JPS6251030A - Manufacture of magnetic disk - Google Patents

Manufacture of magnetic disk

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Publication number
JPS6251030A
JPS6251030A JP18958585A JP18958585A JPS6251030A JP S6251030 A JPS6251030 A JP S6251030A JP 18958585 A JP18958585 A JP 18958585A JP 18958585 A JP18958585 A JP 18958585A JP S6251030 A JPS6251030 A JP S6251030A
Authority
JP
Japan
Prior art keywords
orientation
coating
substrate
magnetic
disk substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18958585A
Other languages
Japanese (ja)
Inventor
Shigeo Hachimori
八森 重夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP18958585A priority Critical patent/JPS6251030A/en
Publication of JPS6251030A publication Critical patent/JPS6251030A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To improve the degree of orientation of a formed film with no deterioration of productivity by setting the relative speed at <=200rpm between the revolutions per minutes of an orientation magnet and the high revolutions per minutes for spin coating and performing the orientation of a magnetic field concurrently with the spin coating. CONSTITUTION:The relative speed is set at <=200rpm between the revolutions per minutes of an orientation magnet and the high revolutions per minutes for spin coating. Then the orientation of a magnetic field is carried out concurrently with the spin coating. For formation of a film, a disk substrate 11 held by a spindle 10 is revolved at a low speed, e.g., 80-350rpm and the magnetic coating material is supplied onto the substrate 11 through a coating nozzle 12 while seeking the surface of the substrate 11. The coating material spreads entirely on the surface of the substrate 11 with >=2mum thickness during the medium-speed revolutions. Then the substrate 11 is revolved at a high speed to get rid of the extra coating material.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、磁気ディスクの製造方法に関し、特に磁気デ
ィスク製造工程の中の塗膜形成おいて。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a method for manufacturing a magnetic disk, particularly in the formation of a coating film in the manufacturing process of a magnetic disk.

塗膜の配向度の向上に好適な磁気ディスクの製造方法に
関するものである。
The present invention relates to a method of manufacturing a magnetic disk suitable for improving the degree of orientation of a coating film.

〔発明の背景〕[Background of the invention]

磁気ディスクの塗膜形成は、遠心塗布方式等によりディ
スク基板上に磁性塗膜を形成し、磁性体の磁化容易軸を
一方向にそろえ゛るために塗膜が未乾燥のうちに磁場配
向(以下、単に配向と称す)を行っている。上記の遠心
塗布方式について説明すると、磁性粒子、有機系樹脂お
よび非磁性荷重支持粒子を主成分とする磁性塗料を低速
で回転するディスク基板に滴下し、続いて、連続的また
は段階的に変化するディスク基板の回転数と回転時間の
組合せで決まる塗布条件によって制御された遠心力によ
り、ディスク基板上の磁性塗料の過剰分が振り切られる
ようにしたものである。
To form a coating film on a magnetic disk, a magnetic coating film is formed on a disk substrate using a centrifugal coating method, etc., and in order to align the axis of easy magnetization of the magnetic material in one direction, magnetic field orientation ( (hereinafter simply referred to as orientation). To explain the above-mentioned centrifugal coating method, a magnetic paint mainly composed of magnetic particles, organic resin, and non-magnetic load-bearing particles is dropped onto a disk substrate rotating at a low speed, and then the coating is applied continuously or stepwise. Excessive magnetic paint on the disk substrate is shaken off by centrifugal force controlled by coating conditions determined by a combination of the rotation speed and rotation time of the disk substrate.

このような従来の塗膜形成工程中、上述した遠心塗布工
程の後に行う配向において、高い配向度を得る上で重要
な要素として、(i)塗膜の乾燥速度および乾燥状態、
(11)周囲の雰囲気、(iii)動的粘度、(iv)
配向磁場強度、(V)配向時間等、その他多く上げるこ
とができる。特にその中でも、塗膜の乾燥状態と動的粘
度は最も重要な要素であると言える。
During such a conventional coating film forming process, important factors in obtaining a high degree of orientation in the orientation performed after the above-mentioned centrifugal coating process are: (i) drying rate and drying state of the coating film;
(11) Surrounding atmosphere, (iii) dynamic viscosity, (iv)
Many other parameters such as orientation magnetic field strength, (V) orientation time, etc. can be increased. Among these, the dry state and dynamic viscosity of the coating film are said to be the most important factors.

上述した磁場配向は、ディスク基板に磁性材料を塗布し
た後に配向を行う別ステーションまで搬送して配向する
方式と、その塗布と配向を同一スチージョンで連続して
行う方式の2方式に分けられるが、先に述べた塗膜の乾
燥状態と動的粘度を考えた場合、後者の方式が有効であ
る。この種の方式としては、特開昭58−222445
号公報が挙げられる。この方式は、塗布と配向を連続し
て行なうことができ、加えてスピンコート後に高速回転
を落さずに行なうことができることから、薄膜化を指向
した場合の配向度向上には有効な方式といえる。しかし
、塗膜の膜厚を形成するスピンコートを実施した後に配
向を開始するため、処理時間がその分長くなるという問
題がある。また、配向をスピンコートの後に高速回転で
行なうことから、低速回転での配向に比較して急速に塗
膜が乾燥していき、その乾燥状態もスピンドルがあるこ
とから、内周側と外周側でアンバランスになることが考
えられるなど、生産性および配向を受ける側の塗膜の状
態に対する配慮がされていなかった。
The above-mentioned magnetic field orientation can be divided into two methods: a method in which a magnetic material is coated on a disk substrate and then transported to another station for orientation, and a method in which the application and orientation are performed continuously in the same station. Considering the dry state and dynamic viscosity of the coating film mentioned above, the latter method is effective. As a method of this kind, Japanese Patent Application Laid-Open No. 58-222445
Publication No. This method allows coating and orientation to be performed continuously, and can also be performed without slowing down the high-speed rotation after spin coating, making it an effective method for improving the degree of orientation when aiming for thinner films. I can say that. However, since the orientation is started after performing spin coating to form the thickness of the coating film, there is a problem that the processing time becomes correspondingly longer. In addition, because the orientation is performed at high speed rotation after spin coating, the coating dries more rapidly than when orientation is performed at low speed rotation. There was no consideration given to productivity and the condition of the coating film on the side receiving orientation, such as the possibility of unbalance.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、このような従来の問題を解消し、磁気
ディスクの塗膜形成において、磁気ディスク製造におけ
る生産性を低下することなく、形成された塗膜の配向度
を向上させることのできる磁気ディスクの製造方法を提
供することにある。
An object of the present invention is to solve such conventional problems and to improve the degree of orientation of the formed coating film in forming a coating film on a magnetic disk without reducing productivity in manufacturing the magnetic disk. An object of the present invention is to provide a method for manufacturing a magnetic disk.

〔発明の概要〕[Summary of the invention]

上記目的を達成するために、本発明の磁気ディスクの製
造方法は、スピンドルでディスク基板を支持し、該ディ
スク基板を回転させて、上記基板上に磁性材料を滴下し
、スピンコートにより磁性膜厚を決定し、かつ、上記デ
ィスク基板と平行で、該基板の片側または両側に設けら
れた配向マグネットを該基板と同一方向に回転させて磁
場配向を行って塗膜形成を行う磁気ディスクの製造方法
において、上記配向マグネットの回転数と上記スピンコ
ート時の塗布高速回転数の相対速度を200 rPm以
内の範囲に設定し、上記スピンコートと同時に上記磁場
配向を行うことに特徴がある。
In order to achieve the above object, the method for manufacturing a magnetic disk of the present invention includes supporting a disk substrate with a spindle, rotating the disk substrate, dropping a magnetic material onto the substrate, and applying spin coating to increase the magnetic film thickness. A method for manufacturing a magnetic disk, which comprises determining the above-mentioned disk substrate, and rotating an alignment magnet provided on one or both sides of the disk substrate in the same direction as the substrate to perform magnetic field alignment and forming a coating film. The present invention is characterized in that the relative speed between the rotational speed of the orientation magnet and the high-speed coating rotational speed during spin coating is set within a range of 200 rPm, and the magnetic field orientation is performed simultaneously with the spin coating.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の一実施例を、図面により詳細に説明する
Hereinafter, one embodiment of the present invention will be described in detail with reference to the drawings.

まず1本発明の詳細な説明をする。First, the present invention will be explained in detail.

一般に、磁気ディスクに用いられる磁性塗料のほとんど
全ては、チキソトロピックな流動をする構造を持ち、塗
料をスピンコートする時などの高ずり速度状態では粘度
が低下して、流れがよくなり、また、塗布直後の低ずり
速度のときは粘度が高く安定するような挙動を示す、し
たがって、磁気ディスクの塗膜形成においで、その配向
度を向上させるために、塗膜の乾燥状態および動的粘度
の上でも最も適したスピンコート時に、ディスク基板と
同軸上に取りつけられた配向マグネットおよびマグネッ
トベースをディスク基板と平行に設置して、かつ、ディ
スク基板の回転方向と同一方向に回転させ、その回転数
もディスク基板のそれに対して±20Orpmの範囲内
にすることによって、スピンコートと同時に配向を行う
ようにしたものである。
In general, almost all magnetic paints used for magnetic disks have a structure that allows thixotropic flow, and at high shear rates such as when spin coating the paint, the viscosity decreases and the flow improves. When the shear rate is low immediately after coating, the viscosity is high and exhibits stable behavior. Therefore, in order to improve the degree of orientation when forming a coating film on a magnetic disk, the dry state of the coating film and the dynamic viscosity must be adjusted. During spin coating, which is the most suitable method for spin coating, the orientation magnet and magnet base, which are coaxially attached to the disk substrate, are installed parallel to the disk substrate and rotated in the same direction as the rotation direction of the disk substrate. The orientation is performed at the same time as spin coating by setting the angle within the range of ±20 Orpm with respect to that of the disk substrate.

第1図は1本発明の一実施例を示す塗膜形成装置の概略
構成図である。
FIG. 1 is a schematic diagram of a coating film forming apparatus showing an embodiment of the present invention.

第1図において、10はディスク基板11を回転させる
スピンドル、11は磁性塗料が塗布されるディスク基板
、30は配向マグネット31を取付ける配向マグネット
ベース、31は磁性体の磁化容易軸を一方向に揃えるた
めの配向マグネット。
In FIG. 1, 10 is a spindle for rotating a disk substrate 11, 11 is a disk substrate to which a magnetic paint is applied, 30 is an orientation magnet base to which an orientation magnet 31 is attached, and 31 is for aligning the axis of easy magnetization of the magnetic material in one direction. Orientation magnet for.

32はマグネット駆動モータ33からの駆動力を伝達す
るタイミングベルト、33はスピンドル10に取付けら
れたディスク基板と、配向マグネット30とを同期を取
って回転させるマグネット駆動モータであり、所定の相
対速度を持たせている。
32 is a timing belt that transmits the driving force from the magnet drive motor 33; 33 is a magnet drive motor that rotates the disk substrate attached to the spindle 10 and the orientation magnet 30 in synchronization; I have it.

第1図の状態は、後述する第2図の塗布機構により塗布
アーム13をディスク基板ll上に移動させ、塗布アー
ム13から磁性材料(磁性粒子。
In the state shown in FIG. 1, the application arm 13 is moved onto the disk substrate 11 by the application mechanism shown in FIG.

有機系樹脂、および非磁性荷重支持粒子を主成分とする
)を滴下(塗布)したものを示している。
This figure shows a droplet (applying) of organic resin and non-magnetic load-bearing particles.

第2図は、第1図の塗布機構を説明するための図である
。ここで、ディスク基板11に磁性塗料を塗布する場合
は、スピンドル10を低速回転させて行っている。
FIG. 2 is a diagram for explaining the coating mechanism shown in FIG. 1. Here, when applying the magnetic paint to the disk substrate 11, the spindle 10 is rotated at a low speed.

第2図において、12は磁性材料等を噴出してディスク
基板11上に塗布するための塗布ノズル、13は塗布ノ
ズル12に取付けられていてディスク基板11上を移動
する塗布アームである。これらの塗布機構は、通常は第
1図の塗膜形成装置の収納部分(図示せず)に格納され
ており、磁性材料(磁性塗料)を滴下(塗布)する場合
にディスク基板11上に移動されるようになっている。
In FIG. 2, reference numeral 12 is a coating nozzle for ejecting magnetic material or the like to coat the disk substrate 11, and 13 is a coating arm that is attached to the coating nozzle 12 and moves over the disk substrate 11. These coating mechanisms are normally stored in the housing part (not shown) of the coating film forming apparatus shown in FIG. 1, and are moved onto the disk substrate 11 when dropping (coating) magnetic material (magnetic paint). It is now possible to do so.

第3図は第2図の塗布機構によりディスク基板11に磁
性塗料が適下された状態を示す図である。
FIG. 3 is a diagram showing a state in which magnetic paint is applied to the disk substrate 11 by the coating mechanism shown in FIG.

この状態では、ディスク基板11は、中速回転するよう
に行う。
In this state, the disk substrate 11 is rotated at a medium speed.

以下、第1図〜第3図を用いて、塗膜形成の工程を詳細
に説明する。
Hereinafter, the process of forming a coating film will be explained in detail using FIGS. 1 to 3.

まず、スピンドルIOに保持されたディスク基板11を
低速回転およそ80〜350rp11で回転させ、第1
図の塗膜形成装置の収納部分(図示せず)に格納されて
いる塗布機構の塗布アーム13をディスク基板11上に
移動させて、この塗布アーム13に保持された塗布ノズ
ル12をディスク基板11上をシークさせながら磁性塗
料を滴下する。
First, the disk substrate 11 held by the spindle IO is rotated at a low speed of approximately 80 to 350 rpm11, and the first
The coating arm 13 of the coating mechanism stored in the housing part (not shown) of the coating film forming apparatus shown in the figure is moved onto the disk substrate 11, and the coating nozzle 12 held by this coating arm 13 is moved onto the disk substrate 11. Drop the magnetic paint while seeking the top.

このとき、配向マグネットベース30は、ディスク基板
11から隔離されているので、その配向マグネットベー
ス30に接着された配向マグネット31の影響はないも
のとする。次に、磁性塗料の滴下が終了した段階で塗布
アーム13を上記収納部分(図示せず)に退避する。
At this time, since the orientation magnet base 30 is isolated from the disk substrate 11, it is assumed that there is no influence of the orientation magnet 31 bonded to the orientation magnet base 30. Next, when the dripping of the magnetic paint is completed, the applicator arm 13 is retracted to the storage area (not shown).

この退避が完了すると、第3図に示すような磁性塗料が
適下された状態のディスク基板11は中速回転の段階に
入る。この段階では、膜厚的には、2μ1以上ある状態
でディスク基板11の表面に全体的に広がっている。こ
こで、ディスク基板11の中速回転数はおよそ400〜
700rpmを用いた。次に、スピンドル10がスピン
コート(磁性塗料が塗布されているディスク基板11を
高速に回転させて余分な塗料を振り切ること)状態に入
ると同時に、マグネット駆動モータ33を駆動させ、配
向マグネット31を固定した配向マグネットベース30
をスピンドル10と同じ方向に回転させながらディスク
基板11に所定の距離まで接近させ、所定の時間配向を
行うようにする。ここで、あらかじめ配向マグネットベ
ース30の回転数Noを1104Orp、ディスク基板
11の高速回転数NHを1100rpi+と設定した。
When this evacuation is completed, the disk substrate 11 on which the magnetic paint has been applied as shown in FIG. 3 enters the stage of medium speed rotation. At this stage, the film has a thickness of 2μ1 or more and has spread over the entire surface of the disk substrate 11. Here, the medium speed rotation speed of the disk substrate 11 is approximately 400~
700 rpm was used. Next, at the same time that the spindle 10 enters the spin coating state (rotating the disk substrate 11 coated with magnetic paint at high speed to shake off excess paint), the magnet drive motor 33 is driven to rotate the orientation magnet 31. Fixed orientation magnet base 30
While rotating in the same direction as the spindle 10, the disk substrate 11 is brought close to a predetermined distance, and orientation is performed for a predetermined time. Here, the rotation speed No of the orientation magnet base 30 was set in advance to 1104 Orp, and the high speed rotation speed NH of the disk substrate 11 was set to 1100 rpi+.

従って、ディスク基板11と配向マグネット31との相
対回転数は、60rpmである6また、配向方法は、N
、S極の反発磁界で、配向マグネット31とディスク基
板11の塗膜表面の距離は2mmとした。なお、今回試
作に用いた磁性塗料の主な成分は、γFe2O3粒子、
アルミナ粒子、pvB樹脂。
Therefore, the relative rotation speed between the disk substrate 11 and the orientation magnet 31 is 60 rpm.6Also, the orientation method is N
, the distance between the orientation magnet 31 and the surface of the coating film on the disk substrate 11 was set to 2 mm due to the repulsive magnetic field of the S pole. The main components of the magnetic paint used in this prototype were γFe2O3 particles,
Alumina particles, pvB resin.

エポキシ樹脂、フェノール樹脂、セロソルブ系溶剤など
である。
These include epoxy resins, phenolic resins, and cellosolve solvents.

第4図は、本発明による配向度の評価結果を示す図であ
る。ここで、aは本発明による評価結果、bは従来技術
による評価結果を示している。
FIG. 4 is a diagram showing the evaluation results of the degree of orientation according to the present invention. Here, a indicates the evaluation result according to the present invention, and b indicates the evaluation result according to the prior art.

第4図に示すように、配向度の評価には、磁気ヒステリ
シス上の残留磁束密度Brと飽和磁束密度Bsの比(角
形比と称す)Br/Bsと塗膜表面粗さく平均中心線粗
さ)Raを使用し、縦軸に角形比(Br/Bs)を、横
軸に塗膜表面粗さRaを示しである。第4図からも明ら
かなように、本実施例と従来のように、高速回転(スピ
ンコート)後に10秒した後、配向を始めた場合とを比
較すると、Br/Bs、Raともに向上していることが
わかる。
As shown in Figure 4, the degree of orientation is evaluated using the ratio of the residual magnetic flux density Br on magnetic hysteresis to the saturation magnetic flux density Bs (referred to as the squareness ratio) Br/Bs, the coating film surface roughness, and the average center line roughness. ) Ra, the vertical axis shows the squareness ratio (Br/Bs), and the horizontal axis shows the coating film surface roughness Ra. As is clear from FIG. 4, when comparing this example with the conventional case where orientation was started 10 seconds after high-speed rotation (spin coating), both Br/Bs and Ra were improved. I know that there is.

このように、本実施例においては、磁気ディスクの塗膜
形成において、塗膜の乾燥状態および動的粘度の上でも
最も適したスピンコートと同時に、ディスク基板と同軸
上に取りつけられた配向マグネットベースをディスク基
板と平行に設置してかつ、ディスク基板の回転方向と同
一方向に回転させ、同時配向が可能となるので塗膜の配
向度を向上させることができる。
As described above, in this example, in forming a coating film on a magnetic disk, spin coating, which is most suitable in terms of the drying state and dynamic viscosity of the coating film, and the oriented magnet base attached coaxially with the disk substrate are used. is installed parallel to the disk substrate and rotated in the same direction as the rotation direction of the disk substrate, making simultaneous orientation possible, thereby improving the degree of orientation of the coating film.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明によれば、磁気ディスクの
塗膜形成において、生産性を低下させることなく、ディ
スク基板上に形成される塗膜の配向度を向上させること
ができる。
As explained above, according to the present invention, in forming a coating film on a magnetic disk, the degree of orientation of the coating film formed on the disk substrate can be improved without reducing productivity.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を示す塗膜形成装置の概略構
成図、第2図は第1図の塗布機構を説明するための図、
第3図は磁性塗料が滴下されたディスク基板が中速回転
時の状態を示す図、第4図は本発明により形成される塗
膜の配向度の評価結果を示す図である。 10ニスピンドル、11:ディスク基板、12:塗布ノ
ズル、13:!!![布アーム、20:磁性塗料。 30:配向マグネットベース、31:配向マグネット、
32:タイミングベルト、33:マグネット駆動モータ
。 第1図 第   2   図
FIG. 1 is a schematic configuration diagram of a coating film forming apparatus showing an embodiment of the present invention, FIG. 2 is a diagram for explaining the coating mechanism of FIG. 1,
FIG. 3 is a diagram showing a state in which a disk substrate onto which magnetic paint has been dropped is rotated at a medium speed, and FIG. 4 is a diagram showing evaluation results of the degree of orientation of a coating film formed according to the present invention. 10: Nissin spindle, 11: disk substrate, 12: coating nozzle, 13:! ! ! [Cloth arm, 20: Magnetic paint. 30: Orientation magnet base, 31: Orientation magnet,
32: Timing belt, 33: Magnet drive motor. Figure 1 Figure 2

Claims (1)

【特許請求の範囲】[Claims] (1)スピンドルでディスク基板を支持し、該ディスク
基板を回転させて、上記基板上に磁性材料を滴下し、ス
ピンコートにより磁性膜厚を決定し、かつ、上記ディス
ク基板と平行で、該基板の片側または両側に設けられた
配向マグネットを該基板と同一方向に回転させて磁場配
向を行って塗膜形成を行う磁気ディスクの製造方法にお
いて、上記配向マグネットの回転数と上記スピンコート
時の塗布高速回転数の相対速度を200rpm以内の範
囲に設定し、上記スピンコートと同時に上記磁場配向を
行うことを特徴とする磁気ディスクの製造方法。
(1) Support a disk substrate with a spindle, rotate the disk substrate, drop a magnetic material onto the substrate, determine the magnetic film thickness by spin coating, and place the disk substrate parallel to the disk substrate. In a method for manufacturing a magnetic disk in which a coating film is formed by rotating an orientation magnet provided on one or both sides of the substrate in the same direction as the substrate to perform magnetic field orientation, the number of rotations of the orientation magnet and the coating during spin coating are determined. A method for manufacturing a magnetic disk, characterized in that the relative speed of the high speed rotation is set within a range of 200 rpm, and the magnetic field orientation is performed simultaneously with the spin coating.
JP18958585A 1985-08-30 1985-08-30 Manufacture of magnetic disk Pending JPS6251030A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18958585A JPS6251030A (en) 1985-08-30 1985-08-30 Manufacture of magnetic disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18958585A JPS6251030A (en) 1985-08-30 1985-08-30 Manufacture of magnetic disk

Publications (1)

Publication Number Publication Date
JPS6251030A true JPS6251030A (en) 1987-03-05

Family

ID=16243789

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18958585A Pending JPS6251030A (en) 1985-08-30 1985-08-30 Manufacture of magnetic disk

Country Status (1)

Country Link
JP (1) JPS6251030A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6341524B1 (en) 1998-01-27 2002-01-29 Mitsubishi Heavy Industries, Ltd. Fuel gauge unit for a fuel tank
WO2009035093A1 (en) * 2007-09-14 2009-03-19 Showa Denko K.K. Double-face coating apparatus, and coating-liquid double-face coating method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6341524B1 (en) 1998-01-27 2002-01-29 Mitsubishi Heavy Industries, Ltd. Fuel gauge unit for a fuel tank
WO2009035093A1 (en) * 2007-09-14 2009-03-19 Showa Denko K.K. Double-face coating apparatus, and coating-liquid double-face coating method

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