JPS62492B2 - - Google Patents

Info

Publication number
JPS62492B2
JPS62492B2 JP365179A JP365179A JPS62492B2 JP S62492 B2 JPS62492 B2 JP S62492B2 JP 365179 A JP365179 A JP 365179A JP 365179 A JP365179 A JP 365179A JP S62492 B2 JPS62492 B2 JP S62492B2
Authority
JP
Japan
Prior art keywords
mask
resist layer
layer
resist
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP365179A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5595951A (en
Inventor
Akira Morishige
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP365179A priority Critical patent/JPS5595951A/ja
Publication of JPS5595951A publication Critical patent/JPS5595951A/ja
Publication of JPS62492B2 publication Critical patent/JPS62492B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP365179A 1979-01-16 1979-01-16 Production of photo mask Granted JPS5595951A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP365179A JPS5595951A (en) 1979-01-16 1979-01-16 Production of photo mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP365179A JPS5595951A (en) 1979-01-16 1979-01-16 Production of photo mask

Publications (2)

Publication Number Publication Date
JPS5595951A JPS5595951A (en) 1980-07-21
JPS62492B2 true JPS62492B2 (enrdf_load_stackoverflow) 1987-01-08

Family

ID=11563369

Family Applications (1)

Application Number Title Priority Date Filing Date
JP365179A Granted JPS5595951A (en) 1979-01-16 1979-01-16 Production of photo mask

Country Status (1)

Country Link
JP (1) JPS5595951A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS5595951A (en) 1980-07-21

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