JPS626636B2 - - Google Patents

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Publication number
JPS626636B2
JPS626636B2 JP17091382A JP17091382A JPS626636B2 JP S626636 B2 JPS626636 B2 JP S626636B2 JP 17091382 A JP17091382 A JP 17091382A JP 17091382 A JP17091382 A JP 17091382A JP S626636 B2 JPS626636 B2 JP S626636B2
Authority
JP
Japan
Prior art keywords
glaze
thin film
metal
decorative body
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP17091382A
Other languages
Japanese (ja)
Other versions
JPS5964782A (en
Inventor
Tooru Mashida
Sumeo Matsushita
Noboru Tezuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP17091382A priority Critical patent/JPS5964782A/en
Publication of JPS5964782A publication Critical patent/JPS5964782A/en
Publication of JPS626636B2 publication Critical patent/JPS626636B2/ja
Granted legal-status Critical Current

Links

Description

【発明の詳細な説明】 この発明は新規な模様面をもつ装飾体の製造法
に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a decorative body having a novel patterned surface.

透明誘電体薄膜の示す干渉色は古くから多くの
人の注意をひき、貝がらを使つたらでん、真珠、
魚鱗の象嵌など天然品を使つた装飾体が好んで作
られているが、最近は薄膜製造技術の進歩により
人工的に作つた透明誘電体薄膜の干渉色を利用し
た装飾体が多数見られるようになつた。これらの
装飾体は、ガラス、金属板、金属箔に透明誘電体
を真空蒸着またはスパツタリング、イオンプレー
テイング、気相成長などの方法により適当厚さの
皮膜として付着せしめ、光の干渉色を示すように
したものである。しかしながら、かかる方法で透
明誘電体薄膜を作るのは必ずしも容易ではなく、
高度で精密な技術を必要としたり、金属薄膜を作
るに較べて時間がかかつたりする。
The interference colors exhibited by transparent dielectric thin films have long attracted the attention of many people, and the use of shells to make cod dens, pearls, etc.
Decorations using natural products such as inlays of fish scales are preferred, but recently, with advances in thin film manufacturing technology, many decorations are being made that utilize the interference colors of artificially created transparent dielectric thin films. It became. These decorations are made by attaching a transparent dielectric material to glass, metal plates, or metal foils as a film of appropriate thickness by vacuum evaporation, sputtering, ion plating, vapor phase growth, or other methods, so that they exhibit light interference colors. This is what I did. However, it is not always easy to make transparent dielectric thin films using this method.
It requires advanced and precise technology and takes more time than making metal thin films.

そこで本出願人は、複雑で深遠な光干渉性模様
層を、何度高度な精密技術を要することなく簡単
に短時間に発現せしめる技術を開発し、さきに特
願昭56―177112号公報として出願した。
Therefore, the present applicant has developed a technology that can easily create a complex and profound optically coherent pattern layer in a short time without requiring highly precise technology, and has previously published this technology in Japanese Patent Application No. 177112/1983. I applied.

該技術は釉を施した基体の釉面に金属薄膜を形
成し、これを酸素雰囲気中で高温処理し、美的模
様を示す光干渉性表面層を形成する方法である。
This technique is a method in which a thin metal film is formed on the glazed surface of a glazed substrate, and this is treated at high temperature in an oxygen atmosphere to form an optically coherent surface layer exhibiting an aesthetic pattern.

この方法によれば、複雑で深遠な光干渉性模様
層をもつ画期的な装飾体が得られるが、干渉性模
様は、膜面に対して見る角度(方向)によつて、
特に強く干渉色が現われたり、弱く現われたりす
る。これは干渉光の性質上当然のことではある
が、一つの問題点であつた。
According to this method, an epoch-making decorative body with a complex and profound optical interference pattern layer can be obtained, but the interference pattern differs depending on the angle (direction) when viewed with respect to the film surface.
Interference colors appear particularly strongly or weakly. Although this is natural due to the nature of interference light, it was a problem.

本発明は、この点を改善すべくなされたもの
で、釉面に凹凸模様をつけることによつて、どの
角度から見ても一様な干渉色が現われるようにな
すものである。
The present invention has been made to improve this point, and by providing a concavo-convex pattern on the glaze surface, a uniform interference color appears when viewed from any angle.

すなわち、その第一発明は基体面に釉を微細凹
凸状に施し、その上に金属薄膜を形成して、これ
を酸素雰囲気中で高温処理し、美的模様を示す光
干渉性表面層を形成することを特徴とする装飾体
の製造法を要旨とする。
That is, the first invention involves applying a glaze to the substrate surface in a finely uneven pattern, forming a thin metal film on top of the glaze, and treating this at high temperature in an oxygen atmosphere to form an optically coherent surface layer that exhibits an aesthetic pattern. The gist of this paper is a method for manufacturing a decorative body characterized by the following.

本発明に用いる基体としては、銅、銀、金、
鉄、鋼、ステンレスその他の合金などの金属、セ
ラミツク、陶磁器、ガラスなどの耐熱性材料が挙
げられる。
Substrates used in the present invention include copper, silver, gold,
Examples include metals such as iron, steel, stainless steel, and other alloys, and heat-resistant materials such as ceramics, ceramics, and glass.

釉としては、陶磁器用の釉と金属用の釉(ホー
ロー釉、七宝釉)があるが、上記基体の材質に合
せて、適当な釉を適宜選択して用いる。釉は無
色、有色、不透明のいずれでもよい。かかる釉を
微細凹凸状に施こすには、釉の粉末を基体面に適
当に散布するだけでよい。そうすると、焼成後、
釉面が島状、ゆず肌状またはちりめん状などの微
細凹凸状を示すようになる。釉粉を基体面に粗く
散布するか密に散布するかによつて、また、散布
する量を加減することによつて、焼成後の釉面の
凹凸の山谷が浅くなつたり、深くなつたりし、上
述のゆず肌やちりめん状になつたり、また、釉の
かかつていない基体面が現われて、釉が島状に存
在する模様をつくることができる。
Glazes include glazes for ceramics and glazes for metals (enamel glaze, cloisonné glaze), and an appropriate glaze is selected and used depending on the material of the substrate. The glaze may be colorless, colored, or opaque. In order to apply such a glaze in the form of fine irregularities, it is sufficient to appropriately sprinkle powder of the glaze on the surface of the substrate. Then, after firing,
The glaze surface begins to show minute irregularities such as islands, yuzu skin, or crepe. Depending on whether the glaze powder is sprinkled coarsely or densely on the base surface, and by adjusting the amount of scattering, the peaks and valleys of the unevenness on the glaze surface after firing will become shallower or deeper. It is possible to create the above-mentioned yuzu skin or crepe-like pattern, or the surface of the base that has never been glazed appears, creating a pattern in which the glaze exists in islands.

また、第二発明は釉を施した基体面に、耐熱性
細粒を散布して焼成することによつて微細凹凸表
面を形成し、その上に金属薄膜を形成して、これ
を酸素雰囲気中で高温処理し、美的模様を示す光
干渉性表面層を形成することを特徴とする装飾体
の製造法を要旨とする。
In addition, the second invention forms a finely uneven surface by scattering and firing heat-resistant fine particles on the glazed substrate surface, forming a metal thin film on top of the fine unevenness, and then exposing this in an oxygen atmosphere. The gist of the present invention is a method for producing a decorative body, which is characterized by forming a light-coherent surface layer exhibiting an aesthetic pattern through high-temperature treatment.

この方法は施釉した基体面に、耐熱性細粒を散
布して焼成することによつて、凹凸模様の釉面を
形成するものであるが、耐熱性細粒としてはガラ
スビーズなど無機質の小球粉、金属の小球または
ガラス、セラミツクス、金属、宝石などの細破砕
片などが用いられる。これらは、焼成に当つて完
全には溶けない程度の耐熱性が必要である。
This method forms a glazed surface with an uneven pattern by scattering heat-resistant fine particles on the glazed substrate surface and firing them. Powder, small metal balls, or finely crushed pieces of glass, ceramics, metal, jewelry, etc. are used. These materials require heat resistance to the extent that they do not completely melt during firing.

この方法によつても、釉面は凹凸を形成し、表
面に形成される金属薄膜による干渉光は広範囲の
角度にわたつて一様に反射される。
Even with this method, the glazed surface forms irregularities, and the interference light due to the metal thin film formed on the surface is uniformly reflected over a wide range of angles.

上記二つの発明において、釉を施した基体は、
上述のように干渉色を出すために、表面に金属薄
膜が形成されるが、その方法は、真空蒸着、スパ
ツタリング、イオンプレーテイング、気相成長お
よびメツキのいずれかの方法による。この形成す
る金属薄膜の材質としては、Fe、Cr、Ni、Cu、
Zn、Ti、Mn、Al、Mg、Zr、Si、、Pb、Sn、In、
Sb、Co、Mo、W、Bi、鋼、合金など種々のもの
が用いられるが、高温の酸素雰囲気中で容易に酸
化される金属がよい。
In the above two inventions, the glazed base is
In order to produce interference colors as described above, a metal thin film is formed on the surface by any one of vacuum evaporation, sputtering, ion plating, vapor phase growth, and plating. The material of the metal thin film to be formed is Fe, Cr, Ni, Cu,
Zn, Ti, Mn, Al, Mg, Zr, Si, , Pb, Sn, In,
Various materials such as Sb, Co, Mo, W, Bi, steel, and alloys can be used, but metals that are easily oxidized in a high-temperature oxygen atmosphere are preferred.

金属薄膜の厚さは、材質によつて多少変動はあ
るが、酸化して表面に光の干渉色ができる厚さ例
えば30ミリミクロン以上がよい。
The thickness of the metal thin film varies somewhat depending on the material, but it is preferably a thickness of 30 millimicrons or more, such as 30 millimicrons or more, at which oxidation produces light interference colors on the surface.

こうしてできた金属薄膜をつけた施釉基体は、
酸素雰囲気中で高温処理を行なう。電気炉による
ときは、空気中でよく、特に酸素を導入する必要
はない。窯業炉の場合は酸化炎炉を用いる。
The glazed base coated with the metal thin film created in this way is
High temperature treatment is performed in an oxygen atmosphere. When using an electric furnace, air may be used, and there is no need to introduce oxygen. In the case of a ceramic furnace, an oxidizing flame furnace is used.

高温処理としては、炉内での処理以外に、空気
中でのバーナー加熱、赤外線加熱、誘導または誘
電加熱などの加熱方法が用いられる。高温処理の
温度は、金属薄膜が酸化し、釉が半流動性を示す
程度がよい。金属薄膜や釉の種類によつて異なる
が、300〜1600℃の範囲であれば、ほとんどの場
合充分である。
As the high-temperature treatment, in addition to treatment in a furnace, heating methods such as burner heating in air, infrared heating, induction or dielectric heating are used. The temperature of the high temperature treatment is preferably such that the metal thin film is oxidized and the glaze exhibits semi-fluidity. Although it varies depending on the type of metal thin film and glaze, a temperature range of 300 to 1600°C is sufficient in most cases.

高温処理されると、金属薄膜は速やかに表面か
ら酸化されて酸化薄膜を形成し、干渉色を現わす
ようになるが、酸化が進むにつれて、干渉色も変
化してゆく。これは既に知られている透明誘電体
薄膜に関する光学的厚さと干渉色の関係に従つて
変つてゆくものと考察される。この場合途中の段
階では、上層は金属酸化物薄膜で、下層は金属薄
膜の状態となつている。高温処理をこの段階で止
めることもあり、金属薄膜全体を完全に酸化する
こともあり、また金属薄膜の一部を全酸化し、一
部には金属部分を下層に残しておくこともある。
要するに希望する模様および色彩に応じて金属薄
膜の酸化程度を適宜制御するものである。
When subjected to high-temperature treatment, the metal thin film is quickly oxidized from the surface to form an oxide thin film, which begins to exhibit interference colors, but as the oxidation progresses, the interference colors also change. This is considered to change according to the already known relationship between optical thickness and interference color for transparent dielectric thin films. In this case, at an intermediate stage, the upper layer is a metal oxide thin film and the lower layer is a metal thin film. The high-temperature treatment may be stopped at this stage, and the entire thin metal film may be completely oxidized, or a portion of the thin metal film may be completely oxidized, leaving the metal portion as an underlying layer.
In short, the degree of oxidation of the metal thin film is appropriately controlled depending on the desired pattern and color.

また、高温処理の目的は、上記の如く金属薄膜
を酸化させて、干渉色を示す透明金属酸化物の薄
膜を形成する以外に、釉を半流動性にして、金属
層や金属酸化物層にき裂、しわ、条、泡などを生
じさせて、模様に変化を与えることにもある。す
なわち、上記方法により釉面に作つた金属薄膜中
の金属酸化物および金属層は、顕微鏡で観察する
と、太いき裂からほそいき裂まで不規則に割れた
り、しわ、条、泡穴が生じたり、突沸部によつて
下地の釉が現れたりする。これは釉がガラス転位
点に達して起る急激な容積変化と、薄膜の機械的
強度との関係によつて起るものと推定される。
In addition to oxidizing the metal thin film as described above to form a transparent metal oxide thin film that exhibits interference colors, the purpose of high-temperature treatment is to make the glaze semi-fluid and to form a metal layer or metal oxide layer. It can also cause changes in the pattern by creating cracks, wrinkles, striations, and bubbles. In other words, when the metal oxides and metal layers in the metal thin film formed on the glaze surface by the above method are observed under a microscope, they show irregular cracks ranging from thick to thin cracks, wrinkles, streaks, and bubble holes. , the underlying glaze may appear due to the bumps. This is presumed to be caused by the relationship between the rapid volume change that occurs when the glaze reaches the glass transition point and the mechanical strength of the thin film.

そして、金属薄膜は高温で半流動性になつた釉
に溶解されることは少ないが、金属酸化物層は容
易に釉に溶解されてその干渉色を失なう。
The metal thin film is rarely dissolved in the glaze, which becomes semi-fluid at high temperatures, but the metal oxide layer is easily dissolved in the glaze and loses its interference color.

したがつて、高温処理の温度条件、温度むら、
薄膜の厚さ、同厚さむらなどにより、また、酸化
程度(処理時間)により、上記の作用が複雑にか
らみ合い、基体表面の金属薄膜には金属酸化物層
および金属層に複雑なき裂、しわ、条などが生
じ、また、金属酸化物層が釉に溶解されて消失
し、そこは釉の地模様になつたり、泡や突沸がで
きたりし、また、基体の凹凸釉面の効果とあいま
つて、従来の単純な干渉色模様とは異つた複雑で
深遠な味わいをもつた干渉色模様が得られる。
Therefore, the temperature conditions of high-temperature treatment, temperature unevenness,
The above effects are intricately intertwined depending on the thickness of the thin film, uneven thickness, etc., and the degree of oxidation (processing time), resulting in complex cracks and cracks in the metal oxide layer and metal layer of the metal thin film on the surface of the substrate. Wrinkles and streaks occur, and the metal oxide layer dissolves into the glaze and disappears, forming the base pattern of the glaze, causing bubbles and bumps, and the effects of uneven glaze surfaces on the base. Together, an interference color pattern with a complex and profound taste different from the conventional simple interference color pattern can be obtained.

さらに高温処理によつて、金属薄膜を強固に釉
と結合させることができ、摩擦、摩耗に耐えるよ
うになる。
Furthermore, the high temperature treatment allows the metal thin film to be firmly bonded to the glaze, making it resistant to friction and wear.

高温処理時間は上記の複雑な作用を考えて、望
みの模様が現れるところに設定すればよい。
The high-temperature treatment time may be set at a time at which the desired pattern appears, taking into account the above-mentioned complex effects.

以下、実施例について説明する。 Examples will be described below.

実施例 1 耐熱性セラミツクス板(材質、酸化アルミニウ
ム、寸法50.8×50.8×0.6mm)に焼成温度850℃の
ホーケイ酸塩釉薬の粉末(40メツシユ篩通過)を
篩を用いて粗く板一面に散布し(散布の厚さ0.00
〜0.02mm、量0.1g)、870℃の炉に3分間入れ
て、表面がちりめん状模様をなす釉掛けしたセラ
ミツクス板を得た。これをチタン金属をターゲツ
トとするスパタリング装置に入れ、5Paの低圧ア
ルゴン気流中で直流放電(電流1A、電圧500V)
を50秒行ない、釉面をもつたセラミツクス板上に
金属チタン薄膜(膜厚2200±330Å)を作つた。
これを700℃の電気炉(空気浴)に80秒入れて、
酸化膜を作り、黄金干渉色を示すセラミツクス板
を得た。酸化膜の厚さは1300〜1400Åと推定され
る。この板はちりめん模様の凹凸の面から黄金干
渉色が見られ、見る方向による干渉色の強弱は極
めてわずかであり、美的な黄金色ちりめん模様の
光干渉性表面層をもつセラミツクス板が得られ
た。
Example 1 A heat-resistant ceramic board (material: aluminum oxide, dimensions 50.8 x 50.8 x 0.6 mm) was coated with porosilicate glaze powder (passed through a 40-mesh sieve) at a firing temperature of 850°C, and was coarsely sprinkled over the board using a sieve. (Scattering thickness 0.00
~0.02 mm, amount: 0.1 g) and placed in a furnace at 870°C for 3 minutes to obtain a glazed ceramic plate with a crepe-like pattern on the surface. This was placed in a sputtering device targeting titanium metal, and DC discharged in a 5Pa low-pressure argon flow (current 1A, voltage 500V).
This was carried out for 50 seconds to form a metallic titanium thin film (film thickness 2200±330 Å) on a ceramic plate with a glazed surface.
Place this in an electric furnace (air bath) at 700℃ for 80 seconds,
We created an oxide film and obtained a ceramic plate that exhibits a golden interference color. The thickness of the oxide film is estimated to be 1300-1400 Å. In this board, a golden interference color was seen from the uneven surface of the crepe pattern, and the strength or weakness of the interference color depending on the viewing direction was extremely small, resulting in a ceramic board with an optically coherent surface layer with an aesthetic golden crepe pattern. .

実施例 2 耐熱性セラミツクス板(材質、酸化アルミニウ
ム、寸法50.8×50.8×0.6mm)に焼成温度850℃の
ホーケイ酸塩釉薬(40メツシユ篩通過)0.2gを
一面に施釉し、さらに径0.2〜0.8mmのガラスビー
ズ0.8gを篩を用いて板一面に粗く散布して、870
℃の炉に3分間入れて焼成し、微細凹凸表面をも
つ板を得た。これを金属チタンをターゲツトとす
るスパタリング装置に入れ、5Paの低圧アルゴン
気流中で直流放電(電流1A、電圧500V)を50秒
行ない、微細凹凸の釉面をもつたセラミツクス板
上に金属チタン薄膜(薄膜の厚さ2200±330Å)
を作つた。これを700℃の電気炉(空気浴)に120
秒間入れて、酸化膜を作つた。酸化膜の厚さは
1700〜1800Åと推測される。この板はゆず肌状の
微細凹凸表面をもち、その面から青色干渉色が見
られ、見る方向による干渉色の強弱は極めてわず
かであり美的な青色ゆず肌模様の光干渉性表面層
をもつセラミツクス板が得られた。
Example 2 A heat-resistant ceramic plate (material: aluminum oxide, dimensions: 50.8 x 50.8 x 0.6 mm) was coated with 0.2 g of porosilicate glaze (passed through a 40-mesh sieve) at a firing temperature of 850°C, and further glazed with a diameter of 0.2 to 0.8 mm. Using a sieve, coarsely scatter 0.8 g of glass beads of 870 mm size over the entire board.
The material was fired by placing it in a furnace at ℃ for 3 minutes to obtain a plate having a finely uneven surface. This was placed in a sputtering device that targets titanium metal, and DC discharge (current 1A, voltage 500V) was performed for 50 seconds in a low-pressure argon flow of 5Pa, and a thin metal titanium film ( Thin film thickness 2200±330Å)
I made it. Place this in an electric furnace (air bath) at 700℃ for 120 minutes.
I left it there for a second to create an oxide film. The thickness of the oxide film is
It is estimated to be 1700-1800Å. This board has a finely uneven surface in the shape of an orange skin, and a blue interference color can be seen from that surface, and the strength or weakness of the interference color depending on the viewing direction is extremely small. A board was obtained.

以上のようにこの発明によれば、新規な模様面
をもつ装飾体が得られ、これは装飾品、食器、建
材、工芸品などとして極めて有用なものである。
As described above, according to the present invention, a decorative body having a novel patterned surface can be obtained, which is extremely useful as ornaments, tableware, building materials, crafts, etc.

Claims (1)

【特許請求の範囲】 1 基体面に釉を微細凹凸状に施し、その上に金
属薄膜を形成して、これを酸素雰囲気中で高温処
理し、美的模様を示す光干渉性表面層を形成する
ことを特徴とする装飾体の製造法。 2 釉を施した基体面に、耐熱性細粒を散布して
焼成することによつて微細凹凸表面を形成し、そ
の上に金属薄膜を形成して、これを酸素雰囲気中
で高温処理し、美的模様を示す光干渉性表面層を
形成することを特徴とする装飾体の製造法。 3 金属薄膜の形成を真空蒸着、スパツタリン
グ、イオンプレーテイング、気相成長およびメツ
キのいずれかの方法にて行なう特許請求の範囲第
1項又は第2項記載の装飾体の製造法。 4 高温処理は金属薄膜が酸化し、釉が半流動性
となる温度で行なう特許請求の範囲第1項又は第
2項記載の装飾体の製造法。
[Claims] 1. A glaze is applied to the substrate surface in a finely uneven shape, a thin metal film is formed on the glaze, and this is treated at high temperature in an oxygen atmosphere to form a light interference surface layer exhibiting an aesthetic pattern. A method for manufacturing a decorative body characterized by: 2. A finely uneven surface is formed by scattering heat-resistant fine particles on the glazed substrate surface and firing, forming a thin metal film on top of the surface, and treating this at high temperature in an oxygen atmosphere. A method for producing a decorative body characterized by forming a light interference surface layer exhibiting an aesthetic pattern. 3. The method for producing a decorative body according to claim 1 or 2, wherein the metal thin film is formed by any one of vacuum deposition, sputtering, ion plating, vapor phase growth, and plating. 4. The method for producing a decorative body according to claim 1 or 2, wherein the high temperature treatment is carried out at a temperature at which the metal thin film is oxidized and the glaze becomes semi-fluid.
JP17091382A 1982-10-01 1982-10-01 Production of decorative body Granted JPS5964782A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17091382A JPS5964782A (en) 1982-10-01 1982-10-01 Production of decorative body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17091382A JPS5964782A (en) 1982-10-01 1982-10-01 Production of decorative body

Publications (2)

Publication Number Publication Date
JPS5964782A JPS5964782A (en) 1984-04-12
JPS626636B2 true JPS626636B2 (en) 1987-02-12

Family

ID=15913660

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17091382A Granted JPS5964782A (en) 1982-10-01 1982-10-01 Production of decorative body

Country Status (1)

Country Link
JP (1) JPS5964782A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2681874B2 (en) * 1994-04-06 1997-11-26 株式会社加藤機械製作所 Food and drink and food containers

Also Published As

Publication number Publication date
JPS5964782A (en) 1984-04-12

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