JPS6250550B2 - - Google Patents
Info
- Publication number
- JPS6250550B2 JPS6250550B2 JP13898483A JP13898483A JPS6250550B2 JP S6250550 B2 JPS6250550 B2 JP S6250550B2 JP 13898483 A JP13898483 A JP 13898483A JP 13898483 A JP13898483 A JP 13898483A JP S6250550 B2 JPS6250550 B2 JP S6250550B2
- Authority
- JP
- Japan
- Prior art keywords
- metal
- acrylic resin
- resin product
- silicon oxide
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004925 Acrylic resin Substances 0.000 claims description 41
- 229920000178 Acrylic resin Polymers 0.000 claims description 41
- 239000002184 metal Substances 0.000 claims description 34
- 229910052751 metal Inorganic materials 0.000 claims description 33
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 20
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 20
- 238000007740 vapor deposition Methods 0.000 claims description 18
- 229910044991 metal oxide Inorganic materials 0.000 claims description 11
- 150000004706 metal oxides Chemical class 0.000 claims description 11
- 150000002736 metal compounds Chemical class 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 8
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 230000008602 contraction Effects 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- -1 TeO 2 Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
Description
〔技術分野〕
本発明は、各種ミラー、ハーフミラー、フイル
ター、覗き窓あるいは装飾品として用いられる金
属蒸着層を有するアクリル樹脂製品およびその製
造方法に関するものである。
〔従来技術〕
合成樹脂板に対し金属または金属化合物を蒸着
層を形成し、これを鏡面として使用したり、ある
いは導電膜等として使用することがよく行なわれ
ている。ところで、合成樹脂板に金属蒸着膜を形
成する場合、概して密着強度が低いため、下地層
としてのアンダーコートあるいは保護膜としての
トツプコートを施すのが一般的であつたが、アン
ダーコートやトツプコートはムラが生じたり、異
物が付着することがあつて、これらの形成に熟練
を要す難点があつた。
このため例えば特公昭55−30535号公報に記載
された発明のように、予め酸化ケイ素と金属との
合金層を形成した上で金属層を形成する等の改善
がなされている。ところが、金属をアクリル樹脂
に蒸着しようとすると、この発明に示された方法
で形成しても十分な密着強度は得られず、実用に
耐える製品は得られなかつた。これは、アクリル
樹脂が所定の表面硬度を有し、他の樹脂と比較し
て含水率、線膨張係数が大きく、しかも残留応力
も大きいことに起因すると考えられる。すなわち
アクリル樹脂板を真空蒸着する際には、加熱され
乾燥されるが、この状態から蒸着後に冷却、吸湿
を受けると、樹脂板が伸縮し、これに伴なつて金
属にヘアークラツクが生じ、殆んど密着性を示さ
ないこととなる。したがつて、アクリル樹脂板に
密着性の高い金属蒸着膜を形成するためには、真
空蒸着時のアクリル樹脂の膨張、収縮を十分考慮
した蒸着膜ないしは蒸着の方法を確立する必要が
ある。
〔発明の目的〕
本発明は上記従来の問題点に鑑み、密着性の高
い蒸着層を備えたアクリル樹脂製品およびその効
率的な製造方法を提供せんとするものである。
〔発明の構成〕
本発明は上記の目的を達成するためになされた
もので、その要旨とするところは、アクリル樹脂
製品の表面に、酸化ケイ素および該酸化ケイ素と
合金可能な金属または金属酸化物との混合物の混
合蒸着を形成し、さらに金属または金属化合物の
蒸着膜を形成したことを特徴とする蒸着層を有す
るアクリル樹脂製品を第１の発明とし、アクリル
樹脂製品を真空槽内に装填して所定の真空度とす
ると共に、アクリル樹脂製品を熱変形温度以下の
温度で予熱し、次に酸化ケイ素および酸化ケイ素
と合金可能な金属または金属酸化物との混合物を
蒸着し、さらに金属または金属化合物を蒸着させ
ることを特徴とするアクリル樹脂製品の製造方法
を第２の発明とするところにある。
以下本発明を実施例の図面に従つてさらに詳細
に説明する。
図中１はアクリル樹脂製品で、このアクリル樹
脂製品１は、一般的に用いられているアクリル樹
脂の板状品、成形品が使用できる。そして、この
表面に最終的に金属または金属化合物の蒸着層が
形成されるが、通常この蒸着膜は一方の表面に設
けられる。勿論両面に設けてもよい。
２は、酸化ケイ素および該酸化ケイ素と合金可
能な金属または金属酸化物との混合蒸着層で、こ
の場合の金属としてはチタン、クロム、ニツケル
が使用でき、また金属酸化物としては酸化チタ
ン、酸化セリウム、酸化タングステン、酸化イン
ジウムが使用できる。この混合蒸着層２、第２図
に示すように例えば酸化ケイ素と酸化チタンを用
いた場合には、まず酸化ケイ素の単独層２１、酸
化ケイ素と酸化チタンとの混合層２２さらに酸化
チタンの単独層２３の如く形成すると蒸着膜が透
明となりしかも密着力が強固となるので都合が良
い。
３は、上記混合蒸着層２の上に形成する蒸着層
で、Al、Cr、Ag、Cu、Bi、In、Mg、Ni、Se、
Te、Ti等の金属、CeO2、In2O3、SiO、SnO2、
TeO2、TiO、TiO2、WO3、CeF3、MgF2等の金
属化合物から選ばれた１種以上のものが用いられ
る。
このようにして蒸着層３を形成すると、下地層
に酸化ケイ素と該酸化ケイ素との混合可能な金属
または金属酸化物との混合物の混合蒸着層２が存
在するため、密着性が頗る向上することとなる。
なお、この混合蒸着層２の厚さとしては30〜100
Å程度、また金属蒸着層３の厚さとしては30〜
500Å程度とするのが好ましい。
以上のように２つの蒸着層が重層として形成さ
れた本発明のアクリル樹脂製品は、アンダーコー
トやトツプコートを施すことなく密着性が優れて
おり、十分に実用性のあることが判明した。
次に本発明の最適な製造方法について説明する
が、本発明の製造方法も金属蒸着の技術に基づい
て行なわれるものである。
まず対象となるアクリル樹脂製品１は、被処理
面が洗浄され、真空槽具体的にはベルジヤ内に装
填される。ベルジヤは閉じられ、内部は真空ポン
プ等により徐々に真空度を高め、所定の真空度に
保持される。一般的にはこの状態に至ると、蒸発
源となる金属等が加熱、溶融され、金属等が微粉
末状となつて飛散し、被処理面に付着して蒸着層
が形成される。このときアクリル樹脂製品１は、
真空による水分の離脱による収縮現象、金属の溶
融による熱の影響による膨張現象さらには蒸着終
了後の大気導入による吸湿による膨張現象を起
し、しかもそれらの現象が微妙に入り乱れて発生
することにより、アクリル樹脂製品１は複雑な膨
張、収縮を起している。したがつてのような現象
が伴なつている被処理面に、蒸発した金属等が付
着しても十分な密着強度が得られていないことと
なる。
そこで本発明においては、その第１の発明にお
いて上記の影響を緩和するために、複数の蒸着層
を重層に形成することによつて密着性を高めるよ
うにしたものであるが、第２の発明においてはア
クリル樹脂製品１の膨張、収縮する現象を極力抑
える処理を併用して、一層密着の高いアクリル樹
脂製品を提供しようとするものである。
このため第２の発明においては、ベルジヤ内に
装填されて所定の真空度に置かれているアクリル
樹脂製品１を、蒸着前の段階で予熱し、膨張、収
縮現象の緩和ないし抑制をせんとするものであ
る。すなわち、アクリル樹脂製品を熱変形温度以
下、好ましくは30〜50℃程度で、0.5〜１分間程
度加熱する。この予熱を行なつた後は、前述した
酸化ケイ素および酸化ケイ素と合金可能な金属ま
たは金属酸化物との混合物を蒸着して混合蒸着層
２を形成し、引続きAl、Cr、Cu等から選ばれた
１つの金属または金属化合物を蒸着して金属蒸着
層３を形成し、これによつて本発明のアクリル樹
脂製品が製造される。この個々の金属等の蒸着条
件は、何等特別なものではなく、一般的な条件が
採用しうる。
〔実施例〕
アクリル樹脂製品として、板厚２mm、縦×横
100×100mmの透明アクリル樹脂板を用意し、この
被処理面をメタノールと水で洗浄した。そしてこ
の透明アクリル樹脂板を、被処理面が蒸発源に向
うようにベルジヤ内に装填し、真空度が１×
10-4torrになるように準備する。次に透明アクリ
ル樹脂板を基板加熱用フイラメントによつて40℃
で１分間予熱した上で、酸化ケイ素と酸化チタン
の混合物を第２図の如き層となるよう、すなわち
まず酸化ケイ素を蒸発させ次に酸化チタンも併せ
て蒸発させ最後に酸化チタンのみ蒸発させた。こ
のときの酸化ケイ素と酸化チタンの使用量は、
SiOが0.1ｇ、TiOが0.02ｇであつた。引続きAlを
0.5ｇ蒸着させた。なおアクリル樹脂板と蒸着用
フイラメントとの間隔は50cmとした。
得られた金属蒸着層を有するアクリル樹脂板の
性能を評価したところ、第１表に示す如く良好な
ものであつた。なお、比較品はアクリル樹脂板に
直接Al蒸着を行なつたものである。
[Technical Field] The present invention relates to an acrylic resin product having a metal vapor deposited layer used as various mirrors, half mirrors, filters, viewing windows, or decorative items, and a method for manufacturing the same. [Prior Art] It is common practice to form a vapor-deposited layer of a metal or a metal compound on a synthetic resin plate and use this as a mirror surface or a conductive film. By the way, when forming a metal vapor deposited film on a synthetic resin board, the adhesion strength is generally low, so it was common to apply an undercoat as a base layer or a top coat as a protective film, but the undercoat and top coat are uneven. There were problems in that the formation of these problems required skill, as there were cases where the formation of these problems caused the formation of foreign matter and the adhesion of foreign substances. For this reason, improvements have been made, such as the invention described in Japanese Patent Publication No. 55-30535, in which an alloy layer of silicon oxide and metal is formed in advance and then a metal layer is formed. However, when attempting to vapor-deposit metal onto an acrylic resin, sufficient adhesion strength could not be obtained even with the method shown in the present invention, and a product that could withstand practical use could not be obtained. This is thought to be due to the fact that the acrylic resin has a predetermined surface hardness, has a higher water content and coefficient of linear expansion than other resins, and also has a higher residual stress. In other words, when vacuum-depositing an acrylic resin plate, it is heated and dried, but when it is cooled and absorbs moisture after being vapor-deposited, the resin plate expands and contracts, and as a result, hair cracks occur in the metal. This results in no adhesion. Therefore, in order to form a highly adhesive metal vapor deposited film on an acrylic resin plate, it is necessary to establish a vapor deposited film or a vapor deposition method that fully takes into account the expansion and contraction of the acrylic resin during vacuum vapor deposition. [Object of the Invention] In view of the above-mentioned conventional problems, it is an object of the present invention to provide an acrylic resin product having a vapor deposited layer with high adhesion and an efficient manufacturing method thereof. [Structure of the Invention] The present invention has been made to achieve the above object, and its gist is that silicon oxide and a metal or metal oxide that can be alloyed with the silicon oxide are added to the surface of an acrylic resin product. The first invention provides an acrylic resin product having a vapor deposited layer characterized by forming a mixed vapor deposition layer of a mixture of a metal or a metal compound and further forming a vapor deposited film of a metal or a metal compound, and the acrylic resin product is loaded into a vacuum chamber. At the same time, the acrylic resin product is preheated to a temperature below the heat distortion temperature, and then silicon oxide and a mixture of a metal or metal oxide that can be alloyed with silicon oxide are vapor-deposited, and then the metal or metal oxide is vapor-deposited. A second invention is a method for manufacturing an acrylic resin product, which is characterized by vapor-depositing a compound. The present invention will be explained in more detail below with reference to drawings of embodiments. In the figure, 1 is an acrylic resin product, and the acrylic resin product 1 can be a plate-like product or a molded product made of commonly used acrylic resin. A vapor deposited layer of a metal or a metal compound is finally formed on this surface, but this vapor deposited film is usually provided on one surface. Of course, it may be provided on both sides. 2 is a mixed vapor deposition layer of silicon oxide and a metal or metal oxide that can be alloyed with the silicon oxide; in this case, titanium, chromium, or nickel can be used as the metal, and titanium oxide or metal oxide can be used as the metal oxide. Cerium, tungsten oxide, and indium oxide can be used. When this mixed vapor deposition layer 2 is made of silicon oxide and titanium oxide, for example, as shown in FIG. Forming as shown in 23 is convenient because the vapor deposited film becomes transparent and the adhesion is strong. 3 is a vapor deposition layer formed on the mixed vapor deposition layer 2, which includes Al, Cr, Ag, Cu, Bi, In, Mg, Ni, Se,
Metals such as Te and Ti, CeO 2 , In 2 O 3 , SiO, SnO 2 ,
One or more metal compounds selected from metal compounds such as TeO 2 , TiO, TiO 2 , WO 3 , CeF 3 and MgF 2 are used. When the vapor deposition layer 3 is formed in this manner, the adhesion is significantly improved because the mixed vapor deposition layer 2 of a mixture of silicon oxide and a metal or metal oxide that can be mixed with the silicon oxide is present in the base layer. becomes.
The thickness of this mixed vapor deposition layer 2 is 30 to 100 mm.
The thickness of the metal vapor deposition layer 3 is approximately 30 Å.
The thickness is preferably about 500 Å. It has been found that the acrylic resin product of the present invention, in which two vapor deposited layers are formed as a multilayer as described above, has excellent adhesion without requiring an undercoat or a topcoat, and is sufficiently practical. Next, an optimal manufacturing method of the present invention will be explained, and the manufacturing method of the present invention is also based on metal vapor deposition technology. First, the surface of the target acrylic resin product 1 to be treated is cleaned, and the product is loaded into a vacuum tank, specifically, a bell jar. The bell gear is closed, and the vacuum inside is gradually increased using a vacuum pump or the like to maintain a predetermined vacuum. Generally, when this state is reached, the metal or the like serving as the evaporation source is heated and melted, and the metal or the like is scattered in the form of fine powder and adheres to the surface to be processed to form a vapor deposited layer. At this time, the acrylic resin product 1 is
Shrinkage occurs due to the removal of moisture due to vacuum, expansion due to the influence of heat due to melting of the metal, and expansion due to moisture absorption due to the introduction of the atmosphere after vapor deposition, and these phenomena are subtly intermingled. The acrylic resin product 1 undergoes complicated expansion and contraction. Therefore, even if evaporated metal or the like adheres to a surface to be treated that is accompanied by such a phenomenon, sufficient adhesion strength will not be obtained. Therefore, in the present invention, in order to alleviate the above-mentioned influence in the first invention, a plurality of vapor deposited layers are formed in a layered manner to increase adhesion, but the second invention In this method, an attempt is made to provide an acrylic resin product with even higher adhesion by using a treatment that suppresses the phenomenon of expansion and contraction of the acrylic resin product 1 as much as possible. For this reason, in the second invention, the acrylic resin product 1 loaded in a bell gear and placed at a predetermined degree of vacuum is preheated at a stage before vapor deposition to alleviate or suppress expansion and contraction phenomena. It is something. That is, the acrylic resin product is heated below its heat distortion temperature, preferably at about 30 to 50°C, for about 0.5 to 1 minute. After this preheating, a mixture of silicon oxide and a metal or metal oxide that can be alloyed with silicon oxide is deposited to form a mixed deposition layer 2, followed by a layer of silicon oxide selected from Al, Cr, Cu, etc. Another metal or metal compound is deposited to form a metal deposited layer 3, thereby producing the acrylic resin product of the present invention. The vapor deposition conditions for each metal, etc. are not special at all, and general conditions can be adopted. [Example] As an acrylic resin product, plate thickness 2 mm, length x width
A 100 x 100 mm transparent acrylic resin plate was prepared, and the surface to be treated was washed with methanol and water. Then, this transparent acrylic resin plate was loaded into the bell gear with the surface to be treated facing the evaporation source, and the vacuum level was set to 1×.
Prepare for 10 -4 torr. Next, the transparent acrylic resin plate was heated to 40°C using a substrate heating filament.
After preheating for 1 minute, the mixture of silicon oxide and titanium oxide was made into a layer as shown in Figure 2. First, the silicon oxide was evaporated, then the titanium oxide was also evaporated, and finally only the titanium oxide was evaporated. . The amounts of silicon oxide and titanium oxide used at this time are:
The amount of SiO was 0.1 g and the amount of TiO was 0.02 g. Continue with Al
0.5g was deposited. Note that the distance between the acrylic resin plate and the filament for deposition was 50 cm. When the performance of the obtained acrylic resin plate having the metal vapor deposited layer was evaluated, it was found to be good as shown in Table 1. Note that the comparison product is one in which Al was directly deposited on an acrylic resin plate.
本発明は以上の如き構成からなるものであるか
ら、密着性の高い蒸着層を有するアクリル樹脂製
品を提供でき、しかも他に特別な装置を要するこ
とがなく密着性の高いこの種アクリル樹脂製品を
効率よく製造することができる利点がある。
Since the present invention is constructed as described above, it is possible to provide an acrylic resin product having a vapor deposited layer with high adhesion, and furthermore, it is possible to provide this type of acrylic resin product with high adhesion without requiring any other special equipment. It has the advantage of being able to be manufactured efficiently.
第１図は本発明の一実施例を示すアクリル樹脂
製品の部分的な拡大断面図、第２図は第１図部
分の拡大断面図である。
１…アクリル樹脂製品、２…混合蒸着層、３…
金属蒸着層。
FIG. 1 is a partially enlarged sectional view of an acrylic resin product showing one embodiment of the present invention, and FIG. 2 is an enlarged sectional view of the portion shown in FIG. 1. 1...Acrylic resin product, 2...Mixed vapor deposition layer, 3...
Metal evaporated layer.
Claims (1)
び該酸化ケイ素と合金可能な金属または金属酸化
物との混合物の混合蒸着を形成し、さらに金属ま
たは金属化合物の蒸着層を形成したことを特徴と
する蒸着層を有するアクリル樹脂製品。 ２ アクリル樹脂製品を真空槽内に装填して所定
の真空度とすると共に、アクリル樹脂製品を熱変
形温度以下の温度で予熱し、次に酸化ケイ素およ
び酸化ケイ素と合金可能な金属または金属酸化物
との混合物を蒸着し、さらに金属または金属化合
物を蒸着させることを特徴とするアクリル樹脂製
品の製造方法。[Claims] 1. A mixed vapor deposition layer of a mixture of silicon oxide and a metal or metal oxide that can be alloyed with the silicon oxide is formed on the surface of an acrylic resin product, and a vapor deposition layer of a metal or metal compound is further formed. An acrylic resin product having a vapor deposited layer characterized by: 2. Load the acrylic resin product into a vacuum chamber to achieve a predetermined degree of vacuum, preheat the acrylic resin product at a temperature below the heat distortion temperature, and then add silicon oxide and a metal or metal oxide that can be alloyed with silicon oxide. A method for producing an acrylic resin product, which comprises depositing a mixture of acrylic resin and a metal or a metal compound.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13898483A JPS6029464A (en) | 1983-07-29 | 1983-07-29 | Acryl resin product having vapor deposition layer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13898483A JPS6029464A (en) | 1983-07-29 | 1983-07-29 | Acryl resin product having vapor deposition layer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6029464A JPS6029464A (en) | 1985-02-14 |
| JPS6250550B2 true JPS6250550B2 (en) | 1987-10-26 |
Family
ID=15234755
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13898483A Granted JPS6029464A (en) | 1983-07-29 | 1983-07-29 | Acryl resin product having vapor deposition layer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6029464A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04359U (en) * | 1990-04-10 | 1992-01-06 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63313574A (en) * | 1987-06-16 | 1988-12-21 | Ajinomoto Co Inc | Powder resistant to moisture-absorption and agglomeration |
| US6651381B2 (en) | 1995-02-01 | 2003-11-25 | Asahi Glass Company Ltd. | Synthetic resin molded material and method for its production |
| EP1217092A3 (en) * | 1995-02-01 | 2002-08-07 | Asahi Glass Company Ltd. | Synthetic resin moldings |
-
1983
- 1983-07-29 JP JP13898483A patent/JPS6029464A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04359U (en) * | 1990-04-10 | 1992-01-06 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6029464A (en) | 1985-02-14 |
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