JPS6259516A - Production of silica - Google Patents

Production of silica

Info

Publication number
JPS6259516A
JPS6259516A JP19756485A JP19756485A JPS6259516A JP S6259516 A JPS6259516 A JP S6259516A JP 19756485 A JP19756485 A JP 19756485A JP 19756485 A JP19756485 A JP 19756485A JP S6259516 A JPS6259516 A JP S6259516A
Authority
JP
Japan
Prior art keywords
silica
bulky
calcining
water
sol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19756485A
Other languages
Japanese (ja)
Other versions
JPH0686288B2 (en
Inventor
Mamoru Yoshizako
吉迫 守
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tama Kagaku Kogyo Co Ltd
Original Assignee
Tama Kagaku Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tama Kagaku Kogyo Co Ltd filed Critical Tama Kagaku Kogyo Co Ltd
Priority to JP60197564A priority Critical patent/JPH0686288B2/en
Publication of JPS6259516A publication Critical patent/JPS6259516A/en
Publication of JPH0686288B2 publication Critical patent/JPH0686288B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:In producing silica by calcining bulky silica obtained by sol-gel method, to smoothly and easily produce silica while preventing volume expansion and foaming in the calcining process, by treating the bulky silica with water before the calcining process is carried out. CONSTITUTION:Bulky silica, for example, is obtained by neutralizing an aqueous solution of sodium silicate with an acid such as hydrochloric acid, etc., gelatinizing the prepared silica sol, filtering and drying, is dried preferably at about 60-300 deg.C and dried to >=about 80wt% silica content. The bulky silica is treated with water in such a way that it is in an immersed state completely in water usually at room temperature. The water treated bulky silica is ground and calcined at about 500-1,300 deg.C for 1-8hr to produce high-purity silica having high silica bulk specific gravity. The bulky silica causes no foaming, no scattering, no adhesion to the wall of a calcining container and no damage of the calcining container by the calcination.

Description

【発明の詳細な説明】 [産業上の利用分野] この発明は、シリカを製造する方法に係り、特にゾル−
ゲル法によって製造された塊状シリカからシリカを製造
する方法に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for producing silica, and particularly to a method for producing silica.
The present invention relates to a method for producing silica from bulk silica produced by a gel method.

[従来の技術] 近年、電子部品封止用樹脂組成物の充填剤、多成分系光
ファイバー、ファインセラミックス、光学ガラス、電子
工業用石英等の原料として合成シリカが使用されるよう
になり、一般的に嵩比重が大きく高純度のものが要請さ
れている。
[Prior art] In recent years, synthetic silica has come to be used as a filler for resin compositions for encapsulating electronic components, as a raw material for multi-component optical fibers, fine ceramics, optical glass, quartz for the electronic industry, etc. There is a demand for high bulk specific gravity and high purity.

特に、電子部品封止用樹脂組成物の充填剤として使用さ
れる封止用シリカについては、LSIや超LSI等のよ
うにその集積度が増すにつれ、より高純度であって特に
ソフトエラーの原因になるα線崩壊物質のウランやトリ
ウム等の元素、化合物の含有量ができるだけ低く、かつ
、比表面積が小さいものが要求されている。
In particular, silica for encapsulation, which is used as a filler in resin compositions for encapsulating electronic components, has a higher purity as the degree of integration increases, such as in LSIs and VLSIs, which causes soft errors. It is required that the content of elements and compounds such as uranium and thorium, which are α-ray decay substances, be as low as possible, and that the specific surface area be small.

そして、従来この種の合成シリカの製造法として、例え
ば、珪酸ナトリウム水溶液を塩酸等の酸で中和し、得ら
れたシリカゾルをゲル化させ、得られた塊状シリカを乾
燥した後500〜1300℃で焼結してシリカを製造す
る方法やテトラアルコキシシランを酸性条件下で加水分
解し、得られたシリカゾルをゲル化させ得られた塊状シ
リカを乾燥した後500〜1300℃で焼結してシリカ
を製造する方法(特開昭59−182.237号公報)
等のいわゆるゾル−ゲル法と称される方法が提案されて
いる。
Conventionally, as a method for producing this type of synthetic silica, for example, an aqueous sodium silicate solution is neutralized with an acid such as hydrochloric acid, the obtained silica sol is gelled, and the obtained bulk silica is dried at a temperature of 500 to 1300°C. A method of producing silica by sintering at 500 to 1300 °C, and a method of producing silica by hydrolyzing tetraalkoxysilane under acidic conditions, gelling the obtained silica sol, drying the obtained bulk silica, and then sintering it at 500 to 1300 °C to produce silica. (Japanese Unexamined Patent Publication No. 182.237/1989)
A method called the so-called sol-gel method has been proposed.

[発明が解決しようとする問題点] しかしながら、この従来のゾル−ゲル法においては、生
成したシリカゾルをゲル化した際に塊状シリカとなるが
、この塊状シリカをその焼結工程で500〜1300℃
に加熱すると体積膨張や発泡が起こり、この発泡の際に
シリカが飛散したり、また、焼結容器の器壁にシリカが
付着してついには容器の繰返し使用が困難になったり、
場合(よっては焼結容器が破損することがあるという問
題があった。
[Problems to be Solved by the Invention] However, in this conventional sol-gel method, when the generated silica sol is gelled, it becomes lumpy silica, but this lumpy silica is heated at 500 to 1300°C in the sintering process.
When heated, volumetric expansion and foaming occur, and during this foaming, silica scatters, and silica adheres to the walls of the sintered container, making it difficult to use the container repeatedly.
In some cases, the sintered container may be damaged.

L問題貞を解決(るための手段] 本発明1.!、かかる観点に鑑みて創案されたもので、
ゾル−ゲル法によって得られた塊状シリカを焼結しτシ
リカを製)Δするに際し、焼結工程に先駆けて水処理す
るシリカの製造方法である。
Means for solving the L problem The present invention 1.! was devised in view of this point of view,
This is a method for producing silica in which water treatment is performed prior to the sintering process when bulk silica obtained by the sol-gel method is sintered to produce τ silica.

本発明で使用覆る塊状シリカは、ぞれが如何なる方法で
製造されたものであってもよく、例えば、珪酸すI・リ
ウム水溶液を塩酸等の酸で中和し、(qられ1.ニジリ
カゾルをゲル化させて濾過し、乾燥させて得られたもの
や、テトラメトキシシランやテトラ1. l−キシシラ
ン等のテトラアルコ1.ジシランを無擲酸や右機酸の存
在下に加水分解し、得られたシリカゾルをゲル化させて
濾過し、乾燥させて得られたもの等を使用することがで
きる。
The bulk silica used in the present invention may be produced by any method, for example, by neutralizing an aqueous solution of lium silicate with an acid such as hydrochloric acid, Those obtained by gelation, filtration, and drying, and those obtained by hydrolyzing tetraalco-1.disilanes such as tetramethoxysilane and tetra-1.l-xysilane in the presence of oxalic acid or diaphragm acid. A product obtained by gelling a silica sol, filtering it, and drying it can be used.

この塊状シリカについては、例えば大気圧下で乾燥する
場合、通常60〜300℃、好ましくは100〜200
℃で脱水・乾燥し、シリカの含有量を80重量%以上、
好ましくは90重量%以上にするのがよい。乾燥温度に
ついてはそれが60℃より低いと脱水・乾燥速度が著し
く遅くなるという問題がある。また、脱水・乾燥温度を
300℃より高くしても特に問題はないが、プロセス経
済性が悪くなる。ざらに、乾燥の程度については、シリ
カ含有量が80重量%以上にすることが必要であり、8
0重量%より低いと体積膨張、発泡、器壁への付着等の
問題が生じる場合がある。
For example, when drying this bulk silica under atmospheric pressure, the temperature is usually 60 to 300°C, preferably 100 to 200°C.
Dehydrate and dry at ℃ to reduce the silica content to 80% by weight or more.
The content is preferably 90% by weight or more. Regarding the drying temperature, if it is lower than 60°C, there is a problem that the dehydration and drying speed becomes extremely slow. Furthermore, although there is no particular problem if the dehydration/drying temperature is made higher than 300° C., the process economy becomes worse. Generally speaking, regarding the degree of drying, it is necessary that the silica content be 80% by weight or more, and 80% by weight or more.
If it is less than 0% by weight, problems such as volumetric expansion, foaming, and adhesion to the vessel wall may occur.

この塊状シリカの脱水・乾燥段階でシリ、力の含有量を
大きくすれば1゛るほど製造されたシリカの粒径が小さ
くなり、このシリカ含有量を調整することにより製造さ
・れるシリカの粒度を調整することができる。例えば、
シリカ含有量が80〜85重量%であると生成したシリ
カの粒径は2〜6H程度になり、また、シリカ含有量が
95重量%以上であると生成したシリカの粒径が2s1
以下になる。
The particle size of the produced silica decreases as the content of silica and force increases by 1% during the dehydration and drying stage of the bulk silica, and by adjusting this silica content, the particle size of the produced silica can be adjusted. for example,
When the silica content is 80 to 85% by weight, the particle size of the generated silica is about 2 to 6H, and when the silica content is 95% by weight or more, the particle size of the generated silica is about 2s1.
It becomes below.

本発明においては、塊状シリカを焼結する前に水処理す
る。
In the present invention, the bulk silica is treated with water before being sintered.

この水処理に使用する水のけは、塊状シリカに添加して
この塊状シリカが完全に浸)d状態となるi衿であれば
よく、もしこの塊状シリカが水に浸漬しない部分がある
場合にはよく水と接触させるために混合が必要になる。
The drainage used for this water treatment may be as long as it is added to the bulk silica so that the bulk silica is completely immersed in the water. requires mixing to ensure good contact with water.

従って、使用する水の爵が少ないと塊状シリカが部分的
にしか浸漬されず、混合しない限り効果的な破砕ができ
なくなるという問題が生じる。
Therefore, if a small amount of water is used, the problem arises that the bulk silica is only partially immersed and cannot be crushed effectively unless mixed.

また、この水処理の際の処y?温痘は、通常室温で行な
われるが、水処理により熱が発生ずるので、水処理後の
温度は水処理前の温度より高くなる。
Also, what should be done during this water treatment? Although smallpox is usually carried out at room temperature, since heat is generated by water treatment, the temperature after water treatment is higher than the temperature before water treatment.

このように()て水処理され、破砕された塊状シリカは
、次に焼結工程で焼結される。
The massive silica thus treated with water and crushed is then sintered in a sintering step.

この焼結工程は、従来公知の方法と同様にして行うこと
ができ、通常500〜1300℃、好ましくは800へ
−1200℃の焼結温度で、通常1〜8時間、好ましく
は3〜6時間行われる。焼結時間を8時間より長くして
も製品の物性、性状に大きな変化はない。
This sintering step can be carried out in the same manner as conventionally known methods, and is usually carried out at a sintering temperature of 500 to 1300°C, preferably 800 to 1200°C, for usually 1 to 8 hours, preferably 3 to 6 hours. It will be done. Even if the sintering time is made longer than 8 hours, there is no significant change in the physical properties and properties of the product.

本発明方法で製造されたシリカは、従来のいわゆるゾル
−ゲル法で製造されたシリカと同様に種々の用途に使用
することができる。
The silica produced by the method of the present invention can be used for various purposes in the same way as silica produced by the conventional so-called sol-gel method.

[実施例1 以下、実施例及び比較例に基づいて本発明方法を具体的
に説明する。
[Example 1] Hereinafter, the method of the present invention will be specifically explained based on Examples and Comparative Examples.

実施例 撹拌装置付きステンレス製反応容器にテトラメトキシシ
ラン100重量部、メタノール16.7重量及び水23
.3重間部を仕込み、撹拌しながら0.2μのメンブラ
ンフィルタ−を通過させて精製した炭酸ガスを反応容器
内を炭酸ガスで飽和状態に維持できる速度で吹込んで反
応系が透明になるまで4時間反応させ、テトラメトキシ
シランを加水分解してシリカゾルを作り、次いでゲル化
させ、150℃で24時間乾燥して塊状シリカ45.9
重/j1部を得た。この塊状シリカのシリカ含有量は8
5重量%であった。
Example 100 parts by weight of tetramethoxysilane, 16.7 parts by weight of methanol and 23 parts by weight of water were placed in a stainless steel reaction vessel equipped with a stirring device.
.. Charge the 3-layer chamber, and while stirring, blow purified carbon dioxide gas through a 0.2μ membrane filter at a rate that keeps the inside of the reaction vessel saturated with carbon dioxide gas until the reaction system becomes transparent. The tetramethoxysilane is hydrolyzed to form a silica sol, which is then gelled and dried at 150°C for 24 hours to form a bulk silica 45.9
1 part of weight/j was obtained. The silica content of this bulk silica is 8
It was 5% by weight.

次に、この塊状シリカに水50fflω部を加えて破砕
し、そのまま室温で1時間放置し、濾過後150〜20
0℃で5時間乾燥してシリカ含有量を95重量%にして
から1100±50℃で3時間焼結した。得られたシリ
カの収6号は38.2重fit部(テトラメトキシシラ
ン基準で収率98%)であり、また、その粒径は3−5
 txmであって比表面積は2況/gであった。
Next, 50 fflω parts of water was added to this bulk silica to crush it, and it was left as it was at room temperature for 1 hour, and after filtration, the
It was dried at 0°C for 5 hours to give a silica content of 95% by weight, and then sintered at 1100±50°C for 3 hours. The yield No. 6 of the obtained silica was 38.2 parts (yield 98% based on tetramethoxysilane), and the particle size was 3-5.
txm, and the specific surface area was 2/g.

この実施例においては、焼結工程の際に発泡現象や容器
への付着が認められず、焼結工程を円滑に進めることが
できた。
In this example, no foaming phenomenon or adhesion to the container was observed during the sintering process, and the sintering process could proceed smoothly.

実施例2 塊状シリカの乾燥温度を200℃で24時間fiってシ
リカ含有量を95車帛%とじlζ以外は実施例1と同様
にしてシリカの製造を行った。得られたシリカの敗退は
38.4重間部(テlへラメ1−キシシラン基準で収率
98.5%)rあり、また、その粒径は2mm以下であ
って比表面積は2ffl/g′C−あった。
Example 2 Silica was produced in the same manner as in Example 1, except that the bulk silica was dried at 200° C. for 24 hours and the silica content was 95%. The yield of the obtained silica was 38.4 times (yield 98.5% based on 1-xysilane), the particle size was 2 mm or less, and the specific surface area was 2ffl/g. 'C-There was.

この実施例においても、焼結工程の際に発泡現象や容器
への付着が認められず、焼結工程を円滑に進めることが
できた。
In this example as well, no foaming phenomenon or adhesion to the container was observed during the sintering process, and the sintering process could proceed smoothly.

比較例 上記実施例と同様にしてシリカ含有量85重間%の塊状
シリカを作り、水処理することなくさらに乾燥してシリ
カ含有量95重量%にした後、実施例と同様にして焼結
しシリカを製造した。
Comparative Example Bulk silica with a silica content of 85% by weight was prepared in the same manner as in the above example, and after further drying without water treatment to a silica content of 95% by weight, it was sintered in the same manner as in the example. produced silica.

この比較例では、焼結工程の際に発泡現象や容器への付
着が起こり、取出すことができなかった。
In this comparative example, foaming phenomenon and adhesion to the container occurred during the sintering process, and the product could not be taken out.

[発明の効果] 本発明方法によれば、ゾル−ゲル法で(qられた塊状シ
リカを焼結してシリカを製造する際に発泡してシリカが
飛散したり、また、焼結容器の器壁にシリカが付着して
繰返し使用することがでざなくなったり、さらには焼結
容器が破損するというようなことがなく、この焼結工程
を円滑におこうことかでき、ゾル−ゲル法によるシリカ
の製造が容易になる。
[Effects of the Invention] According to the method of the present invention, when silica is produced by sintering lumped silica using the sol-gel method, foaming and scattering of silica, and The sintering process can be carried out smoothly without silica adhering to the walls, which prevents repeated use, or even damaging the sintering container. Manufacturing of silica becomes easier.

Claims (1)

【特許請求の範囲】[Claims] (1)ゾル−ゲル法によつて得られた塊状シリカを焼結
してシリカを製造するに際し、焼結工程に先駆けて水処
理することを特徴とするシリカの製造方法。
(1) A method for producing silica, which comprises carrying out water treatment prior to the sintering process when producing silica by sintering bulk silica obtained by a sol-gel method.
JP60197564A 1985-09-09 1985-09-09 Method for producing silica Expired - Lifetime JPH0686288B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60197564A JPH0686288B2 (en) 1985-09-09 1985-09-09 Method for producing silica

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60197564A JPH0686288B2 (en) 1985-09-09 1985-09-09 Method for producing silica

Publications (2)

Publication Number Publication Date
JPS6259516A true JPS6259516A (en) 1987-03-16
JPH0686288B2 JPH0686288B2 (en) 1994-11-02

Family

ID=16376597

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60197564A Expired - Lifetime JPH0686288B2 (en) 1985-09-09 1985-09-09 Method for producing silica

Country Status (1)

Country Link
JP (1) JPH0686288B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0292174A2 (en) * 1987-05-20 1988-11-23 Corning Glass Works Encapsulating compositions ultra-pure, fused-silica fillers

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5281315A (en) * 1975-12-22 1977-07-07 Dynamit Nobel Ag Process for preparing granular silica glass
US4419115A (en) * 1981-07-31 1983-12-06 Bell Telephone Laboratories, Incorporated Fabrication of sintered high-silica glasses
JPS60239329A (en) * 1984-05-15 1985-11-28 Seiko Epson Corp Manufacture of quartz glass
JPS61286230A (en) * 1985-06-10 1986-12-16 Sumitomo Electric Ind Ltd Production of glass

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5281315A (en) * 1975-12-22 1977-07-07 Dynamit Nobel Ag Process for preparing granular silica glass
US4419115A (en) * 1981-07-31 1983-12-06 Bell Telephone Laboratories, Incorporated Fabrication of sintered high-silica glasses
JPS60239329A (en) * 1984-05-15 1985-11-28 Seiko Epson Corp Manufacture of quartz glass
JPS61286230A (en) * 1985-06-10 1986-12-16 Sumitomo Electric Ind Ltd Production of glass

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0292174A2 (en) * 1987-05-20 1988-11-23 Corning Glass Works Encapsulating compositions ultra-pure, fused-silica fillers

Also Published As

Publication number Publication date
JPH0686288B2 (en) 1994-11-02

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