JPS6260027U - - Google Patents
Info
- Publication number
- JPS6260027U JPS6260027U JP1985135571U JP13557185U JPS6260027U JP S6260027 U JPS6260027 U JP S6260027U JP 1985135571 U JP1985135571 U JP 1985135571U JP 13557185 U JP13557185 U JP 13557185U JP S6260027 U JPS6260027 U JP S6260027U
- Authority
- JP
- Japan
- Prior art keywords
- chuck
- semiconductor material
- pin
- attached
- edge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Solid Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985135571U JPS6260027U (enExample) | 1985-09-04 | 1985-09-04 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985135571U JPS6260027U (enExample) | 1985-09-04 | 1985-09-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6260027U true JPS6260027U (enExample) | 1987-04-14 |
Family
ID=31037879
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985135571U Pending JPS6260027U (enExample) | 1985-09-04 | 1985-09-04 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6260027U (enExample) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5258458A (en) * | 1975-11-10 | 1977-05-13 | Hitachi Ltd | Spinner cleaning and drying mechanism |
| JPS5737837A (en) * | 1980-08-20 | 1982-03-02 | Toshiba Corp | Drying device for semiconductor wafer |
| JPS60163436A (ja) * | 1984-02-06 | 1985-08-26 | Seiichiro Sogo | 半導体材料の洗浄乾燥方法 |
-
1985
- 1985-09-04 JP JP1985135571U patent/JPS6260027U/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5258458A (en) * | 1975-11-10 | 1977-05-13 | Hitachi Ltd | Spinner cleaning and drying mechanism |
| JPS5737837A (en) * | 1980-08-20 | 1982-03-02 | Toshiba Corp | Drying device for semiconductor wafer |
| JPS60163436A (ja) * | 1984-02-06 | 1985-08-26 | Seiichiro Sogo | 半導体材料の洗浄乾燥方法 |