JPS6262824A - Production of polymerized thin film of metalphenanthroline complex - Google Patents

Production of polymerized thin film of metalphenanthroline complex

Info

Publication number
JPS6262824A
JPS6262824A JP20412185A JP20412185A JPS6262824A JP S6262824 A JPS6262824 A JP S6262824A JP 20412185 A JP20412185 A JP 20412185A JP 20412185 A JP20412185 A JP 20412185A JP S6262824 A JPS6262824 A JP S6262824A
Authority
JP
Japan
Prior art keywords
phenanthroline
metal
thin film
complex
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20412185A
Other languages
Japanese (ja)
Other versions
JPH0635514B2 (en
Inventor
Yoshikazu Kondo
義和 近藤
Akio Nishino
西野 明男
Toshihiro Yamamoto
俊博 山本
Yoshihito Osada
義仁 長田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanebo Ltd
Original Assignee
Kanebo Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanebo Ltd filed Critical Kanebo Ltd
Priority to JP20412185A priority Critical patent/JPH0635514B2/en
Publication of JPS6262824A publication Critical patent/JPS6262824A/en
Publication of JPH0635514B2 publication Critical patent/JPH0635514B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)

Abstract

PURPOSE:To obtain the titled thin film having high toughness, insoluble in solvent and useful as an indicator, display element, etc., by evaporating and polymerizing a metal-containing compound with a phenanthroline compound in a low-temperature gas plasma thereby depositing a polymerized thin film of the complex of both compounds on a substrate. CONSTITUTION:A metallic compound (e.g ferrocene) and a phenanthroline compound (e.g. o-phenanthroline) are evaporated and polymerized in a low- temperature gas plasma of preferably a non-polymerizable gas (e.g. nitrogen) in vacuum of preferably 10<-3>-10<0>Torr by heating e.g. with a heaer, far infrared radiation, etc. to form the objective polymerized thin film of metal- phenanthroline complex on a substrate (e.g. cellulose acetate membrane filter, etc.). The metal-containing compound is preferably an organometallic compound and the metal is preferably Cu, Ag, Cd, Sn, Pb, Mn, Fe, Ni, etc.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は金属・フェナンスロリン錯体重合薄膜の製造方
法に関する。
DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a method for producing a metal-phenanthroline complex polymeric thin film.

〈従来の技術〉 フェナンスロリン、特にO−フェナンスロリンはFe、
Ag、Cd、Cu、Zn、lAn、Pb、Sn、N i
等の金属とキレートを形成し、金属の分析、回収に使わ
れてきた。
<Prior art> Phenanthroline, especially O-phenanthroline, contains Fe,
Ag, Cd, Cu, Zn, lAn, Pb, Sn, Ni
It forms chelates with other metals and has been used for metal analysis and recovery.

又、金属フェナンスロリン船体は、中心金属の荷電によ
りその錯体の色が変化する事が知られている。例えば、
鉄・フェナンスロリン錯体では下式のような酸化・還元
反応により、錯体の色が変化する。
Furthermore, it is known that the color of the complex of the metal phenanthroline hull changes depending on the charge of the central metal. for example,
In the iron-phenanthroline complex, the color of the complex changes due to the oxidation/reduction reaction shown in the formula below.

Fe(0−フェナンスロリン)R+e、−無色    
 Fe(0−フェナンスロリン)8赤色 従って、この酸化・還元反応を電気的に生ぜしめ。
Fe (0-phenanthroline) R+e, -colorless
Fe (0-phenanthroline) 8 Red Therefore, this oxidation/reduction reaction is caused electrically.

エレクトロクロミズムをおこす事が出来る。もし金k・
フェナンスロリンの薄膜が出来れば、エレクトロクロ6
ツク素子として利用する事が出来る。
It can cause electrochromism. If gold k.
If a thin film of phenanthroline is made, electrochromatography 6
It can be used as a pick element.

これまで金属・フェナンスロリンの不浴性薄股化はもち
ろん、MU化さえも試みられていない。
Up to now, no attempt has been made to make metal/phenanthroline thinner, let alone MU.

〈本発明が解決しようとする問題点〉 本発明者らは鋭意検旧の結果5本発明を完成するに至っ
た0本発明の目的は金属・フェナンスロリン錯体の強面
で溶剤不洛のよ合昂瞑を工業的容后かつ安価に製造する
方法を提供するにある。
<Problems to be Solved by the Present Invention> As a result of intensive research, the present inventors have completed the present invention. The object of the present invention is to provide a method for industrially and inexpensively manufacturing Heqong Meditation.

〈問題点を解決する為の手段〉 本発明方法は貼温ガスプラズマ中で金属含有化合物とフ
ェナンスロリン系化合物とを気化して重合し、基体上に
金−・フェナンスロリン錯体重合薄膜を形成させること
を特徴とする。
<Means for solving the problems> The method of the present invention vaporizes and polymerizes a metal-containing compound and a phenanthroline compound in a hot gas plasma to form a polymerized thin film of a gold-phenanthroline complex on a substrate. It is characterized by forming.

本発明方法で用いる低温ガスプラズマとはプラズマ中の
電子温度がイオン又は他の活性原子の温度より十分高い
非平衡プラズマを言い、該プラズマを発生させる方法と
しては公知のいずれの方法も採用する事が出来る0例え
ばJ−R,ホラハン(Ho1lahan )とA−’I
’、ベル(Bell )版「プラズマ化学の応用技術」
、ワイリー、ニューヨーク1974およびMジエン(S
hen)版「重合体のプラズマ化学」デツカ−・ニュー
ヨーク・1976に記載されている。即ち高周波発生器
に連結された平行板電極の間にモノマーを真空下で入れ
、真空室の外部又は内部のいずれかの平行板を用いてプ
ラズマを生成させることが出来る。また外部誘導コイル
によって電場をつくらせ、イオン化ガスのプラズマを発
生させてもよく、また反対に荷電した電極に間隔をおい
て直接真空室に入れてプラズマを生成させてもよい。
The low-temperature gas plasma used in the method of the present invention refers to non-equilibrium plasma in which the electron temperature in the plasma is sufficiently higher than the temperature of ions or other active atoms, and any known method may be used to generate the plasma. For example, J-R, Hollahan and A-'I
', Bell edition "Application Technology of Plasma Chemistry"
, Wiley, New York 1974 and M Zien (S
hen) "Plasma Chemistry of Polymers", Detzker, New York, 1976. That is, the monomer can be placed under vacuum between parallel plate electrodes connected to a high frequency generator, and the plasma can be generated using the parallel plates either outside or inside the vacuum chamber. Alternatively, an electric field may be created by an external induction coil to generate a plasma of ionized gas, or a plasma may be generated by placing oppositely charged electrodes spaced apart directly into a vacuum chamber.

低温ガスプラズマのガスとしては非酸化性で非重合性ガ
スが好ましく、例えば窒素、アルゴン、ヘリウム、水素
などが挙げられる。非ホ合性ガスの量は反応器内の真空
度を通常10”−’〜l 02torr、好ましくは1
0−4〜10’ torr 、更に好ましくは1σ8〜
10°torrとするように設定する。真空度が1O−
6torr未満又は102torr以上では、低温ガス
プラズマの発生が困1iか或いは不安定となり、好まし
くない。
The gas for the low-temperature gas plasma is preferably a non-oxidizing and non-polymerizable gas, such as nitrogen, argon, helium, hydrogen, etc. The amount of non-polymerizable gas is determined so that the degree of vacuum in the reactor is normally 10'' to 102 torr, preferably 1
0-4 to 10' torr, more preferably 1σ8 to
Set to 10°torr. Vacuum degree is 1O-
If it is less than 6 torr or more than 102 torr, generation of low-temperature gas plasma becomes difficult or unstable, which is not preferable.

低温ガスプラズマは高周波の印加により容易に発生させ
る事が出来る。印加する高周波の出力はiα極形状、t
a極の面積、反応器の大きさ等に依存するが、直径15
のの平行平板電極を使用する場合、通常200W以下、
好ましくは5〜150W、更に好ましくは10〜ioo
w、特に好ましくは20〜70Wである。
Low-temperature gas plasma can be easily generated by applying high frequency. The high frequency output to be applied has an iα pole shape, t
It depends on the area of the a electrode, the size of the reactor, etc., but the diameter is 15
When using parallel plate electrodes, the power is usually 200W or less,
Preferably 5 to 150W, more preferably 10 to ioo
w, particularly preferably 20 to 70W.

プラズマ重合時間は目的に応じて沿宜選択できるが、通
常3600秒以上、好ましくは10〜600秒、史に好
ましくは30〜300秒位である。又、低温ガスプラズ
マとして空気、酸系等酸化性ガスが主体のプラズマでは
、モノマーかプラズマ中で酸化されやすく1本合膜の形
成が困難となる。金属含有化合物はプラズマ重合膜の性
状、形成のしやすさ及び気化のしやすさの点で++lh
金属化合物が好ましい。又、金属の種類としては、フェ
ナンスロリンと錯体形成能のみ・ろものでなcjればな
らず、好ましく 14. Cu、Ag、Cd、 3n 
、Pb 、Mn 、F”e 、N i等がある。
The plasma polymerization time can be appropriately selected depending on the purpose, but is usually 3,600 seconds or more, preferably 10 to 600 seconds, and most preferably about 30 to 300 seconds. Furthermore, in a low-temperature gas plasma that is mainly composed of air or an oxidizing gas such as an acidic gas, the monomer is likely to be oxidized in the plasma, making it difficult to form a single composite film. Metal-containing compounds are ++lh in terms of plasma polymerized film properties, ease of formation, and ease of vaporization.
Metal compounds are preferred. In addition, the type of metal must be one that has only the ability to form a complex with phenanthroline, and is preferred. Cu, Ag, Cd, 3n
, Pb, Mn, F"e, Ni, etc.

フェナンスロリンは0−、m−、p−フェナンスロリン
と3つの異性体が存在するが、0−フェナンスロリン(
1,10−フェナンスロリン)及びその誘導体を主体と
したものが好ましい。0−フェナンスロリンは常圧で沸
点が360−“C以上あり、蒸気圧が低いが気化しやす
くする為及びプラズマ重合膜形成面向上の為に各種の誘
導体を用いる事も好ましい。
There are three isomers of phenanthroline: 0-, m-, and p-phenanthroline, but 0-phenanthroline (
1,10-phenanthroline) and derivatives thereof are preferred. Although O-phenanthroline has a boiling point of 360° C. or more at normal pressure and a low vapor pressure, it is preferable to use various derivatives to facilitate vaporization and to improve the surface on which the plasma polymerized film is formed.

金属含有化合物及びフェナンスロリンは10−6〜10
2tbrrといった圧力下でも気化しに<<、良好なプ
ラズマ重合膜を形成させる為にはそれらを加熱し積極的
に気化させる必要がある。加熱の方法としてはヒーター
加熱、遠赤外線加熱、高周波加熱、レーザー加熱及び電
子銃による加熱がある。
Metal-containing compounds and phenanthroline are 10-6 to 10
They cannot be vaporized even under a pressure of 2 tbrr, so in order to form a good plasma polymerized film, it is necessary to heat them and actively vaporize them. Heating methods include heater heating, far infrared heating, high frequency heating, laser heating, and heating with an electron gun.

金属含有化合物及びフェナンスロリンの気化速度は金属
フェナンスロリン錯体の形成比と同等か或いは金属蒸発
速度が大きい方がよい。金属が不足すると、錯体形成が
十分でなくなる。
The evaporation rate of the metal-containing compound and phenanthroline is preferably equal to or higher than the formation ratio of the metal phenanthroline complex. If there is a lack of metal, complex formation will not be sufficient.

低温ガスプラズマ中で金属含有化合物及びフェナスロリ
ンを気化して重合させると、溶剤不溶性の金属フェナン
スロリン錯体薄膜が形成され、良好な架橋重合膜が形成
される。この金か4フ工ナンスロリン錯体薄膜の形成過
程は十分解明されていないが、プラズマ中にて金属含有
化合物の金属のイオンjMl glとフェナンスロリン
の活性分子が真空という希薄で自由に動きうる空間で再
結合し、金属フェナンスロリン錯体重合薄膜を形成する
ものと思われる。
When a metal-containing compound and phenathroline are vaporized and polymerized in a low-temperature gas plasma, a solvent-insoluble metal phenanthroline complex thin film is formed, and a good crosslinked polymer film is formed. Although the formation process of this thin film of gold or 4-functional nanthroline complex has not been fully elucidated, the metal ions of the metal-containing compound and the active molecules of phenanthroline can move freely in the sparse space of vacuum in the plasma. It is thought that the metal phenanthroline complexes are recombined to form a polymerized thin film of the metal phenanthroline complex.

〈発明の効果〉 本発明方法は、従来全く得られていない金属・フェナン
スロリン錯体重合薄膜の製造方法を提供するという点で
工業的に大きに意義を有する。
<Effects of the Invention> The method of the present invention has great industrial significance in that it provides a method for producing a metal-phenanthroline complex polymerized thin film, which has not been obtained at all heretofore.

又、本発明方法で得られた金属・フェナンスロリン錯体
重合薄膜は中心金属の種類及び荷12数により錯体の色
が変化し、これを利用して有用な酸化・還元指示薬、比
色指示薬1表示素予成いは試験紙として使用可能である
等多くの有用性をもつ。
In addition, the color of the metal-phenanthroline complex polymer thin film obtained by the method of the present invention changes depending on the type of central metal and the number of charges 12, and this can be used to produce useful oxidation/reduction indicators and colorimetric indicators 1 Display element pre-preparation has many useful properties, such as being able to be used as a test strip.

〈実施例〉 以下、実施例を示し、本発明を更に詳しく説明する。<Example> EXAMPLES Hereinafter, the present invention will be explained in more detail with reference to Examples.

実施例1゜ 第1図に本発明に使用したプラズマ反応装置を示す。1
は高周波電源(RFtf源)で、13.56MHzの高
層波を発生させる。lで発生した高周波は19のマツチ
ングボックスを通じて反応器2内の直径1Ocrnの電
極3に通じる。電極3とアース側電極5との間に高周波
が印加されると、反応器内に低温ガスプラズマが発生す
る。金部含有化合物としてフェロセンを用い、加熱容器
21に1.Of入れた。又、フェナンスロリンは加熱用
容器に0.51入れた。バルブ11を微開し、窒素ガス
を15m1/分で流し、真空ポンプ9を起動し1507
?/分の排気速度で排気し、反応器内を0.lトールの
真空度に保った0次いで高周波を30Wの出力で印加し
、窒素ガスの低温ガスプラズマを発生させる。低温ガス
プラズマを発生させながら加熱用電源22を調整し、フ
ェロセン及びフェナンスロリンを3分間間時に気化させ
た。フェロセンの気化量は0.24f、フェナンスロリ
ンの気化量は0.719であった。
Example 1 FIG. 1 shows a plasma reactor used in the present invention. 1
is a high frequency power source (RFtf source) that generates high frequency waves of 13.56 MHz. The high frequency waves generated in the reactor 2 are passed through 19 matching boxes to the electrode 3 having a diameter of 1Ocrn in the reactor 2. When a high frequency wave is applied between the electrode 3 and the earth-side electrode 5, a low-temperature gas plasma is generated within the reactor. Using ferrocene as the metal-containing compound, 1. I put Of. Moreover, 0.51 of phenanthroline was placed in the heating container. Slightly open the valve 11, flow nitrogen gas at a rate of 15 ml/min, start the vacuum pump 9, and
? The inside of the reactor was evacuated at a pumping speed of 0.000. A low-temperature gas plasma of nitrogen gas is generated by applying a high frequency wave with an output of 30 W at a vacuum level of 1 Torr. The heating power source 22 was adjusted while generating low-temperature gas plasma, and ferrocene and phenanthroline were vaporized for 3 minutes. The amount of evaporation of ferrocene was 0.24f, and the amount of evaporation of phenanthroline was 0.719.

基体4は0.1μの多孔を有する酢酸セルローズのメン
ブランフィルタ−を用いた。基体上には良好な鉄・フェ
ナンスロリンの錯体重合薄膜が得られた。膜は赤味を帯
びており、又、水及びエタノール等フェナンスロリンの
溶剤に不溶であり、鉄(1)フェナンスロリンの錯体重
合薄膜の形成が確認された。
As the substrate 4, a cellulose acetate membrane filter having pores of 0.1 μm was used. A good thin film of iron/phenanthroline complex polymerization was obtained on the substrate. The film was reddish and was insoluble in phenanthroline solvents such as water and ethanol, confirming the formation of a thin film of iron(1) phenanthroline complex polymerization.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はプラズマ重合装置の1例を示すもので。 lはh周波電源、2は十字管型反応容器、3及び5は平
行平板tl171Th、 9は真空ポンプ、16.17
及び18は非重合性ガスの供給系、2oはモノマーを示
す。基体4は加熱用容器21のほぼ真上に位置するよう
にする。 〃   刀不牢ワせ械体式云扛 第1図 zO:毛ノマー
Figure 1 shows an example of a plasma polymerization apparatus. 1 is a h-frequency power source, 2 is a cross-tube reaction vessel, 3 and 5 are parallel plates tl171Th, 9 is a vacuum pump, 16.17
and 18 represent a non-polymerizable gas supply system, and 2o represents a monomer. The base body 4 is positioned almost directly above the heating container 21. 〃 Katana Fugaku Wase Meitai Shikiku Figure 1 zO: Kenomah

Claims (6)

【特許請求の範囲】[Claims] (1)低温ガスプラズマ中で金属含有化合物とフェナン
スロリン系化合物とを気化して重合し、基体上に金属・
フェナンスロリン錯体重合薄膜を形成させることを特徴
とする金属・フェナンスロリン錯体重合薄膜の製造方法
(1) A metal-containing compound and a phenanthroline-based compound are vaporized and polymerized in a low-temperature gas plasma, and the metal-containing compound and phenanthroline compound are polymerized on a substrate.
A method for producing a metal/phenanthroline complex polymerization thin film, which comprises forming a phenanthroline complex polymerization thin film.
(2)低温ガスプラズマが非重合性ガスプラズマである
特許請求の範囲第1項記載の方法。
(2) The method according to claim 1, wherein the low-temperature gas plasma is a non-polymerizable gas plasma.
(3)非重合性ガスがアルゴン、窒素及びヘリウムであ
る特許請求の範囲第2項記載の方法。
(3) The method according to claim 2, wherein the non-polymerizable gas is argon, nitrogen, and helium.
(4)金属含有化合物が有機金属化合物である特許請求
の範囲第1項記載の方法。
(4) The method according to claim 1, wherein the metal-containing compound is an organometallic compound.
(5)金属含有化合物の金属がCu、Ag、Zn、Cd
、Sn、Pb、Mn、Fe及びNiである特許請求の範
囲第1項或いは第4項記載の方法。
(5) The metal of the metal-containing compound is Cu, Ag, Zn, Cd
, Sn, Pb, Mn, Fe and Ni.
(6)フェナンスロリン系化合物がO−フェナンスロリ
ン(1,10−フェナンスロリン)及びその誘導体であ
る特許請求の範囲第1項記載の方法。
(6) The method according to claim 1, wherein the phenanthroline compound is O-phenanthroline (1,10-phenanthroline) and its derivatives.
JP20412185A 1985-09-13 1985-09-13 Method for producing metal-phenanthroline complex polymerized thin film Expired - Lifetime JPH0635514B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20412185A JPH0635514B2 (en) 1985-09-13 1985-09-13 Method for producing metal-phenanthroline complex polymerized thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20412185A JPH0635514B2 (en) 1985-09-13 1985-09-13 Method for producing metal-phenanthroline complex polymerized thin film

Publications (2)

Publication Number Publication Date
JPS6262824A true JPS6262824A (en) 1987-03-19
JPH0635514B2 JPH0635514B2 (en) 1994-05-11

Family

ID=16485165

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20412185A Expired - Lifetime JPH0635514B2 (en) 1985-09-13 1985-09-13 Method for producing metal-phenanthroline complex polymerized thin film

Country Status (1)

Country Link
JP (1) JPH0635514B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6445434A (en) * 1987-05-12 1989-02-17 Schering Ag Manufacture of electroconductive polymer-metal compound
JP2012188517A (en) * 2011-03-10 2012-10-04 National Institute For Materials Science Organic/metal hybrid polymer which contains metal whose coordination number is 4 and bisphenanthroline derivative, ligand thereof, and method for producing the same
CN107476116A (en) * 2017-06-27 2017-12-15 安徽比伦生活用纸有限公司 A kind of method for improving flexible toilet paper toughness

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6445434A (en) * 1987-05-12 1989-02-17 Schering Ag Manufacture of electroconductive polymer-metal compound
JP2012188517A (en) * 2011-03-10 2012-10-04 National Institute For Materials Science Organic/metal hybrid polymer which contains metal whose coordination number is 4 and bisphenanthroline derivative, ligand thereof, and method for producing the same
CN107476116A (en) * 2017-06-27 2017-12-15 安徽比伦生活用纸有限公司 A kind of method for improving flexible toilet paper toughness

Also Published As

Publication number Publication date
JPH0635514B2 (en) 1994-05-11

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