JPS6254589A - Mask substrate for laser marker - Google Patents

Mask substrate for laser marker

Info

Publication number
JPS6254589A
JPS6254589A JP60192661A JP19266185A JPS6254589A JP S6254589 A JPS6254589 A JP S6254589A JP 60192661 A JP60192661 A JP 60192661A JP 19266185 A JP19266185 A JP 19266185A JP S6254589 A JPS6254589 A JP S6254589A
Authority
JP
Japan
Prior art keywords
layer
mask
reflection
glass substrate
loss
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60192661A
Other languages
Japanese (ja)
Inventor
Masakazu Nakano
正和 中野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP60192661A priority Critical patent/JPS6254589A/en
Publication of JPS6254589A publication Critical patent/JPS6254589A/en
Pending legal-status Critical Current

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  • Laser Beam Processing (AREA)

Abstract

PURPOSE:To decrease the loss of a laser beam by respectively laminating non- reflection coating layers on the front and rear surfaces of a glass substrate and further etching patterns such as characters and figures onto the non- reflection coating layers. CONSTITUTION:The non-reflection coating layers 2, 3 are formed of magnesium fluoride, etc. on both the front and rear surfaces of the glass substrate 1. A chromium layer 4 as a lattice matching layer and a gold layer 5 as a reflection layer or an aluminum layer 4 as the reflection layer and an aluminum oxide layer 5 as a protective layer are laminated on such coating layer 3. More specifically, a mask reflection layer 6 is formed of the chromium layer 4 and the gold layer 5, etc. The patterns 7 of the characters, figures. etc. are formed on the front surface of the mask reflection layer 6 by photoetching, etc. The loss of the laser beam to the mask substrate is decreased with the coating layer 6 by the above-mentioned method.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は1/−ザマーカに関し、特にプラスティックモ
ールドの集積回路部品、トランジスタ、ダイオード、抵
抗、コンデンサなどの電子部品の表面に商標、品名、ロ
ット番号などをアーキングする1/−ザマーカ等に使用
するマスク基板の構造に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a 1/-za marker, particularly for displaying trademarks, product names, lot numbers, etc. on the surfaces of plastic molded integrated circuit parts, transistors, diodes, resistors, capacitors, and other electronic parts. The present invention relates to the structure of a mask substrate used as a 1/-za marker for arcing.

従来の技術 従来、この種の1ノーザマーカは例えば第2図のLつな
構成となっている。レーザ光源10から発射された光束
の広いレーザビームで商標、品名などを蝕刻したマスク
11を照射し、マスク11を通過したレーザビームを結
像1/ンズ12でマスク像を縮小結像させて、電子部品
13の表面を焼損させることに=ってマーキングする。
2. Description of the Related Art Conventionally, this type of one-norther marker has, for example, an L-shaped configuration as shown in FIG. A mask 11 with a trademark, product name, etc. etched thereon is irradiated with a laser beam with a wide luminous flux emitted from a laser light source 10, and the laser beam that has passed through the mask 11 is focused by an imaging 1/lens 12 to reduce the mask image. The surface of the electronic component 13 is marked = to burn it out.

ここで、マスク11としては、ステンシルと呼ばれる金
属薄板に数字や文字などのパターンを蝕刻したもの、あ
るいはガラス基板の表面に文字などのパターンを蝕刻し
たクロムと金の蒸着層を有する基板が用いられてきた。
Here, as the mask 11, a thin metal plate called a stencil in which patterns such as numbers and letters are etched, or a substrate having a vapor deposited layer of chromium and gold on which patterns such as letters are etched on the surface of a glass substrate is used. It's here.

発明が解決し二つとする問題点 上述した従来のマスクの前者すなわち金属薄板に蝕刻で
穴をあけてパターンを形成するものは、例えば文字の0
”や@8”などのパターンは中抜きとなり欠落する。こ
のため線の間にブリッヂを行って中抜き部分を支持する
必要があり、マーキングされた文字に断線を生じたり、
複雑な商標の場合商標変更となったりする欠点がある。
Two Problems Solved by the Invention The former of the above-mentioned conventional masks, that is, those in which a pattern is formed by etching holes in a thin metal plate, can be used, for example, to form a pattern by etching holes in a thin metal plate.
Patterns such as "and @8" are hollowed out and missing. For this reason, it is necessary to create a bridge between the lines to support the hollow part, which may cause breaks in the marked characters or
The drawback is that complex trademarks may require trademark changes.

また、上述の従来のマスクの後者すなわちガラス基板の
表面に文字や図形を抜いたクロムと金の蒸着層を有する
基板の場合は、上記の欠点はないが、次の工うな問題点
がある。ガラス板には必ず反射があり、ガラスの一面で
の反射損失が例えば4%とすれば、表裏面で約8%、こ
の工うなガラス板を4枚重ね合せれば約28%という大
きな損失を生じる。マーキング丁べき図形が複雑な場合
には、この方式のガラス基板マスクは1枚だけでは不充
分で、数枚重ね合せなければならないことがしばしばあ
る。この工つな場合、上の工うな1ノーザ光の透過量は
著しく減少し、作業効率が悪いという欠点がある。
The latter of the above-mentioned conventional masks, that is, a glass substrate having a evaporated layer of chromium and gold without letters or figures on the surface thereof, does not have the above-mentioned drawbacks, but has the following problems. Glass plates always have reflections, and if the reflection loss on one side of the glass is, for example, 4%, the loss on the front and back sides is about 8%, and if four glass plates like this are stacked together, the loss is about 28%. arise. When the figure to be marked is complex, it is often insufficient to use only one glass substrate mask of this type, and several masks must be stacked one on top of the other. In this case, unlike the above method, the amount of transmitted light from the nose is significantly reduced, resulting in poor working efficiency.

問題点を解決するための手段 本発明によるマスク基板は、ガラス基板の表面および裏
面にレーザ光に対する無反射コーティング層を積層し、
表面側にはこの無反射層の上にさらに文字や図形のパタ
ーンを抜いたマスク反射層をコーティング積層して構成
される。
Means for Solving the Problems The mask substrate according to the present invention has an anti-reflection coating layer against laser light laminated on the front and back surfaces of a glass substrate,
On the front side, a mask reflective layer with character and graphic patterns cut out is further coated and laminated on this non-reflective layer.

作用 本発明における無反射コーティング層の素材としては弗
化マグネシウム、あるいは酸化セリウム、酸化アルミニ
ウム、酸化チタニウムなどがある。
Function: Materials for the antireflection coating layer in the present invention include magnesium fluoride, cerium oxide, aluminum oxide, and titanium oxide.

このコーティングにエフで反射損失は一面当り1%位に
なるので、このマスク基板を4枚重ねても8%位の損失
にしかならない。これは無反射コーティングを施さない
従来の方法の1枚のガラス基板の場合と同程度の損失に
過ぎない。
Since this coating has a reflection loss of about 1% per surface, even if four mask substrates are stacked, the loss will only be about 8%. This is only the same level of loss as in the case of a single glass substrate in the conventional method without anti-reflection coating.

次にマスク反射層の素材にはレーザ光の強い光エネルギ
に充分な耐光性をもつクロムと金の積層を部用したり、
あるいはアルミニウムと酸化アルミニウムを積層したも
のを部用することに工って、複雑なパターンのレーザマ
ーキングが可能になる。
Next, for the material of the mask reflective layer, we use a laminated layer of chromium and gold that has sufficient light resistance to the strong light energy of laser light.
Alternatively, by using a laminated layer of aluminum and aluminum oxide, laser marking of complex patterns becomes possible.

実施例 次に本発明について図面を参照して説明する。Example Next, the present invention will be explained with reference to the drawings.

第1図は本発明の一実施例の斜視断面図である。FIG. 1 is a perspective sectional view of an embodiment of the present invention.

ガラス基板1の表裏両面に弗化マグネシウムなどで無反
射コーティング層2お工び3を施し、この無反射コーテ
ィング層3の上に、格子整合層としてのクロム層4と反
射層としての金属5、あるいは反射層としてのアルミニ
ウム層4と保護層としての酸化アルミニウム層5を積層
する。すなわちクロム(あるいはアルミニウム)層4と
金(あるいは酸化アルミニウム)層5とでマスク反射層
6を形成する。7はマーキング丁べき文字、図形などの
パターンで、マスク反射層6はフォトレジストによる写
真蝕刻に工って無反射コーティング層3を傷つけること
なく蝕刻にエフて作られる。
A non-reflective coating layer 2 is applied on both sides of the glass substrate 1 using magnesium fluoride, etc., and on this anti-reflective coating layer 3, a chromium layer 4 as a lattice matching layer, a metal 5 as a reflective layer, Alternatively, an aluminum layer 4 as a reflective layer and an aluminum oxide layer 5 as a protective layer are laminated. That is, a mask reflective layer 6 is formed of a chromium (or aluminum) layer 4 and a gold (or aluminum oxide) layer 5. Reference numeral 7 designates patterns such as letters and figures to be marked, and the mask reflective layer 6 is formed by photo-etching using photoresist without damaging the non-reflective coating layer 3.

発明の効果 以上に説明した工うに、本発明はガラス基板の表裏両面
に無反射コーティング層を設け、表面の側はさらにその
上にマスク反射層を積層してレーーザマー力用マスク基
板を構成したので、マーキングされる文字あるいは図形
に断線を生じることなく、複雑なパターンでマスク基板
を複数枚重ね合さなければならない場合でも、レーザビ
ームの損失の少いレーザマーカを得られる。
Effects of the Invention As explained above, the present invention provides a non-reflective coating layer on both the front and back sides of a glass substrate, and further laminates a mask reflective layer on the front side to form a mask substrate for laser mercury. A laser marker with low laser beam loss can be obtained without causing disconnection in the characters or figures to be marked, even when a plurality of mask substrates must be stacked in a complex pattern.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例の斜視断面図、第2図は1ノ〜
ザマーカの概略構成の説明図である。 1・・・・−・ガラス基板、2,3・−・・−・無反射
コーティング層、4・・・・・・クロム(あるいはアル
ミニウム)層、5・・・・−・金(あるいは酸化アルミ
ニウム)届。 6・・・・・・マスク反射層、7・−・・・・文字2図
形などのパターン、10・−・・・・レーザ光源、11
・・・・・・マスク、12・・・・・・結像レンズ、1
3・−・・・・電子部品。 、−−1・ 代理人 弁理士  栗 1)春 雄−1■・、口j、a
、−
FIG. 1 is a perspective sectional view of an embodiment of the present invention, and FIG.
FIG. 2 is an explanatory diagram of a schematic configuration of the marker. 1...Glass substrate, 2, 3...Anti-reflective coating layer, 4...Chromium (or aluminum) layer, 5...Gold (or aluminum oxide) ) Notification. 6...Mask reflective layer, 7...Pattern such as 2 characters, 10...Laser light source, 11
...Mask, 12...Imaging lens, 1
3.--Electronic parts. ,--1・ Agent Patent Attorney Kuri 1) Yu Haru-1■・, 口j,a
,−

Claims (1)

【特許請求の範囲】[Claims] ガラス基板の表面および裏面にレーザ光に対する無反射
コーティング層が積層され、かつ表面側には前記無反射
コーティング層の上に、さらに文字、図形などのパター
ンを蝕刻してなるマスク反射層が積層されていることを
特徴とするレーザマーカ用マスク基板。
A non-reflective coating layer against laser light is laminated on the front and back surfaces of the glass substrate, and a mask reflective layer formed by etching patterns such as letters and figures is further laminated on the front surface side on the anti-reflective coating layer. A mask substrate for a laser marker characterized by:
JP60192661A 1985-08-31 1985-08-31 Mask substrate for laser marker Pending JPS6254589A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60192661A JPS6254589A (en) 1985-08-31 1985-08-31 Mask substrate for laser marker

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60192661A JPS6254589A (en) 1985-08-31 1985-08-31 Mask substrate for laser marker

Publications (1)

Publication Number Publication Date
JPS6254589A true JPS6254589A (en) 1987-03-10

Family

ID=16294940

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60192661A Pending JPS6254589A (en) 1985-08-31 1985-08-31 Mask substrate for laser marker

Country Status (1)

Country Link
JP (1) JPS6254589A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03198989A (en) * 1989-12-26 1991-08-30 Matsushita Electric Ind Co Ltd Light beam heating machine

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03198989A (en) * 1989-12-26 1991-08-30 Matsushita Electric Ind Co Ltd Light beam heating machine

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