置換防止工程と剥離工程
及びそれに付随する水洗工程が不要となるか
ら、メツキ処理時間の短縮化と相俟つて処理工
費が大巾に廉価となる。
(2) Since the silver plating process eliminates the need for a substitution prevention process, a peeling process, and the accompanying water washing process, the plating process time is shortened and the process costs are significantly reduced.

(3) 置換防止剤や剥離剤を使用しないため、これ
らの廃液処理設備や工程が不要となるばかり
か、これらの液剤が各メツキ形成部に及ぼす悪
影響も防止しメツキ品位をより高められる。
(3) Since no anti-displacement agent or stripping agent is used, not only are these waste liquid treatment equipment and processes unnecessary, but also the negative effects of these liquids on each plating forming area can be prevented and the plating quality can be further improved.

(4) 下地に金や金合金或いは白金属金属やニツケ
ル等極低抵抗の素材を用いるため、メツキ処理
部は高導電性を有し、ICリードフレームのボ
ンデイングエリアやコンタクター或いはプリン
ト基板のリード部に最適である。
(4) Because the base is made of a material with extremely low resistance such as gold, gold alloy, platinum metal, or nickel, the plating area has high conductivity, and is suitable for bonding areas of IC lead frames, contactors, and lead parts of printed circuit boards. Ideal for

(5) 下地メツキの段階で色相の付与やそれ自体の
光輝性により、被メツキ部材の素地との識別性
が強く、位置決め精度が数段と高くできる。
(5) By adding a hue at the stage of base plating and its own brightness, it is highly distinguishable from the base material of the member to be plated, and the positioning accuracy can be much higher.

従つて、銀メツキやボンデイング処理に際しそ
の座標を正確に設定し得る。
Therefore, the coordinates can be set accurately during silver plating or bonding processing.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の銀メツキ処理工程を示すブロツ
ク図、第2図は本発明に係る銀メツキ処理工程を
示すブロツク図、第3図は同上処理工程に於いて
使用されるメツキ装置の概略構成を示す縦断面
図、第4図は同上処理工程を経て得られたメツキ
処理物の斜視図である。 1……脱脂工程、2……水洗工程、3……酸洗
い工程、11……下地メツキ工程、12……銀メ
ツキ工程、20……リードフレーム(被メツキ部
材)、21……透孔、22……マスク、23……
密閉空間、24……外套管、25……ノズル、2
6……吸気管。
Fig. 1 is a block diagram showing a conventional silver plating process, Fig. 2 is a block diagram showing a silver plating process according to the present invention, and Fig. 3 is a schematic configuration of a plating device used in the above process. FIG. 4 is a perspective view of a plated product obtained through the same treatment process. 1... Degreasing process, 2... Water washing process, 3... Pickling process, 11... Base plating process, 12... Silver plating process, 20... Lead frame (member to be plated), 21... Through hole, 22...Mask, 23...
Closed space, 24... Mantle tube, 25... Nozzle, 2
6...Intake pipe.

Claims (1)

【特許請求の範囲】 1 被メツキ部材の特定箇所に金や金合金或いは
白金属金属又はニツケルにより部分メツキ処理し
た下地メツキ部を形成し、且つこの下地メツキ部
表面上には、これより微小の範囲を銀でもつて微
小部分メツキ処理した微小部分銀メツキ処理物。 2 被メツキ部材を脱脂酸洗いする工程と、洗浄
された被メツキ部材に金や金合金或いは白金属金
属又はニツケルのメツキ液を密閉負圧空間内で噴
射して微小部分下地メツキする手段と、該被メツ
キ部材の下地メツキ部に対し密閉負圧空間内で銀
メツキ液を噴射し微小部分銀メツキする手段から
成る微小部分銀メツキ方法。
[Scope of Claims] 1. A base plated portion is formed by partially plating with gold, gold alloy, platinum metal, or nickel at a specific location of a member to be plated, and on the surface of this base plated portion, finer particles than this are formed. A product that has been plated with silver in small areas. 2. A step of degreasing and pickling the member to be plated, and a means of spraying a gold, gold alloy, platinum metal, or nickel plating liquid onto the cleaned member to be plated in a sealed negative pressure space to perform base plating on minute portions; A microscopic silver plating method comprising means for spraying a silver plating liquid in a sealed negative pressure space onto the base plating portion of the member to be plated to silver the microscopic areas.
JP10158582A 1982-06-14 1982-06-14 Material treated on its minute part with silver plating and plating method Granted JPS58217693A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10158582A JPS58217693A (en) 1982-06-14 1982-06-14 Material treated on its minute part with silver plating and plating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10158582A JPS58217693A (en) 1982-06-14 1982-06-14 Material treated on its minute part with silver plating and plating method

Publications (2)

Publication Number Publication Date
JPS58217693A JPS58217693A (en) 1983-12-17
JPS627280B2 true JPS627280B2 (en) 1987-02-16

Family

ID=14304457

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10158582A Granted JPS58217693A (en) 1982-06-14 1982-06-14 Material treated on its minute part with silver plating and plating method

Country Status (1)

Country Link
JP (1) JPS58217693A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11255404B2 (en) 2017-11-08 2022-02-22 Bridgestone Corporation Anti-vibration device

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60257016A (en) * 1984-06-04 1985-12-18 日本電気株式会社 Method of plating lead switch contact
JPH0742596B2 (en) * 1984-12-04 1995-05-10 段谷産業株式会社 Lead frame plating method
JPS63156391A (en) * 1986-12-19 1988-06-29 松下電工株式会社 Manufacture of printed wiring board
PL2796593T3 (en) * 2013-04-26 2021-07-26 Howmet Corporation Internal airfoil component electroplating

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11255404B2 (en) 2017-11-08 2022-02-22 Bridgestone Corporation Anti-vibration device

Also Published As

Publication number Publication date
JPS58217693A (en) 1983-12-17

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