JPS6258225A - Production of liquid crystal display element - Google Patents

Production of liquid crystal display element

Info

Publication number
JPS6258225A
JPS6258225A JP19922885A JP19922885A JPS6258225A JP S6258225 A JPS6258225 A JP S6258225A JP 19922885 A JP19922885 A JP 19922885A JP 19922885 A JP19922885 A JP 19922885A JP S6258225 A JPS6258225 A JP S6258225A
Authority
JP
Japan
Prior art keywords
stage
transparent conductive
liquid crystal
ultrasonic cleaning
crystal display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19922885A
Other languages
Japanese (ja)
Inventor
Yoshizo Tashiro
田代 美三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alps Alpine Co Ltd
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Priority to JP19922885A priority Critical patent/JPS6258225A/en
Publication of JPS6258225A publication Critical patent/JPS6258225A/en
Pending legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PURPOSE:To maintain a good display grade for a long period of time without generating 'bleeding' even under conditions of a high temp. and high humidity by diffusing and eluting sodium ions in a glass substrate onto the front layer by a high-temp. heating treatment then washing away the sodium ions by ultrasonic cleaning. CONSTITUTION:This process for production is basically the same as the conventional process for production in that an insulating film forming stage 1, transparent conductive film forming stage 2, etching stage 3, silver paste printing stage 4, baking stage 5 and if necessary transparent conductive coating material printing stage 6 and backing stage 7 are executed. In this process for production, however, an ultrasonic cleaning stage 8 is executed after the baking stage 5 in the case of not executing the stages 6, 7 and the ultrasonic cleaning stage 9 is executed after the baking stage 7 in the case of executing the stages 6, 7.

Description

【発明の詳細な説明】 「技術分野」 本発明は、高温、高温条件下における信頼性、寿命を改
善するようにした液晶表示素子の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION TECHNICAL FIELD The present invention relates to a method for manufacturing a liquid crystal display element that improves reliability and life under high temperature conditions.

「従来技術およびその問題点」 周知の如に、液晶表示素子は、内面に電極膜を形成した
一対のガラス基板を所定の間隙を設けて貼り合せ、内部
に液晶を封入した構造をなしている。そして、所定のパ
ターンを有する電極膜の間で電圧を印加することにより
、その部分の液晶の配向を変化させ、透過光あるいは反
射光の透過を制御して所定の表示を行なうようにしてい
る。
"Prior Art and its Problems" As is well known, a liquid crystal display element has a structure in which a pair of glass substrates with electrode films formed on their inner surfaces are bonded together with a predetermined gap, and liquid crystal is sealed inside. . By applying a voltage between the electrode films having a predetermined pattern, the orientation of the liquid crystal in that portion is changed, and the transmission of transmitted light or reflected light is controlled to perform a predetermined display.

従来、液晶表示素子の一部品であるガラス基板には、例
えば第2図に示すような処理がなされていた。すなわち
、ガラス基板の内面に5iQ2等の絶縁被膜を形成する
絶縁被膜形成工程1と、この絶縁被膜上に、例えば酸化
インジウムと酸化スズとからなる透明導電膜を形成する
透明導電膜形成工程2と、この透明導電膜をエツチング
して所定のパターンに加工するエツチング工程3と、端
子部にフレキシブルケーブルを半田付けするため、銀ペ
ーストを印刷する工程礁と、この銀ペーストを焼成する
工程5とを施している。さらに、偏光板を貼る場合に静
電気を防止するため、ガラス基板の外面に透明導電コー
ト剤を印刷する工程8と、この透明導電コート剤を焼成
する工程7とを施す場合もある。
Conventionally, a glass substrate, which is a component of a liquid crystal display element, has been subjected to a treatment as shown in FIG. 2, for example. That is, an insulating film forming step 1 in which an insulating film such as 5iQ2 is formed on the inner surface of a glass substrate, and a transparent conductive film forming step 2 in which a transparent conductive film made of, for example, indium oxide and tin oxide is formed on this insulating film. , an etching process 3 in which this transparent conductive film is etched into a predetermined pattern, a process in which silver paste is printed in order to solder the flexible cable to the terminal part, and a process 5 in which this silver paste is fired. are giving. Furthermore, in order to prevent static electricity when attaching a polarizing plate, a step 8 of printing a transparent conductive coating agent on the outer surface of the glass substrate and a step 7 of firing the transparent conductive coating agent may be performed.

ところで、こうして製造された液晶表示素子においては
、高温、高湿試験(例えば80℃、湿度85%の条件)
を行なった後に、表示パターンがふくらんで見えること
があった。この現象を一般に表示パターンの「にじみ」
と呼んでいる。この原因は、ガラス基板中のナトリウム
成分がナトリウムイオン(Ha” )となって基板表面
上に拡散してくるため、透明導電膜以外の部分が導電性
を帯びて表示パターン以外の部分が表示されやすくなる
ためとされている。
By the way, the liquid crystal display element manufactured in this way is subjected to high temperature and high humidity tests (for example, conditions of 80°C and 85% humidity).
After doing this, the display pattern sometimes appeared bulged. This phenomenon commonly displays pattern "bleeding"
It is called. The reason for this is that the sodium component in the glass substrate becomes sodium ions (Ha) and diffuses onto the substrate surface, which causes parts other than the transparent conductive film to become conductive, causing parts other than the display pattern to be displayed. It is said that this is to make it easier.

そして、従来の液晶表示素子の製造方法においては、前
述したように、銀ペーストを焼成する工程4や、透明導
電コート剤を焼成する工程7が施される。これらの焼成
工程は、300〜500℃程度の温度で行なわれるので
あるが、これにより、ガラス基板からのナトリウムイオ
ンの拡散は著しく促進される。そこで、ナトリウムイオ
ンの表層への拡散を防止するため、ガラス基板上に5i
Q2等の絶縁被膜を形成する工程!を施しているのであ
るが、上記の焼成工程によってナトリウムイオンが絶縁
被膜中に拡散してくるので、「にじみ」現象の発生を充
分に防止することができなかった。
In the conventional method for manufacturing a liquid crystal display element, as described above, the step 4 of firing the silver paste and the step 7 of firing the transparent conductive coating agent are performed. These firing steps are performed at a temperature of about 300 to 500°C, which significantly promotes the diffusion of sodium ions from the glass substrate. Therefore, in order to prevent the diffusion of sodium ions to the surface layer, 5i
The process of forming an insulating film such as Q2! However, due to the above baking process, sodium ions diffuse into the insulating coating, and the occurrence of the "bleeding" phenomenon could not be sufficiently prevented.

なお、従来の液晶表示素子の製造方法においても、焼成
工程の後に別の目的で有機溶剤で洗浄することはあった
が、有機溶剤で洗浄しても焼成により表層に溶出拡散し
たナトリウムイオンを除去することは困難であった。
In the conventional manufacturing method of liquid crystal display elements, cleaning with an organic solvent was sometimes performed for another purpose after the firing process, but even cleaning with an organic solvent does not remove the sodium ions that have eluted and diffused into the surface layer during firing. It was difficult to do so.

「発明の目的」 本発明の目的は、上記従来技術の問題点に鑑み、高温、
高湿の条件下においても長期に亙り良好な表示品位を保
つことができるようにした液晶表示素子の製造方法を提
供することにある。
"Object of the Invention" In view of the above-mentioned problems of the prior art, the object of the present invention is to
An object of the present invention is to provide a method for manufacturing a liquid crystal display element that can maintain good display quality for a long period of time even under high humidity conditions.

「発明の構成」 本発明は、ガラス基板上に絶縁被膜を形成し、この絶縁
被膜上に透明導電膜を形成する液晶表示素子の製造方法
において、少なくとも前記絶縁被膜を形成した後に高温
加熱処理し、その後の工程で超音波洗浄を行なうことを
特徴とする。
"Structure of the Invention" The present invention provides a method for manufacturing a liquid crystal display element in which an insulating film is formed on a glass substrate and a transparent conductive film is formed on the insulating film, in which a high temperature heat treatment is performed at least after forming the insulating film. , which is characterized by performing ultrasonic cleaning in the subsequent process.

このように、本発明では、高温加熱処理により表層に溶
出拡散してきたナトリウムイオンを超音波洗浄により除
去するようにしたので、この基板を用いて組立てた液晶
表示素子は、高温、高湿の条件下においても、ナトリウ
ムイオンの表層への拡散溶出が少なくなり、「にじみ」
現象の発生が防止され、長期に亙って表示品位を良好に
保つことができる。
In this way, in the present invention, the sodium ions that have been eluted and diffused into the surface layer due to the high-temperature heat treatment are removed by ultrasonic cleaning, so that the liquid crystal display element assembled using this substrate can withstand high-temperature and high-humidity conditions. Even at the bottom, the diffusion and elution of sodium ions to the surface layer is reduced, causing "bleeding".
This prevents the phenomenon from occurring and maintains good display quality over a long period of time.

本発明において、高温加熱処理は、少なくとも絶縁被膜
を形成した後に行なえばよく1例えば端子部に印刷した
銀ペーストの焼成工程で行なってもよく、さらには偏光
板を貼る際の静電気防止のためガラス基板の反対面に印
刷した透明導電コート剤の焼成工程で行なってもよい、
また、透明導電膜をスクリーン印刷等の手段で形成する
場合には、印刷あるいは塗布された透明導電膜形成液の
焼成工程で行なってもよい、さらに、ナトリウムイオン
の溶出拡散自体を目的として、絶縁被膜を形成した直後
に高温加熱処理してもよい。
In the present invention, the high-temperature heat treatment may be carried out at least after forming the insulating film (1) For example, it may be carried out in the baking process of the silver paste printed on the terminals, or it may be carried out on the glass to prevent static electricity when pasting the polarizing plate. It may also be performed in the baking process of the transparent conductive coating agent printed on the opposite side of the substrate.
In addition, when forming a transparent conductive film by means such as screen printing, it may be performed in the baking process of the printed or applied transparent conductive film forming liquid. A high-temperature heat treatment may be performed immediately after forming the film.

また、超音波洗浄は、上記高温加熱処理の後の工程のい
ずれかで行なえばよく、必ずしも高温加熱処理をした直
後に行なう必要はない。なお、焼成工程などを複数回行
なう場合には、最後の焼成工程を行なった後に超音波洗
浄をすることが好ましい、超音波洗浄は、水、有機溶剤
等の各種の液体中で行なうことができるが、温水中で行
なうことが最も好ましい、超音波洗浄を常温の純水中で
行なう場合には、洗浄時間は30分以上とすることが好
ましく、温水中で行なう場合には、洗浄時間は3分以上
とすることが好ましい、洗浄時間が上記よりも短い場合
には、表層に溶出拡散したナトリウムイオンを充分に洗
い去り、取除くことが困難である。
Further, ultrasonic cleaning may be performed in any step after the high temperature heat treatment, and does not necessarily need to be performed immediately after the high temperature heat treatment. In addition, when performing the firing process multiple times, it is preferable to perform ultrasonic cleaning after the last firing process. Ultrasonic cleaning can be performed in various liquids such as water and organic solvents. However, it is most preferable to perform ultrasonic cleaning in warm water. When performing ultrasonic cleaning in pure water at room temperature, the cleaning time is preferably 30 minutes or more; If the washing time is shorter than the above value, which is preferably longer than 1 minute, it will be difficult to sufficiently wash away the sodium ions that have eluted and diffused into the surface layer.

「発明の実施例」 第1図には、本発明による液晶表示素子の製造方法の好
ましい態様が示されている。この製造方法は、絶縁被膜
形成工程1.透明導電膜形成工程2)エツチング工程3
、銀ペースト印刷工程4、焼成工程5、さらに必要に応
じて透明導電コート剤印刷工程8.焼成工程7を行なう
点で、第2図に示した従来の製造方法と基本的には変ら
ない。
Embodiments of the Invention FIG. 1 shows a preferred embodiment of the method for manufacturing a liquid crystal display element according to the present invention. This manufacturing method includes an insulating film forming step 1. Transparent conductive film formation process 2) Etching process 3
, a silver paste printing step 4, a firing step 5, and, if necessary, a transparent conductive coating agent printing step 8. The method is basically the same as the conventional manufacturing method shown in FIG. 2 in that the firing step 7 is performed.

しかし、この製造方法では、上記工程6.7を行なわな
い場合には焼成工程5の後に超音波洗浄工程8を行なう
ようにし、上記工程8.7を行なう場合には焼成工程7
の後に超音波洗浄工程9を行なうようにしている。以下
、各工程についてさらに詳しく説明する。
However, in this manufacturing method, when the above step 6.7 is not performed, the ultrasonic cleaning step 8 is performed after the firing step 5, and when the above step 8.7 is performed, the firing step 7 is performed.
After that, an ultrasonic cleaning step 9 is performed. Each step will be explained in more detail below.

絶縁被膜形成工程lは、ガラス基板上に、 5iQ2等
の絶縁物を、真空蒸着法、スパッタリング法、浸漬法、
スピンナー法、スプレー法、スクリーン印刷法等の手段
によってコーティングすることによりなされる。
In the insulating film forming step 1, an insulating material such as 5iQ2 is deposited on the glass substrate using a vacuum evaporation method, a sputtering method, a dipping method,
This is done by coating by means such as a spinner method, a spray method, and a screen printing method.

透明導電膜形成工程2は、例えば酸化スズ、酸化インジ
ウム等の透明導電膜形成材料を、真空蒸着法、スパッタ
リング法等によってコーティングしたり、有機スズ化合
物、有機インジウム化合物等を含む透明導電膜形成液を
スクリーン印刷などの手段で塗布し、焼成することによ
って形成することができる。
In the transparent conductive film forming step 2, for example, a transparent conductive film forming material such as tin oxide or indium oxide is coated by a vacuum evaporation method, a sputtering method, etc., or a transparent conductive film forming liquid containing an organic tin compound, an organic indium compound, etc. It can be formed by applying by screen printing or other means and firing.

エツチング工程3は、例えばホトエツチング等の通常の
手段により行なうことができる。このとき、絶縁被膜等
の表層に拡散溶出したナトリウムイオンは、エツチング
液や、エツチング後の洗浄液によって洗い流される。な
お、透明導電膜形成液をスクリーン印刷して焼成した場
合には、このエツチング工程3は必要がない。
The etching step 3 can be carried out by conventional means such as photo etching. At this time, the sodium ions diffused and eluted into the surface layer of the insulating film etc. are washed away by the etching solution or the cleaning solution after etching. Note that if the transparent conductive film forming liquid is screen printed and fired, this etching step 3 is not necessary.

銀ペースト印刷工程4は、透明導電膜の端子部に銀ペー
スト(例えば銀粉末とガラスフリットと結合剤との混合
物)をスクリーン印刷することによってなされる。
The silver paste printing step 4 is performed by screen printing a silver paste (for example, a mixture of silver powder, glass frit, and a binder) on the terminal portion of the transparent conductive film.

焼成工程5は、ガラス基板を300〜500℃程度に加
熱して、銀ペーストを焼結することによってなされる。
Firing step 5 is performed by heating the glass substrate to about 300 to 500°C to sinter the silver paste.

このとき、ガラス基板から多量のナトリウムイオンが表
層に溶出拡散してくる。
At this time, a large amount of sodium ions elute and diffuse from the glass substrate to the surface layer.

透明導電コート剤印刷工程8は、例えば有機スズ化合物
、有機インジウム化合物等を含む透明導電コート剤を、
ガラス基板の外側面に、スクリーン印刷などの手段で塗
布することによってなされる。
In the transparent conductive coating agent printing step 8, a transparent conductive coating agent containing, for example, an organic tin compound, an organic indium compound, etc.
This is done by coating the outer surface of a glass substrate by means such as screen printing.

焼成工程7は、ガラス基板を300〜500℃に加熱し
て、上記透明導電コート剤を焼成することによってなさ
れる。
Firing step 7 is performed by heating the glass substrate to 300 to 500°C and firing the transparent conductive coating agent.

上記の工程8.7を施さない場合には、焼成工程5の後
に超音波洗浄工程8を行ない、上記の工程θ、7を施す
場合には、焼成工程7の後に超音波洗浄工程8を行なう
If the above step 8.7 is not performed, the ultrasonic cleaning step 8 is performed after the firing step 5, and when the above steps θ and 7 are performed, the ultrasonic cleaning step 8 is performed after the firing step 7. .

実施例 ソーダガラス製基板上に、5102を浸漬法によってコ
ーティングする(絶縁被膜形成工程1)0次に、酸化ス
ズ−酸化インジウム組成の透明導電−をスパッタリング
により上記絶縁被膜上に形成する(透明導電膜形成工程
2)、その後、ホトエツチングによりパターン形成加工
を施す(エツチング工程3)、さらに、端子部に銀ペー
ストをスクリーン印刷しく銀ペースト印刷工程0、ガラ
ス基板を約500℃の炉内に入れて加熱処理する(焼成
工程5)、そして、純水中にてeo分間超音波洗浄(超
音波洗浄工程8)シ、乾燥してから液晶表示素子を組立
てた。
Example 5102 is coated on a soda glass substrate by a dipping method (insulating film forming step 1) Next, a transparent conductive film having a composition of tin oxide and indium oxide is formed on the above insulating film by sputtering (transparent conductive film formation step 1). Film formation step 2), then pattern formation processing is performed by photoetching (etching step 3), and silver paste is screen printed on the terminal portion.In silver paste printing step 0, the glass substrate is placed in a furnace at approximately 500°C. A liquid crystal display element was assembled after heat treatment (baking step 5), ultrasonic cleaning for EO minutes in pure water (ultrasonic cleaning step 8), and drying.

こうして得られた液晶表示素子を、超普波洗浄をしない
他は上記と同様にして作製した液晶表示素子と比較し、
温度80℃、湿度85%における高温高湿試験を行ない
、表示のにじみやふくれが発生するまでの時間を観察し
たところ、上記実施例の液晶表示素子は、比較例の液晶
表示素子に比べて「にじみ」現象の発生までの時間が約
2倍長かった。
The thus obtained liquid crystal display element was compared with a liquid crystal display element prepared in the same manner as above except that ultraviolet cleaning was not performed.
A high-temperature, high-humidity test was conducted at a temperature of 80°C and a humidity of 85%, and the time required for the display to smear or bulge was observed. The results showed that the liquid crystal display element of the above example showed " The time it took for the "bleeding" phenomenon to occur was approximately twice as long.

なお、上記実施例において、超音波洗浄工程8を70℃
温水中で行なったところ、洗浄時間が3分程度でも同様
な効果が得られた。
In addition, in the above example, the ultrasonic cleaning step 8 was carried out at 70°C.
When washing was carried out in warm water, similar effects were obtained even with a washing time of about 3 minutes.

「発明の効果」 以上説明したように、本発明によれば、高温加熱処理に
よりガラス基板中のナトリウムイオンを表層に拡散溶出
させた後、このナトリウムイオンを超音波洗浄により洗
い流すようにしたので、このガラス基板を用いて組立て
た液晶表示素子は、高温高湿の条件下でも「にじみ」現
象を生じることなく、良好な表示品位を長時間保つこと
ができる。
"Effects of the Invention" As explained above, according to the present invention, after the sodium ions in the glass substrate are diffused and eluted to the surface layer by high-temperature heat treatment, the sodium ions are washed away by ultrasonic cleaning. A liquid crystal display element assembled using this glass substrate can maintain good display quality for a long time without causing the "bleeding" phenomenon even under high temperature and high humidity conditions.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明による液晶表示素子の製造方法の好まし
い態様を示す工程図、第2図は従来法による液晶表示素
子の製造方法の一例を示す工程図である。 図中、1は絶縁被膜形成工程、2は透明導電膜形成工程
、3エツチング工程、4は銀ペースト印刷工程、5は焼
成工程、8は透明導電コート剤印刷工程、7は焼成工程
、8.8は超音波洗浄工程である。
FIG. 1 is a process diagram showing a preferred embodiment of a method for manufacturing a liquid crystal display element according to the present invention, and FIG. 2 is a process diagram showing an example of a method for manufacturing a liquid crystal display element by a conventional method. In the figure, 1 is an insulating film forming process, 2 is a transparent conductive film forming process, 3 is an etching process, 4 is a silver paste printing process, 5 is a baking process, 8 is a transparent conductive coating agent printing process, 7 is a baking process, 8. 8 is an ultrasonic cleaning step.

Claims (2)

【特許請求の範囲】[Claims] (1)ガラス基板上に絶縁被膜を形成し、この絶縁被膜
上に透明導電膜を形成する液晶表示素子の製造方法にお
いて、少なくとも前記絶縁被膜を形成した後に高温加熱
処理し、その後の工程で超音波洗浄を行なうことを特徴
とする液晶表示素子の製造方法。
(1) In a method for manufacturing a liquid crystal display element in which an insulating film is formed on a glass substrate and a transparent conductive film is formed on the insulating film, at least after the insulating film is formed, a high temperature heat treatment is performed, and in a subsequent step A method for manufacturing a liquid crystal display element, characterized by performing sonic cleaning.
(2)特許請求の範囲第1項において、前記超音波洗浄
を温水中で行なう液晶表示素子の製造方法。
(2) The method for manufacturing a liquid crystal display element according to claim 1, wherein the ultrasonic cleaning is performed in warm water.
JP19922885A 1985-09-09 1985-09-09 Production of liquid crystal display element Pending JPS6258225A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19922885A JPS6258225A (en) 1985-09-09 1985-09-09 Production of liquid crystal display element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19922885A JPS6258225A (en) 1985-09-09 1985-09-09 Production of liquid crystal display element

Publications (1)

Publication Number Publication Date
JPS6258225A true JPS6258225A (en) 1987-03-13

Family

ID=16404279

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19922885A Pending JPS6258225A (en) 1985-09-09 1985-09-09 Production of liquid crystal display element

Country Status (1)

Country Link
JP (1) JPS6258225A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0642275U (en) * 1992-11-20 1994-06-03 良一 東中 Paper cutting

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54108819A (en) * 1978-02-14 1979-08-25 Matsushita Electric Ind Co Ltd Material for water boiler container and production thereof
JPS57124710A (en) * 1981-01-28 1982-08-03 Canon Inc Manufacture of electrooptical display device
JPS59146022A (en) * 1983-02-08 1984-08-21 Citizen Watch Co Ltd Production of electrode base plate for display body
JPS59189320A (en) * 1983-04-13 1984-10-26 Nippon Taisanbin Kogyo Kk Electrode plate for liquid crystal display body

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54108819A (en) * 1978-02-14 1979-08-25 Matsushita Electric Ind Co Ltd Material for water boiler container and production thereof
JPS57124710A (en) * 1981-01-28 1982-08-03 Canon Inc Manufacture of electrooptical display device
JPS59146022A (en) * 1983-02-08 1984-08-21 Citizen Watch Co Ltd Production of electrode base plate for display body
JPS59189320A (en) * 1983-04-13 1984-10-26 Nippon Taisanbin Kogyo Kk Electrode plate for liquid crystal display body

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0642275U (en) * 1992-11-20 1994-06-03 良一 東中 Paper cutting

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