JPS6269365U - - Google Patents

Info

Publication number
JPS6269365U
JPS6269365U JP16075685U JP16075685U JPS6269365U JP S6269365 U JPS6269365 U JP S6269365U JP 16075685 U JP16075685 U JP 16075685U JP 16075685 U JP16075685 U JP 16075685U JP S6269365 U JPS6269365 U JP S6269365U
Authority
JP
Japan
Prior art keywords
grooves
disk
ion
ion implantation
rotary disk
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16075685U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16075685U priority Critical patent/JPS6269365U/ja
Publication of JPS6269365U publication Critical patent/JPS6269365U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来例の斜視図、第2図は本考案の実
施例の截断平面図、第3図は第2図の―線部
分の拡大図、第4図は第3図の―線部分の拡
大断面図、第5図及び第6図は凹溝の変形状態を
示す断面図である。 1……イオン注入室、2……イオンビーム、3
……回転デイスク、3a……表面、3b……裏面
、6……基板、8……凹溝。
Fig. 1 is a perspective view of the conventional example, Fig. 2 is a cutaway plan view of the embodiment of the present invention, Fig. 3 is an enlarged view of the - line part in Fig. 2, and Fig. 4 is the - line part in Fig. 3. FIGS. 5 and 6 are enlarged cross-sectional views showing the deformed state of the groove. 1...Ion implantation chamber, 2...Ion beam, 3
...Rotating disk, 3a...front surface, 3b...back surface, 6...substrate, 8...concave groove.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] イオンビームが導入されるイオン注入室内に回
転自在に回転デイスクを設け、該デイスクに取付
けたシリコンウエハその他の基板にイオン注入処
理を施すようにしたものに於て、該回転デイスク
の表面及び裏面の夫々に、複数本の凹溝を放射状
に形成し、各表面の凹溝と裏面の凹溝は多少の肉
厚を介して平行する一対に形成して成るイオン注
入装置用回転デイスク。
In an ion implantation chamber in which an ion beam is introduced, a rotary disk is provided so as to be rotatable, and ion implantation is performed on a silicon wafer or other substrate attached to the disk. A rotary disk for an ion implanter, in which a plurality of grooves are formed radially on each disk, and the grooves on each front surface and the grooves on the back surface are formed as a pair parallel to each other with some thickness between them.
JP16075685U 1985-10-22 1985-10-22 Pending JPS6269365U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16075685U JPS6269365U (en) 1985-10-22 1985-10-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16075685U JPS6269365U (en) 1985-10-22 1985-10-22

Publications (1)

Publication Number Publication Date
JPS6269365U true JPS6269365U (en) 1987-05-01

Family

ID=31086434

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16075685U Pending JPS6269365U (en) 1985-10-22 1985-10-22

Country Status (1)

Country Link
JP (1) JPS6269365U (en)

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