JPS6260703B2 - - Google Patents
Info
- Publication number
- JPS6260703B2 JPS6260703B2 JP6698275A JP6698275A JPS6260703B2 JP S6260703 B2 JPS6260703 B2 JP S6260703B2 JP 6698275 A JP6698275 A JP 6698275A JP 6698275 A JP6698275 A JP 6698275A JP S6260703 B2 JPS6260703 B2 JP S6260703B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- photoconductor
- metal
- ions
- glow discharge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 87
- 239000000463 material Substances 0.000 claims description 69
- 150000002500 ions Chemical class 0.000 claims description 37
- 229910052751 metal Inorganic materials 0.000 claims description 26
- 239000002184 metal Substances 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 25
- 108091008695 photoreceptors Proteins 0.000 claims description 23
- 239000007789 gas Substances 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 16
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 11
- 229910052760 oxygen Inorganic materials 0.000 claims description 11
- 239000001301 oxygen Substances 0.000 claims description 11
- 230000000903 blocking effect Effects 0.000 claims description 8
- 230000000694 effects Effects 0.000 claims description 8
- 238000001704 evaporation Methods 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 8
- 230000008020 evaporation Effects 0.000 claims description 7
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 230000006872 improvement Effects 0.000 claims description 2
- 230000003116 impacting effect Effects 0.000 claims 1
- 238000000151 deposition Methods 0.000 description 19
- 238000012360 testing method Methods 0.000 description 17
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 16
- 229910052782 aluminium Inorganic materials 0.000 description 15
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 15
- 230000008021 deposition Effects 0.000 description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 14
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 11
- 238000000576 coating method Methods 0.000 description 9
- 229910052786 argon Inorganic materials 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 8
- 229910052711 selenium Inorganic materials 0.000 description 8
- 239000011669 selenium Substances 0.000 description 8
- 229910001370 Se alloy Inorganic materials 0.000 description 7
- 229910052759 nickel Inorganic materials 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 239000010935 stainless steel Substances 0.000 description 6
- 229910001220 stainless steel Inorganic materials 0.000 description 6
- 230000000875 corresponding effect Effects 0.000 description 5
- 229910052785 arsenic Inorganic materials 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 4
- 238000009833 condensation Methods 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 238000010849 ion bombardment Methods 0.000 description 4
- 238000007733 ion plating Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910001369 Brass Inorganic materials 0.000 description 3
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 239000010951 brass Substances 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- -1 polyethylene terephthalate Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 229910052755 nonmetal Inorganic materials 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 229910052714 tellurium Inorganic materials 0.000 description 2
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- CMSGUKVDXXTJDQ-UHFFFAOYSA-N 4-(2-naphthalen-1-ylethylamino)-4-oxobutanoic acid Chemical compound C1=CC=C2C(CCNC(=O)CCC(=O)O)=CC=CC2=C1 CMSGUKVDXXTJDQ-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229910000967 As alloy Inorganic materials 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QLNFINLXAKOTJB-UHFFFAOYSA-N [As].[Se] Chemical compound [As].[Se] QLNFINLXAKOTJB-UHFFFAOYSA-N 0.000 description 1
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229920005570 flexible polymer Polymers 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000011221 initial treatment Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000001455 metallic ions Chemical class 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US47773774A | 1974-06-10 | 1974-06-10 | |
US51369574A | 1974-10-10 | 1974-10-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS516558A JPS516558A (ja) | 1976-01-20 |
JPS6260703B2 true JPS6260703B2 (enrdf_load_stackoverflow) | 1987-12-17 |
Family
ID=27045656
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6698275A Granted JPS516558A (ja) | 1974-06-10 | 1975-06-03 | Katoseihikarijuyotaitosonoseiho |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS516558A (enrdf_load_stackoverflow) |
CA (1) | CA1041645A (enrdf_load_stackoverflow) |
DE (1) | DE2521518C2 (enrdf_load_stackoverflow) |
GB (1) | GB1507733A (enrdf_load_stackoverflow) |
NL (1) | NL7506841A (enrdf_load_stackoverflow) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2901348A (en) * | 1953-03-17 | 1959-08-25 | Haloid Xerox Inc | Radiation sensitive photoconductive member |
GB1321769A (en) * | 1970-12-04 | 1973-06-27 | Rca Corp | Electrophotographic recording element |
DE2109251A1 (en) * | 1971-02-26 | 1972-09-07 | Licentia Gmbh | Sensitisation of electrophotographic material - contg flexibiliser adhesion promoter with halogen |
JPS609261B2 (ja) * | 1972-06-08 | 1985-03-08 | ク−ルタ−・システムズ・コ−ポレ−ション | 電子写真フイルム物品およびその製造方法 |
-
1975
- 1975-05-06 CA CA226,340A patent/CA1041645A/en not_active Expired
- 1975-05-08 GB GB1937675A patent/GB1507733A/en not_active Expired
- 1975-05-14 DE DE19752521518 patent/DE2521518C2/de not_active Expired
- 1975-06-03 JP JP6698275A patent/JPS516558A/ja active Granted
- 1975-06-09 NL NL7506841A patent/NL7506841A/xx not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
GB1507733A (en) | 1978-04-19 |
NL7506841A (nl) | 1975-09-30 |
DE2521518C2 (de) | 1985-05-15 |
DE2521518A1 (de) | 1975-12-18 |
JPS516558A (ja) | 1976-01-20 |
CA1041645A (en) | 1978-10-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4170662A (en) | Plasma plating | |
US6274014B1 (en) | Method for forming a thin film of a metal compound by vacuum deposition | |
GB1582231A (en) | Application of a layer of carbonaceous material to a surface | |
US4865711A (en) | Surface treatment of polymers | |
US4013463A (en) | Photoreceptor fabrication utilizing AC ion plating | |
US4019902A (en) | Photoreceptor fabrication | |
US4802967A (en) | Surface treatment of polymers | |
US4099969A (en) | Coating method to improve adhesion of photoconductors | |
US5451754A (en) | Corona generating device | |
US4046565A (en) | Amorphous selenium coating | |
US4913762A (en) | Surface treatment of polymers for bonding by applying a carbon layer with sputtering | |
US4152747A (en) | Ionization promoting electrode and method for increasing ionization efficiency | |
JPS6260703B2 (enrdf_load_stackoverflow) | ||
US3077386A (en) | Process for treating selenium | |
US4126457A (en) | Evaporation technique for producing high temperature photoreceptor alloys | |
JPS6260702B2 (enrdf_load_stackoverflow) | ||
US4072518A (en) | Method of making trigonal selenium interlayers by glow discharge | |
US5264256A (en) | Apparatus and process for glow discharge comprising substrate temperature control by shutter adjustment | |
JPWO2022190942A5 (enrdf_load_stackoverflow) | ||
CA1054972A (en) | Ion plated active matrix photoreceptor | |
CA1064857A (en) | Flexible metal belt photoreceptors | |
JP2817164B2 (ja) | 電子写真用感光体 | |
JP3010199B2 (ja) | 光導電体 | |
RU2453628C1 (ru) | Устройство для нанесения покрытий на диэлектрики в разряде | |
JPH061387B2 (ja) | 電子写真画像形成部材の製造方法 |